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1. 发明申请

WO2011103048A2 METHOD AND SYSTEM FOR PROVIDING PROCESS TOOL CORRECTABLES USING AN OPTIMZED SAMPLING SCHEME WITH SMART INTERPOLATION 审中-公开
标题翻译：使用优化采样方案与智能插值提供过程工具可修正性的方法和系统
公开(公告)号：WO2011103048A2
公开(公告)日：2011-08-25
申请号：PCT/US2011/024689
申请日：2011-02-14
申请人： KLA-TENCOR CORPORATION , IZIKSON, Pavel , KANDEL, Daniel , ROBINSON, John
发明人： IZIKSON, Pavel , KANDEL, Daniel , ROBINSON, John
IPC分类号： H01L21/66 , H01L21/027
CPC分类号： H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： The present invention may include performing a first measurement on a wafer of a first lot of wafers via an omniscient sampling process, calculating a first set of process tool correctables utilizing one or more results of the measurement performed via an omniscient sampling process, randomly selecting a set of field sampling locations of the wafer of a first lot of wafers, calculating a second set of process tool correctables by applying an interpolation process to the randomly selected set of field sampling locations, wherein the interpolation process utilizes values from the first set of process tool correctables for the randomly selected set of field sampling locations in order to calculate correctables for fields of the wafer of the first lot not included in the set of randomly selected fields, and determining a sub-sampling scheme by comparing the first set of process tool correctables to the second set of correctables.
摘要翻译：本发明可以包括通过无所不在的采样处理在第一批晶片的晶片上进行第一测量，利用通过全方位采样过程执行的一个或多个测量结果来计算第一组处理工具校正值，随机选择第一批晶片的晶片的一组场采样位置，通过对随机选择的一组场采样位置应用内插处理来计算第二组处理工具可校正值，其中所述内插处理利用来自第一组处理的值用于随机选择的一组场采样位置的工具可校正，以便计算不包括在随机选择的场的集合中的第一批的晶片的场的可校正性，以及通过比较第一组处理工具来确定子采样方案可纠正到第二组可纠正的。

2. 发明申请

WO2009143200A2 SUBSTRATE MATRIX TO DECOUPLE TOOL AND PROCESS EFFECTS 审中-公开
标题翻译：基板矩阵对工具和过程效应
公开(公告)号：WO2009143200A2
公开(公告)日：2009-11-26
申请号：PCT/US2009/044594
申请日：2009-05-20
申请人： KLA-TENCOR CORPORATION , IZIKSON, Pavel , ADEL, Michael, E. , KANDEL, Daniel
发明人： IZIKSON, Pavel , ADEL, Michael, E. , KANDEL, Daniel
IPC分类号： H01L21/66
CPC分类号： G03F7/70641 , G05B19/41845 , G05B2219/32187 , G05B2219/36307 , H01L22/20 , Y02P90/16 , Y02P90/22
摘要： A method of characterizing a process by selecting the process to characterize, selecting a parameter of the process to characterize, determining values of the parameter to use in a test matrix, specifying an eccentricity for the test matrix, selecting test structures to be created in cells on a substrate, processing the substrate through the process using in each cell the value of the parameter as determined by the eccentric test matrix, measuring a property of the test structures in the cells, and developing a correlation between the parameter and the property.
摘要翻译：一种通过选择表征过程来表征过程的方法，选择过程的参数来表征，确定在测试矩阵中使用的参数的值，指定测试矩阵的偏心度，选择要在单元格中创建的测试结构在基板上，通过在每个单元中使用由偏心测试矩阵确定的参数值来处理基板，测量单元中的测试结构的性质，以及发展参数与特性之间的相关性。

3. 发明申请

WO2011028807A2 METROLOGY SYSTEMS AND METHODS 审中-公开
标题翻译：计量系统和方法
公开(公告)号：WO2011028807A2
公开(公告)日：2011-03-10
申请号：PCT/US2010/047539
申请日：2010-09-01
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , SVIZHER, Alexander , SELIGSON, Joel , HILL, Andrew , BACHAR, Ohad , MANASSEN, Amnon , CHUANG, Yung-Ho Alex , SELA, Ilan , MARKOWITZ, Moshe , NEGRI, Daria , ROTEM, Efraim
IPC分类号： H01L21/66
CPC分类号： G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
摘要： Various metrology systems and methods are provided.
摘要翻译：
提供了各种计量系统和方法。

4. 发明申请

WO2008134378A1 OPTICAL GAIN APPROACH FOR ENHANCEMENT OF OVERLAY AND ALIGNMENT SYSTEMS PERFORMANCE 审中-公开
标题翻译：增强覆盖和对准系统性能的光学增益方法
公开(公告)号：WO2008134378A1
公开(公告)日：2008-11-06
申请号：PCT/US2008/061318
申请日：2008-04-23
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , ADEL, Michael , SELIGSON, Joel
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , ADEL, Michael , SELIGSON, Joel
IPC分类号： G01N21/00
CPC分类号： G01B11/272 , G03F7/70633
摘要： A resultant image of a grating target may be obtained by dividing an image of the target into first and second portions and optically modifying the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern. The resultant image may be analyzed to determine a shift in the grating target from a shift in the Moiré pattern. Optical alignment apparatus may include a first beam splitter, an image transformation element optically coupled to the first beam splitter, and a second beam splitter. The first beam splitter divides an image of a grating target into first and second portions. The second beam splitter combines the first portion and the second portion. The image transformation element optically modifies the first and/or second portion such that a final image formed from their combination is characterized by a Moiré pattern.
摘要翻译：可以通过将目标图像划分成第一和第二部分并光学地修改第一和/或第二部分使得由其组合形成的最终图像由莫尔图案表征来获得光栅目标的合成图像。可以分析所得到的图像以确定光栅目标从莫尔图案的偏移中的偏移。光学对准装置可以包括第一分束器，光耦合到第一分束器的图像变换元件和第二分束器。第一分束器将光栅靶的图像分成第一和第二部分。第二分束器组合第一部分和第二部分。图像变换元件光学地修改第一和/或第二部分，使得由它们的组合形成的最终图像的特征在于莫尔图案。

5. 发明申请

WO2011011511A1 ANGLE-RESOLVED ANTISYMMETRIC SCATTEROMETRY 审中-公开
标题翻译：角解决的反对称散射测量
公开(公告)号：WO2011011511A1
公开(公告)日：2011-01-27
申请号：PCT/US2010/042738
申请日：2010-07-21
申请人： KLA-TENCOR CORPORATION , KANDEL, Daniel , LEVINSKI, Vladimir , SAPIENS, Noam
发明人： KANDEL, Daniel , LEVINSKI, Vladimir , SAPIENS, Noam
IPC分类号： G01J4/00
CPC分类号： G01N21/95607 , G01B11/14 , G01B11/24 , G01B2210/56 , G03F7/70633
摘要： A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS 1 ) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS 2 ) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS 1 ) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS 2 ) associated with the second scatterometry cell.
摘要翻译：用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（ΔS1）; 获得与第二散射测量单元相关联的第二反对称差分信号（θS2），并计算与第一散射测量单元和第二反对称差分信号相关联的第一反对称差分（ΔS1）信号的叠加偏移（ βS2）与第二散射测量单元相关联。

6. 发明申请

WO2012109348A1 STRUCTURED ILLUMINATION FOR CONTRAST ENHANCEMENT IN OVERLAY METROLOGY 审中-公开
标题翻译：结构化照明在超大规模的对比度增强
公开(公告)号：WO2012109348A1
公开(公告)日：2012-08-16
申请号：PCT/US2012/024320
申请日：2012-02-08
申请人： KLA-TENCOR CORPORATION , SELIGSON, Joel, L. , SAPIENS, Noam , KANDEL, Daniel
发明人： SELIGSON, Joel, L. , SAPIENS, Noam , KANDEL, Daniel
IPC分类号： G03F9/00
CPC分类号： G01N21/47 , G01B11/02 , G01N21/00 , G03F7/70633
摘要： Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.
摘要翻译：计量工具中的对比度增强可以包括产生照射光束，将所产生的光束的一部分引导到空间光调制器（SLM）的表面上，引导入射到SLM的表面上的所产生的光束的至少一部分通过孔径的孔径停止并且连接到一个或多个样本的一个或多个目标结构上，并且通过使用SLM生成通过孔径透射的照明的选择的照明光瞳函数，以便建立一个或多个场图像的对比度所述一个或多个目标结构在所选择的对比度阈值之上，以及利用所选择的照明光瞳功能对所述一个或多个目标结构执行一个或多个度量测量。

7. 发明申请

WO2010080732A2 SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 审中-公开
标题翻译： SCATTERMETRY计量学目标设计优化
公开(公告)号：WO2010080732A2
公开(公告)日：2010-07-15
申请号：PCT/US2010/020046
申请日：2010-01-04
申请人： KLA-TENCOR CORPORATION , ADEL, Michael E. , MANASSEN, Amnon , KANDEL, Daniel
发明人： ADEL, Michael E. , MANASSEN, Amnon , KANDEL, Daniel
IPC分类号： H01L21/66
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.
摘要翻译：可以使用包括计量目标设计信息，底物信息，过程信息和计量系统信息的输入来优化计量目标设计。采用计量系统获取计量信号可以使用输入来建模，以产生计量目标的一个或多个光学特性。可以将计量学算法应用于特征以确定由计量系统制定的度量目标的预测精度和测量精度。可以修改与度量目标设计有关的部分信息，并且可以重复信号建模和计量学算法以优化一个或多个测量的精度和精度。可以在精度和精度优化后显示或存储度量目标设计。

8. 发明申请

WO2012018674A2 OPTICS SYMMETRIZATION FOR METROLOGY 审中-公开
标题翻译：计量学的光学对称
公开(公告)号：WO2012018674A2
公开(公告)日：2012-02-09
申请号：PCT/US2011/045784
申请日：2011-07-28
申请人： KLA-TENCOR CORPORATION , MANASSEN, Ammon , KANDEL, Daniel , BARUCH, Moshe , SELIGSON, Joel , SVIZHER, Alexander , COHEN, Guy , ROTEM, Efraim , BACHAR, Ohad , NEGRI, Daria , SAPIENS, Noam
发明人： MANASSEN, Ammon , KANDEL, Daniel , BARUCH, Moshe , SELIGSON, Joel , SVIZHER, Alexander , COHEN, Guy , ROTEM, Efraim , BACHAR, Ohad , NEGRI, Daria , SAPIENS, Noam
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G01N21/55 , G03F7/70616
摘要： The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
摘要翻译：本发明包括照明源，至少一个照明对称化模块（ISM），其被配置为使从照明源发出的光的至少一部分对称化;第一分束器，其被配置为将第一部分由ISM沿着物体路径沿着参考路径沿着物体路径被ISM处理到一个或多个样本的表面以及由ISM处理的第二部分光;以及沿着主光轴布置的检测器，其中检测器被配置为收集从一个或多个样本的表面反射的一部分光。

9. 发明申请

WO2011159725A2 DISCRETE POLARIZATION SCATTEROMETRY 审中-公开
标题翻译：离散极化分析
公开(公告)号：WO2011159725A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040389
申请日：2011-06-14
申请人： KLA-TENCOR CORPORATION , HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
发明人： HILL, Andrew V. , MANASSEN, Amnon , KANDEL, Daniel , LEVINSKI, Vladimir , SELIGSON, Joel , SVIZHER, Alexander , WANG, David Y. , ROTTER, Lawrence D. , DE VEER, Johannes D.
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G02B27/141 , G01N21/474 , G01N21/4788 , G01N2021/4792 , G02B27/145 , G03F7/70633
摘要： Systems and methods for discrete polarization scatterometry are provided.
摘要翻译：提供了离散极化散射法的系统和方法。

10. 发明申请

WO2011159625A2 ADVANCED PROCESS CONTROL OPTIMIZATION 审中-公开
标题翻译：高级过程控制优化
公开(公告)号：WO2011159625A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040216
申请日：2011-06-13
申请人： KLA-TENCOR CORPORATION , CHOI, DongSub , WIDMANN, Amir , KANDEL, Daniel , TIEN, David
发明人： CHOI, DongSub , WIDMANN, Amir , KANDEL, Daniel , TIEN, David
IPC分类号： H01L21/027
CPC分类号： G03F7/70525
摘要： A method for automatic process control (APC) performance monitoring may include, but is not limited to: computing one or more APC performance indicators for one or more production lots of semiconductor devices; and displaying a mapping of the one or more APC performance indicators to the one or more production lots of semiconductor devices.
摘要翻译：用于自动过程控制（APC）性能监控的方法可以包括但不限于：计算一个或多个生产批次的半导体器件的一个或多个APC性能指标; 以及显示所述一个或多个APC性能指示符到所述一个或多个半导体器件的生产批次的映射。

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