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1. 发明申请

WO2018217232A1 ZONAL ANALYSIS FOR RECIPE OPTIMIZATION AND MEASUREMENT 审中-公开
公开(公告)号：WO2018217232A1
公开(公告)日：2018-11-29
申请号：PCT/US2017/065629
申请日：2017-12-11
申请人： KLA-TENCOR CORPORATION
发明人： VOLKOVICH, Roie , ADEL, Michael E. , YERUSHALMI, Liran , HERZEL, Eitan , YE, Mengmeng , AMIT, Eran
IPC分类号： H01L21/66
摘要： Metrology methods and modules are provided, which comprise carrying out recipe setup procedure(s) and/or metrology measurement(s) using zonal analysis with respect to respective setup parameter(s) and/or metrology metric(s). The zonal analysis comprises relating to spatially variable values of the setup parameter(s) and/or metrology metric(s) across one or more wafers in one or more lots. Wafer zones may be discrete or spatially continuous, and be used to weight one or more parameter(s) and/or metric(s) during any of the stages of the respective setup and measurement processes.

2. 发明申请

WO2014201396A1 ON-PRODUCT DERIVATION AND ADJUSTMENT OF EXPOSURE PARAMETERS IN A DIRECTED SELF-ASSEMBLY PROCESS 审中-公开
标题翻译：产品衍生和调整自动组装过程中的曝光参数
公开(公告)号：WO2014201396A1
公开(公告)日：2014-12-18
申请号：PCT/US2014/042366
申请日：2014-06-13
申请人： KLA-TENCOR CORPORATION
发明人： VOLKOVICH, Roie , AMIT, Eran , AMIR, Nuriel , ADEL, Michael E.
IPC分类号： H01L21/66
CPC分类号： G05B19/048 , G03F7/0002 , G03F7/70625 , G05B2219/33285 , H01L22/12 , H01L22/20
摘要： Methods and metrology tool modules embodying the methods are provided. Methods comprise measuring characteristics of intermediate features such as guiding lines in a directed self-assembly (DSA) process, deriving exposure parameters from the measured characteristics; and adjusting production parameters for producing consecutive target features according to the derived exposure parameters. The methods and modules enhance the accuracy of the DSA-produced structures and related measurements.
摘要翻译：提供了体现方法的方法和计量工具模块。方法包括测量中间特征的特征，例如定向自组装（DSA）过程中的引导线，从测量的特征导出曝光参数; 并根据导出的曝光参数调整生产连续目标特征的生产参数。这些方法和模块提高了DSA生产的结构和相关测量的准确性。

3. 发明申请

WO2017176314A1 PROCESS COMPATIBILITY IMPROVEMENT BY FILL FACTOR MODULATION 审中-公开
标题翻译：通过填充因子调制改善工艺兼容性
公开(公告)号：WO2017176314A1
公开(公告)日：2017-10-12
申请号：PCT/US2016/060626
申请日：2016-11-04
申请人： KLA-TENCOR CORPORATION
发明人： LEVINSKI, Vladimir , HAJAJ, Eitan , ITZKOVICH, Tal , AHARON, Sharon , ADEL, Michael E.
IPC分类号： G03F7/20 , G03F7/00 , H01L21/027 , H01L21/66
摘要： Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.
摘要翻译：提供度量目标和目标设计方法，其中目标元素通过用具有间距p的周期性图案替换具有与被替换元素至少一个几何差异的辅助元素到形成将间距p保持为单个间距的复合周期性结构。在与先进的多重图案化技术的兼容性范围内构建目标可提高目标的保真度，并且填充因子调制能够调整目标以产生足够的计量灵敏度以提取覆盖图，同时实现目标的过程兼容性。

4. 发明申请

WO2017146785A1 ANALYZING ROOT CAUSES OF PROCESS VARIATION IN SCATTEROMETRY METROLOGY 审中-公开
公开(公告)号：WO2017146785A1
公开(公告)日：2017-08-31
申请号：PCT/US2016/059750
申请日：2016-10-31
申请人： KLA-TENCOR CORPORATION
发明人： MARCIANO, Tal , ADEL, Michael E. , GHINOVKER, Mark , BRINGOLTZ, Barak , KLEIN, Dana , ITZKOVICH, Tal , RAMANATHAN, Vidya , CAMP, Janay
IPC分类号： G01N21/47 , G06F11/34
CPC分类号： G01B11/272 , G03F7/70616 , G03F7/70633 , H01L22/12 , H01L22/20
摘要： Method, metrology modules and RCA tool are provided, which use the behavior of resonance region(s) in measurement landscapes to evaluate and characterize process variation with respect to symmetric and asymmetric factors, and provide root cause analysis of the process variation with respect to process steps. Simulations of modeled stacks with different layer thicknesses and process variation factors may be used to enhance the analysis and provide improved target designs, improved algorithms and correctables for metrology measurements. Specific targets that exhibit sensitive resonance regions may be utilize to enhance the evaluation of process variation.

5. 发明申请

WO2016164372A1 FEED FORWARD OF METROLOGY DATA IN A METROLOGY SYSTEM 审中-公开
标题翻译：在计量系统中进入量纲数据
公开(公告)号：WO2016164372A1
公开(公告)日：2016-10-13
申请号：PCT/US2016/026060
申请日：2016-04-05
申请人： KLA-TENCOR CORPORATION
发明人： LEVY, Ady , KANDEL, Daniel , ADEL, Michael E. , POSLAVSKY, Leonid , ROBINSON, John , MARCIANO, Tal , BRINGOLTZ, Barak , GRUNZWEIG, Tzahi , KLEIN, Dana , ITZKOVICH, Tal , CARMEL, Nadav , AMIR, Nuriel , RAMANATHAN, Vidya , CAMP, Janay , WAGNER, Mark
IPC分类号： H01L21/66 , G01N21/95
CPC分类号： G01B11/272 , G01N21/211 , G01N21/31 , G01N21/41 , G01N21/4738 , G01N21/4788 , G01N21/6489 , G01N21/9501 , G01N2021/213 , G03F7/705 , G03F7/70525 , G03F7/70533 , G03F7/70616
摘要： A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.
摘要翻译：计量性能分析系统包括包括一个或多个检测器的计量工具和通信地耦合到所述一个或多个检测器的控制器。所述控制器被配置为从所述计量工具接收与度量目标相关联的一个或多个度量数据集，其中所述一个或多个测量数据集包括一个或多个测量的度量度量，并且所述一个或多个测量的度量度量指示与标称值的偏差。控制器还被配置为确定与标称值和一个或多个所选择的半导体工艺变化的偏差之间的关系，并且基于一个或多个测量值的值之间的关系确定偏离标称值的一个或多个根本原因度量和一个或多个所选择的半导体工艺变化。

6. 发明申请

WO2016054581A1 VERIFICATION METROLOGY TARGETS AND THEIR DESIGN 审中-公开
标题翻译：验证计量目标及其设计
公开(公告)号：WO2016054581A1
公开(公告)日：2016-04-07
申请号：PCT/US2015/053838
申请日：2015-10-02
申请人： KLA-TENCOR CORPORATION
发明人： ADEL, Michael E. , TARSHISH-SHAPIR, Inna , WEI, Jeremy (Shi-Ming) , GHINOVKER, Mark
IPC分类号： H01L21/66
CPC分类号： G03F7/70491 , G03F7/70616 , G06F17/50 , H01L22/30
摘要： Metrology target design methods and verification targets are provided. Methods comprise using OCD data related to designed metrology target(s) as an estimation of a discrepancy between a target model and a corresponding actual target on a wafer, and adjusting a metrology target design model to compensate for the estimated discrepancy. The dedicated verification targets may comprise overlay target features and be size optimized to be measureable by an OCD sensor, to enable compensation for inaccuracies resulting from production process variation. Methods also comprise modifications to workflows between manufacturers and metrology vendors which provide enable higher fidelity metrology target design models and ultimately higher accuracy of metrology measurements.
摘要翻译：提供计量目标设计方法和验证目标。方法包括使用与设计的计量目标相关的OCD数据作为目标模型与晶片上的相应实际目标之间的差异的估计，以及调整度量目标设计模型以补偿估计的差异。专用验证目标可以包括覆盖目标特征，并且其尺寸被优化以由OCD传感器测量，以便能够对由生产过程变化导致的不准确性进行补偿。方法还包括对制造商和计量供应商之间的工作流程进行修改，这些工具提供了更高保真度量的目标设计模型，并最终提高了计量测量的精度。

7. 发明申请

WO2015089231A1 TARGET AND PROCESS SENSITIVITY ANALYSIS TO REQUIREMENTS 审中-公开
标题翻译：目标和过程灵敏度分析要求
公开(公告)号：WO2015089231A1
公开(公告)日：2015-06-18
申请号：PCT/US2014/069617
申请日：2014-12-10
申请人： KLA-TENCOR CORPORATION
发明人： ADEL, Michael E. , AMIR, Nuriel , GHINOVKER, Mark , SHUSTERMAN, Tal , GREADY, David , BORODYANSKY, Sergey
IPC分类号： G06F17/50
CPC分类号： G06F17/5009
摘要： Systems and method are provided for analyzing target, process and metrology configuration sensitivities to a wide range of parameters, according to external requirements or inner development and verification needs. Systems comprise the following elements. An input module is arranged to receive parameters relating to targets, target metrology conditions and production processes, to generate target data. A metrology simulation unit is arranged to simulate metrology measurements of targets from the target data and to generate multiple metrics that quantify the simulated target measurements. A sensitivity analysis module is arranged to derive functional dependencies of the metrics on the parameters and to define required uncertainties of the parameters with respect to the derived functional dependencies. Finally, a target optimization module is arranged to rank targets and target metrology conditions with respect to the simulated target measurements.
摘要翻译：提供系统和方法，根据外部要求或内部开发和验证需求，将目标，过程和度量配置灵敏度分析到广泛的参数。系统包括以下要素。输入模块被布置成接收与目标相关的参数，目标计量条件和生产过程，以产生目标数据。计量模拟单元被设置为模拟来自目标数据的目标的度量测量并且生成量化模拟目标测量的多个度量。灵敏度分析模块被布置为导出度量对参数的功能依赖性并且相对于导出的功能依赖性来定义参数的所需不确定性。最后，设置目标优化模块以对目标和目标计量条件进行相对于模拟的目标测量的分级。

8. 发明申请

WO2010080732A2 SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 审中-公开
标题翻译： SCATTERMETRY计量学目标设计优化
公开(公告)号：WO2010080732A2
公开(公告)日：2010-07-15
申请号：PCT/US2010/020046
申请日：2010-01-04
申请人： KLA-TENCOR CORPORATION , ADEL, Michael E. , MANASSEN, Amnon , KANDEL, Daniel
发明人： ADEL, Michael E. , MANASSEN, Amnon , KANDEL, Daniel
IPC分类号： H01L21/66
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.
摘要翻译：可以使用包括计量目标设计信息，底物信息，过程信息和计量系统信息的输入来优化计量目标设计。采用计量系统获取计量信号可以使用输入来建模，以产生计量目标的一个或多个光学特性。可以将计量学算法应用于特征以确定由计量系统制定的度量目标的预测精度和测量精度。可以修改与度量目标设计有关的部分信息，并且可以重复信号建模和计量学算法以优化一个或多个测量的精度和精度。可以在精度和精度优化后显示或存储度量目标设计。

9. 发明授权

EP2386114B1 SCATTEROMETRY METROLOGY TARGET DESIGN OPTIMIZATION 有权
公开(公告)号：EP2386114B1
公开(公告)日：2018-10-31
申请号：EP10729404.3
申请日：2010-01-04
申请人： KLA-Tencor Corporation
发明人： ADEL, Michael E. , MANASSEN, Amnon , KANDEL, Daniel
IPC分类号： G03F7/20 , H01L21/66
CPC分类号： G03F7/70683 , G03F7/705 , G03F7/70633 , H01L22/12
摘要： A metrology target design may be optimized using inputs including metrology target design information, substrate information, process information, and metrology system information. Acquisition of a metrology signal with a metrology system may be modeled using the inputs to generate one or more optical characteristics of the metrology target. A metrology algorithm may be applied to the characteristics to determine a predicted accuracy and precision of measurements of the metrology target made by the metrology system. Part of the information relating to the metrology target design may be modified and the signal modeling and metrology algorithm may be repeated to optimize the accuracy and precision of the one or more measurements. The metrology target design may be displayed or stored after the accuracy and precision are optimized.

10. 发明申请

WO2018160502A1 DETERMINING THE IMPACTS OF STOCHASTIC BEHAVIOR ON OVERLAY METROLOGY DATA 审中-公开
公开(公告)号：WO2018160502A1
公开(公告)日：2018-09-07
申请号：PCT/US2018/019793
申请日：2018-02-27
申请人： KLA-TENCOR CORPORATION
发明人： GUREVICH, Evgeni , ADEL, Michael E. , GRONHEID, Roel , FELER, Yoel , LEVINSKI, Vladimir , KLEIN, Dana , AHARON, Sharon
IPC分类号： H01L21/66
摘要： Methods are provided for designing metrology targets and estimating the uncertainty error of metrology metric values with respect to stochastic noise such as line properties (e.g., line edge roughness, LER). Minimal required dimensions of target elements may be derived from analysis of the line properties and uncertainty error of metrology measurements, by either CDSEM (critical dimension scanning electron microscopy) or optical systems, with corresponding targets. The importance of this analysis is emphasized in view of the finding that stochastic noise may have increased importance with when using more localized models such as CPE (correctables per exposure). The uncertainty error estimation may be used for target design, enhancement of overlay estimation and evaluation of measurement reliability in multiple contexts.

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