专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2012015967A3 METHOD AND SYSTEM FOR PROVIDING PROCESS TOOL CORRECTABLES 审中-公开
标题翻译：用于提供处理工具可纠正的方法和系统
公开(公告)号：WO2012015967A3
公开(公告)日：2012-05-24
申请号：PCT/US2011045603
申请日：2011-07-27
申请人： KLA TENCOR CORP , COHEN GUY , KLEIN DANA , IZIKSON PAVEL
发明人： COHEN GUY , KLEIN DANA , IZIKSON PAVEL
IPC分类号： H01L21/02 , H01L21/027 , H01L21/66
CPC分类号： G05B19/41875 , G05B2219/32182 , Y02P90/22
摘要： The present invention may include performing a first measurement process on a wafer of a lot of wafers, wherein the first measurement process includes measuring one or more characteristics of a plurality of targets distributed across one or more fields of the wafer, determining a set of process tool correctables for a residual larger than a selected threshold level utilizing a loss function, wherein the loss function is configured to fit a model for one or more process tools, as a function of field position, to one or more of the measured characteristics of the plurality of targets, wherein the set of process tool correctables includes one or more parameters of the model that act to minimize the difference between a norm of the residual and the selected threshold, and utilizing the determined process tool correctables to monitor or adjust one or more processes of the process tools.
摘要翻译：本发明可以包括在许多晶片的晶片上执行第一测量过程，其中第一测量过程包括测量分布在晶片的一个或多个场上的多个目标的一个或多个特性，确定一组过程用于利用损失函数对于大于所选阈值水平的残差的工具可校正，其中，所述损失函数被配置为将一个或多个处理工具的模型作为场位置的函数拟合至所述测量特征中的一个或多个测量特征多个目标，其中所述一组处理工具可校正包括所述模型的一个或多个参数，所述一个或多个参数用于最小化所述残差的标准与所选阈值之间的差异，并且利用所确定的处理工具可校正来监视或调整一个或多个流程工具的流程。

2. 发明申请

WO2012044702A2 METHOD AND SYSTEM FOR PROVIDING TOOL INDUCED SHIFT USING A SUB-SAMPLING SCHEME 审中-公开
标题翻译：使用子采样方案提供工具感应移位的方法和系统
公开(公告)号：WO2012044702A2
公开(公告)日：2012-04-05
申请号：PCT/US2011053743
申请日：2011-09-28
申请人： KLA TENCOR CORP , IZIKSON PAVEL , COHEN GUY
发明人： IZIKSON PAVEL , COHEN GUY
IPC分类号： H01L21/66
CPC分类号： G03F7/70616
摘要： The present invention may include measuring tool induced shift (TIS) on at least one wafer of a lot of wafers via an omniscient sampling process, randomly generating a plurality of sub-sampling schemes, each of the set of randomly generated sub-sampling schemes having the same number of sampled fields, measuring TIS at each location of each of the randomly generated sub-sampling schemes, approximating a set of TIS values for each of the randomly generated sub-sampling schemes utilizing the TIS measurements from each of the randomly generated sub-sampling schemes, wherein each set of TIS values for each of the randomly generated sub-sampling schemes is calculated utilizing an interpolation process configured to approximate a TIS value for each location not included in a randomly generated sub-sampling scheme, and determining a selected sub-sampling scheme by comparing each of the calculated sets of TIS values to the measured TIS of the omniscient sampling process.
摘要翻译：本发明可以包括通过无所不在的采样过程在许多晶片的至少一个晶片上测量工具诱发偏移（TIS），随机产生多个子采样方案，所述随机生成的子采样方案中的每一个具有相同数量的采样场，测量每个随机生成的子采样方案的每个位置处的TIS，利用来自随机生成的子单元中的每一个的TIS测量来近似每个随机生成的子采样方案的一组TIS值采样方案，其中使用内插过程来计算随机生成的子采样方案中的每一个的每组TIS值，所述内插处理被配置为对未包括在随机生成的子采样方案中的每个位置近似TIS值，并且确定所选择的通过将每个计算出的TIS值集合与全向采样过程的测量TIS进行比较，进行子采样方案。

3. 发明申请

WO2012018674A3 OPTICS SYMMETRIZATION FOR METROLOGY 审中-公开
标题翻译： OPTICS SYMPETRIZATION FOR METROLOGY
公开(公告)号：WO2012018674A3
公开(公告)日：2012-05-18
申请号：PCT/US2011045784
申请日：2011-07-28
申请人： KLA TENCOR CORP , MANASSEN AMMON , KANDEL DANIEL , BARUCH MOSHE , SELIGSON JOEL , SVIZHER ALEXANDER , COHEN GUY , ROTEM EFRAIM , BACHAR OHAD , NEGRI DARIA , SAPIENS NOAM
发明人： MANASSEN AMMON , KANDEL DANIEL , BARUCH MOSHE , SELIGSON JOEL , SVIZHER ALEXANDER , COHEN GUY , ROTEM EFRAIM , BACHAR OHAD , NEGRI DARIA , SAPIENS NOAM
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G01N21/55 , G03F7/70616
摘要： The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
摘要翻译：本发明包括照明源，至少一个照明对称化模块（ISM），被配置为对来自照明源发出的光的至少一部分进行对称;第一分束器，被配置为将由ISM处理的光的第一部分沿着一个或多个样本的表面的物体路径和沿着基准路径由ISM处理的光的第二部分以及沿着主光轴布置的检测器，其中检测器被配置为收集从表面反射的光的一部分的一个或多个标本。

4. 发明申请

WO2012018673A3 MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 审中-公开
标题翻译：多层叠加计量目标和综合覆盖度量度测量系统
公开(公告)号：WO2012018673A3
公开(公告)日：2012-05-18
申请号：PCT/US2011045778
申请日：2011-07-28
申请人： KLA TENCOR CORP , KANDEL DANIEL , LEVINSKI VLADIMIR , COHEN GUY
发明人： KANDEL DANIEL , LEVINSKI VLADIMIR , COHEN GUY
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G03F7/70683
摘要： A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.
摘要翻译：公开了一种用于基于成像的计量学的多层覆盖目标。覆盖目标包括包括三个或更多个目标结构的多个目标结构，每个目标结构包括一组两个或多个模式元素，其中目标结构被配置为在目标结构对准时共享公共对称中心，每个目标结构目标结构相对于公共对称中心不变为N度旋转，其中N等于或大于180度，其中两个或更多个图案元素中的每一个具有单独的对称中心，其中两个或更多个图案每个目标结构的元素对于单个对称中心的M度旋转是不变的，其中M等于或大于180度。

5. 发明公开

KR20180026582A 다층 오버레이 계측 타겟 및 상보적 오버레이 계측 측정 시스템 审中-公开
标题翻译：多层覆盖计量目标和免费覆盖计量测量系统
公开(公告)号：KR20180026582A
公开(公告)日：2018-03-12
申请号：KR20187006323
申请日：2011-07-28
申请人： KLA TENCOR CORP
发明人： KANDEL DANIEL , LEVINSKI VLADIMIR , COHEN GUY
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70633 , G03F7/70683
摘要： 촬상기반계측에서사용하기위한다층오버레이타겟이개시된다. 오버레이타겟은 3개이상의타겟구조물을포함한복수의타겟구조물을포함하고, 각타겟구조물은 2개이상의패턴요소들의집합을포함하며, 타겟구조물은타겟구조물의정렬시에공통대칭중심을공유하도록구성되고, 각타겟구조물은공통대칭중심에대한 N도(N도는 180도이상임) 회전에대하여불변체이며, 2개이상의패턴요소는각각개별적인대칭중심을갖고, 각타겟구조물의 2개이상의패턴요소들은각각개별적인대칭중심에대한 M도(M도는 180도이상임) 회전에대하여불변체이다.
摘要翻译：公开了用于基于成像的度量衡中的多层覆盖目标。覆盖目标包括多个包括三个或更多个目标结构的目标结构，每个目标结构包括一组两个或更多个模式元素，其中目标结构被配置为在目标结构对齐时共享对称的共同中心，每个目标结构围绕所述公共对称中心不变为N度旋转，其中N等于或大于180度，其中所述两个或更多个图案元件中的每一个具有单独的对称中心，其中所述两个或更多个图案中的每一个每个目标结构的元素对于围绕单个对称中心的M度旋转是不变的，其中M等于或大于180度。

6. 发明公开

EP2599106A4 METHOD AND SYSTEM FOR PROVIDING PROCESS TOOL CORRECTABLES 无效
标题翻译： VERFAHREN UND系统ZUR BEREITSTELLUNG VON PROZESSWERKZEUG-KORREKTURMITTELN
公开(公告)号：EP2599106A4
公开(公告)日：2016-10-26
申请号：EP11813139
申请日：2011-07-27
申请人： KLA TENCOR CORP
发明人： COHEN GUY , KLEIN DANA , IZIKSON PAVEL
IPC分类号： H01L21/02 , H01L21/027 , H01L21/66
CPC分类号： G05B19/41875 , G05B2219/32182 , Y02P90/22

7. 发明专利

SG2014008841A OVERLAY TARGETS WITH ORTHOGONAL UNDERLAYER DUMMYFILL 未知
公开(公告)号：SG2014008841A
公开(公告)日：2015-01-29
申请号：SG2014008841
申请日：2013-05-21
申请人： KLA TENCOR CORP
发明人： AMIR NURIEL , COHEN GUY , LEVINSKI VLADIMIR , ADEL MICHAEL
IPC分类号： H01L21/027 , G03F1/42
摘要： The disclosure is directed to designing and using an overlay target with orthogonal underlayer dummyfill. According to various embodiments, an overlay target may include one or more segmented overlay pattern elements forming at least one overlay target structure. The overlay target may further include one or more inactive pattern elements forming at least one dummyfill target structure. Each of the one or more inactive pattern elements may include dummyfill segmented along an axis orthogonal to a segmentation axis of at least one proximately disposed overlay pattern element. In some embodiments, each of the target structures or layers may be formed from a separate process layer successively disposed upon a substrate, such as a silicon wafer. In some embodiments, the overlay and dummyfill target structures may be twofold or fourfold rotationally symmetric to allow for certain manufacturing or metrology advantages.

8. 发明公开

EP2601675A4 MULTI-LAYER OVERLAY METROLOGY TARGET AND COMPLIMENTARY OVERLAY METROLOGY MEASUREMENT SYSTEMS 有权
标题翻译： MEHRSCHICHTIGESÜBERLAPPUNGSMETROLOGIE-ZIEL UND ENTSPRECHENDEÜBERLAPPUNGSMETROLOGIE-MESSSYSTEME
公开(公告)号：EP2601675A4
公开(公告)日：2017-08-23
申请号：EP11815104
申请日：2011-07-28
申请人： KLA-TENCOR CORP
发明人： KANDEL DANIEL , LEVINSKI VLADIMIR , COHEN GUY
IPC分类号： H01L21/027
CPC分类号： G03F7/70633 , G03F7/70683
摘要： A multi-layer overlay target for use in imaging based metrology is disclosed. The overlay target includes a plurality of target structures including three or more target structures, each target structure including a set of two or more pattern elements, wherein the target structures are configured to share a common center of symmetry upon alignment of the target structures, each target structure being invariant to N degree rotation about the common center of symmetry, wherein N is equal to or greater than 180 degrees, wherein each of the two or more pattern elements has an individual center of symmetry, wherein each of the two or more pattern elements of each target structure is invariant to M degree rotation about the individual center of symmetry, wherein M is equal to or greater than 180 degrees.
摘要翻译：公开了用于基于成像的度量衡中的多层覆盖目标。覆盖目标包括多个包括三个或更多个目标结构的目标结构，每个目标结构包括一组两个或更多个模式元素，其中目标结构被配置为在目标结构对齐时共享对称的共同中心，每个目标结构围绕所述公共对称中心不变为N度旋转，其中N等于或大于180度，其中所述两个或更多个图案元件中的每一个具有单独的对称中心，其中所述两个或更多个图案中的每一个每个目标结构的元素对于围绕单个对称中心的M度旋转是不变的，其中M等于或大于180度。

9. 发明公开

EP2694983A4 METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 有权
标题翻译：用于提供改进的过程控制的质量方法的方法和系统
公开(公告)号：EP2694983A4
公开(公告)日：2014-10-29
申请号：EP12768608
申请日：2012-04-04
申请人： KLA TENCOR CORP
发明人： KANDEL DANIEL , COHEN GUY , KLEIN DANA , LEVINSKI VLADIMIR , SAPIENS NOAM , SHULMAN ALEX , KAMENETSKY VLADIMIR , AMIT ERAN , VAKSHTEIN IRINA
IPC分类号： G01N37/00 , G03F7/20
CPC分类号： G03F7/70633 , G01N2223/6116
摘要： The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

10. 发明申请

WO2010128420A3 FRONT-END FOR SATELLITE COMMUNICATION 审中-公开
标题翻译：前端用于卫星通信
公开(公告)号：WO2010128420A3
公开(公告)日：2011-07-14
申请号：PCT/IB2010051811
申请日：2010-04-25
申请人： NOVELSAT LTD , WAJCER DANIEL , COHEN GUY
发明人： WAJCER DANIEL , COHEN GUY
IPC分类号： H04N7/20
CPC分类号： H04B7/18582 , H04B7/18508 , H04B7/18513 , H04B7/18584 , H04L1/005 , H04L1/0057 , H04L1/0059 , H04L1/0065 , H04L1/0071 , H04L1/0072 , H04W84/06 , H04W88/06
摘要： A communication method includes operating a communication unit (60, 124), which demodulates radio signals in accordance with a first air interface and applies at least one upper-layer process to the demodulated signals. A signal is received and demodulated in accordance with a second air interface, different from the first air interface. The demodulated signal is input to the communication unit so as to cause the communication unit to apply the upper-layer process to the signal that was demodulated using the second air interface, while superseding the first air interface.
摘要翻译：通信方法包括操作通信单元（60,124），该通信单元根据第一空中接口对无线电信号进行解调，并对解调的信号应用至少一个上层处理。根据与第一空中接口不同的第二空中接口接收和解调信号。解调后的信号被输入到通信单元，以使得通信单元在取代第一空中接口的同时使上层处理应用于使用第二空中接口解调的信号。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式