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1. 发明专利

JP2011176316A Electron reflector with multiple reflective mode 有权
标题翻译：具有多重反射模式的电子反射器
公开(公告)号：JP2011176316A
公开(公告)日：2011-09-08
申请号：JP2011036851
申请日：2011-02-23
申请人： Kla-Tencor Corp , ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation
发明人： GRELLA LUCA , FREED REGINA , MCCORD MARK A
IPC分类号： H01L21/027 , H01J37/305
CPC分类号： H01J37/3175 , B82Y10/00 , B82Y40/00 , H01J2237/31789
摘要： PROBLEM TO BE SOLVED: To provide a method of controllably reflecting electrons from an array of electron reflectors to make electron beam projection lithography possible at low cost because of maskless processing, and a device of a dynamic pattern generation machine for reflective electron beam lithography. SOLUTION: An input electron beam is formed from an electron source, and the input beam is introduced into the array of electron reflectors. A first plurality of reflective plates are configured to reflect electrons in a first reflective mode in which reflected electrons coming out of the reflective plates form a focusing beam. A second plurality of reflective plates are configured to reflect electrons in a second reflective mode in which reflective electrons coming out of the reflective plates are defocused. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种从电子反射器阵列可控地反射电子的方法，以便由于无掩模处理而以低成本实现电子束投影光刻，以及用于反射电子束的动态图案生成机的装置光刻。解决方案：由电子源形成输入电子束，并将输入光束引入电子反射器阵列。第一多个反射板被配置成以第一反射模式反射电子，其中从反射板出来的反射电子形成聚焦光束。第二多个反射板被配置为以第二反射模式反射电子，其中从反射板流出的反射电子散焦。版权所有（C）2011，JPO＆INPIT

2. 发明专利

SG10201912510QA METHOD AND SYSTEM FOR FOCUS ADJUSTMENT A MULTI-BEAM SCANNING ELECTRON MICROSCOPY SYSTEM 未知
公开(公告)号：SG10201912510QA
公开(公告)日：2020-02-27
申请号：SG10201912510Q
申请日：2016-09-23
申请人： KLA TENCOR CORP
发明人： MCCORD MARK A , KNIPPELMEYER RAINER , MASNAGHETTI DOUGLAS , SIMMONS RICHARD R , YOUNG SCOTT A
摘要： A scanning electron microscopy system is disclosed. The system includes a multi-beam scanning electron microscopy (SEM) sub-system. The SEM sub-system includes a multi-beam electron source configured to form a plurality of electron beams, a sample stage configured to secure a sample, an electron-optical assembly to direct the electron beams onto a portion of the sample, and a detector assembly configured to simultaneously acquire multiple images of the surface of the sample. The system includes a controller configured to receive the images from the detector assembly, identify a best focus image of images by analyzing one or more image quality parameters of the images, and direct the multi-lens array to adjust a focus of one or more electron beams based on a focus of an electron beam corresponding with the identified best focus image.

3. 发明申请

WO02075772A3 SIMULTANEOUS FLOODING AND INSPECTION FOR CHARGE CONTROL IN AN ELECTRON BEAM INSPECTION MACHINE 审中-公开
标题翻译：电子束检测机器同时进行充电控制的检测和检查
公开(公告)号：WO02075772A3
公开(公告)日：2003-03-06
申请号：PCT/US0208630
申请日：2002-03-19
申请人： KLA TENCOR CORP
发明人： MCCORD MARK A , WALKER DAVID , RICHARDSON NEIL , PEI JUN
IPC分类号： G01N23/225 , G01Q30/20 , H01J37/28 , H01J37/02
CPC分类号： H01J37/28 , G01N23/225 , H01J2237/004 , H01J2237/2817
摘要： Disclosed are methods and apparatus for simultaneously flooding a sample 224 (e.g., a semiconductor wafer) to control charge and inspecting the sample 224. The apparatus 200 includes a charged particle beam generator (202-216) arranged to generate a charged particle beam 201 substantially towards a first portion of the sample and a flood gun 230 for generating a second beam towards a second portion of the sample. The second beam is generated substantially simultaneously with the inspection beam 201. The apparatus 200 further includes a detector 226 arranged to detect charged particles 205 originating from the sample portion. In a further implementation, the apparatus 200 further includes an image generator for generating an image of the first portion of the sample from the detected particles. In one embodiment, the sample is a semiconductor wafer. In a method aspect, a first area of a sample is flooded with a flood beam to control charge on a surface of the sample. A second area of the sample is inspected with an inspection beam. The second area comprises at least a portion of the first area flooded by the flood beam. The inspection beam moves in tandem with the flood beam. In another aspect of the present invention, methods and apparatus are provided for controlling the charge buildup of an area of the sample by an electrode 220 having a voltage applied to it and through which the flood beam and charged particles emitted from the area of the sample can pass.
摘要翻译：公开了用于同时淹没样品224（例如，半导体晶片）以控制电荷并检查样品224的方法和装置。装置200包括带电粒子束发生器（202-216），其被布置成基本上产生带电粒子束201 朝向样品的第一部分，以及用于朝向样品的第二部分产生第二束的喷枪230。第二光束基本上与检查光束201同时产生。装置200还包括检测器226，检测器226布置成检测源自样品部分的带电粒子205。在另一实施方式中，装置200还包括图像发生器，用于从检测到的颗粒生成样品的第一部分的图像。在一个实施例中，样品是半导体晶片。在方法方面，样品的第一区域用泛光束淹没以控制样品表面上的电荷。用检查梁检查样品的第二个区域。第二区域包括由洪水束淹没的第一区域的至少一部分。检查梁与洪水束一起移动。在本发明的另一方面，提供了一种方法和装置，用于通过具有施加到其上的电压的电极220来控制样品区域的电荷积累，通过该电极220从样品区域发射的泛光束和带电粒子可以通过

4. 发明申请

WO2015080782A3 ALIGNMENT SENSOR AND HEIGHT SENSOR 审中-公开
标题翻译：对准传感器和高度传感器
公开(公告)号：WO2015080782A3
公开(公告)日：2015-10-01
申请号：PCT/US2014055242
申请日：2014-09-11
申请人： KLA TENCOR CORP
发明人： MCCORD MARK A , DI REGOLO JOSEPH
IPC分类号： H01L21/027 , H01L21/66
CPC分类号： G01B11/0608 , G01B11/27 , G03F9/7007 , G03F9/7034 , G03F9/7069 , H01J2237/2482 , H01J2237/30438 , H01J2237/31774
摘要： One embodiment relates to a device that senses alignment and height of a work piece. The device may include both an alignment sensor and a height sensor. The alignment sensor generates a first illumination beam that illuminates an alignment mark on the work piece so as to create a first reflected beam, and determines the alignment of the work piece using the first reflected beam. The height sensor generates a second illumination beam that is directed to a surface of the work piece at an oblique angle so as to form a second illumination spot and images the second illumination spot to determine the height of the work piece. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及感测工件的对准和高度的装置。该装置可以包括对准传感器和高度传感器。对准传感器产生照亮工件上的对准标记的第一照明光束，以产生第一反射光束，并且使用第一反射光束确定工件的对准。所述高度传感器产生第二照明光束，所述第二照明光束以斜角指向所述工件的表面，以便形成第二照明光点并且对所述第二照明光斑进行成像以确定所述工件的高度。还公开了其它实施例，方面和特征。

5. 发明申请

WO0159807A9 IN-SITU PROBE FOR OPTIMIZING ELECTRON BEAM INSPECTION AND METROLOGY BASED ON SURFACE POTENTIAL 审中-公开
标题翻译：基于表面电位优化电子束检测和计量的现场探测
公开(公告)号：WO0159807A9
公开(公告)日：2002-10-31
申请号：PCT/US0104041
申请日：2001-02-07
申请人： KLA TENCOR CORP , MCCORD MARK A , LAUBER JAN , PEI JUN , FERNANDEZ JORGE P
发明人： MCCORD MARK A , LAUBER JAN , PEI JUN , FERNANDEZ JORGE P
IPC分类号： G01Q40/02 , H01J37/28 , H01J37/304 , H01J37/02 , H01J37/26
CPC分类号： H01J37/28 , H01J2237/004 , H01J2237/2594 , H01J2237/2814 , H01J2237/2817
摘要： Disclosed is a method and apparatus for generating an image from a sample using a charged particle beam. The apparatus further includes a measurement device (228) arranged to measure a characteristic of the sample portion to obtain a surface voltage value of the sample portion that is exposed to the charged particle beam. For example, the measurement device is an electrostatic voltmeter positioned to obtain a surface voltage value of the exposed sample portion. A charged particle beam is directed substantially towards a portion of the sample under a first set of operating conditions. A surface charge value of the sample portion is obtained under the first set of operating conditions. It is then determined whether an optimum set of operating conditions associated with a predetermined surface charge value have been found. When the optimum conditions have not been found, the operating conditions are adjusted and the charged particle beam is directed substantially towards the sample portion. When the optimum conditions have been found, the charged particle beam is directed substantially towards the sample portion under the found optimum operating conditions.
摘要翻译：公开了一种使用带电粒子束从样品生成图像的方法和装置。该装置还包括测量装置（228），其被布置成测量样品部分的特性以获得暴露于带电粒子束的样品部分的表面电压值。例如，测量装置是定位成获得暴露的样品部分的表面电压值的静电电压表。在第一组操作条件下，带电粒子束基本上指向样品的一部分。在第一组操作条件下获得样品部分的表面电荷值。然后确定是否已经找到与预定表面电荷值相关联的最佳操作条件集合。当没有找到最佳条件时，调节操作条件，并且带电粒子束基本上指向样品部分。当已经找到最佳条件时，在找到的最佳操作条件下，带电粒子束基本上指向样品部分。

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