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1. 发明专利

DE112016002277T5 AUF SPANNUNGSKONTRAST BASIERTE FEHLER- UND DEFEKTINFERENZ IN LOGIKCHIPS 未知
公开(公告)号：DE112016002277T5
公开(公告)日：2018-02-08
申请号：DE112016002277
申请日：2016-05-17
申请人： KLA TENCOR CORP
发明人： DUFFY BRIAN
IPC分类号： G01R31/307 , G01R27/02 , G01R31/265 , G01R31/28
摘要： Ein System zur Detektion von Defekten mittels Bildgebung auf Basis von Spannungskontrast umfasst ein Werkzeug für die Bildgebung auf Basis von Spannungskontrast und eine Steuerung, die mit dem Werkzeug für die Bildgebung auf Basis von Spannungskontrast gekoppelt ist. Die Steuerung ist konfiguriert, um eine oder mehrere Abbildungsmetriken auf Basis von Spannungskontrast für eine oder mehrere Strukturen auf einer Probe zu erzeugen, einen oder mehrere Zielbereiche auf der Probe basierend auf der einen oder den mehreren Abbildungsmetriken auf Basis von Spannungskontrast zu bestimmen, einen Datensatz zur Bildgebung auf Basis von Spannungskontrast für den einen oder die mehreren Zielbereiche auf der Probe von dem Werkzeug für die Bildgebung auf Basis von Spannungskontrast zu empfangen und einen oder mehrere Defekte basierend auf dem Datensatz zur Bildgebung auf Basis von Spannungskontrast zu detektieren.

2. 发明专利

DE112015003362T5 VIRTUELLE INSPEKTIONSSYSTEME MIT EINER MEHRZAHL AN MODI 未知
公开(公告)号：DE112015003362T5
公开(公告)日：2017-04-13
申请号：DE112015003362
申请日：2015-07-22
申请人： KLA TENCOR CORP
发明人： DUFFY BRIAN , BANERJEE SAIBAL
IPC分类号： G01N21/88 , G01N21/95
摘要： Verfahren und Systeme zur Bestimmung eines oder mehrerer Merkmale für auf einer Probe detektierte Defekte werden bereitgestellt. Ein System beinhaltet eines oder mehrere Computersubsysteme, die dazu ausgebildet sind, einen ersten Defekt zu identifizieren, der auf einer Probe von einem Inspektionssystem mit einem ersten Modus detektiert wurde, der aber nicht mit einem oder mehreren der anderen Modi detektiert wurde. Das Computersubsystem ist / Die Computersubsysteme sind ebenso dazu ausgebildet, sich von dem Speichermedium ein oder mehrere Bilder zu verschaffen, die mit dem einen oder den mehreren anderen Modi an einer Position auf der Probe erzeugt wurden, welche dem ersten Defekt entspricht. Zusätzlich ist das Computersubsystem / sind die Computersubsysteme dazu ausgebildet, ein oder mehrere Merkmale der sich verschafften ein oder mehreren Bilder zu bestimmen und auf Grundlage des einen oder der mehreren Merkmale der sich verschafften einen oder mehreren Bilder ein oder mehrere Merkmale des ersten Defekts zu bestimmen.

3. 发明专利

SG11201610822SA VIRTUAL INSPECTION SYSTEMS WITH MULTIPLE MODES 未知
公开(公告)号：SG11201610822SA
公开(公告)日：2017-02-27
申请号：SG11201610822S
申请日：2015-07-22
申请人： KLA TENCOR CORP
发明人： DUFFY BRIAN , BANERJEE SAIBAL
IPC分类号： G01N21/88 , G01N21/95
摘要： Methods and systems for determining one or more characteristics for defects detected on a specimen are provided. One system includes one or more computer subsystems configured for identifying a first defect that was detected on a specimen by an inspection system with a first mode but was not detected with one or more other modes. The computer subsystem(s) are also configured for acquiring, from the storage medium, one or more images generated with the one or more other modes at a location on the specimen corresponding to the first defect. In addition, the computer subsystem(s) are configured for determining one or more characteristics of the acquired one or more images and determining one or more characteristics of the first defect based on the one or more characteristics of the acquired one or more images.

4. 发明申请

WO2010065676A3 METHODS AND SYSTEMS FOR DETECTING DEFECTS ON A RETICLE 审中-公开
标题翻译：用于检测有缺陷的方法和系统
公开(公告)号：WO2010065676A3
公开(公告)日：2010-09-16
申请号：PCT/US2009066461
申请日：2009-12-02
申请人： KLA TENCOR CORP , PAK PATRICK TUNG-SING , CHIA WEE-TECK , CHIN AARON GEURDON , MALIK IRFAN , DUFFY BRIAN
发明人： PAK PATRICK TUNG-SING , CHIA WEE-TECK , CHIN AARON GEURDON , MALIK IRFAN , DUFFY BRIAN
IPC分类号： H01L21/66 , H01L21/027
CPC分类号： G01N21/956 , G01N2021/95676 , G06T7/001 , G06T2207/30148
摘要： Methods and systems for detecting defects on a reticle are provided. One method includes printing a single die reticle in first areas of a wafer using different values of a parameter of a lithography process and at least one second area using a nominal value of the parameter. The method also includes acquiring first images of the first areas and second image(s) of the at least one second area. In addition, the method includes separately comparing the first images acquired for different first areas to at least one of the second image(s). The method further includes detecting defects on the reticle based on first portions of the first images in which variations in the first images compared to the at least one second image are greater than second portions of the first images and the first portions that are common to two or more of the first images.
摘要翻译：提供了用于检测光罩上的缺陷的方法和系统。一种方法包括使用光刻工艺的参数的不同值和使用参数的标称值的至少一个第二区域在晶片的第一区域中印刷单个模具掩模版。该方法还包括获取至少一个第二区域的第一区域和第二图像的第一图像。此外，该方法包括将对于不同的第一区域获取的第一图像分别与第二图像中的至少一个进行比较。该方法还包括基于第一图像的第一部分来检测标线上的缺陷，其中与至少一个第二图像相比的第一图像的变化大于第一图像的第二部分和第二图像的两个共同的第一部分或更多的第一图像。

5. 发明申请

WO2008086282A3 METHODS AND SYSTEMS FOR USING ELECTRICAL INFORMATION FOR A DEVICE BEING FABRICATED ON A WAFER TO PERFORM ONE OR MORE DEFECT-RELATED FUNCTIONS 审中-公开
标题翻译：用于在晶片上制造的器件使用电信息以执行一个或多个缺陷相关功能的方法和系统
公开(公告)号：WO2008086282A3
公开(公告)日：2008-09-12
申请号：PCT/US2008050397
申请日：2008-01-07
申请人： KLA TENCOR CORP , PARK ALLEN , ROSE PETER , CHANG ELLIS , DUFFY BRIAN , MCCORD MARK , ABBOTT GORDON
发明人： PARK ALLEN , ROSE PETER , CHANG ELLIS , DUFFY BRIAN , MCCORD MARK , ABBOTT GORDON
IPC分类号： G01N21/95 , G01N21/956 , G01R31/307 , G01R31/311 , G03F7/20 , G06T7/20 , H01L21/66
CPC分类号： G06T7/0004 , G01N21/8851 , G01N21/956 , G01R31/2894 , G06T2207/30148
摘要： Various methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions are provided. One computer-implemented method includes using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions. The one or more defect-related functions include one or more post-mask, defect-related functions.
摘要翻译：提供了用于将电信息用于在晶圆上制造的器件以执行一个或多个缺陷相关功能的各种方法和系统。一种计算机实现的方法包括使用电信息来制造在晶片上制造的器件以执行一个或多个缺陷相关功能。一个或多个缺陷相关功能包括一个或多个后掩模，缺陷相关功能。

6. 发明申请

WO2009038838A3 METHODS AND SYSTEMS FOR DETERMINING A POSITION OF INSPECTION DATA IN DESIGN DATA SPACE 审中-公开
标题翻译：确定设计数据空间中检查数据位置的方法和系统
公开(公告)号：WO2009038838A3
公开(公告)日：2009-11-12
申请号：PCT/US2008066328
申请日：2008-06-09
申请人： KLA TENCOR CORP , KULKARNI ASHOK , DUFFY BRIAN , MAAYAH KAIS , ROUSE GORDON , SHIFRIN EUGENE
发明人： KULKARNI ASHOK , DUFFY BRIAN , MAAYAH KAIS , ROUSE GORDON , SHIFRIN EUGENE
IPC分类号： G06T7/00
CPC分类号： G06F17/5045 , G06T7/0006 , G06T7/33 , G06T2207/30148 , H01L21/67005
摘要： Various methods and systems for determining a position of inspection data in design data space are provided. One computer-implemented method includes determining a centroid of an alignment target formed on a wafer using an image of the alignment target acquired by imaging the wafer. The method also includes aligning the centroid to a centroid of a geometrical shape describing the alignment target. In addition, the method includes assigning a design data space position of the centroid of the alignment target as a position of the centroid of the geometrical shape in the design data space. The method further includes determining a position of inspection data acquired for the wafer in the design data space based on the design data space position of the centroid of the alignment target.
摘要翻译：提供了用于确定设计数据空间中的检查数据的位置的各种方法和系统。一种计算机实现的方法包括使用通过对晶片进行成像而获取的对准目标的图像来确定形成在晶片上的对准目标的质心。该方法还包括将质心对准描述对准目标的几何形状的质心。此外，该方法包括将对准目标的质心的设计数据空间位置指定为设计数据空间中几何形状的质心的位置。该方法还包括基于对准目标的质心的设计数据空间位置确定在设计数据空间中为晶片获取的检查数据的位置。

7. 发明申请

WO2008077100A3 SYSTEMS AND METHODS FOR CREATING INSPECTION RECIPES 审中-公开
标题翻译：用于创建检验录像的系统和方法
公开(公告)号：WO2008077100A3
公开(公告)日：2009-09-24
申请号：PCT/US2007088129
申请日：2007-12-19
申请人： KLA TENCOR CORP , DUFFY BRIAN , KULKARNI ASHOK
发明人： DUFFY BRIAN , KULKARNI ASHOK
IPC分类号： G06F17/50 , G01R31/28
CPC分类号： G03F7/7065 , G03F7/70525
摘要： Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process. The method also includes creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed. The first and second designs are different. The inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process.
摘要翻译：提供了用于创建检查配方的系统和方法。用于创建检查配方的一种计算机实现的方法包括采用制造过程获取第一设计和用于印刷第一设计的晶片的检查系统的输出的一个或多个特性。该方法还包括使用第一设计和为其上印刷有第一设计的晶片获取的输出的一个或多个特性来创建用于第二设计的检查配方。第一和第二种设计是不同的。在使用制造工艺将第二设计印刷在晶片上之后，检查配方将用于检查晶片。

8. 发明公开

EP2195834A4 SYSTEMS AND METHODS FOR CREATING PERSISTENT DATA FOR A WAFER AND FOR USING PERSISTENT DATA FOR INSPECTION-RELATED FUNCTIONS 有权
公开(公告)号：EP2195834A4
公开(公告)日：2017-12-27
申请号：EP08831947
申请日：2008-09-22
申请人： KLA-TENCOR CORP
发明人： BHASKAR KRIS , BHASKAR CHETANA , KULKARNI ASHOK , ROSENGAUS ELIEZER , CAMPOCHIARO CECELIA , MAHER CHRIS , DUFFY BRIAN , KHULLAR ANEESH , KOHLI ALPA , BALASUBRAMANIAN LALITA , BHATTACHARYYA SANTOSH , MAHADEVAN MOHAN
IPC分类号： H01L21/66 , G06T1/20 , G06T7/00
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.

9. 发明申请

WO2010091307A3 SELECTING ONE OR MORE PARAMETERS FOR INSPECTION OF A WAFER 审中-公开
标题翻译：选择一个或多个参数来检查WAFER
公开(公告)号：WO2010091307A3
公开(公告)日：2010-11-04
申请号：PCT/US2010023396
申请日：2010-02-05
申请人： KLA TENCOR CORP , LEE CHRIS , GAO LISHENG , LUO TAO , WU KENONG , TORELLI TOMMASO , VAN RIET MICHAEL J , DUFFY BRIAN
发明人： LEE CHRIS , GAO LISHENG , LUO TAO , WU KENONG , TORELLI TOMMASO , VAN RIET MICHAEL J , DUFFY BRIAN
IPC分类号： H01L21/66 , G01N21/88
CPC分类号： H01L22/20 , G01N21/9501 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Computer-implemented methods, computer-readable media, and systems for selecting one or more parameters for inspection of a wafer are provided.
摘要翻译：提供了计算机实现的方法，计算机可读介质和用于选择用于检查晶片的一个或多个参数的系统。

10. 发明申请

WO2009039486A3 SYSTEMS AND METHODS FOR CREATING PERSISTENT DATA FOR A WAFER AND FOR USING PERSISTENT DATA FOR INSPECTION-RELATED FUNCTIONS 审中-公开
标题翻译：用于为晶片创建持续数据并使用持续数据进行检查相关功能的系统和方法
公开(公告)号：WO2009039486A3
公开(公告)日：2009-06-11
申请号：PCT/US2008077203
申请日：2008-09-22
申请人： KLA TENCOR CORP , BHASKAR KRIS , BHASKAR CHETANA , KULKARNI ASHOK , ROSENGAUS ELIEZER , CAMPOCHIARO CECELIA , MAHER CHRIS , DUFFY BRIAN , KHULLAR ANEESH , KOHLI ALPA , BALASUBRAMANIAN LALITA , BHATTACHARYYA SANTOSH , MAHADEVAN MOHAN
发明人： BHASKAR KRIS , BHASKAR CHETANA , KULKARNI ASHOK , ROSENGAUS ELIEZER , CAMPOCHIARO CECELIA , MAHER CHRIS , DUFFY BRIAN , KHULLAR ANEESH , KOHLI ALPA , BALASUBRAMANIAN LALITA , BHATTACHARYYA SANTOSH , MAHADEVAN MOHAN
IPC分类号： H01L21/66
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.
摘要翻译：提供了用于为晶片创建持久数据并将持久数据用于检查相关功能的各种系统和方法。一个系统包括耦合到检查系统的检测器的一组处理器节点。每个处理器节点被配置为在扫描晶片期间接收由检测器产生的图像数据的一部分。该系统还包括分别耦合到每个处理器节点的存储介质阵列。处理器节点被配置为将由处理器节点接收的所有图像数据或图像数据的选定部分发送到存储介质阵列，使得由检测器生成的所有图像数据或图像数据的所选部分在扫描晶片期间存储在存储介质的阵列中。

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