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1. 发明申请

WO2009039486A3 SYSTEMS AND METHODS FOR CREATING PERSISTENT DATA FOR A WAFER AND FOR USING PERSISTENT DATA FOR INSPECTION-RELATED FUNCTIONS 审中-公开
标题翻译：用于为晶片创建持续数据并使用持续数据进行检查相关功能的系统和方法
公开(公告)号：WO2009039486A3
公开(公告)日：2009-06-11
申请号：PCT/US2008077203
申请日：2008-09-22
申请人： KLA TENCOR CORP , BHASKAR KRIS , BHASKAR CHETANA , KULKARNI ASHOK , ROSENGAUS ELIEZER , CAMPOCHIARO CECELIA , MAHER CHRIS , DUFFY BRIAN , KHULLAR ANEESH , KOHLI ALPA , BALASUBRAMANIAN LALITA , BHATTACHARYYA SANTOSH , MAHADEVAN MOHAN
发明人： BHASKAR KRIS , BHASKAR CHETANA , KULKARNI ASHOK , ROSENGAUS ELIEZER , CAMPOCHIARO CECELIA , MAHER CHRIS , DUFFY BRIAN , KHULLAR ANEESH , KOHLI ALPA , BALASUBRAMANIAN LALITA , BHATTACHARYYA SANTOSH , MAHADEVAN MOHAN
IPC分类号： H01L21/66
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.
摘要翻译：提供了用于为晶片创建持久数据并将持久数据用于检查相关功能的各种系统和方法。一个系统包括耦合到检查系统的检测器的一组处理器节点。每个处理器节点被配置为在扫描晶片期间接收由检测器产生的图像数据的一部分。该系统还包括分别耦合到每个处理器节点的存储介质阵列。处理器节点被配置为将由处理器节点接收的所有图像数据或图像数据的选定部分发送到存储介质阵列，使得由检测器生成的所有图像数据或图像数据的所选部分在扫描晶片期间存储在存储介质的阵列中。

2. 发明公开

KR20180071404A 영역 적응식 결함 검출을 위한 시스템 및 방법 审中-公开
公开(公告)号：KR20180071404A
公开(公告)日：2018-06-27
申请号：KR20187017023
申请日：2016-11-16
申请人： KLA TENCOR CORP
发明人： MAHER CHRISTOPHER , BRAUER BJORN , RAMACHANDRAN VIJAY , KARSENTI LAURENT , ROSENGAUS ELIEZER , JORDAN JOHN , MILLER RONI
IPC分类号： G06T7/00 , G01N21/17 , G01N21/88
CPC分类号： G06T7/001 , G06K9/6202 , G06K9/6212 , G06K9/74 , G06T7/11 , G06T2207/20182 , G06T2207/30148
摘要： 결함검출방법은, 기준이미지를획득하는것; 기준이미지의타겟영역을선택하는것; 매칭메트릭에기초하여, 타겟영역에대응하는기준이미지의하나이상의비교영역을식별하는것; 테스트이미지를획득하는것; 기준이미지의타겟영역및 기준이미지의하나이상의비교영역으로테스트이미지를마스킹하는것; 테스트이미지의하나이상의비교영역에기초하여테스트이미지의타겟영역에대한결함임계치를정의하는것; 및결함임계치에기초하여테스트이미지의타겟영역이결함을포함하는지의여부를결정하는것을포함한다.

3. 发明专利

JP2010249833A System and method for inspecting semiconductor wafers 有权
标题翻译：用于检查半导体波形的系统和方法
公开(公告)号：JP2010249833A
公开(公告)日：2010-11-04
申请号：JP2010131351
申请日：2010-06-08
申请人： Kla-Tencor Corp , ケーエルエー−テンカーコーポレイション
发明人： ROSENGAUS ELIEZER , LANGE STEVEN R
IPC分类号： G01B11/30 , G01N21/956 , G01N21/95 , G06T1/00 , H01L21/66 , H01L21/677
CPC分类号： G01N21/95623 , G01N21/9501 , G01N2021/8822 , H01L21/67155
摘要： PROBLEM TO BE SOLVED: To enable high-speed inspection of semiconductor wafers. SOLUTION: A plurality of independent, low cost, optical-inspection subsystems 30 are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer 20. The wafer location relative to the inspection is controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtering. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer 50 to aid in statistical process control, particularly for manufacturing equipment. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了能够高速检查半导体晶片。解决方案：多个独立的，低成本的光学检查子系统30被封装和集成，以同时对晶片20的部分进行并行检查。控制相对于检查的晶片位置，使得整个晶片被成像通过光学子系统的系统以光栅扫描模式。单色相干光源照亮晶片表面。暗场光学系统收集散射光，并使用傅立叶滤波对由有效的周期性晶片结构产生的滤波图案进行滤波。滤波后的光由通用数字信号处理器处理。图像减法方法用于检测晶片缺陷，其报告给主计算机50，以帮助统计过程控制，特别是用于制造设备。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2014195090A Systems and methods for creating persistent data for wafer and for using persistent data for inspection-related functions 有权
标题翻译：用于创建用于波形的持续数据和使用用于检查相关功能的持续数据的系统和方法
公开(公告)号：JP2014195090A
公开(公告)日：2014-10-09
申请号：JP2014094395
申请日：2014-05-01
申请人： Kla-Tencor Corp , ケーエルエー−テンカー・コーポレーションKla−Tencor Corporation
发明人： BHASKAR KRIS , CHETANA BHASKAR , ASHOK KULKARNI , ROSENGAUS ELIEZER , CECILIA CAMPOCHIARO , MAHER CHRIS , BRIAN DUFFY , ANEESH KHULLAR , ALPA KOHLI , LALITA BALASUBRAMANIAN , SANTOSH BHATTACHARYYA , MAHADEVAN MOHAN
IPC分类号： H01L21/66 , H01L21/02
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To provide various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions.SOLUTION: One system includes a set of processor nodes 20 coupled to a detector 10 of an inspection system. Each of the processor nodes 20 is configured to receive a portion of image data generated by the detector 10 during scanning of a wafer 12. The system also includes an array 22 of storage media separately coupled to each of the processor nodes 20. The processor nodes 20 are configured to send all of the image data or a selected portion of the image data received by the processor nodes 20 to the arrays 22 of storage media such that all of the image data or the selected portion of the image data generated by the detector 10 during the scanning of the wafer 12 is stored in the arrays 22 of the storage media.
摘要翻译：要解决的问题：提供用于为晶片创建持久数据并使用持久数据进行检查相关功能的各种系统和方法。解决方案：一个系统包括耦合到检查系统的检测器10的一组处理器节点20。每个处理器节点20被配置为在晶片12的扫描期间接收由检测器10生成的图像数据的一部分。该系统还包括分别耦合到每个处理器节点20的存储介质的阵列22.处理器节点 20被配置为将由处理器节点20接收的图像数据的所有图像数据或所选部分发送到存储介质的阵列22，使得由检测器生成的图像数据或图像数据的所选部分在晶片12的扫描期间，10被存储在存储介质的阵列22中。

5. 发明专利

SG11201803667RA SYSTEMS AND METHODS FOR REGION-ADAPTIVE DEFECT DETECTION 未知
公开(公告)号：SG11201803667RA
公开(公告)日：2018-06-28
申请号：SG11201803667R
申请日：2016-11-16
申请人： KLA TENCOR CORP
发明人： MAHER CHRISTOPHER , BRAUER BJORN , RAMACHANDRAN VIJAY , KARSENTI LAURENT , ROSENGAUS ELIEZER , JORDAN JOHN , MILLER RONI
IPC分类号： G06T7/00 , G01N21/17 , G01N21/88
摘要： A defect detection method includes acquiring a reference image; selecting a target region of the reference image; identifying, based on a matching metric, one or more comparative regions of the reference image corresponding to the target region; acquiring a test image; masking the test image with the target region of the reference image and the one or more comparative regions of the reference image; defining a defect threshold for the target region in the test image based on the one or more comparative regions in the test image; and determining whether the target region of the test image contains a defect based on the defect threshold.

6. 发明专利

AU3875899A A system and method for inspecting semiconductor wafers 未知
公开(公告)号：AU3875899A
公开(公告)日：1999-11-16
申请号：AU3875899
申请日：1999-04-30
申请人： KLA TENCOR CORP
发明人： ROSENGAUS ELIEZER , LANGE STEVEN R
IPC分类号： G01B11/30 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/66 , H01L21/677 , G01N21/89
摘要： A method for inspecting semiconductor wafers is provided in which a plurality of independent, low-cost, optical-inspection subsystems are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer, the wafer location relative to the inspection being controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtered. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer to aid in statistical process control, particularly for manufacturing equipment.

7. 发明公开

EP2195834A4 SYSTEMS AND METHODS FOR CREATING PERSISTENT DATA FOR A WAFER AND FOR USING PERSISTENT DATA FOR INSPECTION-RELATED FUNCTIONS 有权
公开(公告)号：EP2195834A4
公开(公告)日：2017-12-27
申请号：EP08831947
申请日：2008-09-22
申请人： KLA-TENCOR CORP
发明人： BHASKAR KRIS , BHASKAR CHETANA , KULKARNI ASHOK , ROSENGAUS ELIEZER , CAMPOCHIARO CECELIA , MAHER CHRIS , DUFFY BRIAN , KHULLAR ANEESH , KOHLI ALPA , BALASUBRAMANIAN LALITA , BHATTACHARYYA SANTOSH , MAHADEVAN MOHAN
IPC分类号： H01L21/66 , G06T1/20 , G06T7/00
CPC分类号： G06T7/001 , G06T1/20 , G06T2207/30148
摘要： Various systems and methods for creating persistent data for a wafer and using persistent data for inspection-related functions are provided. One system includes a set of processor nodes coupled to a detector of an inspection system. Each of the processor nodes is configured to receive a portion of image data generated by the detector during scanning of a wafer. The system also includes an array of storage media separately coupled to each of the processor nodes. The processor nodes are configured to send all of the image data or a selected portion of the image data received by the processor nodes to the arrays of storage media such that all of the image data or the selected portion of the image data generated by the detector during the scanning of the wafer is stored in the arrays of the storage media.

8. 发明公开

EP1075652A4 A SYSTEM AND METHOD FOR INSPECTING SEMICONDUCTOR WAFERS 失效
标题翻译： VORRICHTUNG UND VERFAHREN ZUMPRÜFENVON HALBLEITERSCHEIBEN
公开(公告)号：EP1075652A4
公开(公告)日：2007-06-06
申请号：EP99921584
申请日：1999-04-30
申请人： KLA TENCOR CORP
发明人： ROSENGAUS ELIEZER , LANGE STEVEN R
IPC分类号： G01B11/30 , G01N21/95 , G01N21/956 , G06T1/00 , H01L21/66 , H01L21/677 , G01N21/89
CPC分类号： G01N21/95623 , G01N21/9501 , G01N2021/8822 , H01L21/67155
摘要： A method for inspecting semiconductor wafers is provided in which a plurality of independent, low cost, optical-inspection subsystems (30) are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer (20), the wafer location relative to the inspection being controlled so that the entire wafer (20) is imaged by the system of optical subsystems (30) in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtering. The filtered light is processed by general purpose digital-signal processors (19). Image subtraction methods are used to detect wafer defects, which are reported to a main computer (50) to aid in statistical process control, particularly for manufacturing equipment.
摘要翻译：提供了一种用于检查半导体晶片的方法，其中多个独立的低成本光学检查子系统（30）被封装和集成以同时执行晶片（20）的部分的平行检查，相对于检查的晶片位置被控制为使得整个晶片（20）由光学子系统（30）的系统以光栅扫描模式成像。单色相干光源照射晶圆表面。暗场光学系统使用傅里叶滤波来收集散射光并过滤由有效的周期性晶片结构产生的图案。滤波后的光由通用数字信号处理器（19）处理。图像减法方法被用于检测晶片缺陷，其被报告给主计算机（50）以辅助统计过程控制，特别是用于制造设备。

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