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    • 4. 发明授权
    • Text box resizing
    • 文本框调整大小
    • US09508322B2
    • 2016-11-29
    • US12790673
    • 2010-05-28
    • Christopher Thomas
    • Christopher Thomas
    • G09G5/00G09G5/26G06F3/0488G09G5/08
    • G09G5/26G06F3/0488G09G5/08G09G2340/045G09G2340/145
    • A system, method, and computer readable medium are disclosed for re-sizing input fields and text of a user interface displayed within a touch-sensitive screen. The user interface comprises an initial view with at least one input field. The user interface is provided for display on the screen. A touch interaction is detected on the screen, and it is determined whether the interaction is within a predefined area of an input field. Responsive to determining that the interaction is within the predefined area, a magnified view of the input field is generated. The magnified view increases the proportion of the screen filled by the input field and text relative to the initial view. The magnified view is then presented for display on the screen.
    • 公开了一种系统,方法和计算机可读介质,用于重新调整在触敏屏幕内显示的用户界面的输入字段和文本。 用户界面包括具有至少一个输入字段的初始视图。 提供用户界面以在屏幕上显示。 在屏幕上检测到触摸交互,并且确定交互是否在输入字段的预定义区域内。 响应于确定交互在预定区域内,生成输入字段的放大视图。 放大视图增加了输入字段和文本相对于初始视图填充的屏幕的比例。 然后放大的视图显示在屏幕上。
    • 8. 发明申请
    • Betavoltaic cell
    • Betavoltaic细胞
    • US20070080605A1
    • 2007-04-12
    • US11509323
    • 2006-08-24
    • MVS ChandrashekharChristopher ThomasMichael Spencer
    • MVS ChandrashekharChristopher ThomasMichael Spencer
    • G21H1/00
    • G21H1/02
    • High aspect ratio micromachined structures in semiconductors are used to improve power density in Betavoltaic cells by providing large surface areas in a small volume. A radioactive beta-emitting material may be placed within gaps between the structures to provide fuel for a cell. The pillars may be formed of SiC. In one embodiment, SiC pillars are formed of n-type SiC. P type dopant, such as boron is obtained by annealing a borosilicate glass boron source formed on the SiC. The glass is then removed. In further embodiments, a dopant may be implanted, coated by glass, and then annealed. The doping results in shallow planar junctions in SiC.
    • 半导体中的高纵横比微加工结构用于通过在小体积中提供大的表面积来改善Betavoltaic细胞中的功率密度。 放射性β发射材料可以放置在结构之间的间隙内以为电池提供燃料。 支柱可以由SiC形成。 在一个实施例中,SiC柱由n型SiC形成。 通过对形成在SiC上的硼硅酸盐玻璃硼源进行退火,得到硼等P型掺杂剂。 然后取出玻璃。 在另外的实施方案中,掺杂剂可以被注入,用玻璃涂覆,然后退火。 掺杂导致SiC中的浅平面结。