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    • 1. 发明申请
    • Charged Particle Beam Device with Aperture
    • 带孔径的带电粒子束装置
    • US20070257207A1
    • 2007-11-08
    • US10576547
    • 2004-10-19
    • Jurgen FrosienStefan LanioHelmut Banzhof
    • Jurgen FrosienStefan LanioHelmut Banzhof
    • H01J37/09
    • H01J37/09H01J2237/0455
    • The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.
    • 本发明涉及一种用于检查或构造包括带电粒子束源(5)以产生带电粒子束(7)的样本(3)的带电粒子束装置(1),聚焦透镜(9) 带电粒子束(7)到样品(3)上,以及孔径系统(13),用于限定带电粒子束(7)的孔(6)。 孔径系统(13)包括阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第一部分(7a)的第一构件(20),第二构件 (30)阻挡所述带电粒子束源(5)和所述聚焦透镜(9)之间的带电粒子束(7)的第二部分(7b),用于移动所述第一构件(20)的第一装置(24) 以调节带电粒子束(7)的阻塞的第一部分(7a)的尺寸,以及用于独立于第一部分(7b)移动第二部件(30)的第二装置(34)。 利用这种孔径系统(13),可以在操作期间自由地调整孔径(6)的尺寸并将其对准光轴(8)。
    • 3. 发明授权
    • Method and apparatus for automatically positioning a workpiece relative
to a scanning field or mask
    • 用于相对于扫描场或掩模自动定位工件的方法和装置
    • US4219719A
    • 1980-08-26
    • US912982
    • 1978-06-06
    • Jurgen FrosienHelmut Reschke, deceased
    • Jurgen FrosienHelmut Reschke, deceased
    • G03F9/00H01J37/304H01L21/027B23K15/00B23K26/00G05B1/00
    • H01J37/3045
    • A method for automatically positioning a workpiece having at least one marking, specifically a wafer for integrated circuits which is to be processed in a charged-particle beam apparatus, relative to a scanning field or mask. In the method, a scanning beam scans the workpiece along the line and a marking signal is generated when the marking is reached by the beam. This marking signal controls a device which generates a control signal in response to the marking signal which is proportional to the deviation of the marking position from a reference position and which drives a device for correcting the position of the workpiece relative to the scanning field or mask. The improvement of the invention comprises the steps of scanning the beam across the workpiece successively in opposite directions at the same velocity through a forward sweep and a return sweep of the beam; integrating a positive reference voltage in an integrator during the forward sweep of the beam from the beginning of the line scanned until the marking on the workpiece is reached by the beam; integrating a negative reference voltage having the same magnitude as the positive reference voltage in the integrator during the return sweep of the beam from the end of the line scanned by the beam until the marking on the workpiece is reached by the beam; and generating an output control signal by means of the integrator after a full forward and return sweep of the scanning beam over the workpiece for correcting the position of the workpiece relative to the scanning field or mask.A method using digital scanning and apparatus for carrying out the methods are also disclosed.
    • 一种用于自动定位具有至少一个标记的工件的方法,特别是相对于扫描场或掩模在带电粒子束装置中处理的集成电路的晶片。 在该方法中,扫描光束沿着线扫描工件,并且当光束到达标记时产生标记信号。 该标记信号控制响应于与标记位置与参考位置的偏差成比例的标记信号产生控制信号并且驱动用于校正工件相对于扫描场或掩模的位置的装置的装置 。 本发明的改进包括以下步骤:通过正向扫掠和光束的返回扫描以相同的速度在相反方向上连续扫描光束穿过工件; 在从扫描线的开始到光束到达工件上的标记的光束的向前扫描期间,在积分器中积分正参考电压; 在从光束扫描的线的端部返回扫描期间,在积分器中积分具有与正参考电压相同幅度的负参考电压,直到光束到达工件上的标记; 以及在所述扫描光束在所述工件上完全正向和反向扫描之后通过所述积分器产生输出控制信号,以相对于所述扫描场或掩模校正所述工件的位置。 还公开了一种使用数字扫描的方法和用于执行该方法的装置。
    • 4. 发明授权
    • Method for positioning a workpiece relative to a scanning field or a
mask in a charged-particle beam apparatus
    • 在带电粒子束装置中相对于扫描场或掩模定位工件的方法
    • US4152599A
    • 1979-05-01
    • US868756
    • 1978-01-12
    • Jurgen Frosien
    • Jurgen Frosien
    • H01J37/305G01R17/00H01J37/304H01L21/027H03F1/30A61K27/02
    • H03F1/303G01R17/00H01J37/304H01J37/3045
    • An improved method for positioning a workpiece having at least one marking in a charged-particle beam apparatus relative to either a scanning field or a mask and in which a scanning beam linearly scans the workpiece and a signal is generated by the scanning and controls a writing beam which travels across the screen of a display means. The improvement of the invention comprises the step of scanning the workpiece with the scanning beam successively in opposite directions at the same velocity. The writing beam travels across the screen of the display means in response to the scanning in the same direction once for each scan of the workpiece by the scanning beam in a definite phase relationship to the scanning beam. The scanning of the workpiece generates two signals in response thereto and the positions of the two signals, which are displayed on the display means, are adjusted so that the signals are brought into coincidence.
    • 一种用于在带电粒子束装置中相对于扫描场或掩模定位具有至少一个标记的工件的改进方法,其中扫描光束线性扫描工件,并且通过扫描产生信号并控制写入 横跨显示装置的屏幕的光束。 本发明的改进包括以相同的速度在相反方向上以扫描光束连续扫描工件的步骤。 写入光束响应于以与扫描光束确定的相位关系的扫描光束对于工件的每次扫描在相同方向扫描一次而横越显示装置的屏幕。 工件的扫描产生响应于此的两个信号,并且调节显示在显示装置上的两个信号的位置,使得信号被重合。
    • 5. 发明申请
    • CHARGED PARTICLE BEAM EMITTING DEVICE AND METHOD FOR OPERATING A CHARGED PARTICLE BEAM EMITTING DEVICE
    • 充电颗粒射束发射装置和用于操作充电颗粒光束发射装置的方法
    • US20070158588A1
    • 2007-07-12
    • US11469728
    • 2006-09-01
    • Fang ZhouPavel AdamecJurgen FrosienJimmy Vishnipolsky
    • Fang ZhouPavel AdamecJurgen FrosienJimmy Vishnipolsky
    • A61N5/00
    • H01J37/073H01J2237/022H01J2237/06325
    • A method for operating a charged particle beam emitting device and, in particular, an electron beam emitting device including a cold field emitter is provided. The method includes the steps of placing the cold field emitter in a vacuum of a given pressure, the emitter exhibiting a high initial emission current I0 and a lower stable mean emission current IS under a given electric extraction field; applying the given electric extraction field to the emitter for emitting electrons from the emitter surface; performing a cleaning process by applying at least one heating pulse to the cold field emitter for heating the emitter surface, whereby the cleaning process is performed before the emission current of the cold field emitter has declined to the lower stable mean emission value IS; and repeating the cleaning process to keep the emission current of the emitter continuously above the substantially stable emission value IS.
    • 提供了一种用于操作带电粒子束发射器件的方法,特别是包括冷场发射器的电子束发射器件。 该方法包括以下步骤:将冷场发射器置于给定压力的真空中,发射体表现出高的初始发射电流I 0和较低的稳定平均发射电流I S, 在给定的电提取场下; 将给定的电提取场施加到发射器以从发射器表面发射电子; 通过对冷场发射器施加至少一个加热脉冲来加热发射体表面来执行清洁处理,由此在冷场发射器的发射电流已经下降到较低的稳定平均发光值I < S
    • 8. 发明授权
    • Method and device for determining the focal length of a long focal
length electron optical lens
    • 用于确定长焦距电子光学透镜的焦距的方法和装置
    • US4246487A
    • 1981-01-20
    • US48627
    • 1979-06-14
    • Klaus AngerJurgen FrosienBurkhard Lischke
    • Klaus AngerJurgen FrosienBurkhard Lischke
    • H01J37/141G01B15/00G01Q20/02H01J37/21H01J37/30H01L21/027A61K27/02
    • H01J37/21H01J37/3007
    • A method and a device used for determining the focal length of a long focal length electron optical lens particularly used with a microprojector characterized by projecting a bundle of parallel rays along the axis of the long focal length lens, said bundle of rays having a ring-shaped cross section with a radius R, providing a pinhole diaphragm having a diameter which corresponds approximately to the diameter of the circle of least confusion of the lens for a ring-shaped bundle of parallel rays, either positioning the diaphragm axially relative to the lens or holding the diaphragm fixed and changing the excitement of the lens to obtain the least influence of the diaphragm on the bundle of rays passing through the pinhole diaphragm, detecting the image of the rays passing through the diaphragm on a plane at a distance z.sub.2 from the diaphragm, measuring the radius r of the image of the ring-shaped bundle of rays on the plane and then determining the focal length f from the magnitude of R, r, z.sub.2 according to the formula f=(R/r).multidot.z.sub.2. The device includes an annular field stop for producing the bundle of rays having a ring-shaped cross section, means for positioning the field stop in that path of the rays prior to their reaching the lens, a diaphragm having an aperture of the circle of least confusion for the lenses of the ring-shaped bundle of parallel rays and means for recording the image passing through the diaphragm.
    • 一种用于确定特别用于具有沿着长焦距透镜的轴线投射一束平行光束的微型投影仪的长焦距电子光学透镜的焦距的方法和装置,所述光束具有环形光束, 形成具有半径R的横截面,提供针孔隔膜,其具有对应于近似于环形束平行光线的透镜的最小混淆的圆的直径的直径,或者相对于透镜轴向地定位隔膜; 保持隔膜固定并改变透镜的兴奋,以获得通过针孔隔膜的光束束的影响最小的影响,检测通过隔膜的光线的图像在与隔膜的距离z2处的平面上 测量平面上的环形光束束的图像的半径r,然后从R的大小确定焦距f, r,z2根据公式f =(R / r)xz2。 该装置包括用于产生具有环形横截面的射线束的环形场停止件,用于在射入到达镜片之前将射线挡块定位在该光线路径中的装置,具有至少圆形孔径的隔膜 对于平行光束的环形束的透镜的混淆以及用于记录通过光阑的图像的装置。
    • 10. 发明授权
    • Particle beam apparatus
    • 粒子束装置
    • US06720557B2
    • 2004-04-13
    • US09825257
    • 2001-04-03
    • Jurgen Frosien
    • Jurgen Frosien
    • H01J3728
    • H01J37/244H01J2237/2448H01J2237/2449
    • A particle beam apparatus includes a source for providing a primary particle beam along a primary beam axis, an objective lens for focussing the primary particle beam onto a specimen so as to release particles therefrom, and a detection system for image generation. The objective lens includes an immersion lens for decelerating the primary particle. The detection system includes a converter with a conversion area to convert the released accelerated particles into secondary particles, an electrode for influencing the converted secondary particles and at least one detector for detecting the converted secondary particles. The detection system is arranged in front of the immersion lens. The converter and the electrode control the converted secondary particles so as to prevent the converted secondary particles released at a specific part of the conversion area from reaching the detector.
    • 粒子束装置包括用于沿主光束轴提供初级粒子束的源,用于将一次粒子束聚焦到样本上以便从其上释放颗粒的物镜,以及用于图像生成的检测系统。 物镜包括用于使一次粒子减速的浸没透镜。 检测系统包括具有转换区域以将释放的加速颗粒转化为二次颗粒的转换器,用于影响转化的二次颗粒的电极和用于检测转化的二次颗粒的至少一个检测器。 检测系统布置在浸没透镜的前面。 转换器和电极控制转换的二次粒子,以防止在转换区域的特定部分释放的转换的二次粒子到达检测器。