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1. 发明授权

US4246487A Method and device for determining the focal length of a long focal length electron optical lens 失效
标题翻译：用于确定长焦距电子光学透镜的焦距的方法和装置
公开(公告)号：US4246487A
公开(公告)日：1981-01-20
申请号：US48627
申请日：1979-06-14
申请人： Klaus Anger , Jurgen Frosien , Burkhard Lischke
发明人： Klaus Anger , Jurgen Frosien , Burkhard Lischke
IPC分类号： H01J37/141 , G01B15/00 , G01Q20/02 , H01J37/21 , H01J37/30 , H01L21/027 , A61K27/02
CPC分类号： H01J37/21 , H01J37/3007
摘要： A method and a device used for determining the focal length of a long focal length electron optical lens particularly used with a microprojector characterized by projecting a bundle of parallel rays along the axis of the long focal length lens, said bundle of rays having a ring-shaped cross section with a radius R, providing a pinhole diaphragm having a diameter which corresponds approximately to the diameter of the circle of least confusion of the lens for a ring-shaped bundle of parallel rays, either positioning the diaphragm axially relative to the lens or holding the diaphragm fixed and changing the excitement of the lens to obtain the least influence of the diaphragm on the bundle of rays passing through the pinhole diaphragm, detecting the image of the rays passing through the diaphragm on a plane at a distance z.sub.2 from the diaphragm, measuring the radius r of the image of the ring-shaped bundle of rays on the plane and then determining the focal length f from the magnitude of R, r, z.sub.2 according to the formula f=(R/r).multidot.z.sub.2. The device includes an annular field stop for producing the bundle of rays having a ring-shaped cross section, means for positioning the field stop in that path of the rays prior to their reaching the lens, a diaphragm having an aperture of the circle of least confusion for the lenses of the ring-shaped bundle of parallel rays and means for recording the image passing through the diaphragm.
摘要翻译：一种用于确定特别用于具有沿着长焦距透镜的轴线投射一束平行光束的微型投影仪的长焦距电子光学透镜的焦距的方法和装置，所述光束具有环形光束，形成具有半径R的横截面，提供针孔隔膜，其具有对应于近似于环形束平行光线的透镜的最小混淆的圆的直径的直径，或者相对于透镜轴向地定位隔膜; 保持隔膜固定并改变透镜的兴奋，以获得通过针孔隔膜的光束束的影响最小的影响，检测通过隔膜的光线的图像在与隔膜的距离z2处的平面上测量平面上的环形光束束的图像的半径r，然后从R的大小确定焦距f， r，z2根据公式f =（R / r）xz2。该装置包括用于产生具有环形横截面的射线束的环形场停止件，用于在射入到达镜片之前将射线挡块定位在该光线路径中的装置，具有至少圆形孔径的隔膜对于平行光束的环形束的透镜的混淆以及用于记录通过光阑的图像的装置。

2. 发明授权

US4238680A Method and device for setting and correcting errors of an electron optical condenser of a microprojector 失效
标题翻译：用于设置和校正微型喷射器的电子光学冷凝器的误差的方法和装置
公开(公告)号：US4238680A
公开(公告)日：1980-12-09
申请号：US39878
申请日：1979-05-17
申请人： Klaus Anger , Juergen Frosien , Burkhard Lischke
发明人： Klaus Anger , Juergen Frosien , Burkhard Lischke
IPC分类号： H01J37/153 , H01J37/21 , H01J37/30 , H01L21/027 , G01K1/08
CPC分类号： H01J37/153 , H01J37/21 , H01J37/3007
摘要： A method and device for correcting errors and setting the focus of an electron optical condenser of a microprojector which condenser produces a bundle of axially parallel electron rays for illuminating a large surface transmission mask to create an image which is projected by means of an electron optical lens system on a surface of a wafer characterized by placing an annular field stop or diaphragm which passes a bundle of rays having a ring-shaped or annular cross section and recording the image in a plane preferably adjacent the surface of the wafer. The recording can be accomplished by utilizing a photographic plate or by utilizing a detector arrangement. When the image on the recording unit is the same size and shape as the annular field stop, then the electron optical condenser has the correct focal length and the source is disposed on the front focal plane.
摘要翻译：一种用于校正误差并设置微型喷射器的电子光学冷凝器的焦点的方法和装置，该冷凝器产生一束轴向平行的电子射线，用于照射大的表面透射掩模以产生通过电子光学透镜投影的图像系统，其特征在于放置通过具有环形或环形横截面的一束光线的环形场阻挡件或隔膜，并将图像记录在优选地邻近晶片表面的平面中。记录可以通过利用照相板或利用检测器装置来实现。当记录单元上的图像与环形场停止的尺寸和形状相同时，电子光学聚光器具有正确的焦距，并且源设置在前焦平面上。

3. 发明授权

US4136285A Method for irradiating a specimen by corpuscular-beam radiation 失效
标题翻译：用辐射光束照射样本的方法
公开(公告)号：US4136285A
公开(公告)日：1979-01-23
申请号：US732645
申请日：1976-10-15
申请人： Klaus Anger , Burkhard Lischke , Andreas Oelmann , Helmut Reschke
发明人： Klaus Anger , Burkhard Lischke , Andreas Oelmann , Helmut Reschke
IPC分类号： H01J37/04 , H01J37/30 , H01J37/302 , H01J37/00
CPC分类号： H01J37/302 , H01J37/3007
摘要： A method for irradiating a specimen by corpuscular-beam radiation in which an irradiated surface pattern including isolated areas unexposed to the corpuscular beam surrounded at least almost completely by areas exposed to the beam is generated on a specimen by first imaging a mask which is supported by a support grid comprising a plurality of parallel strips and having a pattern corresponding to the surface pattern to be generated, on the specimen by shadow projection by means of a corpuscular beam consisting of a plurality of parallel rays. The image of the supporting grid is then removed by tilting the corpuscular beam in a direction perpendicular to the longitudinal axis of the strips forming the support grid through an angle which is at least equal in radians to the ratio of the width of the strips to the distance between the mask and the specimen.

4. 发明授权

US4514638A Electron-optical system with variable-shaped beam for generating and measuring microstructures 失效
标题翻译：具有可变形梁的电子 - 光学系统用于产生和测量微结构
公开(公告)号：US4514638A
公开(公告)日：1985-04-30
申请号：US643108
申请日：1984-08-22
申请人： Burkhard Lischke , Juergen Frosien , Klaus Anger , Erich Plies
发明人： Burkhard Lischke , Juergen Frosien , Klaus Anger , Erich Plies
IPC分类号： H01J37/28 , H01J37/063 , H01J37/09 , H01J37/141 , H01J37/30 , H01J37/305 , H01L21/027 , H01J37/145
CPC分类号： H01J37/063 , H01J37/09 , H01J37/141 , H01J37/3007
摘要： An electron-optical system with a variable-shaped beam for generating and measuring microstructures, such as circuits on a semiconductor substrate, generates the variable-shaped electron beam by the use of electron-optical shadow projection imaging and has a remote focus multipole Wehnelt electrode for adjusting, focusing, and controlling the intensity of the electron beam. The system also has a ferrite polecylinder in the beam projections lens with field attenuation or may have a beam projection lens with an external air gap. The length of the electron beam is approximately 60 centimeters.
摘要翻译：具有用于产生和测量微结构的可变形光束的电子 - 光学系统，例如半导体衬底上的电路，通过使用电子 - 光学阴影投影成像产生可变形电子束，并具有远程聚焦多极Wehnelt电极用于调整，聚焦和控制电子束的强度。该系统在具有场衰减的束投影透镜中还具有铁氧体吸收柱，或者可以具有具有外部气隙的束投影透镜。电子束的长度约为60厘米。

5. 发明授权

US4393308A High current electron source 失效
标题翻译：大电流源
公开(公告)号：US4393308A
公开(公告)日：1983-07-12
申请号：US240881
申请日：1981-03-05
申请人： Klaus Anger , Juergen Frosien , Burkhard Lischke , Erich Plies , Klaus Tonar
发明人： Klaus Anger , Juergen Frosien , Burkhard Lischke , Erich Plies , Klaus Tonar
IPC分类号： H01J37/063 , H01J37/06 , H01J37/153 , H01L21/027 , H01J37/00
CPC分类号： H01J37/06
摘要： A high current electron source with a narrow energy band of the type employed in an electron beam printer has a beam generating system consisting of a cathode and focusing electrodes and an anode with at least one electrode functioning to astigmatically focus at least one electron crossover in the low velocity range. For varying the position and shape of the crossover in a simple manner for adaptation to particular use conditions of the high current electron source, the Wehnelt electrode of the electron source consists of one or more cylinder lenses or of an electrostatic multipole element, or an electromagnetic multipole element is disposed in the plane of a conventional non-ferromagnetic Wehnelt electrode with a circular aperture for the electron beam. By pole reversal of the Wehnelt voltage or of the coil current and by changing the size of the current, the shape and azimuth position of the first crossover in the cathode space can be varied to any configuration. By so doing, an energy spread of the electrons is prevented and an optimum illumination of surfaces to be imaged is achieved.
摘要翻译：具有在电子束打印机中使用的类型的窄能带的高电流电子源具有由阴极和聚焦电极组成的光束产生系统，以及具有至少一个电极的阳极，其功能是使至少一个电子交叉点在低速范围为了以简单的方式改变交叉的位置和形状以适应高电流电子源的特定使用条件，电子源的Wehnelt电极由一个或多个圆柱透镜或静电多极元件或电磁多极元件设置在具有用于电子束的圆形孔的常规非铁磁Wehnelt电极的平面中。通过Wehnelt电压或线圈电流的极点反转以及通过改变电流的大小，阴极空间中的第一交叉点的形状和方位角度可以变化到任何构造。通过这样做，可以防止电子的能量扩散，并实现要成像的表面的最佳照明。

6. 发明授权

US4140913A Charged-particle beam optical apparatus for the reduction imaging of a mask on a specimen 失效
标题翻译：带电粒子束光学装置，用于对试样上的掩模进行还原成像
公开(公告)号：US4140913A
公开(公告)日：1979-02-20
申请号：US870585
申请日：1978-01-18
申请人： Klaus Anger , Burkhard Lischke , Karl-Heinz Muller , Andreas Oelmann
发明人： Klaus Anger , Burkhard Lischke , Karl-Heinz Muller , Andreas Oelmann
IPC分类号： H01L21/027 , H01J37/30 , H01J37/00
CPC分类号： H01J37/3007
摘要： A charged-particle beam optical apparatus for the reduction imaging of a mask on a specimen to be examined. The apparatus comprises a beam source for illuminating the mask, a condenser lens system comprising a plurality of lenses generating a ray bundle which strikes the mask as a probe, a beam deflection system located ahead of the last of the condenser lenses in the direction of the beam path, and a projection lens system including a long focal length intermediate lens and a short focal length imaging lens. The intermediate and imaging lenses are spaced apart by a distance which is equal to the sum of their focal lengths, and the mask is located in the front focal plane of the intermediate lens. The improvement of the invention comprises the provision of means for generating a probe in the form of a ray bundle comprising a plurality of rays which are at least approximately parallel to each other and which simultaneously illuminate a partial two-dimensional surface area of the mask.
摘要翻译：一种带电粒子束光学装置，用于对要检查的试样上的掩模进行还原成像。该装置包括用于照亮掩模的光束源，包括多个透镜的聚光透镜系统，该多个透镜产生作为探针撞击掩模的光束，位于最后聚光透镜前方的光束偏转系统沿着以及包括长焦距中间透镜和短焦距成像透镜的投影透镜系统。中间和成像透镜间隔开等于其焦距的总和的距离，并且掩模位于中间透镜的前焦平面中。本发明的改进包括提供用于产生包括至少大致彼此平行并且同时照射面罩的部分二维表面区域的多条光线的射线束形式的探针的装置。

7. 发明授权

US4335309A Method and device for the rapid deflection of a particle beam 失效
标题翻译：用于粒子束快速偏转的方法和装置
公开(公告)号：US4335309A
公开(公告)日：1982-06-15
申请号：US172085
申请日：1980-07-24
申请人： Klaus Anger , Juergen Frosien
发明人： Klaus Anger , Juergen Frosien
IPC分类号： G21K1/087 , H01J37/147 , H01L21/027 , H05H7/00 , H01J37/00
CPC分类号： H01J37/1474
摘要： In an exemplary system, a two stage deflection system responds to a first control signal of low frequency such that extra-axial chromatic errors due to electrostatic and magnetic deflection are made equal and opposite. The magnetic and electrostatic deflection systems may be arranged in either order along the beam path just so the low frequency electrostatic deflection is one-half the magnetic deflection and is in an opposite direction at the target. A second higher frequency control signal controls only the electrostatic deflection system. Preferably the deflection velocities at the target produced by the two control signals are equal, with the higher frequency being an integral multiple of the lower frequency and with the control signals being poled to provide opposite deflections. When the two deflection velocities are superimposed, the resultant is then a step type deflection as a function of time.
摘要翻译：在示例性系统中，两级偏转系统响应于低频的第一控制信号，使得由于静电和磁偏转引起的异轴色差误差相等而相反。磁性和静电偏转系统可以沿着光束路径以任何顺序布置，因此低频静电偏转是磁偏转的一半，并且在目标处是相反的方向。第二高频控制信号仅控制静电偏转系统。优选地，由两个控制信号产生的目标处的偏转速度相等，其中较高的频率是较低频率的整数倍，并且控制信号极化以提供相反的偏转。当两个偏转速度叠加时，所得到的是随时间变化的阶梯型偏转。

8. 发明授权

US4090077A Particle beam device with a deflection system and a stigmator 失效
标题翻译：具有偏转系统和瞄准器的粒子束装置
公开(公告)号：US4090077A
公开(公告)日：1978-05-16
申请号：US646669
申请日：1976-01-05
申请人： Klaus Anger
发明人： Klaus Anger
IPC分类号： H01J37/153 , H01J37/26
CPC分类号： H01J37/153
摘要： A particle beam device is provided with an arrangement for eliminating deflection errors having a deflection system and a stigmator. The deflection system has at least two pairs of deflection means disposed in a single plane at right angles to each other. The two deflection means of each of the pairs are disposed diametrically opposite each other and are centered with respect to the beam axis. The stigmator has at least four pairs of field generating means grouped into two systems of two pairs each and the two field generating means of each of the pairs are likewise disposed diametrically opposite each other and centered with respect to the beam axis. The two systems are disposed in the single plane at right angles to each other and are arranged so that each of the systems forms an angle of 45.degree. with the two pairs of deflection means.
摘要翻译：粒子束装置设置有用于消除具有偏转系统和扫描器的偏转误差的装置。偏转系统具有设置在彼此成直角的单个平面中的至少两对偏转装置。每对的两个偏转装置彼此沿直径相对地设置，并且相对于光束轴线居中。该标示符具有至少四对场产生装置，分成两组，每组两对，每对的两个场产生装置同样地彼此径向相对设置并相对于光束轴线居中。两个系统在单个平面中彼此成直角地设置，并且被布置成使得每个系统与两对偏转装置形成45°的角度。

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