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1. 发明授权

US5876280A Substrate treating system and substrate treating method 失效
标题翻译：底物处理系统和底物处理方法
公开(公告)号：US5876280A
公开(公告)日：1999-03-02
申请号：US864937
申请日：1997-05-29
申请人： Junichi Kitano , Hiroshi Shinya , Takayuki Katano , Hidetami Yaegashi , Yasunori Kawakami , Fumihiko Kawano
发明人： Junichi Kitano , Hiroshi Shinya , Takayuki Katano , Hidetami Yaegashi , Yasunori Kawakami , Fumihiko Kawano
IPC分类号： G03F7/20 , H01L21/00 , H01L21/677 , F24F7/06
CPC分类号： H01L21/67173 , G03F7/7075 , H01L21/67017 , H01L21/67178 , H01L21/67778 , Y10S414/14
摘要： The present invention provides a substrate treating system for successively treating a plurality of substrates W under an air-conditioned environment. The system comprises an outer casing provided with a cassette transfer port through which a cassette is transferred, a cassette section having a cassette table arranged within an inner space surrounded by the outer casing for supporting the cassette transferred through the cassette transfer port, a sub-arm mechanism for taking the substrates one by one from the cassette section, a process section positioned adjacent to the cassette section and having a plurality of treating units for treating the substrates arranged therein, a main arm mechanism arranged within the process section for receiving the substrates from the sub-arm mechanism arranged in the cassette section and, then, transferring the received substrates to each of the treating units while transferring the treated substrates out of the treating units, an air supply mechanism for supplying a clean air to form a down-stream within the space surrounded by the outer casing, and a partition plate for partitioning the inner space surrounded by the outer casing not to interfere the down-flow of the air formed by the air supply mechanism, the partition plate having a substrate transfer port through which the substrate is transferred from one of the partitioned spaces to the other partitioned space.
摘要翻译：本发明提供一种用于在空调环境下连续处理多个基板W的基板处理系统。该系统包括设置有盒传送端口的外壳，盒传送通过该盒外壳，盒部具有设置在由外壳包围的内部空间内的盒式表台，用于支撑通过盒式磁带传送端口传送的磁带，用于从盒部分逐个取出基板的臂机构，与盒部分相邻设置的处理部分，并具有用于处理布置在其中的基板的多个处理单元;布置在处理部分内用于接收基板的主臂机构从设置在盒部中的副臂机构，然后将接收到的基板传送到每个处理单元，同时将处理过的基板从处理单元传送出去;空气供应机构，用于供应清洁空气，在由外壳包围的空间内流动，以及用于分隔内部空间的分隔板所述隔板由所述外壳围绕，不会干扰由所述供气机构形成的空气的向下流动，所述隔板具有基板传送口，所述基板通过所述基板传送口从所述分隔空间之一转移到所述另一个分隔空间。

2. 发明授权

US6017663A Method of processing resist utilizing alkaline component monitoring 失效
标题翻译：利用碱性成分监测处理抗蚀剂的方法
公开(公告)号：US6017663A
公开(公告)日：2000-01-25
申请号：US277735
申请日：1999-03-29
申请人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
发明人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
IPC分类号： G03F7/30 , G03F7/16 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , G03F9/00
CPC分类号： H01L21/67173 , G03F7/16 , G03F7/26 , G03F7/7075 , G03F7/70866 , H01L21/67017 , H01L21/67178 , Y10S414/135
摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.
摘要翻译：一种在基板上形成抗蚀剂并在具有空调的处理区域和非处理区域的抗蚀剂处理系统中处理抗蚀剂的方法，该方法包括以下步骤：将基板转移到非处理区域将抗蚀剂涂覆在基材上，使涂覆的抗蚀剂曝光，显影曝光的抗蚀剂，使涂覆的抗蚀剂至少一次，在从转印步骤到显影步骤的时间段内进行热处理，至少检测一次，在从转印步骤到显影步骤的期间，处理气氛中的抗蚀剂分辨率降低的碱性成分，在导致抗蚀剂分辨率不良的处理气氛中设定碱成分浓度的阈值，以及根据检测到的碱性com的浓度控制和改变步骤中的至少一种处理气氛 ponent和阈值。

3. 发明授权

US6097469A Method of processing resist onto substrate and resist processing apparatus 有权
标题翻译：将抗蚀剂加工到基材和抗蚀剂处理装置上的方法
公开(公告)号：US6097469A
公开(公告)日：2000-08-01
申请号：US277734
申请日：1999-03-29
申请人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
发明人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
IPC分类号： G03F7/30 , G03F7/16 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , G03B27/52
CPC分类号： H01L21/67173 , G03F7/16 , G03F7/26 , G03F7/7075 , G03F7/70866 , H01L21/67017 , H01L21/67178 , Y10S414/135
摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.
摘要翻译：一种在基板上形成抗蚀剂并在具有空调的处理区域和非处理区域的抗蚀剂处理系统中处理抗蚀剂的方法，该方法包括以下步骤：将基板转移到非处理区域将抗蚀剂涂覆在基材上，使涂覆的抗蚀剂曝光，显影曝光的抗蚀剂，使涂覆的抗蚀剂至少一次，在从转印步骤到显影步骤的时间段内进行热处理，至少检测一次，在从转印步骤到显影步骤的期间，处理气氛中的抗蚀剂分辨率降低的碱性成分，在导致抗蚀剂分辨率不良的处理气氛中设定碱成分浓度的阈值，以及根据检测到的碱性com的浓度控制和改变步骤中的至少一种处理气氛 ponent和阈值。

4. 发明授权

US5932380A Method of processing resist utilizing alkaline component monitoring 失效
公开(公告)号：US5932380A
公开(公告)日：1999-08-03
申请号：US823470
申请日：1997-03-24
申请人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
发明人： Hidetami Yaegashi , Yasunori Kawakami , Jae Hoon Park , Keiko Kanzawa , Takayuki Katano , Takayuki Toshima , Yuji Kakazu
IPC分类号： G03F7/30 , G03F7/16 , G03F7/20 , G03F7/26 , H01L21/00 , H01L21/027 , G03C5/00
CPC分类号： H01L21/67173 , G03F7/16 , G03F7/26 , G03F7/7075 , G03F7/70866 , H01L21/67017 , H01L21/67178 , Y10S414/135
摘要： A method of forming a resist on a substrate and processing the resist in a resist processing system having a processing region and a non-processing region which are air-conditioned, the method comprising the steps of, transferring the substrate into the non-processing region, coating the resist on the substrate, exposing the coated resist, developing the exposed resist, subjecting the coated resist at least once, to heat treatment in a period from the transferring step to the developing step, detecting at least once, the concentration of an alkaline component which causes defective resolution of the resist in a processing atmosphere in a period from the transferring step to the developing step, setting a threshold value for the concentration of the alkaline component in the processing atmosphere which causes the defective resolution of the resist, and controlling and changing at least one processing atmosphere in the steps in accordance with a detected concentration of the alkaline component and the threshold value.

5. 发明授权

US6054181A Method of substrate processing to form a film on multiple target objects 失效
标题翻译：在多个目标物体上形成膜的基板处理方法
公开(公告)号：US6054181A
公开(公告)日：2000-04-25
申请号：US692286
申请日：1996-08-05
申请人： Mitsuhiro Nanbu , Naruaki Iida , Hideaki Gotou , Masanori Tateyama , Yuji Yoshimoto , Tomoko Ishimoto , Hidetami Yaegashi , Yasunori Kawakami , Takahide Fukuda , Akihiro Fujimoto , Takashi Takekuma , Hiroyuki Matsukawa
发明人： Mitsuhiro Nanbu , Naruaki Iida , Hideaki Gotou , Masanori Tateyama , Yuji Yoshimoto , Tomoko Ishimoto , Hidetami Yaegashi , Yasunori Kawakami , Takahide Fukuda , Akihiro Fujimoto , Takashi Takekuma , Hiroyuki Matsukawa
IPC分类号： H01L21/00 , H01L21/677 , B05D3/12
CPC分类号： H01L21/67265 , H01L21/67173 , H01L21/67766 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/141
摘要： A method of subjecting a plurality of wafers to coating and beating treatments where a first boat is placed on a stage arranged in an interface section. The first boat is capable of containing the wafers stacked at intervals in a vertical direction. The stage is capable of moving in a horizontal direction, and has a plurality of positions for respectively placing a plurality of boats. The wafers are conveyed from a supply section to a coating section, and are subjected to a coating treatment one by one. The wafers, which have undergone the coating treatment, are conveyed to the interface section. The wafers, which have undergone the coating treatment, are loaded into the first boat placed on the stage, in the interface section. The first boat containing the wafers, which have undergone the coating treatment, is located at a transfer position by moving the stage. The first boat, located at a transfer position by moving the stage. The first boat, located at the transfer position, is conveyed from the stage into a heating section, and the wafers, which have undergone the coating treatment, are subjected to a heating treatment simultaneously and all together.
摘要翻译：一种将多个晶片进行涂覆和打浆处理的方法，其中第一个船被放置在布置在界面部分中的台上。第一艘船能够容纳沿垂直方向间隔堆叠的晶片。舞台能够沿水平方向移动，并且具有用于分别放置多个船的多个位置。将晶片从供给部输送到涂布部，并逐个进行涂布处理。已经经过涂覆处理的晶片被输送到界面部分。已经进行了涂覆处理的晶片被装载到接口部分中放置在载物台上的第一个舟皿中。包含经过涂覆处理的晶片的第一艘船通过移动台架位于转移位置。第一艘船，通过移动舞台位于转移位置。位于转移位置的第一个船从载物台输送到加热部分，并且经过涂覆处理的晶片同时进行加热处理。

6. 发明授权

US5565034A Apparatus for processing substrates having a film formed on a surface of the substrate 失效
标题翻译：用于处理在基板的表面上形成有膜的基板的装置
公开(公告)号：US5565034A
公开(公告)日：1996-10-15
申请号：US331083
申请日：1994-10-28
申请人： Mitsuhiro Nanbu , Naruaki Iida , Hideaki Gotou , Masanori Tateyama , Yuji Yoshimoto , Tomoko Ishimoto , Hidetami Yaegashi , Yasunori Kawakami , Takahide Fukuda , Akihiro Fujimoto , Takashi Takekuma , Hiroyuki Matsukawa
发明人： Mitsuhiro Nanbu , Naruaki Iida , Hideaki Gotou , Masanori Tateyama , Yuji Yoshimoto , Tomoko Ishimoto , Hidetami Yaegashi , Yasunori Kawakami , Takahide Fukuda , Akihiro Fujimoto , Takashi Takekuma , Hiroyuki Matsukawa
IPC分类号： H01L21/00 , H01L21/677 , B05C5/00
CPC分类号： H01L21/67265 , H01L21/67173 , H01L21/67766 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/141
摘要： A substrate processing apparatus according to this invention includes an interface section having a first transfer member for transferring an object from a coating process section for applying a process solution to the object in accordance with a single sheet process to an object holding member, and a moving member for detachably supplying a plurality of object holding member and simultaneously moving the plurality of object holding member, and a heat-treatment section having a second transfer member for transferring the object placed on the object holding member to a heat-treatment section for heat-treating the plurality of objects, which have undergone the coating process, in accordance with a batch process.
摘要翻译：根据本发明的基板处理装置包括接口部分，其具有第一传送部件，用于从涂覆处理部分传送物体，用于根据单个片材处理将物体施加到物体上，并将物体保持部件移动用于可拆卸地供给多个物体保持部件并同时移动多个物体保持部件的部件，以及具有用于将放置在物体保持部件上的物体转印到热处理部的热转印部件的热处理部，根据分批处理对经过涂覆处理的多个物体进行处理。

7. 发明授权

US5725664A Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections 失效
标题翻译：半导体晶片处理装置包括涂层和热处理部之间的局部加湿
公开(公告)号：US5725664A
公开(公告)日：1998-03-10
申请号：US692436
申请日：1996-08-05
申请人： Mitsuhiro Nanbu , Naruaki Iida , Hideaki Gotou , Masanori Tateyama , Yuji Yoshimoto , Tomoko Ishimoto , Hidetami Yaegashi , Yasunori Kawakami , Takahide Fukuda , Akihiro Fujimoto , Takashi Takekuma , Hiroyuki Matsukawa
发明人： Mitsuhiro Nanbu , Naruaki Iida , Hideaki Gotou , Masanori Tateyama , Yuji Yoshimoto , Tomoko Ishimoto , Hidetami Yaegashi , Yasunori Kawakami , Takahide Fukuda , Akihiro Fujimoto , Takashi Takekuma , Hiroyuki Matsukawa
IPC分类号： H01L21/00 , H01L21/677 , B05C5/00
CPC分类号： H01L21/67265 , H01L21/67173 , H01L21/67766 , H01L21/67778 , Y10S134/902 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/141
摘要： An apparatus for subjecting a plurality of wafers to coating and heating treatments, including a coating section for subjecting the wafers to a coating treatment one by one, a heating section for subjecting wafers which have undergone the coating treatment to a heating treatment all together, and an interface section arranged between the coating section and the heating section. The wafers are heat-treated in the heat treatment section while the wafers are stacked at intervals in a vertical direction in a boat. The wafers which have undergone the coating treatment are loaded into the boat by a conveying member in the interface section. The conveying member and the boat are surrounded by a surrounding space formed by a casing at the interface section. A circulation line is combined with an air supply and exhaust system, for circulating air in the surrounding space. A dehumidifier is arranged on the circulation line for dehumidifying air in the circulation line to provide localized dehumidification of the surrounding space formed by the casing.
摘要翻译：一种用于对多个晶片进行涂覆和加热处理的设备，包括用于对晶片进行一次涂覆处理的涂布部分，将经过涂覆处理的晶片全部进行加热处理的加热部分一起进行加热处理;以及布置在涂覆部分和加热部分之间的界面部分。在热处理部分中对晶片进行热处理，同时晶片在船上沿垂直方向间隔堆叠。已经经过涂覆处理的晶片通过接口部分中的传送部件装载到船中。输送构件和舟皿由在界面部分处由壳体形成的周围空间包围。循环管线与供气和排气系统结合，用于在周围空间循环空气。在循环管线上设置除湿器，用于对循环管线中的空气进行除湿，以提供由壳体形成的周围空间的局部除湿。

8. 发明授权

US09136737B2 Stator and resolver 有权
标题翻译：定子和解析器
公开(公告)号：US09136737B2
公开(公告)日：2015-09-15
申请号：US13462369
申请日：2012-05-02
申请人： Motozumi Yura , Yasunori Kawakami
发明人： Motozumi Yura , Yasunori Kawakami
IPC分类号： H01F5/00 , H02K3/28 , H02K24/00
CPC分类号： H02K3/28 , H02K24/00
摘要： Coils are formed into a coil group for a single phase by serially connecting a plurality of coils so that the resulting magnetic flux distribution is a sine wave distribution. The coil group for a single phase is constituted by a plurality of coil sets, formed from two coils that are wound around two adjacent magnetic pole teeth, connected in series. Each coil set includes coils of the two magnetic pole teeth constituting that coil set wound in opposite directions to each other looking from the inside of the stator. An electrical wire extending from an end winding of each coil is turned back so as to run in a direction opposite to an electrical wire connection to a start winding of that coil, and is connected to either a start winding of the next coil or a connection terminal.
摘要翻译：通过串联多个线圈将线圈形成为单相的线圈组，使得所得到的磁通分布为正弦波分布。用于单相的线圈组由多个线圈组构成，其由缠绕在两个相邻磁极齿上的两个线圈组成，该线圈组串联连接。每个线圈组包括构成从定子内部彼此相反缠绕的线圈组的两个磁极齿的线圈。从每个线圈的端部绕组延伸的电线被转回，以便沿与该线圈的起始绕组的电线连接相反的方向延伸，并且连接到下一个线圈的起始绕组或连接终奌站。

9. 发明申请

US20120280678A1 STATOR AND RESOLVER 有权
标题翻译：定期和解决
公开(公告)号：US20120280678A1
公开(公告)日：2012-11-08
申请号：US13462369
申请日：2012-05-02
申请人： Motozumi Yura , Yasunori Kawakami
发明人： Motozumi Yura , Yasunori Kawakami
IPC分类号： G01B7/30
CPC分类号： H02K3/28 , H02K24/00
摘要： Coils are formed into a coil group for a single phase by serially connecting a plurality of coils so that the resulting magnetic flux distribution is a sine wave distribution. The coil group for a single phase is constituted by a plurality of coil sets, formed from two coils that are wound around two adjacent magnetic pole teeth, connected in series. Each coil set includes coils of the two magnetic pole teeth constituting that coil set wound in opposite directions to each other looking from the inside of the stator. An electrical wire extending from an end winding of each coil is turned back so as to run in a direction opposite to an electrical wire connection to a start winding of that coil, and is connected to either a start winding of the next coil or a connection terminal.
摘要翻译：通过串联多个线圈将线圈形成为单相的线圈组，使得所得到的磁通分布为正弦波分布。用于单相的线圈组由多个线圈组构成，其由缠绕在两个相邻磁极齿上的两个线圈组成，该线圈组串联连接。每个线圈组包括构成从定子内部彼此相反缠绕的线圈组的两个磁极齿的线圈。从每个线圈的端部绕组延伸的电线被转回，以便沿与该线圈的起始绕组的电线连接相反的方向延伸，并且连接到下一个线圈的起始绕组或连接终奌站。

10. 发明授权

US07756512B2 Transmitting and receiving system, transmitting apparatus and receiving apparatus 有权
标题翻译：发射和接收系统，发射装置和接收装置
公开(公告)号：US07756512B2
公开(公告)日：2010-07-13
申请号：US11766148
申请日：2007-06-21
申请人： Takumi Ikeda , Yasunori Kawakami , Tsutomu Mikami , Hidekazu Tanigawa
发明人： Takumi Ikeda , Yasunori Kawakami , Tsutomu Mikami , Hidekazu Tanigawa
IPC分类号： H04M1/725
CPC分类号： H04H60/46 , H04H60/27 , H04M3/4211 , H04M3/487
摘要： A transmission and reception system includes a transmission apparatus and reception apparatuses. The transmission apparatus transmits a storage identifier for identifying a storage medium and data. The reception apparatuses each include a receiving section for receiving the storage identifier for identifying the storage medium and the data, and a storage control section for storing the data received by the receiving section on the storage medium identified by the storage identifier received by the receiving section. Hence, automatic storage of data conforming to personal taste and simultaneous automatic storage of data for plural persons are realized.
摘要翻译：发送和接收系统包括发送装置和接收装置。发送装置发送用于识别存储介质和数据的存储标识符。接收装置各自包括用于接收用于识别存储介质和数据的存储标识符的接收部分，以及存储控制部分，用于将由接收部分接收的数据存储在由接收部分接收的存储标识符识别的存储介质上。因此，实现了符合个人喜好的数据的自动存储和用于多个人的数据的同时自动存储。

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