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1. 发明申请

US20060003684A1 Grating and clean room system comprising the same 审中-公开
标题翻译：包括它的光栅和洁净室系统
公开(公告)号：US20060003684A1
公开(公告)日：2006-01-05
申请号：US11143589
申请日：2005-06-03
申请人： Jung-Sung Hwang , Chang-Min Cho , Jae-Hyun Yang , Sang-Mun Chon , Jae-Bong Kim
发明人： Jung-Sung Hwang , Chang-Min Cho , Jae-Hyun Yang , Sang-Mun Chon , Jae-Bong Kim
IPC分类号： F24F7/007
CPC分类号： F24F13/068 , F24F3/161
摘要： Grating forming the floor of a clean room minimizes turbulence and enhances the rate at which air is discharged therethrough. The grate includes a base plate having a plurality of through-holes. Each of the through-holes includes a receiving portion through which the air is received and an exhausting portion through which the air is exhausted. The cross-sectional area of the receiving decreases toward the exhausting portion, and the cross-sectional area of the exhausting portion decreases toward the receiving portion.
摘要翻译：形成洁净室的地板的光栅使湍流最小化，并提高空气通过其排出的速率。格栅包括具有多个通孔的基板。每个通孔包括容纳空气的容纳部分和空气排出的排气部分。接收部的截面积朝向排气部减小，排气部的截面积朝向接收部减小。

2. 发明申请

US20060021934A1 Method and system for fabricating filter structure 审中-公开
标题翻译：制造过滤器结构的方法和系统
公开(公告)号：US20060021934A1
公开(公告)日：2006-02-02
申请号：US11089456
申请日：2005-03-22
申请人： Chang-Min Cho , Jung-Sung Hwang , Dong-Seok Ham , Ha-Na Kim
发明人： Chang-Min Cho , Jung-Sung Hwang , Dong-Seok Ham , Ha-Na Kim
IPC分类号： B01D29/07
CPC分类号： B01D39/083 , B01D39/086 , B01D39/12 , B01D2239/0407 , B01D2239/0478 , B01D2239/083 , B01J20/3223 , Y10T156/10
摘要： The invention discloses a method and system for fabricating a filter structure. The method for fabricating the filter structure comprises preparing a filtering net having mesh patterns, injecting an adhesive on the filtering net, and adhering refining materials to the filtering net coated with the adhesive. Here, the adhesive is injected to have a smaller size than an interval of the mesh patterns. The system for fabricating the filter structure comprises a filtering net, a filtering net transfer device for transferring the filtering net, and an adhesive injection device for injecting an adhesive solution on the filtering net.
摘要翻译：本发明公开了一种制造过滤器结构的方法和系统。制造过滤器结构的方法包括制备具有网眼图案的过滤网，在过滤网上注入粘合剂，以及将精炼材料粘附到涂覆有粘合剂的过滤网上。这里，粘合剂被注入以具有比网状图案的间隔更小的尺寸。用于制造过滤器结构的系统包括过滤网，用于转移过滤网的过滤网转移装置和用于在过滤网上注入粘合剂溶液的粘合剂注入装置。

3. 发明授权

US07326284B2 Contamination control system and air-conditioning system of a substrate processing apparatus using the same 失效
标题翻译：使用其的基板处理装置的污染控制系统和空调系统
公开(公告)号：US07326284B2
公开(公告)日：2008-02-05
申请号：US10883584
申请日：2004-07-01
申请人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
发明人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
IPC分类号： B01D47/00
CPC分类号： F24F3/161 , B01D53/14 , B01D53/78 , B01D2255/802 , B01D2257/106 , B01D2257/302 , B01D2257/404 , B01D2257/406 , B01D2257/70 , F24F2003/1617 , F24F2006/006 , Y02A50/21
摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要翻译：基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。用于除去空气中的污染物的污染控制装置连接到进气管线。控制器控制空气的温度和湿度，没有污染物。空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

4. 发明申请

US20050000243A1 Contamination control system and air-conditioning system of a substrate processing apparatus using the same 失效
标题翻译：使用其的基板处理装置的污染控制系统和空调系统
公开(公告)号：US20050000243A1
公开(公告)日：2005-01-06
申请号：US10883584
申请日：2004-07-01
申请人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
发明人： Tae-Jin Hwang , Jae-Hyun Yang , Jung-Sung Hwang , Hyun-Joon Kim , Yo-Han Ahn
IPC分类号： H01L21/02 , B01D53/14 , B01D53/78 , F24F3/16 , C10K1/08 , F22D1/28 , B01D47/00 , F02M23/14 , F02M31/00 , F25D17/04
CPC分类号： F24F3/161 , B01D53/14 , B01D53/78 , B01D2255/802 , B01D2257/106 , B01D2257/302 , B01D2257/404 , B01D2257/406 , B01D2257/70 , F24F2003/1617 , F24F2006/006 , Y02A50/21
摘要： An air-conditioning system of a substrate processing apparatus includes an air inlet line for providing air to a clean room. A contamination control apparatus for removing contaminants in the air is connected to the air inlet line. A controller controls temperature and humidity of the air without the contaminants. An air outlet line provides the air having the controlled temperature and humidity to a substrate processing chamber that is disposed in the clean room. The contamination control apparatus includes a spray unit having at least one nozzle that sprays water. At least one eliminator that traps the water for capturing contaminants in the air and drops the trapped water into a tank. A water circulation unit provides the water that includes an additive for controlling pH of the water to the spray unit.
摘要翻译：基板处理装置的空调系统包括用于向洁净室提供空气的进气管线。用于除去空气中的污染物的污染控制装置连接到进气管线。控制器控制空气的温度和湿度，没有污染物。空气出口管路将具有受控温度和湿度的空气提供给设置在洁净室中的基板处理室。污染控制装置包括具有喷射水的至少一个喷嘴的喷射单元。至少一个消除器捕获水以捕获空气中的污染物并将被捕获的水滴入罐中。水循环单元提供包括用于控制喷雾单元的水的pH的添加剂的水。

5. 发明授权

US07161660B2 Photolithography system and method of monitoring the same 有权
标题翻译：光刻系统及其监控方法相同
公开(公告)号：US07161660B2
公开(公告)日：2007-01-09
申请号：US11017783
申请日：2004-12-22
申请人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
发明人： Yo-Han Ahn , Seok-Ryeul Lee , Jung-Sung Hwang , Tae-Jin Hwang , Byung-Moo Lee
IPC分类号： G03B27/72
CPC分类号： G03F7/70558
摘要： A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.
摘要翻译：公开了一种在曝光过程中的掩模版的管理系统和方法。计算器计算照射到光刻工艺中使用的掩模版上的照射光的累积剂量。计算器连接到曝光装置以暴露半导体衬底上的光致抗蚀剂。比较器将计算的累积剂量与预设的参考剂量进行比较。当计算的累积剂量大于或等于参考剂量时，控制器暂停光刻工艺。最小化掩模版上的雾度污染，从而防止过程故障。

6. 发明授权

US5871812A Apparatus and method for depositing molecular impurities on a semiconductor wafer 失效
标题翻译：用于在半导体晶片上沉积分子杂质的装置和方法
公开(公告)号：US5871812A
公开(公告)日：1999-02-16
申请号：US773879
申请日：1996-12-26
申请人： Jung-Sung Hwang , Dong-Joo Lee , Nam-Hee You , Sang-Young Moon
发明人： Jung-Sung Hwang , Dong-Joo Lee , Nam-Hee You , Sang-Young Moon
IPC分类号： G01N21/88 , C23C16/44 , C23C16/448 , C23C16/455 , C30B31/06 , C30B33/00 , G01N21/94 , G01N21/956 , H01L21/02 , H01L21/20 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/4401 , C23C16/448 , C23C16/45512 , C30B31/06 , C30B33/00
摘要： An apparatus for quantitatively depositing molecular impurities on a semiconductor wafer, includes a reaction chamber, a gas generator for generating a source gas serving as the molecular impurities, a humidifier for generating moisture vapour of a constant temperature, a mixer for mixing the source gas and the moisture vapour to generate a mixed gas, a gas injector for injecting the mixed gas into the reaction chamber, an exhausting part for initiating a vacuum condition in the reaction chamber before deposition of the molecular impurities and for exhausting a remaining gases after deposition of the molecular impurities, and a cleaning air supply portion for supplying a cleaning air into the reaction chamber before deposition of the molecular impurities. After fabricating a semiconductor device using the wafer processed as above, a defective source of mechanism of contamination can be traced by analysing the semiconductor device.
摘要翻译：一种用于在半导体晶片上定量沉积分子杂质的装置包括反应室，用于产生用作分子杂质的源气体的气体发生器，用于产生恒温的湿气的加湿器，用于混合源气体的混合器和产生混合气体的水分蒸汽，将混合气体注入反应室的气体注入器，用于在沉积分子杂质之前在反应室中引发真空状态并在沉积之后排出剩余气体的排气部分分子杂质和用于在沉积分子杂质之前将清洁空气供应到反应室中的清洁空气供应部分。在使用如上所述处理的晶片制造半导体器件之后，可以通过分析半导体器件来追踪污染机制的有缺陷的源。

7. 发明授权

US07156892B2 Filter protection device for preventing damage to an air filter 失效
标题翻译：过滤器保护装置，用于防止空气过滤器损坏
公开(公告)号：US07156892B2
公开(公告)日：2007-01-02
申请号：US10684409
申请日：2003-10-15
申请人： Dae-Won Kim , Jung-Sung Hwang , Tae-Hyup Kim
发明人： Dae-Won Kim , Jung-Sung Hwang , Tae-Hyup Kim
IPC分类号： B01D46/10
CPC分类号： B01D46/0002 , Y10S55/29 , Y10S55/31 , Y10S55/35
摘要： A filter protection apparatus includes a frame of a closed curve defining an inner space isolated from surroundings, the frame having a shape of a filter securing part for securing an air filter, an attaching part for attaching the frame to a filter securing part, and a protection part, which is coupled on the inner surface of the frame to occupy the inner space with a plurality of minute holes through which air passes, for protecting the filter from damage. In operation, the protection part is able to prevent damage to the filter that may be caused by work instruments during maintenance work.
摘要翻译：过滤器保护装置包括限定与周围隔离的内部空间的闭合曲线的框架，框架具有用于固定空气过滤器的过滤器固定部分的形状，用于将框架附接到过滤器固定部分的附接部分，以及保护部件，其联接在框架的内表面上，以利用空气通过的多个微小孔来占据内部空间，以保护过滤器免受损坏。在操作中，保护部件能够防止在维护工作期间由工作仪器引起的过滤器损坏。

8. 发明授权

US06996453B2 Substrate processing apparatus and method of processing substrate while controlling for contamination in substrate transfer module 失效
标题翻译：基板处理装置和处理基板的方法，同时控制基板传送模块中的污染
公开(公告)号：US06996453B2
公开(公告)日：2006-02-07
申请号：US10684436
申请日：2003-10-15
申请人： Yo-Han Ahn , Ki-Doo Kim , Soo-Woong Lee , Jung-Sung Hwang , Hyeog-Ki Kim
发明人： Yo-Han Ahn , Ki-Doo Kim , Soo-Woong Lee , Jung-Sung Hwang , Hyeog-Ki Kim
IPC分类号： G06F7/00
CPC分类号： H01L21/00 , H01L21/67017 , Y10S414/139
摘要： A substrate processing apparatus for processing substrates prevents the substrates from contaminating as they are transferred. The apparatus includes a container, like a FOUP, for containing substrates, at least one processing chamber where the substrates are processed, a substrate transferring module including a substrate transfer chamber and at least one load port for supporting a container, and a contamination controlling system for the substrate transfer chamber. The contamination controlling system includes a purge gas supply inlet connected to the substrate transfer chamber, and a gas circulating tube for recycling the purging gas to circulate through the chamber. The substrate transfer chamber is purged using the purging gas to remove moisture and contaminating materials from the substrate transfer chamber. The formation of particles on the substrate otherwise caused by a reaction between the moisture and contaminating materials while the substrate is standing by in the container can be prevented.
摘要翻译：用于处理基板的基板处理装置防止基板在被转印时被污染。该装置包括用于容纳衬底的容器，如FOUP，用于处理衬底的至少一个处理室，包括衬底传送室的衬底传送模块和用于支撑容器的至少一个负载端口，以及污染控制系统用于衬底传送室。污染控制系统包括连接到基板传送室的吹扫气体供给入口和用于使净化气体循环通过室的气体循环管。使用净化气体清洗基板传送室，以从基板传送室去除水分和污染材料。可以防止在衬底上的颗粒在容器中待机时由水分和污染物质之间的反应引起的颗粒的形成。

9. 发明授权

US07988122B2 Vibration control pedestal and installation method thereof 失效
标题翻译：振动控制台及其安装方法
公开(公告)号：US07988122B2
公开(公告)日：2011-08-02
申请号：US11937384
申请日：2007-11-08
申请人： Seok-Youn Kim , Jung-Sung Hwang , Ho-Young Lee , Do-Hyun Kwun , Jung-Shik Heo
发明人： Seok-Youn Kim , Jung-Sung Hwang , Ho-Young Lee , Do-Hyun Kwun , Jung-Shik Heo
IPC分类号： F16M1/00
CPC分类号： F16F15/02 , H01L21/6719
摘要： A vibration control pedestal and an installation method thereof are disclosed, including a method for reducing particles and vibrations while moving equipment, including semiconductor equipment, from one vibration control pedestal to another. The vibration control pedestal includes an equipment support body having at least two equipment support cells. A cell connection unit passes through side surfaces of the equipment support cells and connects the equipment support cells to each other. A bottom structure installed under the equipment support body braces the equipment support body.
摘要翻译：公开了一种振动控制基座及其安装方法，包括在将包括半导体设备的设备从一个振动控制基座移动到另一个振动控制基座的同时减小颗粒和振动的方法。振动控制基座包括具有至少两个设备支撑单元的设备支撑体。电池连接单元通过设备支撑单元的侧表面并将设备支撑单元彼此连接。安装在设备支撑体下方的底部结构支撑设备支撑体。

10. 发明申请

US20080160905A1 EXHAUST UNIT, EXHAUSTING METHOD, AND SEMICONDUCTOR MANUFACTURING FACILITY WITH THE EXHAUST UNIT 审中-公开
标题翻译：排气装置，排气装置和排气装置的半导体制造设备
公开(公告)号：US20080160905A1
公开(公告)日：2008-07-03
申请号：US11968039
申请日：2007-12-31
申请人： Moon-Jeong Kim , Kang-Ho Ahn , Suck-Hoon Kang , Jae-Young Lee , Jai-Heung Choi , Jung-Sung Hwang
发明人： Moon-Jeong Kim , Kang-Ho Ahn , Suck-Hoon Kang , Jae-Young Lee , Jai-Heung Choi , Jung-Sung Hwang
IPC分类号： F24F7/00 , H01L21/02 , F24F13/10
CPC分类号： F24F11/72 , F24F2110/40
摘要： Provided is an exhaust unit capable of preventing large pressure fluctuations within a process chamber due to atmospheric pressure changes. The exhaust unit includes a main exhaust duct and a supplemental exhaust duct that acts as a partial bypass. A flap is located at a downstream opening between the main exhaust duct and supplemental exhaust duct and controls the amount of bypassed gas flowing from the supplemental exhaust duct to the main exhaust duct. First and second plates of the flap are pivotally coupled to the main exhaust duct adjacent the downstream opening, the first plate colliding with gas flowing through the main exhaust duct and the second plate partially blocking bypassed gas flowing back into the main exhaust duct from the supplemental exhaust duct. When gas is exhausted through the main exhaust line and the supplemental exhaust duct, the flap passively controls the amount by which the supplemental exhaust duct is opened through fluctuations in atmospheric pressure.
摘要翻译：提供了能够防止由于大气压变化而导致处理室内的大的压力波动的排气单元。排气单元包括用作部分旁路的主排气管道和补充排气管道。翼片位于主排气管道和补充排气管道之间的下游开口处，并且控制从辅助排气管道流向主排气管道的旁路气体的量。翼片的第一和第二板与邻近下游开口的主排气管枢转连接，第一板与流经主排气管的气体相碰撞，第二板部分地阻挡旁路气体从辅助排出管道流回主排气管道排气管。当气体通过主排气管线和补充排气管道排出时，挡板被动地控制补充排气管道通过大气压力的波动而打开的量。

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