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1. 发明授权

US07824560B2 Manufacturing method for ink jet recording head chip, and manufacturing method for ink jet recording head 有权
标题翻译：喷墨记录头芯片的制造方法和喷墨记录头的制造方法
公开(公告)号：US07824560B2
公开(公告)日：2010-11-02
申请号：US11679656
申请日：2007-02-27
申请人： Toshiyasu Sakai , Shuji Koyama , Kenji Ono , Jun Yamamuro
发明人： Toshiyasu Sakai , Shuji Koyama , Kenji Ono , Jun Yamamuro
IPC分类号： B41J2/16
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , H01L21/76898
摘要： A manufacturing method for a substrate for an ink jet head, including formation of an ink supply port in a silicon substrate, the method includes a step of forming, on one side of the substrate, an etching mask layer having an opening at a position corresponding ink supply port; a step of forming unpenetrated holes through the opening of the etching mask layer in at least two rows in a longitudinal direction of the opening; and a step of forming the ink supply port by crystal anisotropic etching of the substrate in the opening.
摘要翻译：一种用于喷墨头的基板的制造方法，包括在硅基板中形成供墨口，该方法包括以下步骤：在基板的一侧上形成在相应位置具有开口的蚀刻掩模层供墨口; 通过蚀刻掩模层的开口沿开口的纵向至少两行形成未穿透孔的步骤; 以及通过在开口中的基板的晶体各向异性蚀刻形成供墨口的步骤。

2. 发明授权

US07727411B2 Manufacturing method of substrate for ink jet head and manufacturing method of ink jet recording head 失效
标题翻译：喷墨头用基板的制造方法和喷墨记录头的制造方法
公开(公告)号：US07727411B2
公开(公告)日：2010-06-01
申请号：US11681411
申请日：2007-03-02
申请人： Jun Yamamuro , Shuji Koyama , Kenji Ono , Toshiyasu Sakai
发明人： Jun Yamamuro , Shuji Koyama , Kenji Ono , Toshiyasu Sakai
IPC分类号： B41J2/16
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1645 , Y10T29/49401
摘要： The present invention provides a manufacturing method of a substrate for an ink jet head including forming an ink supply opening to a silicon substrate, including (a) forming, at the back surface of the silicon substrate, an etching mask layer, which has an opening that is asymmetric with a center line, extending in the longitudinal direction, of an area on the surface of the silicon substrate where the ink supply opening is to be formed; (b) forming a non-through hole on the silicon substrate via the opening on the etching mask layer; and (c) forming the ink supply opening by performing a crystal anisotropic etching to the silicon substrate from the opening.
摘要翻译：本发明提供一种喷墨头用基板的制造方法，其特征在于，包括：（a）在所述硅基板的背面形成有具有开口部的蚀刻掩模层在硅基板的要形成供墨口的表面上的区域的沿长度方向延伸的中心线是不对称的; （b）通过蚀刻掩模层上的开口在硅衬底上形成非通孔; 和（c）通过从开口对硅衬底进行结晶各向异性蚀刻来形成供墨口。

3. 发明申请

US20070212891A1 MANUFACTURING METHOD OF SUBSTRATE FOR INK JET HEAD AND MANUFACTURING METHOD OF INK JET RECORDING HEAD 失效
标题翻译：喷墨头底座的制造方法和喷墨记录头的制造方法
公开(公告)号：US20070212891A1
公开(公告)日：2007-09-13
申请号：US11681411
申请日：2007-03-02
申请人： Jun Yamamuro , Shuji Koyama , Kenji Ono , Toshiyasu Sakai
发明人： Jun Yamamuro , Shuji Koyama , Kenji Ono , Toshiyasu Sakai
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1639 , B41J2/1645 , Y10T29/49401
摘要： The present invention provides a manufacturing method of a substrate for an ink jet head including forming an ink supply opening to a silicon substrate, including (a) forming, at the back surface of the silicon substrate, an etching mask layer, which has an opening that is asymmetric with a center line, extending in the longitudinal direction, of an area on the surface of the silicon substrate where the ink supply opening is to be formed; (b) forming a non-through hole on the silicon substrate via the opening on the etching mask layer; and (c) forming the ink supply opening by performing a crystal anisotropic etching to the silicon substrate from the opening.
摘要翻译：本发明提供一种喷墨头用基板的制造方法，其特征在于，包括：（a）在所述硅基板的背面形成有具有开口部的蚀刻掩模层在硅基板的要形成供墨口的表面上的区域的沿长度方向延伸的中心线是不对称的; （b）通过蚀刻掩模层上的开口在硅衬底上形成非通孔; 和（c）通过从开口对硅衬底进行结晶各向异性蚀刻来形成供墨口。

4. 发明授权

US08057017B2 Ink jet recording head with ink supply ports having a cross-section with varying width 有权
标题翻译：喷墨记录头具有具有变化宽度的横截面的供墨口
公开(公告)号：US08057017B2
公开(公告)日：2011-11-15
申请号：US12878339
申请日：2010-09-09
申请人： Toshiyasu Sakai , Shuji Koyama , Kenji Ono , Jun Yamamuro
发明人： Toshiyasu Sakai , Shuji Koyama , Kenji Ono , Jun Yamamuro
IPC分类号： B41J2/05
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1635 , B41J2/1639 , B41J2/1645 , H01L21/76898
摘要： A manufacturing method for a substrate for an ink jet head, including formation of an ink supply port in a silicon substrate, the method includes a step of forming, on one side of the substrate, an etching mask layer having an opening at a position corresponding ink supply port; a step of forming unpenetrated holes through the opening of the etching mask layer in at least two rows in a longitudinal direction of the opening; and a step of forming the ink supply port by crystal anisotropic etching of the substrate in the opening.
摘要翻译：一种用于喷墨头的基板的制造方法，包括在硅基板中形成供墨口，该方法包括以下步骤：在基板的一侧上形成在相应位置具有开口的蚀刻掩模层供墨口; 通过蚀刻掩模层的开口沿开口的纵向至少两行形成未穿透孔的步骤; 以及通过在开口中的基板的晶体各向异性蚀刻形成供墨口的步骤。

5. 发明申请

US20110020966A1 METHOD FOR PROCESSING SILICON SUBSTRATE AND METHOD FOR PRODUCING SUBSTRATE FOR LIQUID EJECTING HEAD 审中-公开
标题翻译：加工硅基板的方法和用于生产用于液体喷射头的基板的方法
公开(公告)号：US20110020966A1
公开(公告)日：2011-01-27
申请号：US12839301
申请日：2010-07-19
申请人： Mitsuru Chida , Keiji Edamatsu , Toshiyasu Sakai , Jun Yamamuro
发明人： Mitsuru Chida , Keiji Edamatsu , Toshiyasu Sakai , Jun Yamamuro
IPC分类号： H01L21/306
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1645
摘要： A method for processing a silicon substrate includes preparing a first silicon substrate including an etching mask layer including first and second opening portions; forming a first recess in a portion of the silicon substrate corresponding to a region in the first opening portion; etching the silicon substrate by crystal anisotropic etching through the etching mask layer with an etching apparatus and an etchant, the etching proceeding in the first and second opening portions to form a through hole in a position corresponding to the first opening portion and to form a second recess in a position corresponding to the second opening portion; calculating an etching rate of the silicon substrate in terms of the etchant by using the second recess; and determining, by using the calculated etching rate, an etching condition for etching another silicon substrate with the etching apparatus after the etching of the first silicon substrate.
摘要翻译：一种处理硅衬底的方法包括：制备包含第一和第二开口部分的蚀刻掩模层的第一硅衬底; 在所述硅衬底的与所述第一开口部分中的区域相对应的部分中形成第一凹部; 通过蚀刻装置和蚀刻剂通过蚀刻掩模层通过晶体各向异性蚀刻来蚀刻硅衬底，蚀刻在第一和第二开口部分中进行，以在对应于第一开口部分的位置形成通孔，并形成第二在与第二开口部相对应的位置处凹陷; 通过使用第二凹槽计算蚀刻剂方面的硅衬底的蚀刻速率; 以及通过使用所计算的蚀刻速率，在蚀刻所述第一硅衬底之后，使用所述蚀刻装置来确定用于蚀刻另一硅衬底的蚀刻条件。

6. 发明申请

US20100147793A1 METHOD FOR PRODUCING LIQUID DISCHARGE HEAD 有权
标题翻译：生产液体排放头的方法
公开(公告)号：US20100147793A1
公开(公告)日：2010-06-17
申请号：US12635083
申请日：2009-12-10
申请人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
发明人： Tadanobu Nagami , Junichi Kobayashi , Takeshi Terada , Makoto Watanabe , Hiroyuki Abo , Mitsunori Toshishige , Yoshinori Tagawa , Shuji Koyama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinobu Urayama , Taichi Yonemoto
IPC分类号： G11B5/127
CPC分类号： B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1639 , Y10T29/49401
摘要： The present invention provides a method for producing a liquid discharge head including a silicon substrate having, on a first surface, energy generating elements, and a supply port penetrating the substrate from the first surface to a second surface, which is a rear surface of the first surface of the substrate. The method includes the steps of: preparing the silicon substrate having a sacrifice layer at a portion on the first surface where the ink supply port is to be formed and an etching mask layer having a plurality of openings on the second surface, the volume of a portion of the sacrifice layer at a position corresponding to a portion between two adjacent said openings being smaller than the volume of a portion of the sacrifice layer at a position corresponding to the opening; etching the silicon substrate from the plurality of openings and etching the sacrifice layer.
摘要翻译：本发明提供了一种液体排出头的制造方法，该液体排出头包括硅基板，该第一表面在第一表面上具有能量产生元件和从第一表面穿过该基板的供给口，基片的第一表面。该方法包括以下步骤：在要形成供墨口的第一表面上的一部分制备具有牺牲层的硅衬底和在第二表面上具有多个开口的蚀刻掩模层，牺牲层的与相邻的两个开口之间的部分相对应的位置处的部分比对应于开口的位置处的牺牲层的一部分的体积小; 从多个开口蚀刻硅衬底并蚀刻牺牲层。

7. 发明授权

US07300596B2 Method of manufacturing liquid discharge head 有权
标题翻译：液体排放头的制造方法
公开(公告)号：US07300596B2
公开(公告)日：2007-11-27
申请号：US11481796
申请日：2006-07-07
申请人： Hiroyuki Murayama , Shuji Koyama , Yoshinori Tagawa , Kenji Fujii , Masaki Ohsumi , Yoshinobu Urayama , Jun Yamamuro , Tsuyoshi Takahashi , Masahisa Watanabe
发明人： Hiroyuki Murayama , Shuji Koyama , Yoshinori Tagawa , Kenji Fujii , Masaki Ohsumi , Yoshinobu Urayama , Jun Yamamuro , Tsuyoshi Takahashi , Masahisa Watanabe
IPC分类号： B41J2/05 , H01L21/00
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1639 , B41J2/164 , B41J2/1645
摘要： The method of manufacturing a recording head has a flow path wall forming step of forming flow path walls on a substrate having energy generating elements formed thereon, an imbedded material depositing step of depositing an imbedded material between the flow path walls and on a top of each flow path wall, a flattening step of polishing a top of the deposited imbedded material, until the top of the flow path wall is exposed, and a step of forming an orifice plate on the tops of the polished imbedded material and the exposed flow path wall. In the step of forming the flow path walls, patterning of a close contact property improvement layer is simultaneously performed to improve a close contact property between the flow path wall and the substrate.
摘要翻译：制造记录头的方法具有流路壁形成步骤，在其上形成有能量产生元件的基板上形成流路壁，嵌入材料沉积步骤，在流路壁之间和每个顶部上沉积嵌入材料流动路径壁，抛光沉积的嵌入材料的顶部的平坦化步骤，直到流动路径壁的顶部被暴露，以及在抛光的嵌入材料的顶部上形成孔板的步骤和暴露的流动路径壁。在形成流路壁的步骤中，同时进行紧密接触性改善层的图案化，以改善流路壁和基板之间的紧密接触性。

8. 发明授权

US07287847B2 Method of manufacturing ink jet recording head, ink jet recording head, and ink jet cartridge 有权
标题翻译：制造喷墨记录头，喷墨记录头和喷墨墨盒的方法
公开(公告)号：US07287847B2
公开(公告)日：2007-10-30
申请号：US10990492
申请日：2004-11-18
申请人： Kenji Fujii , Shuji Koyama , Masaki Osumi , Shingo Nagata , Jun Yamamuro , Yoshinori Tagawa , Hiroyuki Murayama , Yoshinobu Urayama
发明人： Kenji Fujii , Shuji Koyama , Masaki Osumi , Shingo Nagata , Jun Yamamuro , Yoshinori Tagawa , Hiroyuki Murayama , Yoshinobu Urayama
IPC分类号： B41J2/175
CPC分类号： B41J2/1639 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1635 , B41J2/1642 , B41J2/1645 , B41J2002/14403 , B41J2002/14475
摘要： A method of manufacturing an ink jet head which discharges ink, comprising: a step of preparing a silicon substrate; a step of forming a membrane having a layer in which a plurality of holes are disposed to constitute a filter mask, and a layer with which a first surface is coated in such a manner that the first surface is not exposed from the plurality of holes on the first surface of the substrate; a step of forming a close contact enhancing layer on the membrane formed on the substrate; a step of forming a channel constituting member on the close contact enhancing layer to constitute a plurality of discharge ports and a plurality of ink channels communicating with the plurality of discharge ports; a step of forming an ink supply port communicating with the plurality of ink channels in the silicon substrate by anisotropic etching from a second surface facing the first surface of the substrate; and a step of forming a filter in a portion of the close contact enhancing layer positioned in an opening of the ink supply port using the layer of the membrane in which a plurality of holes are disposed as the mask.
摘要翻译：一种制造喷墨头的喷墨头的方法，包括：制备硅衬底的步骤; 形成具有设置有多个孔的层以构成过滤掩模的膜的步骤，以及第一表面以不使第一表面从多个孔露出的方式涂覆有第一表面的层衬底的第一表面; 在形成在基板上的膜上形成紧密接触增强层的工序; 在紧密接触增强层上形成通道构成构件以构成多个排出口和与多个排出口连通的多个墨水通道的步骤; 通过各向异性蚀刻形成与所述硅衬底中的所述多个墨通道连通的供墨口从与所述基板的所述第一表面相对的第二表面形成的步骤; 以及使用其中设置有多个孔作为掩模的膜层在位于供墨口的开口中的紧密接触增强层的一部分中形成过滤器的步骤。

9. 发明申请

US20060098055A1 Liquid discharge recording head and method for manufacturing same 失效
标题翻译：液体放电记录头及其制造方法
公开(公告)号：US20060098055A1
公开(公告)日：2006-05-11
申请号：US11261511
申请日：2005-10-31
申请人： Kenji Fujii , Shuji Koyama , Masaki Osumi , Jun Yamamuro , Hiroyuki Murayama
发明人： Kenji Fujii , Shuji Koyama , Masaki Osumi , Jun Yamamuro , Hiroyuki Murayama
IPC分类号： B41J2/05
CPC分类号： B41J2/1639 , B41J2/14129 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1635 , B41J2/1642
摘要： The present invention permits to manufacture, with low cost and good through-put, a liquid discharge recording head in which a nozzle plate is formed from inorganic material. In the liquid discharge recording head according to the present invention, a nozzle plate formed from inorganic material is stacked on a front surface of a silicon substrate including heat generating resistant members for generating energy for discharging liquid and an electric circuit for driving the heat generating resistant members. The liquid can be supplied from a liquid supply port extending through the silicon substrate to flow paths provided between the silicon substrate and the nozzle plate. Recessed portions having predetermined depths are formed in a region of the surface of the silicon substrate, where the flow paths are formed, and discharge ports are formed above the recessed portions.
摘要翻译：本发明允许以低成本和良好的通过量制造其中由无机材料形成喷嘴板的液体排出记录头。在根据本发明的液体排出记录头中，由无机材料形成的喷嘴板堆叠在硅基板的前表面上，该硅基板包括用于产生排出液体的能量的产生发热性的部件和用于驱动发热电阻的电路会员液体可以从延伸穿过硅衬底的液体供应口提供到设置在硅衬底和喷嘴板之间的流动路径。在硅基板的形成有流路的区域形成有规定深度的凹部，在凹部上形成排出口。

10. 发明授权

US07901064B2 Ink jet recording head with ink filter formed of a plurality of stacked films 有权
标题翻译：具有由多个层叠膜形成的油墨过滤器的喷墨记录头
公开(公告)号：US07901064B2
公开(公告)日：2011-03-08
申请号：US11625537
申请日：2007-01-22
申请人： Yoshinobu Urayama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinori Tagawa , Shuji Koyama
发明人： Yoshinobu Urayama , Kenji Fujii , Masaki Ohsumi , Jun Yamamuro , Hiroyuki Murayama , Yoshinori Tagawa , Shuji Koyama
IPC分类号： B41J2/175 , B41J2/05 , B41J2/045
CPC分类号： B41J2/1603 , B41J2/14145 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1635 , B41J2/1639 , B41J2/1645 , B41J2002/14403
摘要： An ink jet recording head includes: a substrate; a plurality of ink discharge ports formed to a front face side of the substrate, and a plurality of ink flow paths communicating with the ink discharge ports; an ink supply opening extending through the substrate and communicating with the plurality of ink flow paths; and a filter formed in an opening portion of the ink supply opening arranged in the front face side of the substrate, the filter being constituted of two or more stacked films having formed therein a plurality of opening portions. In this case, the stacked films are arranged with a spacing therebetween.
摘要翻译：喷墨记录头包括：基板; 形成在所述基板的正面侧的多个排墨口以及与所述排墨口连通的多个墨流路; 供墨开口，延伸穿过基板并与多个墨流路连通; 以及形成在所述基板的正面侧的所述供墨口的开口部的过滤器，所述过滤器由形成有多个开口部的两层以上的层叠膜构成。在这种情况下，堆叠的膜以它们之间的间隔布置。

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