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1. 发明申请

US20130065183A1 PATTERNING PROCESS AND RESIST COMPOSITION 审中-公开
标题翻译：绘图工艺和耐腐蚀组合物
公开(公告)号：US20130065183A1
公开(公告)日：2013-03-14
申请号：US13606297
申请日：2012-09-07
申请人： Tomohiro Kobayashi , Jun Hatakeyama , Masashi Iio , Yuuki Suka , Koji Hasegawa , Yuji Harada
发明人： Tomohiro Kobayashi , Jun Hatakeyama , Masashi Iio , Yuuki Suka , Koji Hasegawa , Yuji Harada
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
摘要： A resist composition is provided comprising a polymer comprising recurring units having a protected hydroxyl group, a photoacid generator, an organic solvent, and a hydroxyl-free polymeric additive comprising fluorinated recurring units. A negative pattern is formed by coating the resist composition, prebaking to form a resist film, exposing, baking, and developing the exposed film in an organic solvent-based developer to selectively dissolve the unexposed region of resist film.
摘要翻译：提供了抗蚀剂组合物，其包含聚合物，其包含具有被保护的羟基的重复单元，光致酸产生剂，有机溶剂和包含氟化重复单元的无羟基聚合物添加剂。通过涂覆抗蚀剂组合物，预烘烤以形成抗蚀剂膜，在有机溶剂基显影剂中曝光，烘烤和显影曝光的膜以选择性地溶解抗蚀剂膜的未曝光区域，形成负图案。

2. 发明申请

US20120249995A1 RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD 审中-公开
标题翻译：耐腐蚀膜材料和图案形成方法
公开(公告)号：US20120249995A1
公开(公告)日：2012-10-04
申请号：US13494746
申请日：2012-06-12
申请人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
发明人： Jun Hatakeyama , Yuji Harada , Takeru Watanabe
IPC分类号： G03B27/32
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041
摘要： The invention is a protective film material for immersion lithography that enables desirable immersion lithography, can be removed simultaneously with development of a photoresist layer, and has excellent process adaptability. The invention also includes a method for forming a pattern using the material. More specifically, the invention is a protective film material comprising (i) a blend of a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and an optional alkali soluble repeating unit and a polymer comprising a repeating unit having a fluorine-free alkyl group and an optional alkali soluble repeating unit, or (ii) a polymer comprising a repeating unit having a fluorine-containing alkyl or alkylene group which contains at least one fluorine atom and a repeating unit having a fluorine-free alkyl group and an optional alkali-soluble repeating unit.
摘要翻译：本发明是用于浸没式光刻的保护膜材料，其能够进行希望的浸渍光刻，可以与光致抗蚀剂层的显影同时除去，并且具有优异的工艺适应性。本发明还包括使用该材料形成图案的方法。更具体地说，本发明是一种保护膜材料，其包含（i）包含具有含有至少一个氟原子的含氟烷基或亚烷基的重复单元和任选的碱可溶重复单元的聚合物的共混物和包含具有无氟烷基和任选的碱可溶重复单元的重复单元，或（ii）含有含有至少一个氟原子的含氟烷基或亚烷基的重复单元的聚合物和具有至少一个氟原子的重复单元无氟烷基和任选的碱溶性重复单元。

3. 发明授权

US07666967B2 Ester compound, polymer, resist composition, and patterning process 有权
标题翻译：酯化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07666967B2
公开(公告)日：2010-02-23
申请号：US11606069
申请日：2006-11-30
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： C08F214/18
CPC分类号： C07D307/93 , C07D409/12 , G03F7/0046 , G03F7/0397
摘要： A polymer comprising recurring units (2) obtained through polymerization of an ester compound of formula (1) is used to form a resist composition. R1 is F or C1-C6 fluoroalkyl, R2 is H or C1-C8 alkyl, R3 is O or C1-C6 alkylene, R4 and R5 each are H or C1-C10 alkyl or fluoroalkyl, and R6 is H or an acid labile group. The resist composition, when processed by ArF lithography, has advantages including improved resolution, transparency, minimal line edge roughness, and etch resistance. The resist composition exhibits better performance when processed by ArF immersion lithography with liquid interposed between a projection lens and a wafer.
摘要翻译：使用包含通过聚合式（1）的酯化合物获得的重复单元（2）的聚合物来形成抗蚀剂组合物。 R 1是F或C 1 -C 6氟代烷基，R 2是H或C 1 -C 8烷基，R 3是O或C 1 -C 6亚烷基，R 4和R 5各自是H或C 1 -C 10烷基或氟代烷基，R 6是H或酸不稳定基团。当通过ArF光刻处理时，抗蚀剂组合物具有改进的分辨率，透明度，最小的线边缘粗糙度和耐蚀刻性的优点。当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，抗蚀剂组合物表现出更好的性能。

4. 发明授权

US07642034B2 Polymer, resist protective coating material, and patterning process 有权
标题翻译：聚合物，抗蚀剂保护涂层材料和图案化工艺
公开(公告)号：US07642034B2
公开(公告)日：2010-01-05
申请号：US11699485
申请日：2007-01-30
申请人： Jun Hatakeyama , Koji Hasegawa , Yuji Harada
发明人： Jun Hatakeyama , Koji Hasegawa , Yuji Harada
IPC分类号： G03F7/00 , G03F7/004 , C08F218/00
CPC分类号： G03F7/11 , C08F220/18 , C08F220/24 , C08F220/26 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/2041
摘要： A polymer comprising repeat units having formula (1) wherein R1 and R2 are hydrogen or C1-C12 alkyl, or R1 and R2 may bond together to form a ring, and R30 is hydrogen or methyl is used to formulate a resist protective coating material. A protective coating formed therefrom on a resist film is water-insoluble, dissolvable in alkali aqueous solution or alkaline developer, and immiscible with the resist film so that the immersion lithography can be conducted in a satisfactory manner. During alkali development, development of the resist film and removal of the protective coating can be simultaneously achieved.
摘要翻译：包含具有式（1）的重复单元的聚合物，其中R 1和R 2是氢或C 1 -C 12烷基，或者R 1和R 2可以键合在一起形成环，并且R 30是氢或甲基来配制抗蚀剂保护涂层材料。在抗蚀剂膜上形成的保护涂层是水不溶性的，可溶于碱性水溶液或碱性显影剂中，与抗蚀剂膜不混溶，使浸渍光刻可以以令人满意的方式进行。在碱显影过程中，可以同时实现抗蚀剂膜的开发和保护涂层的去除。

5. 发明申请

US20090280434A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20090280434A1
公开(公告)日：2009-11-12
申请号：US12463751
申请日：2009-05-11
申请人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译：碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。

6. 发明申请

US20090197200A1 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US20090197200A1
公开(公告)日：2009-08-06
申请号：US12320183
申请日：2009-01-21
申请人： Jun Hatakeyama , Yuji Harada
发明人： Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/11 , G03F7/2041
摘要： The present invention relates to a resist top coat composition and a patterning process adopting such a material, which resist top coat composition is provided for forming a top coat on a photoresist film so as to protect the photoresist film, in liguid immersion photolithography. The present invention provides a resist top coat composition for forming a top coat on a photoresist film, wherein the resist top coat composition comprises, at least: a polymer I including a repeating unit a represented by the following general formula (1); and a polymer II including repeating unit having a sulfonic acid or an amine salt of a sulfonic acid:
摘要翻译：本发明涉及一种抗蚀剂面漆组合物和采用这种材料的图案化方法，其抗蚀面漆组合物用于在光致抗蚀剂膜上形成顶涂层以保护光致抗蚀剂膜，在液体浸渍光刻中。本发明提供了一种用于在光致抗蚀剂膜上形成顶涂层的抗蚀剂面漆组合物，其中抗蚀剂面漆组合物至少包含：包含由以下通式（1）表示的重复单元的聚合物I; 和包含具有磺酸或磺酸胺盐的重复单元的聚合物II：

7. 发明授权

US07537880B2 Polymer, resist composition, and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07537880B2
公开(公告)日：2009-05-26
申请号：US11905763
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/30 , C08F24/00
CPC分类号： G03F7/0397 , C08F24/00 , C08F220/32 , G03F7/0046 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
摘要翻译：作为添加剂，作为抗蚀剂组合物，含有含有含氟酯的内酯单元的碱溶性聚合物。抗蚀剂组合物形成显影后具有降低的接触角的抗蚀剂膜。抗蚀剂膜防止浸渍光刻时的水渗透。

8. 发明授权

US07488567B2 Polymer, resist composition and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07488567B2
公开(公告)日：2009-02-10
申请号：US11440126
申请日：2006-05-25
申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
发明人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A polymer comprising recurring units of formula (1) wherein R1 is F or fluoroalkyl, R2 is alkylene or fluoroalkylene, and R3 is an acid labile group and having a Mw of 1,000-500,000 is used to formulate a resist composition, which is processed by the lithography involving ArF exposure and offers many advantages including resolution, minimal line edge roughness, etch resistance, and minimal surface roughness after etching. The composition performs well when processed by the ArF immersion lithography with liquid interposed between the projection lens and the wafer.
摘要翻译：一种包含式（1）的重复单元的聚合物，其中R1是F或氟代烷基，R2是亚烷基或氟代亚烷基，R3是酸不稳定基团，Mw为1,000-500,000，用于配制抗蚀剂组合物，涉及ArF曝光的光刻技术提供许多优点，包括分辨率，最小线边缘粗糙度，耐蚀刻性和蚀刻后的最小表面粗糙度。当通过ArF浸没式光刻法处理介于投影透镜和晶片之间的液体时，组合物表现良好。

9. 发明申请

US20090011365A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20090011365A1
公开(公告)日：2009-01-08
申请号：US12167151
申请日：2008-07-02
申请人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
发明人： Tomohiro KOBAYASHI , Jun Hatakeyama , Yuji Harada
IPC分类号： G03F7/20 , G03C1/00
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0392 , G03F7/11 , G03F7/2041 , Y10S430/108 , Y10S430/111
摘要： To a resist composition comprising a polymer which changes its alkali solubility under the action of an acid as a base resin, is added a copolymer comprising recurring units containing amino and recurring units containing α-trifluoromethylhydroxy as an additive. The composition is suited for immersion lithography.
摘要翻译：对于包含在酸作为基础树脂的作用下改变其碱溶解性的聚合物的抗蚀剂组合物，加入含有氨基的重复单元和含有α-三氟甲基羟基作为添加剂的重复单元的共聚物。该组合物适用于浸没光刻。

10. 发明申请

US20070298355A1 Resist top coat composition and patterning process 有权
标题翻译：抵抗面漆组合和图案化工艺
公开(公告)号：US20070298355A1
公开(公告)日：2007-12-27
申请号：US11808543
申请日：2007-06-11
申请人： Yuji Harada , Jun Hatakeyama
发明人： Yuji Harada , Jun Hatakeyama
IPC分类号： G03C5/00 , C08F12/30 , C08G63/685 , C08G63/688 , C08G75/26
CPC分类号： G03F7/11 , C08F2/38 , C08F20/18 , C08F220/18 , C08F220/22 , C08F220/28 , C08F232/08 , G03F7/0046 , G03F7/2041 , Y10S430/106 , Y10S430/108
摘要： There is disclosed a resist top coat composition, comprising at least a polymer that has an amino group or a sulfonamide group at a polymer end and that is represented by the following general formula (1); and a patterning process comprising: at least, a step of forming a photoresist film on a substrate; a step of forming a resist top coat on the photoresist film by using the resist top coat composition; a step of exposing the substrate; and a step of developing the substrate with a developer. There can be provided a resist top coat composition that makes it possible to provide more certainly rectangular and excellent resist patterns when a top coat is formed on a photoresist film; and a patterning process using such a composition.
摘要翻译：公开了一种抗蚀剂面漆组合物，其至少包含在聚合物末端具有氨基或磺酰胺基团并由以下通式（1）表示的聚合物; 以及图案化工艺，包括：至少在衬底上形成光致抗蚀剂膜的步骤; 通过使用抗蚀剂面漆组合物在光致抗蚀剂膜上形成抗蚀剂面涂层的步骤; 使基板曝光的工序; 以及用显影剂显影衬底的步骤。可以提供抗蚀剂面漆组合物，当在光致抗蚀剂膜上形成顶涂层时，可以提供更确定的矩形和优异的抗蚀剂图案; 以及使用这种组合物的图案化工艺。

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