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    • 1. 发明授权
    • Edge bead remover for thick film photoresists
    • 用于厚膜光刻胶的边缘珠去除器
    • US06524775B1
    • 2003-02-25
    • US09693215
    • 2000-10-20
    • Joseph E. OberlanderCraig TraynorErnesto S. SisonJeff Griffin
    • Joseph E. OberlanderCraig TraynorErnesto S. SisonJeff Griffin
    • G03F716
    • G03F7/162
    • An edge bead remover for a photoresist composition disposed as a film on a surface, consisting essentially of a solvent mixture comprising from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone. A method is also provided for treating a photoresist composition film disposed on a surface which method comprises contacting the photoresist composition with a solvent mixture, in an amount sufficient to produce a substantially uniform film thickness of the photoresist composition across the surface, wherein the solvent mixture comprises from about 50 to about 80 parts by weight, based on the weight of the solvent mixture, of at least one di(C1-C3)alkyl carbonate and from about 20 to about 50 parts by weight, based on the weight of the solvent mixture, of cyclopentanone.
    • 一种用于光刻胶组合物的边缘珠去除剂,其以表面的薄膜的形式设置,其基本上由溶剂混合物组成,所述溶剂混合物包含基于溶剂混合物的重量约50至约80份重量的至少一种二(C1- C3)烷基碳酸酯和约20至约50重量份的基于溶剂混合物的重量的环戊酮。 还提供了一种处理设置在表面上的光致抗蚀剂组合物膜的方法,该方法包括使光致抗蚀剂组合物与溶剂混合物接触,其量足以在整个表面上产生基本上均匀的光致抗蚀剂组合物的膜厚度,其中溶剂混合物 基于溶剂混合物的重量,包含约50至约80重量份的至少一种碳酸二(C 1 -C 3)烷基酯和约20至约50重量份,基于溶剂的重量 混合物,环戊酮。