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    • 10. 发明授权
    • Method of making pole tip structure for thin film magnetic heads
    • 制造薄膜磁头极头结构的方法
    • US5393376A
    • 1995-02-28
    • US175886
    • 1993-12-30
    • Mao-Min ChenKochan JuNeil L. RobertsonPo-Kang Wang
    • Mao-Min ChenKochan JuNeil L. RobertsonPo-Kang Wang
    • G11B5/31B44C1/22C03C15/00C03C25/00
    • G11B5/3163G11B5/3116G11B5/3183
    • A simplified method is provided for making a thin film magnetic head pole tip structure which includes a sidegap G sandwiched between pole tips PT1 and PT2. The method includes depositing bottom and top seedlayers with an insulation layer sandwiched therebetween. The pole tip PT2 is frame plated on top of the top seedlayer with top and bottom film surfaces which are bounded in part by a pair of spaced-apart sidewalls. The second seedlayer and preferably a depth portion of the insulation layer are removed with the exception of width portions of these layers below the pole tip PT1. A gap insulation layer is deposited on a sidewall of the pole tip PT1 to form the sidegap. The insulation layer with the exception of a portion of an insulation layer below the pole tip PT1 is removed to expose a portion of the bottom seedlayer adjacent to the pole tip PT1 where the pole tip PT2 is to be formed. The pole tip PT2 is then frame plated on top of the exposed portion of the first seedlayer adjacent to the sidegap to complete the desired thin film magnetic head.
    • 提供了一种制造薄膜磁头极尖端结构的简化方法,其包括夹在极尖PT1和PT2之间的侧隙G。 该方法包括沉积具有夹在其间的绝缘层的底部和顶部种子层。 极尖PT2被框架镀在顶部种子层的顶部上,顶部和底部膜表面部分地由一对间隔开的侧壁限定。 除了绝缘层的深度部分之外,除了这些层在极端PT1下方的宽度部分之外,除去第二种子层。 间隙绝缘层沉积在极尖PT1的侧壁上以形成侧隙。 去除绝缘层,绝缘层除极点PT1下方的绝缘层除外以露出与要形成极尖PT2的极尖PT1相邻的底部种子层的一部分。 然后将极端PT2框架电镀在与侧隙相邻的第一种子层的暴露部分的顶部上,以完成所需的薄膜磁头。