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    • 2. 发明授权
    • Light emitting diode having active region of multi quantum well structure
    • 具有多量子阱结构的有源区的发光二极管
    • US07649195B2
    • 2010-01-19
    • US12137708
    • 2008-06-12
    • Dong Seon LeeGyu Beom Kim
    • Dong Seon LeeGyu Beom Kim
    • H01L31/00
    • H01L33/32H01L33/06
    • Disclosed is a light emitting diode (LED) having an active region of a multiple quantum well structure in which well layers and barrier layers are alternately laminated between a GaN-based N-type compound semiconductor layer and a GaN-based P-type compound semiconductor layer. The LED includes a middle barrier layer having a bandgap relatively wider than the first barrier layer adjacent to the N-type compound semiconductor layer and the n-th barrier layer adjacent to the P-type compound semiconductor layer. The middle barrier layer is positioned between the first and n-th barrier layers. Accordingly, positions at which electrons and holes are combined in the multiple quantum well structure to emit light can be controlled, and luminous efficiency can be enhanced. Furthermore, an LED is provided with enhanced luminous efficiency using a bandgap engineering or impurity doping technique.
    • 公开了一种具有多量子阱结构的有源区的发光二极管(LED),其中阱层和势垒层交替层叠在GaN基N型化合物半导体层和GaN基P型化合物半导体之间 层。 LED包括具有比与N型化合物半导体层相邻的第一势垒层和与P型化合物半导体层相邻的第n势垒层相对宽的带隙的中间势垒层。 中间阻挡层位于第一和第n阻挡层之间。 因此,可以控制电子和空穴在多量子阱结构中组合以发光的位置,并且可以提高发光效率。 此外,使用带隙工程或杂质掺杂技术来提供LED具有增强的发光效率。
    • 4. 发明申请
    • LIGHT EMITTING DIODE HAVING ACTIVE REGION OF MULTI QUANTUM WELL STRUCTURE
    • 具有多量子结构活动区域的发光二极管
    • US20090152586A1
    • 2009-06-18
    • US12261627
    • 2008-10-30
    • Dong Seon LeeEu Jin Hwang
    • Dong Seon LeeEu Jin Hwang
    • H01L33/00
    • H01L33/32H01L33/06
    • Disclosed is a light emitting diode having an active region of a multi quantum well structure. The active region is positioned between GaN-based N-type and P-type compound semiconductor layers. At least one of barrier layers in the active region includes an undoped InGaN layer and a Si-doped GaN layer, and the Si-doped GaN layer is in contact with a well layer positioned at a side of the P-type compound semiconductor layer therefrom. Accordingly, carrier overflow and a quantum confined stark effect can be reduced, thereby improving an electron-hole recombination rate. Further, disclosed is an active region of a multi quantum well structure including relatively thick barrier layers and relatively thin barrier layers.
    • 公开了具有多量子阱结构的有源区的发光二极管。 有源区位于GaN基N型和P型化合物半导体层之间。 有源区中的至少一个势垒层包括未掺杂的InGaN层和Si掺杂的GaN层,并且掺杂Si的GaN层与位于其P型化合物半导体层侧面的阱层接触 。 因此,可以降低载流子溢出和量子限制的Stark效应,从而提高电子 - 空穴复合率。 此外,公开了包括相对较厚的阻挡层和相对薄的阻挡层的多量子阱结构的有源区。
    • 5. 发明授权
    • Light emitting diode having active region of multi quantum well structure
    • 具有多量子阱结构的有源区的发光二极管
    • US07626209B2
    • 2009-12-01
    • US12261627
    • 2008-10-30
    • Dong Seon LeeEu Jin Hwang
    • Dong Seon LeeEu Jin Hwang
    • H01L33/00
    • H01L33/32H01L33/06
    • Disclosed is a light emitting diode having an active region of a multi quantum well structure. The active region is positioned between GaN-based N-type and P-type compound semiconductor layers. At least one of barrier layers in the active region includes an undoped InGaN layer and a Si-doped GaN layer, and the Si-doped GaN layer is in contact with a well layer positioned at a side of the P-type compound semiconductor layer therefrom. Accordingly, carrier overflow and a quantum confined stark effect can be reduced, thereby improving an electron-hole recombination rate. Further, disclosed is an active region of a multi quantum well structure including relatively thick barrier layers and relatively thin barrier layers.
    • 公开了具有多量子阱结构的有源区的发光二极管。 有源区位于GaN基N型和P型化合物半导体层之间。 有源区中的至少一个势垒层包括未掺杂的InGaN层和Si掺杂的GaN层,并且掺杂Si的GaN层与位于其P型化合物半导体层侧面的阱层接触 。 因此,可以降低载流子溢出和量子限制的Stark效应,从而提高电子 - 空穴复合率。 此外,公开了包括相对较厚的阻挡层和相对薄的阻挡层的多量子阱结构的有源区。