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    • 8. 发明申请
    • Nitride semiconductor light emitting device
    • 氮化物半导体发光器件
    • US20120132887A1
    • 2012-05-31
    • US13064186
    • 2011-03-09
    • Min-Ho KimMartin F. SchubertJong Kyu KimF. Fred SchubertYongio ParkCheolsoo SoneSukho Yoon
    • Min-Ho KimMartin F. SchubertJong Kyu KimF. Fred SchubertYongio ParkCheolsoo SoneSukho Yoon
    • H01L33/06
    • H01L33/04H01L33/02H01L33/32
    • A nitride semiconductor light emitting device includes n-type and p-type nitride semiconductor layers; an active layer disposed between the n-type and p-type nitride semiconductor layers and having a structure in which a plurality of quantum barrier layers and one or more quantum well layers are alternately stacked; and an electron blocking layer disposed between the active layer and the p-type nitride semiconductor layer. The electron blocking layer has a superlattice structure in which two or more layers having different compositions are alternately stacked. An absolute value of a net polarization mismatch between a material, the material having a composition corresponding to an average composition of the superlattice structure, and a quantum barrier layer adjacent to the electron blocking layer among the plurality of quantum barrier layers is less than ⅔ of an absolute value of a net polarization mismatch between AlxG1-xN(0
    • 氮化物半导体发光器件包括n型和p型氮化物半导体层; 设置在n型和p型氮化物半导体层之间的有源层,并且具有多个量子势垒层和一个或多个量子阱层交替堆叠的结构; 以及设置在有源层和p型氮化物半导体层之间的电子阻挡层。 电子阻挡层具有超晶格结构,其中具有不同组成的两层或更多层交替堆叠。 在多个量子势垒层中,材料,具有对应于超晶格结构的平均组成的组成的材料和与电子阻挡层相邻的量子势垒层的材料之间的净偏振失配的绝对值小于 具有等于​​材料的带隙能量和不同于其的组成的Al x G 1-x N(0
    • 9. 发明授权
    • Nitride semiconductor light emitting device
    • 氮化物半导体发光器件
    • US08546846B2
    • 2013-10-01
    • US13064186
    • 2011-03-09
    • Min-Ho KimMartin F. SchubertJong Kyu KimF. Fred SchubertYongio ParkCheolsoo SoneSukho Yoon
    • Min-Ho KimMartin F. SchubertJong Kyu KimF. Fred SchubertYongio ParkCheolsoo SoneSukho Yoon
    • H01L33/00
    • H01L33/04H01L33/02H01L33/32
    • A nitride semiconductor light emitting device includes n-type and p-type nitride semiconductor layers; an active layer disposed between the n-type and p-type nitride semiconductor layers and having a structure in which a plurality of quantum barrier layers and one or more quantum well layers are alternately stacked; and an electron blocking layer disposed between the active layer and the p-type nitride semiconductor layer. The electron blocking layer has a superlattice structure in which two or more layers having different compositions are alternately stacked. An absolute value of a net polarization mismatch between a material, the material having a composition corresponding to an average composition of the superlattice structure, and a quantum barrier layer adjacent to the electron blocking layer among the plurality of quantum barrier layers is less than ⅔ of an absolute value of a net polarization mismatch between AlxG1-xN(0
    • 氮化物半导体发光器件包括n型和p型氮化物半导体层; 设置在n型和p型氮化物半导体层之间的有源层,并且具有多个量子势垒层和一个或多个量子阱层交替堆叠的结构; 以及设置在有源层和p型氮化物半导体层之间的电子阻挡层。 电子阻挡层具有超晶格结构,其中具有不同组成的两层或更多层交替堆叠。 在多个量子势垒层中,具有与超晶格结构的平均组成对应的组成的材料和与电子阻挡层相邻的量子势垒层的材料之间的净偏振失配的绝对值小于2 / 3的具有等于材料的带隙能量和与其不同的组成的Al x G 1-x N(0