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1. 发明申请

US20090087994A1 METHOD OF FORMING FINE PATTERNS AND MANUFACTURING SEMICONDUCTOR LIGHT EMITTING DEVICE USING THE SAME 有权
标题翻译：形成精细图案的方法和使用其制造半导体发光器件
公开(公告)号：US20090087994A1
公开(公告)日：2009-04-02
申请号：US12239122
申请日：2008-09-26
申请人： Jong Ho LEE , Moo Youn Park , Soo Ryong Hwang , Il Hyung Jung , Gwan Su Lee , Jin Ha Kim
发明人： Jong Ho LEE , Moo Youn Park , Soo Ryong Hwang , Il Hyung Jung , Gwan Su Lee , Jin Ha Kim
IPC分类号： H01L21/302
CPC分类号： H01L33/20 , H01L21/30617 , H01L21/30621 , H01L21/3083 , H01L33/22 , H01L33/382
摘要： A method of forming a fine pattern begins with providing a c-plane hexagonal semiconductor crystal. A mask having a predetermined pattern is formed on the semiconductor crystal. The semiconductor crystal is dry-etched by using the mask to form a first fine pattern on the semiconductor crystal. The semiconductor crystal including the first fine pattern is wet-etched to expand the first fine pattern in a horizontal direction to form a second fine pattern. The second fine pattern obtained in the wet-etching the semiconductor crystal has a bottom surface and a sidewall that have unique crystal planes, respectively. The present fine-pattern forming process can be advantageously applied to a semiconductor light emitting device, particularly, to a phonic crystal structure required to have fine patterns or a structure using a surface plasmon resonance principle.
摘要翻译：形成精细图案的方法开始于提供c面六边形半导体晶体。在半导体晶体上形成具有预定图案的掩模。通过使用掩模对半导体晶体进行干蚀刻以在半导体晶体上形成第一精细图案。包括第一精细图案的半导体晶体被湿蚀刻以在第一精细图案沿水平方向扩展以形成第二精细图案。在半导体晶体的湿式蚀刻中获得的第二精细图案分别具有独特的晶面的底面和侧壁。本发明的精细图案形成方法可以有利地应用于半导体发光器件，特别是应用于具有精细图案所需的语音晶体结构或使用表面等离子体共振原理的结构。

2. 发明授权

US08080480B2 Method of forming fine patterns and manufacturing semiconductor light emitting device using the same 有权
标题翻译：形成精细图案的方法和制造使用其的半导体发光器件
公开(公告)号：US08080480B2
公开(公告)日：2011-12-20
申请号：US12239122
申请日：2008-09-26
申请人： Jong Ho Lee , Moo Youn Park , Soo Ryong Hwang , Il Hyung Jung , Gwan Su Lee , Jin Ha Kim
发明人： Jong Ho Lee , Moo Youn Park , Soo Ryong Hwang , Il Hyung Jung , Gwan Su Lee , Jin Ha Kim
IPC分类号： H01L21/302
CPC分类号： H01L33/20 , H01L21/30617 , H01L21/30621 , H01L21/3083 , H01L33/22 , H01L33/382
摘要： A method of forming a fine pattern begins with providing a c-plane hexagonal semiconductor crystal. A mask having a predetermined pattern is formed on the semiconductor crystal. The semiconductor crystal is dry-etched by using the mask to form a first fine pattern on the semiconductor crystal. The semiconductor crystal including the first fine pattern is wet-etched to expand the first fine pattern in a horizontal direction to form a second fine pattern. The second fine pattern obtained in the wet-etching the semiconductor crystal has a bottom surface and a sidewall that have unique crystal planes, respectively. The present fine-pattern forming process can be advantageously applied to a semiconductor light emitting device, particularly, to a phonic crystal structure required to have fine patterns or a structure using a surface plasmon resonance principle.
摘要翻译：形成精细图案的方法开始于提供c面六边形半导体晶体。在半导体晶体上形成具有预定图案的掩模。通过使用掩模对半导体晶体进行干蚀刻以在半导体晶体上形成第一精细图案。包括第一精细图案的半导体晶体被湿蚀刻以在第一精细图案沿水平方向扩展以形成第二精细图案。在半导体晶体的湿式蚀刻中获得的第二精细图案分别具有独特的晶面的底面和侧壁。本发明的精细图案形成方法可以有利地应用于半导体发光器件，特别是应用于具有精细图案所需的语音晶体结构或使用表面等离子体共振原理的结构。

3. 发明授权

US08198609B2 Apparatus for forming nano pattern and method for forming the nano pattern using the same 有权
标题翻译：用于形成纳米图案的装置和使用其形成纳米图案的方法
公开(公告)号：US08198609B2
公开(公告)日：2012-06-12
申请号：US12219547
申请日：2008-07-23
申请人： Moo Youn Park , Jin Ha Kim , Soo Ryong Hwang , Il Hyung Jung , Jong Ho Lee
发明人： Moo Youn Park , Jin Ha Kim , Soo Ryong Hwang , Il Hyung Jung , Jong Ho Lee
IPC分类号： G21G1/00
CPC分类号： G03F7/70408 , G02B5/1857
摘要： The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
摘要翻译：本发明涉及一种用于形成能够以低成本制造均匀纳米图案的纳米图案的装置，包括用于产生光束的激光器; 用于将来自激光束的光束分成具有相同强度的两个光束的分束器; 用于将由分束器分裂的两束光反射到基板的可变镜; 光束扩展单元，用于通过定位在朝向基板行进的两个光束的路径上来扩展光束的直径; 以及安装在基板的上部的光束阻挡单元，仅透射通过光束扩展单元扩展的特定区域和阻挡区域的剩余区域，以及使用其形成纳米图案的方法。

4. 发明申请

US20090039293A1 Apparatus for forming nano pattern and method for forming the nano pattern using the same 有权
标题翻译：用于形成纳米图案的装置和使用其形成纳米图案的方法
公开(公告)号：US20090039293A1
公开(公告)日：2009-02-12
申请号：US12219547
申请日：2008-07-23
申请人： Meo Youn Park , Jin Ha Kim , Soo Ryong Hwang , Il Hyung Jung , Jong Ho Lee
发明人： Meo Youn Park , Jin Ha Kim , Soo Ryong Hwang , Il Hyung Jung , Jong Ho Lee
IPC分类号： G21K5/04
CPC分类号： G03F7/70408 , G02B5/1857
摘要： The present invention relates to an apparatus for forming a nano pattern capable of fabricating the uniform nano pattern at a low cost including a laser for generating a beam; a beam splitter for splitting the beam from the laser into two beams with the same intensity; variable mirrors for reflecting the two beams split by the beam splitter to a substrate; beam expansion units for expanding diameters of the beams by being positioned on paths of the two beams traveling toward the substrate; and a beam blocking unit, installed on an upper part of the substrate, transmitting only a specific region expanded through the beam expansion unit and blocking regions a remaining region, and a method for forming the nano pattern using the same.
摘要翻译：本发明涉及一种用于形成能够以低成本制造均匀纳米图案的纳米图案的装置，包括用于产生光束的激光; 用于将来自激光束的光束分成具有相同强度的两个光束的分束器; 用于将由分束器分裂的两束光反射到基板的可变镜; 光束扩展单元，用于通过定位在朝向基板行进的两个光束的路径上来扩展光束的直径; 以及安装在基板的上部的光束阻挡单元，仅透射通过光束扩展单元扩展的特定区域和阻挡区域的剩余区域，以及使用其形成纳米图案的方法。

5. 发明申请

US20090298214A1 METHOD OF GROWING NITRIDE SINGLE CRYSTAL AND METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR LIGHT EMITTING DEVICE 有权
标题翻译：生长氮化物单晶的方法及制造氮化物半导体发光装置的方法
公开(公告)号：US20090298214A1
公开(公告)日：2009-12-03
申请号：US12263873
申请日：2008-11-03
申请人： Ho Sun Paek , Sung Nam Lee , Jeong Wook Lee , Il Hyung Jung , Youn Joon Sung
发明人： Ho Sun Paek , Sung Nam Lee , Jeong Wook Lee , Il Hyung Jung , Youn Joon Sung
IPC分类号： H01L33/00 , H01L21/205
CPC分类号： H01L33/007 , H01L21/0242 , H01L21/02433 , H01L21/02458 , H01L21/0254 , H01L21/02609 , H01L21/02639 , H01L33/08 , H01L33/12
摘要： There is provided a method of growing a nitride single crystal. A method of growing a nitride single crystal according to an aspect of the invention may include: growing a first nitride single crystal layer on a substrate; forming a dielectric pattern having an open area on the first nitride single crystal layer, the open area exposing a part of an upper surface of the first nitride single crystal layer; and growing a second nitride single crystal layer on the first nitride single crystal layer through the open area while the second nitride single crystal layer grows to be equal to or larger than a height of the dielectric pattern, wherein the height of the dielectric pattern is greater than a width of the open area so that dislocations in the second nitride single crystal layer move laterally, collide with side walls of the dielectric pattern, and are terminated.
摘要翻译：提供了生长氮化物单晶的方法。根据本发明的一个方面的生长氮化物单晶的方法可以包括：在衬底上生长第一氮化物单晶层; 在所述第一氮化物单晶层上形成具有开放区域的电介质图案，所述开放区域露出所述第一氮化物单晶层的上表面的一部分; 以及通过所述开放区域在所述第一氮化物单晶层上生长第二氮化物单晶层，而所述第二氮化物单晶层生长至等于或大于所述电介质图案的高度，其中所述电介质图案的高度较大比第二氮化物单晶层的位错横向移动，与介质图案的侧壁碰撞而终止。

6. 发明授权

US08179430B2 Biometric authentication device 有权
标题翻译：生物认证设备
公开(公告)号：US08179430B2
公开(公告)日：2012-05-15
申请号：US12609378
申请日：2009-10-30
申请人： Hae Seung Hyun , Bae Kyun Kim , Il Kweon Joung , Il Hyung Jung , Kyungno Lee
发明人： Hae Seung Hyun , Bae Kyun Kim , Il Kweon Joung , Il Hyung Jung , Kyungno Lee
IPC分类号： H04N5/253 , G06F7/04 , G06K9/00 , H04N5/243
CPC分类号： H04N1/4406 , G06K9/00013 , G06K9/2018 , G06K2009/00932 , H04N1/442 , H04N2201/0096
摘要： Disclosed herein is a biometric authentication device. The biometric authentication device according to the present invention is configured such that it blocks visible light using an authentication button, the inside of which is opened or closed by a finger so as to realize the small size and slim shape of a biometric authentication device, and blocks infrared light or allows infrared light to pass while a driving unit moves vertically or horizontally by the operation of the authentication button. Accordingly, in the biometric authentication device, a camera module captures a normal image in normal mode, and captures an infrared pattern reflected from a finger in a vein authentication mode to perform biometric authentication.
摘要翻译：本文公开了一种生物认证装置。根据本发明的生物认证装置被配置为使用使用由手指打开或关闭的认证按钮来阻止可见光，以便实现生物体认证装置的小尺寸和细长形状，以及通过认证按钮的操作，驱动单元垂直或水平移动时，阻挡红外光或允许红外光通过。因此，在生物体认证装置中，相机模块以正常模式拍摄正常图像，并以静脉认证模式捕获从手指反射的红外图案，以进行生物体认证。

7. 发明申请

US20110063430A1 BIOMETRIC AUTHENTICATION DEVICE 有权
标题翻译：生物识别装置
公开(公告)号：US20110063430A1
公开(公告)日：2011-03-17
申请号：US12609378
申请日：2009-10-30
申请人： Hae Seung Hyun , Bae Kyun Kim , Il Kweon Joung , Il Hyung Jung , Kyungno Lee
发明人： Hae Seung Hyun , Bae Kyun Kim , Il Kweon Joung , Il Hyung Jung , Kyungno Lee
IPC分类号： H04N7/18
CPC分类号： H04N1/4406 , G06K9/00013 , G06K9/2018 , G06K2009/00932 , H04N1/442 , H04N2201/0096
摘要： Disclosed herein is a biometric authentication device. The biometric authentication device according to the present invention is configured such that it blocks visible light using an authentication button, the inside of which is opened or closed by a finger so as to realize the small size and slim shape of a biometric authentication device, and blocks infrared light or allows infrared light to pass while a driving unit moves vertically or horizontally by the operation of the authentication button. Accordingly, in the biometric authentication device, a camera module captures a normal image in normal mode, and captures an infrared pattern reflected from a finger in a vein authentication mode to perform biometric authentication.
摘要翻译：本文公开了一种生物认证装置。根据本发明的生物认证装置被配置为使用使用由手指打开或关闭的认证按钮来阻止可见光，以便实现生物体认证装置的小尺寸和细长形状，以及通过认证按钮的操作，驱动单元垂直或水平移动时，阻挡红外光或允许红外光通过。因此，在生物体认证装置中，相机模块以正常模式拍摄正常图像，并以静脉认证模式捕获从手指反射的红外图案，以进行生物体认证。

8. 发明授权

US08148178B2 Method of growing nitride single crystal and method of manufacturing nitride semiconductor light emitting device 有权
标题翻译：氮化物单晶的生长方法及氮化物半导体发光元件的制造方法
公开(公告)号：US08148178B2
公开(公告)日：2012-04-03
申请号：US12263873
申请日：2008-11-03
申请人： Ho Sun Paek , Sung Nam Lee , Jeong Wook Lee , Il Hyung Jung , Youn Joon Sung
发明人： Ho Sun Paek , Sung Nam Lee , Jeong Wook Lee , Il Hyung Jung , Youn Joon Sung
IPC分类号： H01L33/00
CPC分类号： H01L33/007 , H01L21/0242 , H01L21/02433 , H01L21/02458 , H01L21/0254 , H01L21/02609 , H01L21/02639 , H01L33/08 , H01L33/12
摘要： There is provided a method of growing a nitride single crystal. A method of growing a nitride single crystal according to an aspect of the invention may include: growing a first nitride single crystal layer on a substrate; forming a dielectric pattern having an open area on the first nitride single crystal layer, the open area exposing a part of an upper surface of the first nitride single crystal layer; and growing a second nitride single crystal layer on the first nitride single crystal layer through the open area while the second nitride single crystal layer grows to be equal to or larger than a height of the dielectric pattern, wherein the height of the dielectric pattern is greater than a width of the open area so that dislocations in the second nitride single crystal layer move laterally, collide with side walls of the dielectric pattern, and are terminated.
摘要翻译：提供了生长氮化物单晶的方法。根据本发明的一个方面的生长氮化物单晶的方法可以包括：在衬底上生长第一氮化物单晶层; 在所述第一氮化物单晶层上形成具有开放区域的电介质图案，所述开放区域露出所述第一氮化物单晶层的上表面的一部分; 以及通过所述开放区域在所述第一氮化物单晶层上生长第二氮化物单晶层，而所述第二氮化物单晶层生长至等于或大于所述电介质图案的高度，其中所述电介质图案的高度较大比第二氮化物单晶层的位错横向移动，与介质图案的侧壁碰撞而终止。

9. 发明申请

US20110057775A1 BIOMETRIC AUTHENTICATION DEVICE 审中-公开
标题翻译：生物识别装置
公开(公告)号：US20110057775A1
公开(公告)日：2011-03-10
申请号：US12609333
申请日：2009-10-30
申请人： Il Kweon JOUNG , Bae Kyun Kim , Il Hyung Jung , Kyung No Lee , Hae Seung Hyun
发明人： Il Kweon JOUNG , Bae Kyun Kim , Il Hyung Jung , Kyung No Lee , Hae Seung Hyun
IPC分类号： G05B19/00
CPC分类号： G06K9/00013
摘要： Disclosed herein is a biometric authentication device. The biometric authentication device includes a main body for forming a hand grip surface and constituting an entire framework of the biometric authentication device. At least one light source is disposed on one side of the main body and configured to radiate light. A reflection unit is included in the main body and attached to a side opposite that of the light source, the reflection unit allowing the radiated light to be incident on a hand and re-reflecting light that is incident on and reflected from the hand. An imaging device is disposed on the side of the main body, which is identical to the side on which the light source is disposed, and is configured to acquire biometric information of the hand by forming images of re-reflected light. An authentication/verification unit performs personal authentication using the biometric information.
摘要翻译：本文公开了一种生物认证装置。生物认证装置包括用于形成手柄表面并构成生物体认证装置的整个框架的主体。至少一个光源设置在主体的一侧并且被配置为辐射光。反射单元包括在主体中并且附接到与光源相反的一侧，反射单元允许辐射光入射在手上并重新反射入射并从其反射的光。成像装置设置在主体的与设置有光源的一侧相同的一侧，并且被配置为通过形成再反射光的图像来获取手的生物信息。认证/验证单元使用生物特征信息执行个人认证。

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