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    • 3. 发明授权
    • Method of fabricating nitride-based semiconductor laser diode
    • 制造氮化物基半导体激光二极管的方法
    • US07736925B2
    • 2010-06-15
    • US11448800
    • 2006-06-08
    • Tan SakongYoun-joon SungHo-sun Paek
    • Tan SakongYoun-joon SungHo-sun Paek
    • H01L21/00
    • H01S5/22B82Y20/00H01S5/0213H01S5/16H01S5/2201H01S5/34333H01S2304/12
    • A method of manufacturing a nitride-based semiconductor laser diode that can minimize optical absorption on a cavity mirror plane and improve the surface roughness of the cavity mirror plane is provided. The method includes the steps of: forming on a (0001) GaN (gallium nitride) substrate having at least two masks spaced apart by a distance equal to a laser cavity length in stripes that extend along the direction; growing an n-GaN layer on the GaN substrate between the masks so that two (1-100) edges of the n-GaN layer are thicker than the remaining regions thereof; sequentially stacking an n-clad layer, an active layer, and a p-clad layer on the n-GaN layer to form an edge-emitting laser cavity structure in which laser light generated in the active layer passes through a region of the n-clad layer aligned laterally with the active layer and is output; and etching a (1-100) plane of the laser cavity structure to form a cavity mirror plane.
    • 提供一种制造氮化物基半导体激光二极管的方法,其可以使腔镜面上的光吸收最小化并且改善腔镜面的表面粗糙度。 该方法包括以下步骤:在(0001)GaN(氮化镓)衬底上形成具有至少两个掩模,该掩模间隔开等于沿着<11-20>方向延伸的条纹的激光器腔长度的距离; 在掩模之间的GaN衬底上生长n-GaN层,使得n-GaN层的两个(1-100)边缘比其余区域厚; 顺序地在n-GaN层上层叠n包覆层,有源层和p覆盖层,以形成边缘发射激光器腔结构,其中在有源层中产生的激光穿过n-GaN层的区域, 包层与活性层横向排列并被输出; 并蚀刻激光腔结构的(1-100)面以形成腔镜面。
    • 6. 发明授权
    • Semiconductor laser diode and method for manufacturing the same
    • 半导体激光二极管及其制造方法
    • US07406111B2
    • 2008-07-29
    • US11340590
    • 2006-01-27
    • Youn-joon SungTae-hoon Jang
    • Youn-joon SungTae-hoon Jang
    • H01S5/00
    • H01S5/22
    • In the semiconductor laser diode, a first material layer, an active layer, and a second material layer are sequentially formed on a substrate, a ridge portion and a first protrusion portion are formed on the second material layer in a direction perpendicular to the active layer, the first protrusion portion being formed at one side of the ridge portion, a second electrode layer is formed in contact with a top surface of the ridge portion, a current restricting layer is formed on an entire surface of the second material layer and exposes the second electrode layer, a protective layer is formed on a surface of the current restricting layer above the first protrusion portion and has an etch selectivity different from that of the current restricting layer, and a bonding metal layer is formed on the current restricting layer and the protective layer in electrical connection with the second electrode layer.
    • 在半导体激光二极管中,第一材料层,有源层和第二材料层依次形成在基板上,脊部和第一突出部分在垂直于有源层的方向上形成在第二材料层上 所述第一突起部分形成在所述脊部的一侧,形成与所述脊部的顶面接触的第二电极层,在所述第二材料层的整个表面上形成限流层, 第二电极层,在第一突起部分上方的电流限制层的表面上形成保护层,并且具有不同于电流限制层的蚀刻选择性,并且在电流限制层上形成接合金属层, 与第二电极层电连接的保护层。
    • 7. 发明申请
    • Semiconductor laser diode with current restricting layer and fabrication method thereof
    • 具有限流层的半导体激光二极管及其制造方法
    • US20070041413A1
    • 2007-02-22
    • US11580093
    • 2006-10-13
    • Joon-seop KwakKyoung-ho HaYoun-joon Sung
    • Joon-seop KwakKyoung-ho HaYoun-joon Sung
    • H01S5/00
    • H01S5/22H01S5/2063H01S5/32341
    • Provided are a semiconductor laser diode having a current confining layer and a method of fabricating the same. The semiconductor laser diode includes a substrate, a first material layer deposited on the substrate, an active layer which is deposited on the first material layer and emits a laser beam, and a second material layer which is deposited on the active layer and includes a ridge portion protruding from the active layer and a current confining layer formed by injection of ions into peripheral portions of the ridge portion so as to confine a current injected into the active layer. Therefore, it is possible to fabricate an improved semiconductor laser diode having a low-resonance critical current value that can remove a loss in an optical profile and reduce the profile width of a current injected into the active layer while maintaining the width of the ridge portion.
    • 提供一种具有电流限制层的半导体激光二极管及其制造方法。 半导体激光二极管包括衬底,沉积在衬底上的第一材料层,沉积在第一材料层上并发射激光束的有源层和沉积在有源层上并包括脊的第二材料层 从活性层突出的部分和通过将离子注入脊部的周边部分形成的电流限制层,以便限制注入有源层的电流。 因此,可以制造具有低共振临界电流值的改进的半导体激光二极管,其可以消除光学轮廓的损失并且减小注入有源层的电流的轮廓宽度,同时保持脊部的宽度 。