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    • 4. 发明申请
    • METHODS AND APPARATUS FOR INKJET PRINTING COLOR FILTERS FOR DISPLAYS USING PATTERN DATA
    • 用于使用图案数据显示的喷墨打印彩色滤镜的方法和装置
    • US20070042113A1
    • 2007-02-22
    • US11466507
    • 2006-08-23
    • Hongbin JiInchen HuangBassam ShamounQuanyuan ShangShinichi KuritaJohn White
    • Hongbin JiInchen HuangBassam ShamounQuanyuan ShangShinichi KuritaJohn White
    • B05D5/06
    • B41J3/28B41J3/407G02B5/223
    • The invention provides methods, systems, and drivers for controlling an inkjet printing system and manufacturing display objects. The system may include a print controller including one or more drivers, at least one print head coupled to the drivers, a stage controller coupled to the print controller, one or more motors coupled to the stage controller, encoders coupled to the motors and the stage controller, and a host coupled to the stage controller and the print controller. The host is adapted to transfer pattern parameter data to the print controller, and the print controller is adapted to use the pattern parameter data to trigger the at least one print head to deposit ink into pixel wells on a substrate as the substrate is moved in a print direction by the at least one motor under the direction of the stage controller in response to a command from the host.
    • 本发明提供了用于控制喷墨打印系统和制造显示对象的方法,系统和驱动程序。 该系统可以包括包括一个或多个驱动器的打印控制器,耦合到驱动器的至少一个打印头,耦合到打印控制器的台控制器,耦合到平台控制器的一个或多个马达,耦合到马达的编码器 控制器和耦合到级控制器和打印控制器的主机。 主机适于将图案参数数据传送到打印控制器,并且打印控制器适于使用图案参数数据来触发至少一个打印头,以便在将基板移动到基板中时将墨水沉积在基板上的像素孔中 响应于来自主机的命令,在舞台控制器的指导下由至少一个电动机打印方向。
    • 8. 发明申请
    • Apparatus and method of shaping profiles of large-area PECVD electrodes
    • 大面积PECVD电极成形轮廓的装置和方法
    • US20060005771A1
    • 2006-01-12
    • US11143506
    • 2005-06-02
    • John WhiteEmanuel BeerWei ChangRobin TinerSoo Choi
    • John WhiteEmanuel BeerWei ChangRobin TinerSoo Choi
    • C23C16/00C23F1/00
    • C23C16/4583H01J37/3244H01J2237/3325
    • An apparatus and method for shaping profiles of a large-area PECVD electrode is provided. A plasma-enhanced CVD chamber for processing a large-area substrate is first provided. The chamber includes a lower electrode that supports a large area substrate. The lower electrode is shaped to selectively conform the supported substrate in a selected orientation under operating conditions. The orientation may be either planar or nonplanar. The substrate complies with the shape of the electrode so the substrate is substantially parallel to an upper electrode in the chamber, and/or to a gas diffusion plate in the chamber. The lower electrode comprises a substrate support fabricated from a material of insufficient strength to support itself at operating temperatures and pressure in the chamber. The shape of the substrate support is adjusted by modifying the dimensions and/or planarity of a supporting base structure, and/or by appropriately varying the thickness of the substrate support.
    • 提供了一种用于形成大面积PECVD电极的轮廓的装置和方法。 首先提供用于处理大面积基板的等离子体增强CVD室。 该室包括支撑大面积基板的下电极。 下电极被成形为在操作条件下以选定的方向选择性地使受支撑的衬底符合。 取向可以是平面或非平面的。 基板符合电极的形状,因此基板基本上平行于腔室中的上部电极,和/或腔室中的气体扩散板。 下电极包括由强度不足的材料制成的衬底支撑件,以在腔室中的操作温度和压力下自身支撑。 通过改变支撑基底结构的尺寸和/或平面度和/或通过适当地改变基底支撑件的厚度来调节基底支撑件的形状。