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1. 发明授权

US5316970A Generation of ionized air for semiconductor chips 失效
标题翻译：生成半导体芯片的电离空气
公开(公告)号：US5316970A
公开(公告)日：1994-05-31
申请号：US895181
申请日：1992-06-05
申请人： John S. Batchelder , Vaughn P. Gross , Robert A. Gruver , Philip C. D. Hobbs , Kenneth D. Murray
发明人： John S. Batchelder , Vaughn P. Gross , Robert A. Gruver , Philip C. D. Hobbs , Kenneth D. Murray
IPC分类号： B01J19/00 , B01J19/12 , H01L21/00 , H01L21/304 , H05F3/06
CPC分类号： H01L21/67028 , H05F3/06 , Y10S430/138 , Y10S438/909
摘要： Ionization of air without the use of corona discharge tips, thereby to avoid the generation of particulates from corrosion of the corona tips, is accomplished by use of a laser beam focussed to a small focal volume of intense electric field adjacent a semiconductor chip. The electric field is sufficiently intense to ionize air. In the manufacture of a semiconductor circuit chip, during those steps which are conducted in an air environment, opportunity exists to remove from a surface of a chip, or wafer, charge acquired during the manufacturing process. The ionized air is passed along the chip surface. Ions in the air discharge local regions of the chip surface which have become charged by steps of a manufacturing process. By way of further embodiment of the invention, the ionization may be produced by injection of molecules of water into the air, which molecules are subsequently ionized by a laser beam and directed toward the chip via a light shield with the aid of a magnetic field.
摘要翻译：通过使用聚焦于与半导体芯片相邻的强电场的小焦点体积的激光束来实现空气的离子化，而不使用电晕放电尖端，从而避免由于电晕尖端的腐蚀而产生微粒。电场足够强以使空气电离。在半导体电路芯片的制造中，在空气环境中进行的那些步骤中，存在从制造过程中获取的芯片或晶片的表面去除电荷的机会。电离空气沿芯片表面通过。芯片表面的空气放电局部区域中的离子通过制造过程的步骤而被充电。通过本发明的进一步的实施方式，电离可以通过将水分子注入到空气中来产生，该分子随后通过激光束被电离，并借助于磁场通过光屏指向芯片。

2. 发明授权

US5432670A Generation of ionized air for semiconductor chips 失效
标题翻译：生成半导体芯片的电离空气
公开(公告)号：US5432670A
公开(公告)日：1995-07-11
申请号：US166509
申请日：1993-12-13
申请人： John S. Batchelder , Vaughn P. Gross , Robert A. Gruver , Philip C. D. Hobbs , Kenneth D. Murray
发明人： John S. Batchelder , Vaughn P. Gross , Robert A. Gruver , Philip C. D. Hobbs , Kenneth D. Murray
IPC分类号： B01J19/00 , B01J19/12 , H01L21/00 , H01L21/304 , H05F3/06
CPC分类号： H01L21/67028 , H05F3/06 , Y10S430/138 , Y10S438/909
摘要： Ionization of air without the use of corona discharge tips, thereby to avoid the generation of particulates from corrosion of the corona tips, is accomplished by use of a laser beam focussed to a small focal volume of intense electric field adjacent a semiconductor chip. The electric field is sufficiently intense to ionize air. In the manufacture of a semiconductor circuit chip, during those steps which are conducted in an air environment, opportunity exists to remove from a surface of a chip, or wafer, charge acquired during the manufacturing process. The ionized air is passed along the chip surface. Ions in the air discharge local regions of the chip surface which have become charged by steps of a manufacturing process. By way of further embodiment of the invention, the ionization may be produced by injection of molecules of water into the air, which molecules are subsequently ionized by a laser beam and directed toward the chip via a light shield with the aid of a magnetic field.
摘要翻译：通过使用聚焦于与半导体芯片相邻的强电场的小焦点体积的激光束来实现空气的离子化，而不使用电晕放电尖端，从而避免由于电晕尖端的腐蚀而产生微粒。电场足够强以使空气电离。在半导体电路芯片的制造中，在空气环境中进行的那些步骤中，存在从制造过程中获取的芯片或晶片的表面去除电荷的机会。电离空气沿芯片表面通过。芯片表面的空气放电局部区域中的离子通过制造过程的步骤而被充电。通过本发明的进一步的实施方式，电离可以通过将水分子注入到空气中来产生，该分子随后通过激光束被电离，并借助于磁场通过光屏指向芯片。

3. 发明授权

US5116583A Suppression of particle generation in a modified clean room corona air ionizer 失效
标题翻译：在改进的洁净室电晕空气电离器中抑制颗粒产生
公开(公告)号：US5116583A
公开(公告)日：1992-05-26
申请号：US696308
申请日：1991-04-29
申请人： John S. Batchelder , Vaughn P. Gross , Philip C. D. Hobbs , Robert J. Miller , Kenneth D. Murray
发明人： John S. Batchelder , Vaughn P. Gross , Philip C. D. Hobbs , Robert J. Miller , Kenneth D. Murray
IPC分类号： H01T23/00
CPC分类号： H01T23/00
摘要： A clean non-hydrogen-containing dry gas flows through the corona points of a clean room corona air ionizer in order to suppress the generation of particles.
摘要翻译：清洁的不含氢的干燥气体流过洁净室电晕空气离子发生器的电晕点，以抑制颗粒的产生。

4. 发明授权

US5343290A Surface particle detection using heterodyne interferometer 失效
标题翻译：使用外差干涉仪进行表面粒子检测
公开(公告)号：US5343290A
公开(公告)日：1994-08-30
申请号：US897198
申请日：1992-06-11
申请人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs , Marc A. Taubenblatt
发明人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs , Marc A. Taubenblatt
IPC分类号： G01B9/02 , G01B11/30 , G01J9/04 , G01N21/47 , G01N21/88 , G01N21/93 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/66
CPC分类号： G01N21/94 , G01J9/04 , G01N2021/8822 , G01N21/47 , G01N21/9501
摘要： A heterodyne interferometer is combined with darkfield surface particle detection for improved surface particle detection sensitivity. The probe beam and the reference beam have different wavelengths. The reference beam may either be a real reference beam or a virtual reference beam. The probe beam may be incident at the surface at either a grazing angle or at an angle substantially normal to the surface. The real reference beam is incident at the surface at a grazing angle. The detection may either be conventional heterodyne detection or a combination of heterodyne and Lloyd's mirror detection.
摘要翻译：外差干涉仪与暗场表面颗粒检测相结合，提高表面颗粒检测灵敏度。探测光束和参考光束具有不同的波长。参考光束可以是真实参考光束或虚拟参考光束。探针光束可以以掠射角度或基本上垂直于表面的角度入射在表面处。实际参考光束以掠射角入射在表面。检测可以是常规外差检测或外差和劳合镜检测的组合。

5. 发明授权

US5220403A Apparatus and a method for high numerical aperture microscopic examination of materials 失效
标题翻译：高数值孔径显微镜检查材料的仪器和方法
公开(公告)号：US5220403A
公开(公告)日：1993-06-15
申请号：US954282
申请日：1992-09-30
申请人： John S. Batchelder , Philip C. D. Hobbs , Marc A. Taubenblatt
发明人： John S. Batchelder , Philip C. D. Hobbs , Marc A. Taubenblatt
IPC分类号： G01J3/42 , G01J3/44 , G01J9/02 , G01N21/35 , G01N21/95 , G02B3/00 , G02B21/00
CPC分类号： G01N21/9505 , G02B21/0016 , G02B3/00 , G01J2003/421 , G01J2009/0207 , G01J3/44 , G01N2021/1725 , G01N2021/1782 , G01N2021/8822 , G01N21/3563 , G01N21/359 , G01N2201/0638 , G01N2201/1087
摘要： Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a prism or a plano-convex lens. The plano-convex lens may be held in contact with the wafer or separated from the wafer via an air bearing or an optical coupling fluid to allow the sample to be navigated beneath the lens. The lens may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.
摘要翻译：在半导体晶片的内部特征的近红外线中执行高分辨率光学成像的装置和方法使用由具有高折射率的材料制成的光学装置，并且保持非常靠近晶片。光学器件可以是棱镜或平凸透镜。平凸透镜可以保持与晶片接触或通过空气轴承或光耦合流体与晶片分离，以允许样品在透镜下面导航。透镜可以用于许多光学仪器，例如明视野显微镜，Schlieren显微镜，暗视野显微镜，Linnik干涉仪，拉曼光谱仪和吸收光谱仪。

6. 发明授权

US5294806A Optical submicron aerosol particle detector 失效
标题翻译：光学亚微米气溶胶颗粒检测器
公开(公告)号：US5294806A
公开(公告)日：1994-03-15
申请号：US17214
申请日：1993-02-12
申请人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs
发明人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs
IPC分类号： G01N15/10 , G01N15/02 , G01N15/14 , G01N21/21 , G01N21/47 , G01N21/94 , G01N15/06
CPC分类号： G01N15/0205 , G01N21/94 , G01N15/1434 , G01N2015/0238 , G01N2015/145
摘要： A particle detector that determines the presence of particles in an enclosed volume includes a laser that directs an optical beam to a beam splitter that produces first and second beams. An optical system directs the first beam into the enclosed volume. A detector is positioned adjacent the volume in order to receive back scattered optical energy arising from a particle in the volume encountering the first beam. The back scattered optical energy and the second beam are optically combined so as to overlap in a region and in the overlap region the back scattered optical energy and second beam are in the same state of focus, of the same polarization and are substantially parallel. A detector located at the overlap region produces an electrical signal indicative of the intensity of the back scattered light. A signal processor analyzes the electrical signal to determine the presence of the particle.
摘要翻译：确定封闭体积中颗粒的存在的粒子检测器包括将光束引导到产生第一和第二光束的分束器的激光器。光学系统将第一光束引导到封闭的体积中。检测器邻近体积定位，以便接收从遇到第一光束的体积中的颗粒产生的反向散射的光能。后散射光能和第二光束被光学组合以便在区域中重叠，并且在重叠区域中，后散射光能和第二光束处于相同偏振的相同聚焦状态并且基本平行。位于重叠区域的检测器产生指示背散射光强度的电信号。信号处理器分析电信号以确定颗粒的存在。

7. 发明授权

US5208648A Apparatus and a method for high numerical aperture microscopic examination of materials 失效
标题翻译：装置和材料高数值孔径微观检验方法
公开(公告)号：US5208648A
公开(公告)日：1993-05-04
申请号：US667773
申请日：1991-03-11
申请人： John S. Batchelder , Philip C. D. Hobbs , Marc A. Taubenblatt , Douglas W. Cooper
发明人： John S. Batchelder , Philip C. D. Hobbs , Marc A. Taubenblatt , Douglas W. Cooper
IPC分类号： G01N21/88 , G01J3/42 , G01J3/44 , G01J9/02 , G01N21/35 , G01N21/95 , G01N21/956 , G01Q30/02 , G02B3/00 , G02B21/00 , G02B27/00 , H01L21/66
CPC分类号： G01N21/9505 , G02B21/0016 , G02B3/00 , G01J2003/421 , G01J2009/0207 , G01J3/44 , G01N2021/1725 , G01N2021/1782 , G01N2021/8822 , G01N21/3563 , G01N21/359 , G01N2201/0638 , G01N2201/1087
摘要： Apparatus and a method for performing high resolution optical imaging in the near infrared of internal features of semiconductor wafers uses an optical device made from a material having a high index of refraction and held in very close proximity to the wafer. The optical device may either be a prism or a plano-convex lens. The plano-convex lens may be held in contact with the wafer or separated from the wafer via an air bearing or an optical coupling fluid to allow the sample to be navigated beneath the lens. The lens may be used in a number of optical instruments such as a bright field microscope, a Schlieren microscope, a dark field microscope, a Linnik interferometer, a Raman spectroscope and an absorption spectroscope.

8. 发明授权

US5133602A Particle path determination system 失效
标题翻译：粒径测定系统
公开(公告)号：US5133602A
公开(公告)日：1992-07-28
申请号：US682752
申请日：1991-04-08
申请人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs , Marc A. Taubenblatt
发明人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs , Marc A. Taubenblatt
IPC分类号： G01N15/14 , G01N15/02 , G01N21/21 , G01P11/00
CPC分类号： G01N15/0205 , G01N2015/0238 , G01N2021/1759 , G01N2021/4792
摘要： A bright-field, particle position determining optical system is disclosed that uses both phase shift and extinction signals to determine particle trajectories. In a first embodiment, a pair of orthogonally polarized beams are positioned along an axis that intersects a particle's flow path at an acute angle. An optical system recombines the beams after they exit the flow path, the combined beams manifesting an elliptical polarization if a particle intersects one of the beams. Bright field detectors detect polarization components of the combined beam, provide a phase shift signal between the beam's orthogonal components and provide corresponding signals to a processor. The processor determines a signal asymmetry from the phase shift signal that is indicative of a particle's position in the flow path. Another embodiment of the invention examines a signal resulting from the beam's phase shift and determines a correction factor that is dependent upon the distance of the particle from the focal plane of the beams. Another embodiment employs a dithering system for cyclically moving one or more optical beams across a particle to further enable its trajectory or position to be determined.
摘要翻译：公开了使用相移和消光信号来确定粒子轨迹的明场，粒子位置确定光学系统。在第一实施例中，一对正交偏振光束沿着与颗粒的流动通道以锐角相交的轴线定位。光束在离开流路之后将光束重新组合，如果粒子与光束之一相交，那么组合光束表现出椭圆极化。光场检测器检测组合光束的偏振分量，在光束的正交分量之间提供相移信号，并向处理器提供相应的信号。处理器确定来自指示颗粒在流动路径中的位置的相移信号的信号不对称性。本发明的另一个实施例检查由光束的相移产生的信号，并确定取决于粒子与光束的焦平面的距离的校正因子。另一个实施例采用抖动系统来循环移动一个或多个光束穿过颗粒，以进一步确定其轨迹或位置。

9. 发明授权

US5192870A Optical submicron aerosol particle detector 失效
标题翻译：光学亚微米气溶胶颗粒检测器
公开(公告)号：US5192870A
公开(公告)日：1993-03-09
申请号：US820709
申请日：1992-01-14
申请人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs
发明人： John S. Batchelder , Donald M. DeCain , Philip C. D. Hobbs
IPC分类号： G01N15/10 , G01N15/02 , G01N15/14 , G01N21/21 , G01N21/47 , G01N21/94
CPC分类号： G01N15/0205 , G01N21/94 , G01N15/1434 , G01N2015/0238 , G01N2015/145
摘要： A particle detector that determines the presence of particles in an enclosed volume includes a laser that directs a coherent optical beam to a beam splitter that produces first and second divergent beams. An optical system images the point of origin of the two divergent beams within the beam splitter into the enclosed volume, whereby the first and second beams are caused to intersect and interfere at an inspection region within the volume. A detector is positioned adjacent the volume and is responsive to light scattered from one of the beams, as a result of a particle passing through the inspection region, to produce an electrical signal indicative of the intensity of the scattered light. A signal processor analyzes the electrical signals and to determine the presence of the particle. An embodiment of the invention includes an acousto-optic modulator to enable one of the beams to be frequency shifted from the other beam so as to enable the presence of a carrier signal on which a particle's Doppler frequency is modulated. Another embodiment relies upon the Doppler modulation of a reflected optical beam to create an interference pattern at a detector.

10. 发明授权

US5177559A Dark field imaging defect inspection system for repetitive pattern integrated circuits 失效
标题翻译：用于重复图案集成电路的暗场成像缺陷检查系统
公开(公告)号：US5177559A
公开(公告)日：1993-01-05
申请号：US701936
申请日：1991-05-17
申请人： John S. Batchelder , Marc A. Taubenblatt
发明人： John S. Batchelder , Marc A. Taubenblatt
IPC分类号： G01B11/24 , G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66
CPC分类号： G02B21/10 , G01N21/95623 , G01N2021/8822
摘要： An optical inspection system for patterned semiconductor wafers generates a dark field image of the wafer by applying a collimated beam of monochrome light at an incident angle with respect to the surface of the wafer of between 8.degree. and a maximum angle defined by the numerical aperture of the imaging system and collecting the light which is scattered at angles approximately normal to the surface of the wafer and within the numerical aperture of the imaging system. In addition, the incident light is at an angle of 45.degree. in the surface plane of the wafer with respect to the rectangular lines which predominate in the pattern. Before forming the dark field image, the collected light is passed through a Fourier transform filter which substantially attenuates spatial frequency components corresponding to the pattern. In the resultant dark field image, defects in the pattern and contaminating particles are accentuated relative to the pattern features.
摘要翻译：用于图案化半导体晶片的光学检查系统通过以相对于晶片表面的入射角施加8°的准直光束和由数字孔径的数值孔径限定的最大角度来施加晶片的暗视场图像成像系统并收集以大致垂直于晶片表面并且在成像系统的数值孔径内散射的光。此外，入射光在晶片的表面平面上相对于以图案为主的矩形线成45度的角度。在形成暗场图像之前，所收集的光通过傅里叶变换滤波器，该滤波器基本上衰减对应于图案的空间频率分量。在所得到的暗场图像中，图案和污染颗粒中的缺陷相对于图案特征被加强。

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