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    • 6. 发明授权
    • Use of beam deflection to control an electron beam wire deposition process
    • 使用光束偏转来控制电子束丝沉积过程
    • US08344281B2
    • 2013-01-01
    • US12751075
    • 2010-03-31
    • Karen M. TamingerWilliam H. HofmeisterRobert A. Hafley
    • Karen M. TamingerWilliam H. HofmeisterRobert A. Hafley
    • B23K15/00
    • B23K15/02
    • A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.
    • 一种用于控制电子束工艺的方法,其中将熔丝熔化并沉积在作为熔池的衬底上的方法包括以复杂光栅图案生成电子束,并将光束引导到电线的外表面上,由此控制位置 电线相对于熔池。 引导梁选择性地加热线的外表面并且保持线相对于熔池的位置。 一种用于控制电子束处理的装置包括适于产生电子束的束枪,以及用于向电子束提供复杂光栅图案并用于将电子束引导到线的外表面以控制位置的控制器 的电线相对于熔池。
    • 8. 发明授权
    • Closed-loop process control for electron beam freeform fabrication and deposition processes
    • 电子束自由形成和沉积过程的闭环过程控制
    • US08452073B2
    • 2013-05-28
    • US12750991
    • 2010-03-31
    • Karen M. TamingerRobert A. HafleyRichard E. MartinWilliam H. Hofmeister
    • Karen M. TamingerRobert A. HafleyRichard E. MartinWilliam H. Hofmeister
    • G06K9/00
    • H01J37/304H01J37/305H01J2237/30455
    • A closed-loop control method for an electron beam freeform fabrication (EBF3) process includes detecting a feature of interest during the process using a sensor(s), continuously evaluating the feature of interest to determine, in real time, a change occurring therein, and automatically modifying control parameters to control the EBF3 process. An apparatus provides closed-loop control method of the process, and includes an electron gun for generating an electron beam, a wire feeder for feeding a wire toward a substrate, wherein the wire is melted and progressively deposited in layers onto the substrate, a sensor(s), and a host machine. The sensor(s) measure the feature of interest during the process, and the host machine continuously evaluates the feature of interest to determine, in real time, a change occurring therein. The host machine automatically modifies control parameters to the EBF3 apparatus to control the EBF3 process in a closed-loop manner.
    • 用于电子束自由形成(EBF3)处理的闭环控制方法包括在使用传感器的过程中检测感兴趣的特征,连续评估感兴趣的特征,实时地确定其中发生的变化, 并自动修改控制参数来控制EBF3进程。 一种装置提供了该方法的闭环控制方法,并且包括用于产生电子束的电子枪,用于将线材馈送到衬底的送丝器,其中线材熔化并逐渐沉积到衬底上,传感器 (s)和主机。 传感器在过程中测量感兴趣的特征,并且主机连续评估感兴趣的特征,以实时确定其中发生的变化。 主机自动将控制参数修改为EBF3设备,以闭环方式控制EBF3进程。
    • 10. 发明申请
    • Use of Beam Deflection to Control an Electron Beam Wire Deposition Process
    • 使用光束偏转来控制电子束线沉积过程
    • US20100270274A1
    • 2010-10-28
    • US12751075
    • 2010-03-31
    • Karen M. TamingerWilliam H. HofmeisterRobert A. Hafley
    • Karen M. TamingerWilliam H. HofmeisterRobert A. Hafley
    • B23K15/00
    • B23K15/02
    • A method for controlling an electron beam process wherein a wire is melted and deposited on a substrate as a molten pool comprises generating the electron beam with a complex raster pattern, and directing the beam onto an outer surface of the wire to thereby control a location of the wire with respect to the molten pool. Directing the beam selectively heats the outer surface of the wire and maintains the position of the wire with respect to the molten pool. An apparatus for controlling an electron beam process includes a beam gun adapted for generating the electron beam, and a controller adapted for providing the electron beam with a complex raster pattern and for directing the electron beam onto an outer surface of the wire to control a location of the wire with respect to the molten pool.
    • 一种用于控制电子束工艺的方法,其中将熔丝熔化并沉积在作为熔池的衬底上的方法包括以复杂光栅图案生成电子束,并将光束引导到电线的外表面上,由此控制位置 电线相对于熔池。 引导梁选择性地加热线的外表面并且保持线相对于熔池的位置。 一种用于控制电子束处理的装置包括适于产生电子束的束枪,以及用于向电子束提供复杂光栅图案并用于将电子束引导到线的外表面以控制位置的控制器 的电线相对于熔池。