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1. 发明授权

US07438175B2 Linear vacuum deposition system 失效
标题翻译：线性真空沉积系统
公开(公告)号：US07438175B2
公开(公告)日：2008-10-21
申请号：US11176085
申请日：2005-07-07
申请人： John M. White , Wendell T. Blonigan
发明人： John M. White , Wendell T. Blonigan
IPC分类号： B65G43/08
CPC分类号： H01L21/67739 , C23C14/56 , C23C14/568 , C23C16/54
摘要： Embodiments of a vacuum conveyor system are provided herein. In one embodiment a vacuum conveyor system includes a first vacuum sleeve having a plurality of rollers that support and move substrates through the first vacuum sleeve. A port is provided for sealably coupling the first vacuum sleeve to a process chamber. A first substrate handler is disposed proximate the port. Multiple ports may be provided for sealably coupling the first vacuum sleeve to a plurality of process chambers. A dedicated substrate handler is provided for each process chamber. A second vacuum sleeve may be sealably coupled to an opposing side of the process chambers. The vacuum conveyor system may be modular with independent modules linked via load lock chambers. The plurality of rollers may compensate for any sag of the leading edge of a substrate being transported thereupon.
摘要翻译：本文提供了真空输送系统的实施例。在一个实施例中，真空输送系统包括具有支撑并移动基板通过第一真空套筒的多个辊的第一真空套筒。提供端口用于将第一真空套筒密封地联接到处理室。第一衬底处理器设置在端口附近。可以提供多个端口用于将第一真空套管密封地联接到多个处理室。为每个处理室提供专用的基板处理器。第二真空套筒可以密封地联接到处理室的相对侧。真空输送系统可以是模块化的，具有通过负载锁定室连接的独立模块。多个辊可以补偿在其上运送的基板的前缘的任何下垂。

2. 发明授权

US06823589B2 Flexibly suspended gas distribution manifold for plasma chamber 有权
标题翻译：用于等离子体室的柔性悬浮气体分配歧管
公开(公告)号：US06823589B2
公开(公告)日：2004-11-30
申请号：US10293544
申请日：2002-11-12
申请人： John M. White , Ernst Keller , Wendell T. Blonigan
发明人： John M. White , Ernst Keller , Wendell T. Blonigan
IPC分类号： B23P1500
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , Y10T29/49428 , Y10T29/49826
摘要： A method of flexibly mounting a gas distribution plate to the back wall of a gas inlet manifold for a plasma chamber. A perforated gas distribution plate is suspended from the back wall by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate.
摘要翻译：一种将气体分配板柔性地安装到用于等离子体室的气体入口歧管的后壁的方法。穿孔式气体分配板通过柔性侧壁从后壁悬挂。柔性悬架使气体分配板的热膨胀的机械应力最小化。

3. 发明授权

US06477980B1 Flexibly suspended gas distribution manifold for plasma chamber 有权
标题翻译：用于等离子体室的柔性悬浮气体分配歧管
公开(公告)号：US06477980B1
公开(公告)日：2002-11-12
申请号：US09488612
申请日：2000-01-20
申请人： John M. White , Ernst Keller , Wendell T. Blonigan
发明人： John M. White , Ernst Keller , Wendell T. Blonigan
IPC分类号： C23C1600
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , Y10T29/49428 , Y10T29/49826
摘要： A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provides thermal isolation between the gas distribution plate and other components of the chamber.
摘要翻译：一种用于等离子体室的气体入口歧管，其具有由柔性侧壁悬挂的穿孔气体分配板。柔性悬架使气体分配板的热膨胀的机械应力最小化。在另一方面，悬架提供气体分配板和腔室的其它部件之间的热隔离。

4. 发明授权

US07270713B2 Tunable gas distribution plate assembly 失效
标题翻译：可调气体分配板总成
公开(公告)号：US07270713B2
公开(公告)日：2007-09-18
申请号：US10337483
申请日：2003-01-07
申请人： Wendell T. Blonigan , John M. White , William A. Bagley
发明人： Wendell T. Blonigan , John M. White , William A. Bagley
IPC分类号： C23C16/455 , C23C16/50 , C23C16/503 , C23C16/505 , C23C16/509 , C23F1/00 , H01L21/306
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/45591 , C23C16/5096 , H01J37/3244 , H01J37/32449
摘要： A gas distribution plate assembly and a method for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution plate assembly includes a tuning plate coupled to a diffuser plate. The tuning plate has a plurality of orifice holes formed therethrough that align with a plurality of apertures formed through the diffuser plate, where the apertures each have a greater sectional area than the holes in the tuning plate. Each aperture is aligned with a respective hole to define gas passages through the gas distribution plate assembly. The tuning plate may be interchanged with a replacement tuning plate to change the gas flow characteristics through the gas distribution plate assembly.
摘要翻译：提供一种气体分配板组件和在处理室中分配气体的方法。在一个实施例中，气体分配板组件包括联接到扩散板的调谐板。调谐板具有穿过其形成的多个孔孔，其与通过扩散板形成的多个孔对准，其中孔各自具有比调谐板中的孔更大的截面面积。每个孔与相应的孔对准以限定通过气体分配板组件的气体通道。调谐板可以与更换调谐板互换，以改变通过气体分配板组件的气流特性。

5. 发明授权

US06435868B2 Multi-function chamber for a substrate processing system 失效
标题翻译：用于基板处理系统的多功能室
公开(公告)号：US06435868B2
公开(公告)日：2002-08-20
申请号：US09732159
申请日：2000-12-07
申请人： John M. White , Wendell T. Blonigan , Michael W. Richter
发明人： John M. White , Wendell T. Blonigan , Michael W. Richter
IPC分类号： F27D306
CPC分类号： H01L21/67748 , H01L21/67098 , H01L21/67109 , H01L21/67173 , H01L21/67201 , H01L21/67236 , H01L21/67248
摘要： A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations, including a base configuration for providing a transition between two different pressures, a heating configuration for heating the substrate and providing a transition between two different pressures, and a cooling configuration for cooling the substrate and providing a transition between two different pressures. Various features of the chamber configurations help increase the throughput of the system by enabling rapid heating and cooling of substrates and simultaneous evacuation and venting of the chamber, and help compensate for thermal losses near the substrate edges, thereby providing a more uniform temperature across the substrate.
摘要翻译：负载锁定室包括具有孔的腔体，以允许衬底被转移到腔室中或从腔室中移出。负载锁定室可配置为多种配置，包括用于提供两种不同压力之间的转换的基本配置，用于加热衬底并提供两种不同压力之间的转换的加热配置，以及用于冷却衬底的冷却配置，两种不同压力之间的转变。腔室结构的各种特征有助于通过使衬底的快速加热和冷却以及腔室的同时排空和排气来增加系统的生产能力，并且有助于补偿衬底边缘附近的热损失，由此在衬底上提供更均匀的温度。

6. 发明授权

US06193507B1 Multi-function chamber for a substrate processing system 有权
标题翻译：用于基板处理系统的多功能室
公开(公告)号：US06193507B1
公开(公告)日：2001-02-27
申请号：US09502117
申请日：2000-02-10
申请人： John M. White , Wendell T. Blonigan , Michael W. Richter
发明人： John M. White , Wendell T. Blonigan , Michael W. Richter
IPC分类号： F27D306
CPC分类号： H01L21/67748 , H01L21/67098 , H01L21/67109 , H01L21/67173 , H01L21/67201 , H01L21/67236 , H01L21/67248
摘要： A load lock chamber includes a chamber body having an aperture to allow a substrate to be transferred into or out of the chamber. The load lock chamber is configurable in several configurations, including a base configuration for providing a transition between two different pressures, a heating configuration for heating the substrate and providing a transition between two different pressures, and a cooling configuration for cooling the substrate and providing a transition between two different pressures. Various features of the chamber configurations help increase the throughput of the system by enabling rapid heating and cooling of substrates and simultaneous evacuation and venting of the chamber, and help compensate for thermal losses near the substrate edges, thereby providing a more uniform temperature across the substrate.
摘要翻译：负载锁定室包括具有孔的腔体，以允许衬底被转移到腔室中或从腔室中移出。负载锁定室可配置为多种配置，包括用于提供两种不同压力之间的转换的基本配置，用于加热衬底并提供两种不同压力之间的转换的加热配置，以及用于冷却衬底的冷却配置，两种不同压力之间的转变。腔室结构的各种特征有助于通过使衬底的快速加热和冷却以及腔室的同时排空和排气来增加系统的生产能力，并且有助于补偿衬底边缘附近的热损失，由此在衬底上提供更均匀的温度。

7. 发明授权

US6016611A Gas flow control in a substrate processing system 失效
标题翻译：衬底处理系统中的气体流量控制
公开(公告)号：US6016611A
公开(公告)日：2000-01-25
申请号：US115110
申请日：1998-07-13
申请人： John M. White , Wendell T. Blonigan , Michael W. Richter
发明人： John M. White , Wendell T. Blonigan , Michael W. Richter
IPC分类号： C23C16/455 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , F26B13/30
CPC分类号： H01L21/67173 , H01L21/67017 , Y10S414/139
摘要： A substrate processing system can include an evacuable chamber adjacent a process chamber and back-to-back process chambers, or other combinations of evacuable chambers and process chambers. The processing system includes various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. A controller controls the respective positions of the various gas flow valves and vacuum valves depending, in part, on whether the various isolation valves are in their open or sealed positions. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled, for example, to help maximize throughput, increase efficiency, and reduce the likelihood of cross-contamination between chambers.
摘要翻译：衬底处理系统可以包括邻近处理室和背对背处理室的可抽空室，或者可抽空室和处理室的其它组合。处理系统包括设置在相邻室之间的各种隔离阀以及气体流量阀和真空阀。控制器控制各种气体流量阀和真空阀的各个位置，部分地取决于各种隔离阀是处于其打开或密封位置。通过控制阀的位置，可以控制来往不同室的气体流，例如，以帮助最大限度地提高生产量，提高效率，并减少室之间交叉污染的可能性。

8. 发明授权

US07959987B2 Fuel cell conditioning layer 有权
标题翻译：燃料电池调理层
公开(公告)号：US07959987B2
公开(公告)日：2011-06-14
申请号：US11292225
申请日：2005-11-30
申请人： Tae Kyung Won , Robert Bachrach , John M. White , Wendell T. Blonigan
发明人： Tae Kyung Won , Robert Bachrach , John M. White , Wendell T. Blonigan
IPC分类号： C23C16/24 , C23C16/34 , C23C16/513
CPC分类号： C23C16/24 , C23C16/345 , H01M8/0213 , H01M8/0215 , H01M8/0226 , H01M8/0228
摘要： A method and apparatus for depositing a material layer to treat and condition a substrate, such as a fuel cell part, is described. The method includes depositing a hydrophilic material layer on a portion of the surface of the substrate in a process chamber from a mixture of precursors of the hydrophilic material layer. In addition, the method includes reducing a fluid contact angle of the substrate surface. The hydrophilic material layer comprises a wet etch rate of less than about 0.03 Å/min in the presence of about 10 ppm of hydrofluoric acid in water. The material layer can be used to condition various parts of a fuel cell useful in applications to generate electricity.
摘要翻译：描述了用于沉积材料层以处理和调节诸如燃料电池部件的基板的方法和装置。该方法包括在亲水材料层的前体的混合物的处理室中的基底表面的一部分上沉积亲水材料层。此外，该方法包括降低衬底表面的流体接触角。在大约10ppm氢氟酸存在下，亲水性材料层包括小于约0.03 /分钟的湿蚀刻速率。材料层可用于调节用于发电的燃料电池的各种部件。

9. 发明授权

US06746198B2 Substrate transfer shuttle 失效
标题翻译：基材转运班车
公开(公告)号：US06746198B2
公开(公告)日：2004-06-08
申请号：US09881009
申请日：2001-06-13
申请人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
发明人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
IPC分类号： B65G4907
CPC分类号： H01L21/67748 , C03B25/08 , C03B29/08 , C03B35/142 , C03B35/202 , C03B2225/02 , C03C17/002 , F27D3/00 , F27D5/00 , H01L21/67173 , H01L21/67236 , Y02P40/57 , Y10S414/135 , Y10S414/139
摘要： The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a processing chamber. A substrate transfer shuttle is provided and is moveable along a linear path defined by guide rollers between one position in the first chamber and another position in the second chamber. In this way, the substrate may be transferred, in both a forward and a reverse direction, between the first chamber and the second chamber. The substrate transfer shuttle is structured so that a substrate may be removed therefrom by moving a support in one of the chambers from a lowered position to an intermediate position, after which the substrate transfer shuttle may be removed from the chamber.
摘要翻译：本发明提供了一种用于基板输送的装置和方法。在根据本发明的系统中，提供至少第一和第二腔室。第一室可以是装载锁，第二室是处理室。提供基板传送梭，并且可沿着由第一室中的一个位置和第二室中的另一位置之间的导辊限定的线性路径移动。以这种方式，可以在第一室和第二室之间沿正向和反向的方向转移衬底。衬底传送穿梭被构造成使得可以通过将其中一个室中的支撑件从降低位置移动到中间位置而从其中移除基板，之后可以从室移除基板传送梭。

10. 发明授权

US06679671B2 Substrate transfer shuttle having a magnetic drive 有权
标题翻译：具有磁力驱动的基板转移梭
公开(公告)号：US06679671B2
公开(公告)日：2004-01-20
申请号：US10244567
申请日：2002-09-16
申请人： Wendell T. Blonigan , John M. White
发明人： Wendell T. Blonigan , John M. White
IPC分类号： B65G4907
CPC分类号： H01L21/67742 , H01L21/67709 , H01L21/6776 , Y10S414/139
摘要： A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can magnetically engage the rack magnets. Thus, rotation of the pinion will cause the shuttle to move along the linear path. The magnets may be oriented with a helix angle between their primary axis and the axis of rotation of the pinion. One rack and one pinion are located on each side of the shuttle. A set of lower guide rollers supports the shuttle, and a set of upper guide rollers prevents the shuttle from lifting off the lower guide rollers.
摘要翻译：一种磁性驱动系统，用于在半导体制造装置中沿着室之间的线性路径移动基板传送梭。具有齿条磁体的机架固定到梭子上，并且具有小齿轮磁体的可旋转小齿轮定位成邻近齿条，使得小齿轮磁体可以磁性地接合齿条磁体。因此，小齿轮的旋转将使梭子沿线性路径移动。磁体可以在其主轴线和小齿轮的旋转轴线之间具有螺旋角度定向。一个机架和一个小齿轮位于梭子的每一侧。一组下导辊支撑梭子，一组上导辊防止梭子从下导辊上脱落。

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