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    • 7. 发明授权
    • Device and method for coating substrates in a vacuum utilizing an absorber electrode
    • 使用吸收电极在真空中涂布基板的装置和方法
    • US06533908B1
    • 2003-03-18
    • US09763636
    • 2001-03-12
    • Carl-Friedrich MeyerHans-Joachim Scheibe
    • Carl-Friedrich MeyerHans-Joachim Scheibe
    • C23C1454
    • H01J37/32055H01J2237/022
    • The invention relates to a device and method for coating substrates in a vacuum, wherein a plasma is to be generated from a target and ionized particles of the plasma are to be deposited on the substrate in the form of a layer, as has long been used in a very wide range of known PVD processes. The intention of the invention is to prevent droplets and particles from settling in the applied layer, which droplets and particles have an adverse effect on the properties of the layer, or at least to reduce the number of these droplets and particles. To solve this problem, an absorber electrode which is at an electrically positive potential is used, which electrode is a few mm away from the root of the plasma, and is arranged in front of or next to the plasma in such a way and is shaped in such a way that an electric field is formed around the absorber electrode. The electric field vector is to be oriented at least approximately orthogonally to the direction of movement of the ionized particles of the plasma.
    • 本发明涉及一种用于在真空中涂覆基板的装置和方法,其中将从靶产生等离子体,等离子体的离子化的颗粒将以层的形式沉积在基板上,如早已使用 在非常广泛的已知PVD工艺中。 本发明的目的是防止液滴和颗粒沉积在施加的层中,这些液滴和颗粒对该层的性质具有不利影响,或至少减少这些液滴和颗粒的数量。 为了解决这个问题,使用处于正电位的吸收体电极,该电极距离等离子体的根部几毫米,并且以这样的方式布置在等离子体的前面或旁边,并且成形 以这样的方式在吸收体电极周围形成电场。 电场矢量至少大致与等离子体的电离粒子的运动方向垂直。
    • 8. 发明授权
    • Vacuum coating system with a coating chamber and at least one source chamber
    • 具有涂层室和至少一个源室的真空涂布系统
    • US06338778B1
    • 2002-01-15
    • US09214764
    • 1999-01-12
    • Daniela GierschRobert SchalauskyGoetz MielschHans-Joachim Scheibe
    • Daniela GierschRobert SchalauskyGoetz MielschHans-Joachim Scheibe
    • C23C1432
    • C23C14/28C23C14/325C23C14/564
    • The invention relates to a device, in particular for a laser-induced vacuum are discharge evaporator for depositing of multiple layers with a high level of purity and high deposition rates on large-area components. According to the invention, the material source for the coating material is in a source chamber which can be evacuated and can be separated in a vacuum-tight manner from the actual coating chamber in which the substrate to be coated is located. The evaporator can, in particular, be used for deposition of amorphous carbon layers which are hydrogen-free and superhard and/or which contain hydrogen, in conjunction with high-purity metal layers or for the reactive plasma-enhanced deposition of, for example, oxidic, carbide, nitride hard material layers of ceramic layers or a combination thereof. The corresponding plasma sources can be flange-mounted on any suitable coating chambers and, consequently, also combined with conventional coating processes, for example magnetron sputtering.
    • 本发明涉及一种装置,特别是用于激光诱发真空的装置,是用于在大面积部件上以高纯度和高沉积速率沉积多层的放电蒸发器。 根据本发明,用于涂料的材料源在源腔室中,其可被抽真空并且可以以真空密封的方式从待涂覆的基底所在的实际涂覆室分离。 特别地,蒸发器可用于沉积无氢和超硬和/或含有氢的无定形碳层,结合高纯度金属层或用于例如反应性等离子体增强沉积, 氧化物,碳化物,氮化物硬质材料层或其组合。 相应的等离子体源可以法兰安装在任何合适的涂层室上,并因此也与传统的涂覆工艺(例如磁控溅射)组合。