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1. 发明授权

US4846920A Plasma amplified photoelectron process endpoint detection apparatus 失效
标题翻译：等离子体放大光电子进程端点检测装置
公开(公告)号：US4846920A
公开(公告)日：1989-07-11
申请号：US130573
申请日：1987-12-09
申请人： John H. Keller , Gary S. Selwyn , Jyothi Singh
发明人： John H. Keller , Gary S. Selwyn , Jyothi Singh
IPC分类号： H01L21/302 , H01J37/32 , H01L21/3065
CPC分类号： H01J37/32935
摘要： A plasma processing apparatus and process endpoint detection method including a plasma chamber for processing an item that has a first portion of a first material and a second portion of a second material, with the first and second materials having different work functions, and a structure for generating a plasma in the plasma chamber, with the plasma generating structure including at least a pair of RF-power electrodes with one of them being excited by an RF excitation frequency. The apparatus further includes a structure for generating and ejecting electrons from the second material only when the second material is exposed to the plasma, and a structure for increasing the energies of these generated electrons and accelerating these electrons into the etching plasma with sufficient energy to generate secondary electrons in the plasma. The apparatus further includes a structure for receiving a plasma discharge voltage signal, a structure for filtering the discharge electrical voltage signal to remove the RF excitation frequency and any DC components therein, and a structure for amplifying the natural frequencies of excitation and decay of the plasma discharge voltage perturbation signal, to thereby detect the processing endpoint.In a preferred embodiment, the electron energy increasing and accelerating structure includes a structure for generating an electrode voltage sheath, and a structure for generating the electrons within this voltage sheath to thereby accelerate the electrons into the plasma. The electron generating structure includes a structure for directing a beam of photons in a selected energy range onto the item to be processed, which energy range is not sufficient to eject photoelectrons from the first material, but is high enough to generate photoelectrons from areas of exposed second material.

2. 发明申请

US20190061879A1 ADVANCES IN WATERCRAFT HULL LIFT, EFFICENCY, AND REDUCED HUMP DRAG WITH INCREASED STABILITY 审中-公开
公开(公告)号：US20190061879A1
公开(公告)日：2019-02-28
申请号：US16115823
申请日：2018-08-29
申请人： John H. Keller , John Wallace Keller
发明人： John H. Keller , John Wallace Keller
IPC分类号： B63B1/20
摘要： Watercraft hulls and parts thereof are disclosed which improve hydrodynamic performance for yachts, sailboards, and other craft. Drag at the transition from displacement mode to planing mode may be reduced to be the same or less than the minimum drag experienced in planing mode. Exemplary embodiments may include a bow with a center planing surface and tunnels to either side. The bow tunnels may each end in a step. At least part of the center planing surface may be cambered. A spoiler and/or interceptor may be provided at an aft end of a camber of a planing surface. For some hulls, the bow is followed by a main lift surface which is followed by a back lift surface (from stem to stern). In the back lift surface behind the main lift surface, a tunnel surface may be provided to add longitudinal stability.

3. 发明申请

US20110030600A1 SAILBOARD WITH SLOTTED WINGLETS 审中-公开
标题翻译：带有楔形手镯的舷梯
公开(公告)号：US20110030600A1
公开(公告)日：2011-02-10
申请号：US12880360
申请日：2010-09-13
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63H9/04
CPC分类号： B63B1/20 , B63B1/24 , B63B35/7906 , B63B35/7926 , B63B2001/201 , B63B2001/202
摘要： A winglet in a planing hull for sailboards with longitudinal length at least three times its transverse width, or a top slot that covers at least half the winglet area, and a forward slot and or a top slot, which allows dynamic lift from both the top and bottom surface of the winglet when the board is traveling at a transition speed between displacement mode and planing mode, but at high planing speed it does not normally have lift from the top surface of the winglet. This winglet may have a camber/slope step on the planing surface. In addition the transverse section of the nose of the hull can have the shape of an upside down wing.
摘要翻译：舷梯的舷梯，其纵向长度至少为其横向宽度的三倍，或覆盖至少一半小翼区域的顶部槽口，以及前槽和/或顶部槽口，其允许从顶部起动并且当板在位移模式和刨削模式之间以过渡速度行进时，小翼的底表面，但是在高刨削速度下，通常不具有从小翼顶表面的升力。该小翼可能在平面上具有弧度/坡度。另外，船体的鼻部的横截面可以具有倒立的翼的形状。

4. 发明授权

US07793604B2 Planing sailboard 有权
标题翻译：刨帆板
公开(公告)号：US07793604B2
公开(公告)日：2010-09-14
申请号：US10157875
申请日：2002-05-31
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63B35/79
CPC分类号： B63B1/20 , B63B35/7906 , B63B35/792 , B63B35/7926 , B63B35/7953 , B63B2001/201 , B63B2001/202 , B63B2001/206
摘要： High performance of a sailboard is achieved over a wider range of wind and water conditions by providing a hull having two or more planing surfaces which may differ in shape and/or aspect ratio. Drag due to suction at steps between planing surfaces is reduced by venting to the air. Cusp shaping of the respective planing surfaces can reduce and stabilize the angle of attack at the displacement/planing transition without causing fore-and-aft pitching effects known as porpoising. By confining water under the planing surfaces to reduce lateral outflow thereof through increased downward curvature of the bottom of the board, winglets, asymmetrical fins, fences and the like, the effective width and aspect ratio of the wetted area may be altered beyond that of the actual geometry of the planing surfaces to further increase lift and reduce drag while providing additional sources of lift at displacement, transitional and planing speeds. Steps and/or cambered shapes of the planing surface may be used to dramatically further reduce wetted area and further increase effective aspect ratio.
摘要翻译：通过提供具有在形状和/或纵横比上可能不同的两个或更多个刨面的船体，可以在较宽范围的风和水条件下实现帆板的高性能。通过排放到空气中减少由于在刨削表面之间的台阶处的吸力而拖动。相应的刨削面的尖头成形可以减小并稳定位移/刨削过渡处的迎角，而不会导致称为海豚的前后俯仰效应。通过将水限制在刨削表面下，通过增加板的底部，小翼片，不对称翼片，围栏等的向下弯曲来减少侧向流出，湿润区域的有效宽度和纵横比可以被改变超过刨削表面的实际几何形状，以进一步增加升力并减少阻力，同时在位移，过渡和刨削速度下提供额外的升力源。可以使用刨削表面的台阶和/或弧形形状来显着地进一步减少润湿面积并进一步增加有效纵横比。

5. 发明授权

US5880034A Reduction of semiconductor structure damage during reactive ion etching 失效
标题翻译：反应离子蚀刻期间半导体结构损伤的减少
公开(公告)号：US5880034A
公开(公告)日：1999-03-09
申请号：US841218
申请日：1997-04-29
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： H01J37/32 , H01L21/3065 , H01L21/00
CPC分类号： H01J37/321 , H01J37/3266 , H01L21/3065 , H01J2237/3341
摘要： Uniformity of plasma density and potential are increased by reducing plasma confinement through use of a non-uniform, graded magnetic field by asymmetric energization of electromagnets with a waveform including harmonics of a fundamental frequency. The magnetic field strength or intensity decreases in the direction of ExB drift of energetic electrons within the plasma which tends to cause additional ionization in the plasma and a gradient of plasma density and potential. Thus, increase in ionization due to ExB drift is balanced by reduction of plasma confinement. Uniformity of average exposure to the plasma is further increased by rotation of the magnetic field. Uniformity of plasma potential or wafer bias is further improved by modulation of the radio frequency (RF) power used to form the plasma in synchronism with decreases in the magnetic field during switching for magnetic field rotation.
摘要翻译：通过使用不均匀的梯度磁场，通过包括基波频率的波形的电磁体的不对称激励来降低等离子体密度和电位的均匀性。磁场强度或强度在等离子体内的能量电子的ExB漂移方向上减小，这倾向于在等离子体中引起额外的电离和等离子体密度和电位的梯度。因此，通过减少等离子体限制来平衡由ExB漂移造成的电离的增加。平均暴露于等离子体的均匀性通过磁场的旋转进一步增加。通过与用于磁场旋转的切换期间的磁场的减小同步地调制用于形成等离子体的射频（RF）功率来进一步提高等离子体电位或晶片偏置的均匀性。

6. 发明授权

US5241245A Optimized helical resonator for plasma processing 失效
标题翻译：用于等离子体处理的优化螺旋谐振器
公开(公告)号：US5241245A
公开(公告)日：1993-08-31
申请号：US879663
申请日：1992-05-06
申请人： Michael S. Barnes , Dennis K. Coultas , John G. Forster , John H. Keller
发明人： Michael S. Barnes , Dennis K. Coultas , John G. Forster , John H. Keller
IPC分类号： H05H1/46 , B01J19/08 , C23C16/50 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01P7/00
CPC分类号： H01J37/321
摘要： An optimized helical resonator which increases the plasma density for efficient processing of semiconductor wafers is characterized by a low inductance and, hence, a low Q. A first embodiment uses either a distributed or lumped capacitance to reduce the value of .omega.L to less than about 200 Ohms. A second embodiment uses a flat spiral coil having a low value of .omega.L and resonant as a 1/4 or 1/2 wave resonator. A third embodiment combines features of the first two embodiments using both spiral and solenoid coils as the helical resonator.
摘要翻译：提高用于半导体晶片的有效处理的等离子体密度的优化螺旋谐振器的特征在于低电感，因此具有低Q.第一实施例使用分布式或集总电容将ωL的值减小到小于约 200欧姆第二实施例使用具有低ΩΩL值并且谐振的扁平螺旋线圈作为1/4或1/2波形谐振器。第三实施例组合了使用螺旋和螺线管线圈的前两个实施例的特征作为螺旋谐振器。

7. 发明授权

US4158589A Negative ion extractor for a plasma etching apparatus 失效
标题翻译：用于等离子体蚀刻装置的负离子提取器
公开(公告)号：US4158589A
公开(公告)日：1979-06-19
申请号：US865811
申请日：1977-12-30
申请人： John H. Keller , Charles M. McKenna
发明人： John H. Keller , Charles M. McKenna
IPC分类号： H01J27/14 , H01J37/08 , H01J37/305 , H01L21/302 , B01K1/00 , C23F1/02
CPC分类号： H01J37/3053 , H01J27/14 , H01J37/08
摘要： Process and apparatus for use in extracting negative ions from a plasma which is particularly useful in reactive ion etching of metals, silicon and oxides and nitrides of silicon in the manufacture of semiconductor devices. A magnetic field is employed in the apparatus and, herein, is created by a novel grid, through which negative ions pass to a surface, such as one to be etched, while free electrons are prevented from passing through the grid and out of the plasma. The novel process utilizes negative ions which have a large fraction in the atomic state.
摘要翻译：用于从等离子体中提取负离子的方法和装置，其特别可用于半导体器件制造中的金属，硅和氧化物和氮化物的反应离子蚀刻。在该装置中采用磁场，并且在这里由新颖的栅格产生，负离子通过该栅极传递到诸如被蚀刻的表面，同时防止自由电子通过栅极并离开等离子体。该新方法利用在原子状态下具有大部分的负离子。

8. 发明授权

US08622013B2 Sailboard step design with less ventilation and increased speed 有权
标题翻译：帆板踏步设计，通风较少，速度更快
公开(公告)号：US08622013B2
公开(公告)日：2014-01-07
申请号：US13119035
申请日：2009-09-16
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63B1/32
CPC分类号： B63B1/18
摘要： A step shape in a planing hull for water craft and more particularly for sailboards, surfboard or PWC for increasing the lift in front of the step and decreasing it in back at high planing speed, which has dynamic lift directly behind the step when the hull is traveling at a transition speed between displacement mode and planing mode, but at high planing speed it does not have lift directly behind the step. The hull has increased speed because the lift behind the step at transition speed allows the position of the step to be moved forward and in one embodiment has cambered surface (9) in front of the step. This step does not go across the full width of the hull such that there is a continuous planing surface in front of the fins or other means, which it is desirous that they not ventilate, and fin or other means has more ventilation resistance in another embodiment.
摘要翻译：在水上工艺的平面船体中形成一个台阶，特别是帆板，冲浪板或PWC，用于增加台阶前的升力，并以高刨削速度将其降低回来，当船体为以位移模式和刨削模式之间的过渡速度行驶，但是在高刨床速度下，它不会直接在踏板后面。船体具有增加的速度，因为在转变速度之后的踏板上的升力允许台阶的位置向前移动，并且在一个实施例中在台阶前面具有弧形表面（9）。该步骤不会穿过船体的整个宽度，使得在翼片或其他装置前面存在连续的刨削表面，这是希望它们不通风的，并且翅片或其它装置在另一个实施例中具有更多的通风阻力。

9. 发明授权

US06595151B2 Planing sailboard 有权
公开(公告)号：US06595151B2
公开(公告)日：2003-07-22
申请号：US09867437
申请日：2001-05-31
申请人： John H. Keller
发明人： John H. Keller
IPC分类号： B63B3500
CPC分类号： B63B1/20 , B63B35/7906 , B63B35/792 , B63B35/7926 , B63B35/7953 , B63B2001/201 , B63B2001/202 , B63B2001/206
摘要： High performance of a sailboard is achieved over a wider range of wind and water conditions by providing a hull having two or more planing surfaces which may differ in shape and/or aspect ratio. Drag due to suction at steps between planing surfaces is reduced by venting to the air. Cusp shaping of the respective planing surfaces can reduce and stabilize the angle of attack at the displacement/planing transition without causing fore-and-aft pitching effects known as porpoising.

10. 发明授权

US06323493B1 Increased ion beam throughput with reduced beam divergence in a dipole magnet 失效
标题翻译：增加离子束通量，减少偶极子磁体中的光束发散
公开(公告)号：US06323493B1
公开(公告)日：2001-11-27
申请号：US09383772
申请日：1999-08-26
申请人： John H. Keller , Kathleen J. Keller
发明人： John H. Keller , Kathleen J. Keller
IPC分类号： H01J3700
CPC分类号： H01J37/3266 , H01J37/04
摘要： Spreading of an ion beam when passing through a dipole magnet is reduced or suppressed by electrostatic ion beam confinement which supplements magnetic confinement which may be provided. The magnetic confinement is enhanced by the provision of a magnetic mirror through concentration and localized increase of the dipole field with a concave profile of the pole pieces faces and/or provision of permanent magnets or localized regions of material of increased permeability to form magnetic cusps. Pitch and geometry of convex portions of the pole piece faces are adjusted to increase the mirror ratio and the location of the maximum mirror field relative to the thickness of a graphite or insulating liner which may be employed. Electrostatic confinement elements in the form of negatively charged electrodes and/or electrically isolated electrodes or insulators which assume a negative charge. Ionization of plasma between the pole pieces may be enhanced by application of a VHF/UHF field having a frequency of about 40 MHz to 100 MHZ or higher.
摘要翻译：当通过偶极子磁体时，离子束的扩散通过静电离子束限制被减少或抑制，这补充了可以提供的磁约束。通过集中提供磁镜并通过极片面的凹形轮廓和/或提供永久磁体或增加渗透性的材料的局部区域形成磁尖来提供磁镜来增强磁约束。调节极片面的凸起部分的几何形状和镜片面的几何形状，以增大镜面比率和最大镜面相对于可采用的石墨或绝缘衬垫的厚度的位置。具有带负电荷的电极和/或电隔离电极或绝缘体形式的静电限制元件，其承担负电荷。可以通过施加具有约40MHz至100MHz或更高频率的VHF / UHF场来增强极片之间的等离子体的电离。

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