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    • 3. 发明授权
    • Method for manufacturing compound semiconductor field-effect transistors
with improved DC and high frequency performance
    • 具有改善的直流和高频性能的化合物半导体场效应晶体管的制造方法
    • US6083781A
    • 2000-07-04
    • US941264
    • 1997-10-01
    • John C. ZolperMarc E. SherwinAlbert G. Baca
    • John C. ZolperMarc E. SherwinAlbert G. Baca
    • H01L21/265H01L21/338
    • H01L29/66863H01L21/26546
    • A method for making compound semiconductor devices including the use of a p-type dopant is disclosed wherein the dopant is co-implanted with an n-type donor species at the time the n-channel is formed and a single anneal at moderate temperature is then performed. Also disclosed are devices manufactured using the method. In the preferred embodiment n-MESFETs and other similar field effect transistor devices are manufactured using C ions co-implanted with Si atoms in GaAs to form an n-channel. C exhibits a unique characteristic in the context of the invention in that it exhibits a low activation efficiency (typically, 50% or less) as a p-type dopant, and consequently, it acts to sharpen the Si n-channel by compensating Si donors in the region of the Si-channel tail, but does not contribute substantially to the acceptor concentration in the buried p region. As a result, the invention provides for improved field effect semiconductor and related devices with enhancement of both DC and high-frequency performance.
    • 公开了一种用于制造包括使用p型掺杂剂的化合物半导体器件的方法,其中在形成n沟道时,掺杂剂与n型供体物质共注入,然后在中等温度下进行单次退火 执行。 还公开了使用该方法制造的装置。 在优选实施例中,使用在GaAs中共同注入Si原子的C离子来制造n-MESFET和其它类似的场效应晶体管器件,以形成n沟道。 C在本发明的上下文中表现出独特的特征,因为它表现出作为p型掺杂剂的低活化效率(通常为50%或更少),因此,其作用是通过补偿Si供体来锐化Si n通道 在Si通道尾部的区域中,但是对掩埋p区的受主浓度没有显着贡献。 结果,本发明提供了具有增强的直流和高频性能的改进的场效应半导体和相关器件。