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1. 发明授权

US06963595B2 Automatic gas control system for a gas discharge laser 失效
标题翻译：气体放电激光器自动气体控制系统
公开(公告)号：US06963595B2
公开(公告)日：2005-11-08
申请号：US10356168
申请日：2003-01-31
申请人： John A. Rule , Richard C. Morton , Vladimir V. Fleurov , Fedor Trintchouk , Toshihiko Ishihara , Alexander I. Ershov , James A. Carmichael
发明人： John A. Rule , Richard C. Morton , Vladimir V. Fleurov , Fedor Trintchouk , Toshihiko Ishihara , Alexander I. Ershov , James A. Carmichael
IPC分类号： H01L21/027 , G03F7/20 , H01S20060101 , H01S3/036 , H01S3/041 , H01S3/08 , H01S3/134 , H01S3/22 , H01S3/223 , H01S3/225 , H01S3/23
CPC分类号： H01S3/225 , G03F7/70025 , H01S3/036 , H01S3/041 , H01S3/08009 , H01S3/09702 , H01S3/2258 , H01S3/2333
摘要： An automatic F2 laser gas control, for a modular high repetition rate ultraviolet gas discharge laser. The laser gas control includes techniques, monitors, and processor for monitoring the F2 consumption rates through the operating life of the laser system. These consumption rates are used by a processor programmed with an algorithm to determine F2 injections needed to maintain laser beam quality within a delivery range. Preferred embodiments include F2 controls for a two-chamber MOPA laser system.
摘要翻译：用于模块化高重复率紫外线气体放电激光器的自动F 2激光气体控制。激光气体控制包括技术，监视器和处理器，用于在激光系统的使用寿命期间监视F 2消耗率。这些消耗速率由用算法编程的处理器用于确定在输送范围内保持激光束质量所需的F 2注射。优选实施例包括用于两室MOPA激光系统的F 2控制。

2. 发明授权

US07596164B2 Control system for a two chamber gas discharge laser 有权
标题翻译：双室气体放电激光器控制系统
公开(公告)号：US07596164B2
公开(公告)日：2009-09-29
申请号：US11376364
申请日：2006-03-15
申请人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号： H01S3/223
CPC分类号： H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制特征包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F2注入控制与新的学习算法。

3. 发明授权

US07079564B2 Control system for a two chamber gas discharge laser 有权
标题翻译：双室气体放电激光器控制系统
公开(公告)号：US07079564B2
公开(公告)日：2006-07-18
申请号：US11181258
申请日：2005-07-14
申请人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob P. Lipcon , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号： H01S3/22
CPC分类号： H01S3/097 , H01S3/0057 , H01S3/08004 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/10038 , H01S3/1055 , H01S3/225 , H01S3/2251 , H01S3/2333 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。特别适用于双室气体放电激光系统的新型控制特征包括：（1）脉冲能量控制，具有纳秒定时精度（2）精确脉冲到脉冲波长控制，具有高速和极速波长调谐（3）快速响应气体温度控制和（4）F 2注入控制与新的学习算法。

4. 发明授权

US07039086B2 Control system for a two chamber gas discharge laser 有权
公开(公告)号：US07039086B2
公开(公告)日：2006-05-02
申请号：US10631349
申请日：2003-07-30
申请人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , G03F7/70025 , G03F7/70041 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/0381 , H01S3/09702 , H01S3/1055 , H01S3/2258 , H01S3/2333
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

5. 发明授权

US06690704B2 Control system for a two chamber gas discharge laser 有权
标题翻译：双室气体放电激光器控制系统
公开(公告)号：US06690704B2
公开(公告)日：2004-02-10
申请号：US10210761
申请日：2002-07-31
申请人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号： H01S322
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

6. 再颁专利

USRE42588E1 Control system for a two chamber gas discharge laser system 有权
标题翻译：双室气体放电激光系统控制系统
公开(公告)号：USRE42588E1
公开(公告)日：2011-08-02
申请号：US11352522
申请日：2006-02-10
申请人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号： H01S3/22
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

7. 发明授权

US06853653B2 Laser spectral engineering for lithographic process 有权
公开(公告)号：US06853653B2
公开(公告)日：2005-02-08
申请号：US10036925
申请日：2001-12-21
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： B41C20060101 , B41C1/00 , G03F7/20 , H01L21/027 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/08 , H01S3/081 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/10 , H01S3/102 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/223 , H01S3/225 , H01J3/10
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.

8. 发明授权

US06563128B2 Base stabilization system 有权
标题翻译：基地稳定系统
公开(公告)号：US06563128B2
公开(公告)日：2003-05-13
申请号：US10074059
申请日：2002-02-11
申请人： Leonard Lublin , David J. Warkentin , Baruch Pletner , John A. Rule
发明人： Leonard Lublin , David J. Warkentin , Baruch Pletner , John A. Rule
IPC分类号： G01N2186
CPC分类号： F16F15/02 , F16F15/005 , F16F15/0275 , F16F2230/08 , G03F7/70725 , G03F7/70825 , G03F7/70833 , G03F7/709
摘要： A system that provides a base stabilization system for controlling motion of a controlled structure. The system includes a ground structure such as the floor of a fabrication facility and the controlled structure includes a base on which equipment is mounted. The system also includes at least three air mounts and a plurality of actuators all attached to the ground structure and to the base to isolate the base from the ground structure and to stabilize the base. The system includes a plurality of position and acceleration sensors each of which are co-located with a corresponding actuator. The system also includes a multi-input, multi output feedback control system comprising a computer processor programmed with a feedback control algorithm for controlling each of the actuators based on feedback signals from each of the sensors. The co-location of the sensors with the actuators avoids serious problems resulting from higher order vibration modes.
摘要翻译：提供用于控制受控结构的运动的基本稳定系统的系统。该系统包括诸如制造设备的底板的接地结构，并且受控结构包括安装设备的基座。该系统还包括至少三个空气支架和多个致动器，所述致动器全部附接到地面结构和底座以将基座与地面结构隔离并稳定基座。该系统包括多个位置和加速度传感器，每个位置和加速度传感器与相应的致动器共同定位。该系统还包括多输入多输出反馈控制系统，其包括用基于来自每个传感器的反馈信号控制每个致动器的反馈控制算法编程的计算机处理器。传感器与执行器的共同位置避免了由较高阶振动模式引起的严重问题。

9. 发明授权

US07382815B2 Laser spectral engineering for lithographic process 有权
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：US07382815B2
公开(公告)日：2008-06-03
申请号：US10915517
申请日：2004-08-09
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： H01S5/00
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

10. 发明授权

US07298770B2 Laser spectral engineering for lithographic process 有权
标题翻译：激光光谱工程用于光刻工艺
公开(公告)号：US07298770B2
公开(公告)日：2007-11-20
申请号：US10912933
申请日：2004-08-05
申请人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
发明人： Ronald L. Spangler , Jacob P. Lipcon , John A. Rule , Robert N. Jacques , Armen Kroyan , Ivan Lalovic , Igor V. Fomenkov , John M. Algots
IPC分类号： H01S3/22 , H01S3/223 , H01S3/10 , H01S3/13
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258
摘要： An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum needed to produce a desired lithographic result. A fast responding tuning mechanism is then used to adjust center wavelength of laser pulses in a burst of pulses to achieve an integrated spectrum for the burst of pulses approximating the desired laser spectrum. The laser beam bandwidth is controlled to produce an effective beam spectrum having at least two spectral peaks in order to produce improved pattern resolution in photo resist film. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection control system having a time response of less than about 2.0 millisecond. In a preferred embodiment, a wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second in phase with the repetition rate of the laser. In one case, the piezoelectric drive was driven with a square wave signal and in a second case it was driven with a sine wave signal. In another embodiment, the maximum displacement was matched on a one-to-one basis with the laser pulses in order to produce a desired average spectrum with two peaks for a series of laser pulses. Other preferred embodiments utilize three separate wavelength tuning positions producing a spectrum with three separate peaks.
摘要翻译：一种称为光电工程的集成电路光刻技术，用于放电激光器的带宽控制。在优选的方法中，使用计算机模型来模拟光刻参数以确定产生所需光刻结果所需的所需激光光谱。然后使用快速响应的调谐机构来调整脉冲串中的激光脉冲的中心波长，以实现接近所需激光光谱的脉冲串的集成光谱。控制激光束带宽以产生具有至少两个光谱峰值的有效光束光谱，以便在光致抗蚀剂膜中产生改进的图案分辨率。提供了具有至少一个压电驱动器和具有小于约2.0毫秒的时间响应的快速带宽检测控制系统的线窄设备。在优选实施例中，波长调谐镜以与激光器的重复频率相位的每秒超过500次抖动的抖动速率抖动。在一种情况下，用方波信号驱动压电驱动，在第二种情况下，它是用正弦波信号驱动的。在另一个实施例中，最大位移与激光脉冲在一对一的基础上匹配，以便为一系列激光脉冲产生具有两个峰值的所需平均光谱。其它优选实施例利用三个独立的波长调谐位置，产生具有三个独立峰值的光谱。

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