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    • 1. 发明授权
    • Bleachable materials for lithography
    • 用于光刻的可漂洗材料
    • US07875408B2
    • 2011-01-25
    • US11698182
    • 2007-01-25
    • John A. HoffnagleDavid R. MedeirosRobert D. MillerLibor VycklickyGregory M. Wallraff
    • John A. HoffnagleDavid R. MedeirosRobert D. MillerLibor VycklickyGregory M. Wallraff
    • G03F7/00G03F7/004G03F7/031G03F7/075
    • G03F7/091G03F7/0382G03F7/0392Y10S430/106Y10S430/146
    • Compositions comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure. (reversible photobleaching). We use these compositions in art-known contrast enhancement layers and as a part of a photoresist, especially in optical lithography processes for semiconductor fabrication. They may comprise polymers such as organo-silicon polymers, polymers comprising polymers of aromatic hydroxyl compounds such as phenol and naphthol such as phenol formaldehyde polymers and naphthol formaldehyde polymers styrene polymers and phenolic acrylate polymers or cyclic materials comprising: where the radicals “R” and “Y” represent organo, or substituted organo moieties, Structures I, II, and III represent basic organic skeletons and can be unsubstituted or substituted in any available position with any one or combinations of multiple substituents.
    • 包含可光漂白有机材料的组合物可以用193nm的光漂白,并且在曝光后通过刺激使其恢复到其初始状态。 (可逆光漂白)。 我们将这些组合物用于本领域已知的对比增强层和作为光致抗蚀剂的一部分,特别是在用于半导体制造的光刻工艺中。 它们可以包括聚合物,例如有机硅聚合物,包含芳族羟基化合物如苯酚和萘酚的聚合物的聚合物,例如苯酚甲醛聚合物和萘酚甲醛聚合物苯乙烯聚合物和酚醛丙烯酸酯聚合物或环状材料,其包括:其中基团“R”和 “Y”表示有机或取代的有机部分,结构I,II和III表示碱性有机骨架,并且可以在任何可用位置被未取代或被任何一个或多个取代基的组合取代。
    • 2. 发明申请
    • Bleachable materials for lithography
    • 用于光刻的可漂洗材料
    • US20080182178A1
    • 2008-07-31
    • US11698182
    • 2007-01-25
    • John A. HoffnagleDavid R. MedeirosRobert D. MillerLibor VycklickyGregory M. Wallraff
    • John A. HoffnagleDavid R. MedeirosRobert D. MillerLibor VycklickyGregory M. Wallraff
    • G03C1/00G03F1/00
    • G03F7/091G03F7/0382G03F7/0392Y10S430/106Y10S430/146
    • Compositions comprising photobleachable organic materials can be bleached by 193 nm light, and brought back to their original state by stimuli after exposure. (reversible photobleaching). We use these compositions in art-known contrast enhancement layers and as a part of a photoresist, especially in optical lithography processes for semiconductor fabrication. They may comprise polymers such as organosilicon polymers, polymers comprising polymers of aromatic hydroxyl compounds such as phenol and naphthol such as phenol formaldehyde polymers and naphthol formaldehyde polymers styrene polymers and phenolic acrylate polymers or cyclic materials comprising: where the radicals “R” and “Y” represent organo, or substituted organo moieties, Structures I, II, and III represent basic organic skeletons and can be unsubstituted or substituted in any available position with any one or combinations of multiple substituents.
    • 包含可光漂白有机材料的组合物可以用193nm的光漂白,并且在曝光后通过刺激使其恢复到其初始状态。 (可逆光漂白)。 我们将这些组合物用于本领域已知的对比增强层和作为光致抗蚀剂的一部分,特别是在用于半导体制造的光刻工艺中。 它们可以包括聚合物,例如有机硅聚合物,包含芳族羟基化合物如苯酚和萘酚的聚合物的聚合物,例如苯酚甲醛聚合物和萘酚甲醛聚合物苯乙烯聚合物和酚醛丙烯酸酯聚合物或环状材料,其包含:其中基团“R”和“Y “表示有机或取代的有机部分,结构I,II和III表示碱性有机骨架,并且可以在任何可用的位置被未取代或被任意一个或多个取代基的组合取代。
    • 4. 发明授权
    • System for converting optical beams to collimated flat-top beams
    • 将光束转换成准直平顶梁的系统
    • US06801368B2
    • 2004-10-05
    • US10679058
    • 2003-10-02
    • Hans J. CoufalJohn A. HoffnagleCarl M. Jefferson
    • Hans J. CoufalJohn A. HoffnagleCarl M. Jefferson
    • G02B1318
    • G02B19/0057G02B13/18G02B19/0014G02B27/09G02B27/0927G02B27/0944G02B27/0955G03F7/70075
    • An optical beam transformation system includes a first and a second optical element, each of which has a non-reentrant surface. The system transforms a substantially non-uniform optical input beam (such as a Gaussian) to a substantially uniform output beam. The first and second optical elements are arranged in either a Keplerian or Galilean configuration. The aspheric surface of the second optical element is related to the aspheric surface of the first optical element by a ray-tracing function that maps substantially all of an input light beam that is incident on the first optical element to a collimated output light beam that is output from the second optical element. Preferably, the output light beam has a Fermi-Dirac intensity distribution, and the ray-tracing function maps the input light beam to the output beam out to the (1/e)6 intensity radius of the input light beam.
    • 光束转换系统包括第一和第二光学元件,每个光学元件具有非凹入表面。 系统将基本上不均匀的光输入光束(例如高斯)转换成基本均匀的输出光束。 第一和第二光学元件以开普勒或伽利略配置布置。 第二光学元件的非球面通过光线跟踪功能与第一光学元件的非球面相关,该光线跟踪功能将入射在第一光学元件上的输入光束基本上全部映射到准直的输出光束 从第二光学元件输出。 优选地,输出光束具有费米 - 迪拉克强度分布,并且光线跟踪功能将输入光束映射到输入光束的输出光束的(1 / e)6强度半径。
    • 7. 发明授权
    • System for converting optical beams to collimated flat-top beams
    • 将光束转换成准直平顶梁的系统
    • US06654183B2
    • 2003-11-25
    • US09917370
    • 2001-07-27
    • Hans J. CoufalJohn A. HoffnagleCarl M. Jefferson
    • Hans J. CoufalJohn A. HoffnagleCarl M. Jefferson
    • G02B1318
    • G02B19/0057G02B13/18G02B19/0014G02B27/09G02B27/0927G02B27/0944G02B27/0955G03F7/70075
    • An optical beam transformation system includes a first and a second optical element, each of which has a non-reentrant surface. The system transforms a substantially non-uniform optical input beam (such as a Gaussian) to a substantially uniform output beam. The first and second optical elements are arranged in either a Keplerian or Galilean configuration. The aspheric surface of the second optical element is related to the aspheric surface of the first optical element by a ray-tracing function that maps substantially all of an input light beam that is incident on the first optical element to a collimated output light beam that is output from the second optical element. Preferably, the output light beam has a Fermi-Dirac intensity distribution, and the ray-tracing function maps the input light beam to the output beam out to the (1/e)6 intensity radius of the input light beam.
    • 光束转换系统包括第一和第二光学元件,每个光学元件具有非凹入表面。 系统将基本上不均匀的光输入光束(例如高斯)转换成基本均匀的输出光束。 第一和第二光学元件以开普勒或伽利略配置布置。 第二光学元件的非球面通过光线跟踪功能与第一光学元件的非球面相关,该光线跟踪功能将入射在第一光学元件上的输入光束基本上全部映射到准直的输出光束 从第二光学元件输出。 优选地,输出光束具有费米 - 迪拉克强度分布,并且光线跟踪功能将输入光束映射到输入光束的输出光束的(1 / e)6强度半径。
    • 8. 发明授权
    • Monolithic symmetric interferometer for generation of variable-periodicity patterns for lithography
    • 用于生成用于光刻的可变周期性图案的单片对称干涉仪
    • US06178000B1
    • 2001-01-23
    • US09111878
    • 1998-07-08
    • John A. Hoffnagle
    • John A. Hoffnagle
    • G01B902
    • G03F7/70408
    • An interferometer device includes a first prism portion and a second prism portion. The first prism portion has a semi-transparent surface, a beam incident surface and a beam emerging surface. The beam incident surface receives an incident light beam at a wavelength of &lgr; and at an angle of incidence &thgr; with respect to a normal to the beam incident surface. The second prism portion has a surface that corresponds to the semi-transparent surface of the first prism portion and a beam emerging surface that corresponds to the beam emerging surface of the first prism portion. The first and second prism portions are attached to each other at the semi-transparent surface of the first prism portion and the surface of the second prism portion corresponding to the semi-transparent surface. The semi-transparent surface splits the incident light beam into first and second light beams by reflecting the first beam at the semi-transparent surface and by passing the second light beam through the semi-transparent surface so that the second light beam enters the second prism portion. The first and second light beams are each respectively reflected internally to the first and second prism portions and emerge from the respective beam emerging surfaces of the first and second prism portions to form an interference pattern on a surface that has a periodicity &Lgr; that is a function of the angle of incidence &thgr; of the incident light beam, with the ratio of &Lgr;:&lgr; being greater than 2:1.
    • 干涉仪装置包括第一棱镜部分和第二棱镜部分。 第一棱镜部分具有半透明表面,光束入射表面和光束出射表面。 光束入射表面以相对于光束入射表面的法线接收入射光束,其入射光束以羔羊的波长并且以入射角θ相对于法线接收。 第二棱镜部分具有对应于第一棱镜部分的半透明表面的表面和对应于第一棱镜部分的光束出射表面的光束出射表面。 第一和第二棱镜部分在第一棱镜部分的半透明表面和对应于半透明表面的第二棱镜部分的表面彼此附接。 半透明表面通过在半透明表面处反射第一光束并使第二光束穿过半透明表面将入射光束分裂成第一和第二光束,使得第二光束进入第二棱镜 一部分。 第一和第二光束各自分别在内部反射到第一和第二棱镜部分并从第一和第二棱镜部分的相应光束出射表面出射,以在具有周期性LAMBD的表面上形成干涉图案 的入射光束的入射角θ,LAMBD:兰比的比值大于2:1。