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    • 1. 发明授权
    • Producing a covered through substrate via using a temporary cap layer
    • 通过使用临时盖层生产覆盖的基板
    • US07704881B2
    • 2010-04-27
    • US12092605
    • 2006-11-03
    • Johan H. KlootwijkAntonius L. A. M. KemmerenRonald DekkerEric Cornelis Egbertus Van GrunsvenFreddy Roozeboom
    • Johan H. KlootwijkAntonius L. A. M. KemmerenRonald DekkerEric Cornelis Egbertus Van GrunsvenFreddy Roozeboom
    • H01L21/44
    • H01L21/76898H01L21/764H01L23/481H01L2924/0002H01L2924/00
    • The present invention relates to a method for producing a substrate with at least one covered via that electrically and preferably also thermally connects a first substrate side with an opposite second substrate side. The processing involves forming a trench on a the first substrate side remains and covering the trench with a permanent layer on top of a temporary, sacrificial cap-layer, which is decomposed in a thermal process step. The method of the invention provides alternative ways to remove decomposition products of the sacrificial cap-layer material without remaining traces or contamination even in the presence of the permanent layer. This is, according to a first aspect of the invention, achieved by providing the substrate trench with an overcoat layer that has holes. The holes in the overcoat layer leave room for the removal of the decomposition products of the cap-layer material. According to the second aspect of the invention, opening the covered trench from the second substrate side and allowing the cap-layer material to be removed through that opening provides a solution. Both methods of the present invention are based on the common idea of using a temporary cap-layer even in a situation where the substrate opening is permanently covered before the removal of the temporary cap-layer.
    • 本发明涉及一种制造具有至少一个覆盖通孔的基板的方法,所述至少一个覆盖通孔电连接并优选地将第一基板侧与相对的第二基板侧热连接。 所述处理涉及在第一基板侧上形成沟槽,并在热处理步骤中分解的临时牺牲盖层的顶部上保留并覆盖具有永久层的沟槽。 本发明的方法提供了即使在存在永久层的情况下除去牺牲帽层材料的分解产物而不留下痕迹或污染物的替代方法。 根据本发明的第一方面,这是通过为基底沟槽提供具有孔的外涂层而实现的。 外涂层中的孔留下去除盖层材料的分解产物的空间。 根据本发明的第二方面,从第二基板侧打开被覆盖的沟槽并且允许通过该开口去除盖层材料提供了一种解决方案。 本发明的两种方法都是基于即使在去除临时盖层之前基材开口被永久地覆盖的情况下使用临时盖层的常见思想。
    • 2. 发明申请
    • Producing a Covered Through Substrate Via Using a Temporary Cap Layer
    • 通过使用临时盖层生成通过基板覆盖
    • US20080280435A1
    • 2008-11-13
    • US12092605
    • 2006-11-03
    • Johan H. KlootwijkAntonius L. A. M. KemmerenRonald DekkerEric Cornelis Egbertus Van GrunsvenFreddy Roozeboom
    • Johan H. KlootwijkAntonius L. A. M. KemmerenRonald DekkerEric Cornelis Egbertus Van GrunsvenFreddy Roozeboom
    • H01L21/768
    • H01L21/76898H01L21/764H01L23/481H01L2924/0002H01L2924/00
    • The present invention relates to a method for producing a substrate with at least one covered via that electrically and preferably also thermally connects a first substrate side with an opposite second substrate side. The processing involves forming a trench on a the first substrate side remains and covering the trench with a permanent layer on top of a temporary, sacrificial cap-layer, which is decomposed in a thermal process step. The method of the invention provides alternative ways to remove decomposition products of the sacrificial cap-layer material without remaining traces or contamination even in the presence of the permanent layer This is, according to a first aspect of the invention, achieved by providing the substrate trench with an overcoat layer that has holes. The holes in the overcoat layer leave room for the removal of the decomposition products of the cap-layer material. According to the second aspect of the invention, opening the covered trench from the second substrate side and allowing the cap-layer material to be removed through that opening provides a solution. Both methods of the present invention are based on the common idea of using a temporary cap-layer even in a situation where the substrate opening is permanently covered before the removal of the temporary cap-layer
    • 本发明涉及一种制造具有至少一个覆盖通孔的基板的方法,所述至少一个覆盖通孔电连接并优选地将第一基板侧与相对的第二基板侧热连接。 所述处理涉及在第一基板侧上形成沟槽,并在热处理步骤中分解的临时牺牲盖层的顶部上保留并覆盖具有永久层的沟槽。 本发明的方法提供了即使在存在永久层的情况下除去牺牲帽层材料的分解产物而不留下痕迹或污染物的替代方法。根据本发明的第一方面,通过提供衬底沟槽 具有孔的外涂层。 外涂层中的孔留下去除盖层材料的分解产物的空间。 根据本发明的第二方面,从第二基板侧打开被覆盖的沟槽并且允许通过该开口去除盖层材料提供了一种解决方案。 本发明的两种方法都是基于即使在基板开口被永久覆盖之前使用临时盖层的常见思想,在移除临时盖层之前
    • 4. 发明申请
    • THROUGH-SUBSTRATE VIA AND REDISTRIBUTION LAYER WITH METAL PASTE
    • 通过基底和重新分配层与金属膏
    • US20110210452A1
    • 2011-09-01
    • US13126286
    • 2009-10-21
    • Freddy RoozeboomEric Cornelis Egbertus Van GrunsvenFranciscus Hubertus Marie SandersMaria Mathea Antonetta Burghoorn
    • Freddy RoozeboomEric Cornelis Egbertus Van GrunsvenFranciscus Hubertus Marie SandersMaria Mathea Antonetta Burghoorn
    • H01L23/48H01L21/768
    • H01L23/49827H01L21/4846H01L23/481H01L2224/02372H01L2224/0401H01L2224/05H01L2224/05548H01L2224/13H01L2224/13022H01L2224/13024H01L2224/14181H01L2924/1301H01L2924/1461H01L2924/00
    • The invention relates to a semiconductor device for use in a stacked configuration of the semiconductor device and a further semiconductor device. The semiconductor device comprises: a substrate (5) comprising at least part of an electronic circuit (7) provided at a first side thereof. The substrate (5) comprises a passivation layer (19) at the first side and a substrate via that extends from the first side to a via depth beyond a depth of the electronic circuit (7) such that it is reconfigurable into a through-substrate via (10) by backside thinning of the substrate (5). The semiconductor device further comprises: a patterned masking layer (15) on the first side of the substrate (5). The patterned masking layer (15) comprises at least a trench (16) extending fully through the patterned masking layer (15). The trench has been filled with a redistribution conductor (20). The substrate via and the redistribution conductor (20) comprise metal paste (MP) and together form one piece. The effect of the features of the semi-conductor device of the invention is that there is no physical interface between those the through-substrate via (10) and the redistribution conductor (20). As a consequence of the invention the parasitic resistance of this electrical connection is reduced, which results in a better electrical performance of the semiconductor device. The invention further relates to a method of manufacturing such semiconductor device. And the invention relates to a semiconductor assembly comprising a stacked configuration of a plurality of such semiconductor devices.
    • 本发明涉及一种用于半导体器件和另一半导体器件的叠层结构的半导体器件。 半导体器件包括:衬底(5),其包括设置在其第一侧的电子电路(7)的至少一部分。 衬底(5)包括在第一侧处的钝化层(19)和衬底通孔,其从第一侧延伸到超过电子电路(7)的深度的通孔深度,使得其可重新配置成贯穿衬底 通过(10)通过衬底(5)的背面变薄。 半导体器件还包括:在衬底(5)的第一侧上的图案化掩模层(15)。 图案化掩模层(15)包括至少一个完全延伸穿过图案化掩模层(15)的沟槽(16)。 沟槽已经填充有再分布导体(20)。 衬底通孔和再分布导体(20)包括金属膏(MP)并且一起形成一片。 本发明的半导体器件的特征的效果在于通孔(10)和再分布导体(20)之间没有物理界面。 作为本发明的结果,该电连接的寄生电阻降低,这导致半导体器件的更好的电性能。 本发明还涉及制造这种半导体器件的方法。 本发明涉及包括多个这样的半导体器件的叠层结构的半导体组件。