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1. 发明申请

US20100128235A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100128235A1
公开(公告)日：2010-05-27
申请号：US12700602
申请日：2010-02-04
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

2. 发明授权

US09110389B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09110389B2
公开(公告)日：2015-08-18
申请号：US13241837
申请日：2011-09-23
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

3. 发明申请

US20120008117A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20120008117A1
公开(公告)日：2012-01-12
申请号：US13240978
申请日：2011-09-22
申请人： Joannes Theodoor DE SMIT , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor DE SMIT , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

4. 发明授权

US08363208B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08363208B2
公开(公告)日：2013-01-29
申请号：US12700602
申请日：2010-02-04
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

5. 发明授权

US07684008B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07684008B2
公开(公告)日：2010-03-23
申请号：US10860662
申请日：2004-06-04
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Marcel Mathijs Theodore Marie Dierichs , Theodorus Marinus Modderman
IPC分类号： G03B27/52 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动成像场和/或相移超声波驻波节点图案。

6. 发明授权

US07317504B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07317504B2
公开(公告)日：2008-01-08
申请号：US10820227
申请日：2004-04-08
申请人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
发明人： Joannes Theodoor De Smit , Vadim Yevgenyevich Banine , Theodorus Hubertus Josephus Bisschops , Theodorus Marinus Modderman , Marcel Mathijs Theodore Marie Dierichs
IPC分类号： G03B27/52 , G03B27/42 , G03B27/32 , G03C5/00 , B06B1/00
CPC分类号： G03F7/70341
摘要： A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection can be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal can be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and phase shifting ultrasonic standing-wave node patterns.
摘要翻译：光刻设备和设备制造方法利用限制在储存器13中的高折射率液体，至少部分地填充投影透镜的最终元件与基板之间的成像场。检测并去除从溶解的大气中的液体中形成的液体或暴露于液体的装置元件的气体排出的气泡，使得它们不会干扰曝光并导致基板上的印刷缺陷。检测可以通过测量液体中超声波衰减的频率依赖性进行，气泡去除可以通过对液体进行脱气和加压来实现，使用低表面张力的液体从大气中分离出液体，从而提供连续的液体流通成像领域和相移超声波驻波节点模式。

7. 发明授权

US06630984B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效
公开(公告)号：US06630984B2
公开(公告)日：2003-10-07
申请号：US09919616
申请日：2001-08-01
申请人： Theodorus Hubertus Josephus Bisschops
发明人： Theodorus Hubertus Josephus Bisschops
IPC分类号： G03B2752
CPC分类号： G03F7/70891 , G03F7/708 , G03F7/70875
摘要： A lithographic projection apparatus including at least one temperature control member that at least partly surrounds at least one component selected from a group comprising mask and substrate tables, the projection system and an isolated reference frame for controlling the temperature of the surrounded components. The surface finish of the member is chosen to help keep the components which it partly surrounds isothermal during operation.

8. 发明授权

US07285785B2 Apparatus with permanent magnetic lenses 有权
标题翻译：带永久磁性镜片的设备
公开(公告)号：US07285785B2
公开(公告)日：2007-10-23
申请号：US11418730
申请日：2006-05-03
申请人： Bart Buijsse , Theodorus Hubertus Josephus Bisschops , Mark Theo Meuwese
发明人： Bart Buijsse , Theodorus Hubertus Josephus Bisschops , Mark Theo Meuwese
IPC分类号： H01J1/50 , H01J37/147 , H01J37/26
CPC分类号： H01J37/143
摘要： The invention describes a particle-optical apparatus arranged to focus a beam (1) of electrically charged particles with the aid of two particle-optical lens systems (10, 20). The lens action is achieved by magnetic fields, which fields are generated by permanent-magnetic materials (13, 23). In contrast to magnetic lenses equipped with a coil, it is not easy in the case of lenses equipped with permanent-magnetic material to alter the focusing magnetic field with the aim of altering the optical power. In an apparatus according to the invention, the optical power of the lens systems is altered by altering the energy with which the beam (1) traverses the lens systems (10, 20). This can easily happen by altering the voltage of electrical power supplies (14, 24).
摘要翻译：本发明描述了一种粒子光学装置，其被布置成借助于两个粒子光学透镜系统（10,20）来聚焦带电粒子的束（1）。透镜作用是通过磁场实现的，这些磁场由永磁材料（13,23）产生。与配备有线圈的磁性透镜相比，在配备永磁材料的透镜的情况下，为了改变光焦度来改变聚焦磁场是不容易的。在根据本发明的装置中，通过改变光束（1）穿过透镜系统（10,20）的能量来改变透镜系统的光焦度。这可以通过改变电源的电压来容易地发生（14,24）。

9. 发明授权

US06740891B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06740891B2
公开(公告)日：2004-05-25
申请号：US09989700
申请日：2001-11-21
申请人： Johannes Cornelis Driessen , Hermanus Mathias Joannes Rene Soemers , Michael Jozefa Mathijs Renkens , Theodorus Hubertus Josephus Bisschops , Johannes Petrus Martinus Bernardus Vermeulen , Antonius Maria Rijken
发明人： Johannes Cornelis Driessen , Hermanus Mathias Joannes Rene Soemers , Michael Jozefa Mathijs Renkens , Theodorus Hubertus Josephus Bisschops , Johannes Petrus Martinus Bernardus Vermeulen , Antonius Maria Rijken
IPC分类号： H01J3720
CPC分类号： G03F7/70691 , G01N23/04 , G03F7/70991
摘要： A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.
摘要翻译：光刻投影设备包括向诸如物体台和/或相关联的电动机和/或传感器的真空室中的部件供应电力的导管。通过与其相关联的对象台具有至少相同数量的自由度的导管导管，将导管屏蔽到暴露于真空。

10. 发明授权

US06538257B2 Method of generating extremely short-wave radiation, and extremely short-wave radiation source unit 失效
标题翻译：产生极短波辐射的方法和极短波辐射源单元
公开(公告)号：US06538257B2
公开(公告)日：2003-03-25
申请号：US09726780
申请日：2000-11-30
申请人： Theodorus Hubertus Josephus Bisschops
发明人： Theodorus Hubertus Josephus Bisschops
IPC分类号： G21G400
CPC分类号： H05G2/001 , B82Y10/00 , G03F7/70033
摘要： A method of generating EUV radiation is described, comprising the steps of: transporting a solid medium (33) through a source space (34) connected to a vacuum pump (35), and irradiating a portion (37) of the medium with an intense, pulsed, laser beam (41) focused on said portion of the medium, thus creating a plasma (47) which emits EUV radiation. To increase the intensity of the EUV radiation and improve the possibility to collect particles (51, 52, 53) released from the medium, at least the medium portions (37) to be irradiated have a concave shape. The method can be improved by embedding the medium in a flow of rare gas. Also described are a EUV radiation source unit for realizing the method and the application of the method in the manufacture of devices such as IC devices, and in a lithographic projection apparatus.
摘要翻译：描述了一种产生EUV辐射的方法，包括以下步骤：将固体介质（33）输送通过连接到真空泵（35）的源空间（34），并用强烈的，脉冲激光束（41）聚焦在介质的所述部分上，从而产生发射EUV辐射的等离子体（47）。为了增加EUV辐射的强度，并提高收集释放的颗粒（51,52,53）的可能性至少所述被照射的介质部（37）从所述介质形成为凹状。该方法可以通过将介质嵌入到稀有气体流中而得到改善。还描述了一种EUV辐射源单元，用于实现该方法在制造诸如IC器件的器件中的方法和应用，并且在光刻投影设备。

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