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1. 发明申请

US20070054050A1 Photoresist coating apparatus and method 审中-公开
标题翻译：光刻胶涂布装置及方法
公开(公告)号：US20070054050A1
公开(公告)日：2007-03-08
申请号：US11372376
申请日：2006-03-10
申请人： Jin Lee , Jun Koo , Seong Kim , Tae Kim , Tae Park , Chang Jung , Dong Lee
发明人： Jin Lee , Jun Koo , Seong Kim , Tae Kim , Tae Park , Chang Jung , Dong Lee
IPC分类号： B05B5/025 , B05C11/02 , C23C16/00
CPC分类号： C23C26/00 , H01L21/6715
摘要： A photoresist coating apparatus and method for solving an edge bead problem occurring in photoresist coating. An edge bead is prevented from occurring by forming a solvent vapor layer from ionized solvent vapor on a wafer through the use of a magnetic field generator, spraying a liquid photoresist on the wafer, and controlling the liquid photoresist to not vaporize more at the edge of the wafer than towards the center thereof. A photoresist coating apparatus includes: a solvent ionizer supplying ionized solvent vapor; and a magnetic field generator forming a solvent vapor layer on a wafer from the ionized solvent vapor.
摘要翻译：一种用于解决在光致抗蚀剂涂层中出现的边缘珠问题的光致抗蚀剂涂覆装置和方法。通过使用磁场发生器，在晶片上喷射液态光致抗蚀剂，并且在液晶光致抗蚀剂的边缘处喷射液态光致抗蚀剂，从而在晶片上形成溶剂蒸汽层晶片比其中心。光致抗蚀剂涂布装置包括：提供离子化溶剂蒸气的溶剂离子发生器; 以及磁场发生器，从电离溶剂蒸气在晶片上形成溶剂蒸汽层。

2. 发明申请

US20070082499A1 Photoresist coating apparatus, medium, and method efficiently spraying photoresist 审中-公开
标题翻译：光刻胶涂布设备，介质和方法有效地喷涂光刻胶
公开(公告)号：US20070082499A1
公开(公告)日：2007-04-12
申请号：US11489465
申请日：2006-07-20
申请人： Chang Jung , Tae Kim , Jin Lee , June Koo
发明人： Chang Jung , Tae Kim , Jin Lee , June Koo
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6715 , G03F7/162
摘要： A photoresist coating apparatus, medium, and method for efficiently spraying a liquid photoresist to maintain an atmosphere of ionized solvent vapor between a substrate and a spray nozzle of an upper portion by using a vapor inducing pipe supplying ionized solvent vapor, with the atmosphere being maintained by differently biasing a lower portion supporting the substrate and a plate of the upper portion. Photoresist can be evenly coated over the entire surface of the substrate while reducing the loss of sprayed photoresist droplets.
摘要翻译：一种光致抗蚀剂涂覆装置，介质和方法，用于通过使用供应离子化溶剂蒸气的蒸气诱导管，保持气氛来有效地喷射液体光致抗蚀剂以保持基板和上部喷嘴之间的离子化溶剂蒸气的气氛通过不同地偏置支撑衬底的下部和上部的板。光致抗蚀剂可以均匀地涂覆在基材的整个表面上，同时减少喷涂的光致抗蚀剂液滴的损失。

3. 发明申请

US20070077352A1 Photoresist coating system and method 审中-公开
标题翻译：光刻胶涂层体系及方法
公开(公告)号：US20070077352A1
公开(公告)日：2007-04-05
申请号：US11511435
申请日：2006-08-29
申请人： June Koo , Tae Kim , Jin Lee , Chang Jung
发明人： June Koo , Tae Kim , Jin Lee , Chang Jung
IPC分类号： B05D3/12 , B05D7/00 , B05C11/02 , B05B7/06
CPC分类号： G03F7/162 , G03F7/168
摘要： A photoresist coating system and method solving an edge bead problem that occurs in photoresist coating by adding at least one of high boiling point solvent, which may generate a film on the surface of a solvent having a higher boiling point than a solvent contained in a liquid photoresist or the surface of the liquid photoresist, or by supplying a surfactant to an edge of the wafer, with the surfactant being combinable with the solvent or capable of forming a film on the solvent.
摘要翻译：一种光致抗蚀剂涂覆系统和方法，其通过加入至少一种高沸点溶剂来解决在光致抗蚀剂涂层中发生的边缘珠粒问题，所述高沸点溶剂可在具有高于沸点的溶剂的表面上产生比液体中所含的溶剂产生的膜光致抗蚀剂或液态光致抗蚀剂的表面，或者通过向晶片的边缘供给表面活性剂，表面活性剂可与溶剂组合或能够在溶剂上形成膜。

4. 发明申请

US20070025708A1 Wafer heating apparatus and method of setting the apparatus 审中-公开
标题翻译：晶圆加热装置及设备的设置方法
公开(公告)号：US20070025708A1
公开(公告)日：2007-02-01
申请号：US11483879
申请日：2006-07-11
申请人： Dong Lee , Tae Kim , Jin Lee
发明人： Dong Lee , Tae Kim , Jin Lee
IPC分类号： F26B19/00 , F26B3/30
CPC分类号： H01L21/67103
摘要： A wafer apparatus including a heating plate, a case supporting and containing the heating plate, pressing arms laid across the case and the heating plate, and arm controlling units vertically moving the pressing arm toward the case. A plurality of the pressing arms and the arm controlling units are disposed along the circumference of the heating plate and may compensate a portion protruded upward due to the warpage of the heating plate by pressurizing. The warpage of the heating plate can be effectively compensated, and a wafer can be heated with a uniform temperature.
摘要翻译：一种晶片装置，包括加热板，支撑并容纳加热板的壳体，跨过壳体的加压臂和加热板，以及将按压臂向壳体垂直移动的臂控制单元。多个按压臂和臂控制单元沿着加热板的圆周设置，并且可以通过加压来补偿由于加热板的翘曲而向上突出的部分。可以有效地补偿加热板的翘曲，并且可以以均匀的温度加热晶片。

5. 发明申请

US20050121098A1 Liquid crystal display panel, method of fabricating the same and apparatus thereof 有权
公开(公告)号：US20050121098A1
公开(公告)日：2005-06-09
申请号：US11039882
申请日：2005-01-24
申请人： Seong Kim , Woo Shin , Hak Lee , Yeong Hwang , Tae Kim
发明人： Seong Kim , Woo Shin , Hak Lee , Yeong Hwang , Tae Kim
IPC分类号： B05D1/06 , B65B1/04 , G02F1/1335 , G02F1/1339 , G02F1/1362
CPC分类号： G02F1/13392 , G02F1/133512 , G02F1/136286
摘要： An apparatus for fabricating a liquid crystal display panel includes a chamber for holding a substrate, wherein the substrate includes first and second metal patterns, a spray nozzle connected to the chamber for spraying spacers onto the substrate, wherein the spacers are charged with a predetermined polarity, and a first power supplier connected to the chamber for applying a first voltage with a positive polarity and a second voltage with a negative polarity to the first and second metal patterns of the substrate.

6. 发明申请

US20050046780A1 Method and apparatus of fabricating liquid crystal display panel 有权
标题翻译：制造液晶显示面板的方法和装置
公开(公告)号：US20050046780A1
公开(公告)日：2005-03-03
申请号：US10927089
申请日：2004-08-27
申请人： Seong Kim , Woo Shin , Yeong Hwang , Tae Kim
发明人： Seong Kim , Woo Shin , Yeong Hwang , Tae Kim
IPC分类号： G02F1/1339
CPC分类号： G02F1/13392 , G02F2202/28
摘要： A method and an apparatus that can fabricate a liquid crystal display panel capable of selectively forming a spacer at a desired area. The inventive apparatus includes a sprayer to spray adhesive spacers over a substrate having at least one metal pattern, a dryer to dry the adhesive spacers, and a blower to selectively remove the adhesive spacers located at a region non-overlapping the metal pattern.
摘要翻译：一种可以制造能够在期望区域选择性地形成间隔物的液晶显示面板的方法和装置。本发明的装置包括喷雾器，用于在具有至少一种金属图案的基底上喷涂粘合剂间隔物，干燥器以干燥粘合剂间隔物，以及鼓风机，以选择性地去除位于不重叠金属图案的区域处的粘合剂间隔物。

7. 发明申请

US20050102854A1 Dryer rack 有权
标题翻译：烘干机架
公开(公告)号：US20050102854A1
公开(公告)日：2005-05-19
申请号：US10958655
申请日：2004-10-06
申请人： Dong Lee , Il Han , Tae Kim
发明人： Dong Lee , Il Han , Tae Kim
IPC分类号： D06F58/04 , F26B11/02 , F26B25/00
CPC分类号： D06F58/04
摘要： A dryer rack for use with an apparatus for drying an object inside a drum is disclosed, wherein the dryer rack includes a platform for having an upper surface for supporting the object. The platform may include at least one grip for loading and unloading the dryer rack into an interior space of the drum. The at least one grip is flush with the upper surface of the platform. The at least one grip is formed in a forward portion of the platform, to be near an access point of the drum.
摘要翻译：公开了一种与用于干燥滚筒内的物体的设备一起使用的烘干机架，其中干燥机架包括用于具有用于支撑物体的上表面的平台。平台可以包括至少一个用于将干衣架装载和卸载到滚筒的内部空间中的把手。至少一个手柄与平台的上表面齐平。至少一个把手形成在平台的前部，靠近滚筒的接近点。

8. 发明申请

US20060224371A1 Information system for metabolic flux analysis using extensible markup language and operating method thereof 失效
标题翻译：使用可扩展标记语言进行代谢通量分析的信息系统及其操作方法
公开(公告)号：US20060224371A1
公开(公告)日：2006-10-05
申请号：US11148907
申请日：2005-06-09
申请人： Sang Lee , Hong Yun , Dong Lee , Seung Lee , Joon Jeong , Tae Kim
发明人： Sang Lee , Hong Yun , Dong Lee , Seung Lee , Joon Jeong , Tae Kim
IPC分类号： G06G7/48 , G06G7/58
CPC分类号： G06F19/26 , G06F19/12
摘要： The present invention relates to an MFA (Metabolic Flux Analysis) information system using an XML (eXtensible Markup Language) and an operating method thereof. More specifically, the invention relates to an MFA information system and an operating method thereof, which generates, edits, stores and visualizes an MFA model feature and an MFA object using XML, and edits, stores and visualizes the result obtained by performing MFA based on the object. The present invention provides the MFA information system and method capable of generating, editing, storing and visualizing MFA model features and MFA objects using XML. Accordingly, MFA can be easily performed by utilizing advantages of XML, such as transplantation, reusability, deciphering, scalability, flexibility and effective data exchange, and thus the present invention can be applied to cell improvement using metabolic engineering.
摘要翻译：本发明涉及使用XML（可扩展标记语言）的MFA（代谢通量分析）信息系统及其操作方法。更具体地，本发明涉及一种MFA信息系统及其操作方法，其使用XML生成，编辑，存储和可视化MFA模型特征和MFA对象，并且通过执行MFA获得的结果进行编辑，存储和可视化物体。本发明提供了能够使用XML来生成，编辑，存储和可视化MFA模型特征和MFA对象的MFA信息系统和方法。因此，通过利用移植，可重用性，解密，可扩展性，灵活性和有效的数据交换等XML的优点，可以容易地实现MFA，因此本发明可以应用于使用代谢工程的细胞改良。

9. 发明申请

US20060293376A1 Benzopyran derivatives substituted with a benzimidazole derviative, pharmaceutically acceptable salts thereof, their preparations and pharmaceutical compositions containing them 失效
标题翻译：被苯并咪唑衍生物取代的苯并吡喃衍生物，其药学上可接受的盐，其制剂和含有它们的药物组合物
公开(公告)号：US20060293376A1
公开(公告)日：2006-12-28
申请号：US10558020
申请日：2004-05-28
申请人： Hong Lim , Dong Lee , San Kim , Sung-Eun Yoo , Kyu Yi , Sun Lee , Jee Suh , Nak Kim , Sun Hwang , Tae Kim , Byung Lee , Ho-Won Seo
发明人： Hong Lim , Dong Lee , San Kim , Sung-Eun Yoo , Kyu Yi , Sun Lee , Jee Suh , Nak Kim , Sun Hwang , Tae Kim , Byung Lee , Ho-Won Seo
IPC分类号： A61K31/4184 , C07D405/04
CPC分类号： C07D405/04 , C07D405/14
摘要： The present invention relates to benzopyran derivatives substituted with a benzimidazole derivative, or pharmaceutically acceptable salts thereof, a preparation method of the same and pharmarceutical compositions containing them. Benzopyran derivatives substituted with a benzimidazole derivative, represented in Formula (1), have the function of protecting heart from ischemia-reperfusion without side effect like vasodilation, so that a pharmaceutical composition containing benzopyran derivatives substituted with a benzimidazole derivative or pharmaceutically acceptable salts thereof of the present invention as an effective ingredient can be effectively used for the protection of tissues influenced by ischemia-reperfusion, for example, for the protection of heart, nervous cells, brain, retinal cells, storage organs, etc. and for the treatment of diseases caused by ischemia-reperfusion.
摘要翻译：本发明涉及被苯并咪唑衍生物取代的苯并吡喃衍生物或其药学上可接受的盐，其制备方法和含有它们的药物组合物。由式（1）表示的苯并咪唑衍生物取代的苯并吡喃衍生物具有保护心脏免于缺血再灌注而无副作用如血管舒张的功能，因此含有苯并咪唑衍生物或其药学上可接受的盐取代的苯并吡喃衍生物的药物组合物作为有效成分的本发明可以有效地用于保护受缺血再灌注影响的组织，例如用于保护心脏，神经细胞，脑，视网膜细胞，储存器官等，并用于治疗疾病由缺血再灌注引起。

10. 发明申请

US20060223264A1 Method of fabricating flash memory device 失效
标题翻译：制造闪存设备的方法
公开(公告)号：US20060223264A1
公开(公告)日：2006-10-05
申请号：US11297147
申请日：2005-12-07
申请人： Jeong Park , Tae Kim , Dong Lee
发明人： Jeong Park , Tae Kim , Dong Lee
IPC分类号： H01L21/336
CPC分类号： H01L27/11526 , H01L27/105 , H01L27/11546
摘要： A method of fabricating a flash memory device includes defining a high voltage region and a low voltage region on a substrate. The high voltage region provides an area for one or more first transistors configured to operation at a first voltage, the low voltage region providing an area for one or more second transistors configured to operation at a second voltage that is lower than the first voltage, each first transistor having a gate and a source/drain region on each side of the gate. A first impurity region is formed as part of the source/drain region, the first impurity region having a first depth from an upper surface of the substrate, the first impurity region being of first conductivity having a first impurity concentration. A second impurity is formed as part of the source/drain region, the second impurity region having a second depth from the upper surface of the substrate that is less than first depth, the second impurity region being of the first conductivity and having a second impurity concentration that is greater than the first impurity concentration. Impurities of second conductivity are implanted into the source/drain region.
摘要翻译：制造闪速存储器件的方法包括在衬底上限定高电压区域和低电压区域。所述高电压区域为配置成在第一电压下操作的一个或多个第一晶体管提供一个区域，所述低电压区域提供一个或多个第二晶体管的区域，所述第二晶体管被配置为在低于所述第一电压的第二电压下工作，第一晶体管在栅极的每一侧具有栅极和源极/漏极区域。第一杂质区域形成为源极/漏极区域的一部分，第一杂质区域具有从衬底的上表面的第一深度，第一杂质区域具有第一杂质浓度的第一导电性。第二杂质形成为源极/漏极区的一部分，第二杂质区具有比衬底的上表面小于第一深度的第二深度，第二杂质区具有第一导电性且具有第二杂质浓度大于第一杂质浓度。将第二导电性杂质注入源/漏区。

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