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1. 发明申请

US20120015502A1 p-GaN Fabrication Process Utilizing a Dedicated Chamber and Method of Minimizing Magnesium Redistribution for Sharper Decay Profile 审中-公开
标题翻译：利用专用室的p-GaN制造工艺和最小化镁再分布的方法，用于更陡峭的衰变曲线
公开(公告)号：US20120015502A1
公开(公告)日：2012-01-19
申请号：US13174530
申请日：2011-06-30
申请人： Jie Cui , David Bour , Wei-Yung Hsu
发明人： Jie Cui , David Bour , Wei-Yung Hsu
IPC分类号： H01L21/20 , C23C16/00
CPC分类号： H01L21/0254 , C30B25/02 , C30B29/403 , H01L21/02458 , H01L21/02505 , H01L21/02579 , H01L21/0262
摘要： Methods and systems for the fabrication of p-GaN, and related, films utilizing a dedicated chamber in a multi-chamber tool are described. Also described are methods of fabricating a magnesium doped group III-V material layer, such as a GaN layer, with a sharp magnesium decay profile.
摘要翻译：描述了利用多室工具中的专用室制造p-GaN和相关薄膜的方法和系统。还描述了制造具有尖锐的镁衰变曲线的掺杂镁的III-V族材料层（例如GaN层）的方法。

2. 发明申请

US20120052216A1 GAS DISTRIBUTION SHOWERHEAD WITH HIGH EMISSIVITY SURFACE 审中-公开
标题翻译：具有高功率表面的气体分配淋浴
公开(公告)号：US20120052216A1
公开(公告)日：2012-03-01
申请号：US13154060
申请日：2011-06-06
申请人： Hiroji Hanawa , Kyawwin Jason Maung , Hua Chung , Jie Cui , David Bour , Wei-Yung Hsu , Liang-Yuh Chen
发明人： Hiroji Hanawa , Kyawwin Jason Maung , Hua Chung , Jie Cui , David Bour , Wei-Yung Hsu , Liang-Yuh Chen
IPC分类号： C23C16/48
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/481 , C23C16/52
摘要： Embodiments of the present invention provide methods and apparatus for surface coatings applied to process chamber components utilized in chemical vapor deposition processes. In one embodiment, the apparatus provides a showerhead apparatus comprising a body, a plurality of conduits extending through the body, each of the plurality of conduits having an opening extending to a processing surface of the body, and a coating disposed on the processing surface, the coating being about 50 microns to about 200 microns thick and comprising a coefficient of emissivity of about 0.8, an average surface roughness of about 180 micro-inches to about 220 micro-inches, and a porosity of about 15% or less.
摘要翻译：本发明的实施例提供了应用于化学气相沉积工艺中使用的处理腔室部件的表面涂层的方法和装置。在一个实施例中，该装置提供一种喷头装置，其包括主体，延伸穿过主体的多个导管，多个导管中的每一个具有延伸到主体的处理表面的开口，以及设置在处理表面上的涂层，该涂层为约50微米至约200微米厚，并且包括约0.8的发射率系数，约180微英寸至约220微英寸的平均表面粗糙度，以及约15％或更小的孔隙率。

3. 发明申请

US20120234238A1 INTEGRATED METROLOGY FOR WAFER SCREENING 审中-公开
标题翻译：用于筛选筛选的综合方程
公开(公告)号：US20120234238A1
公开(公告)日：2012-09-20
申请号：US13419121
申请日：2012-03-13
申请人： Wei-Yung Hsu , Hua Chung , Ting-Ruei Shiu , Jie Cui
发明人： Wei-Yung Hsu , Hua Chung , Ting-Ruei Shiu , Jie Cui
IPC分类号： C23C16/52 , G01N3/00
CPC分类号： G01N3/20 , G01N3/068 , G01N3/12 , G01N2203/0282 , H01L21/67109 , H01L21/67115 , H01L21/67207 , H01L21/67288 , H01L21/67754 , H01L21/68764 , H01L21/68771
摘要： Integrated wafer or substrate bow measurement modules are described. For example, a multi-chamber system includes a chamber housing a bow measurement module. In another example, a method of pre-screening a wafer includes inserting a wafer or a substrate into a multi-chamber system. A bow parameter of the wafer or the substrate is measured in a bow measurement module housed in a chamber of the multi-chamber system.
摘要翻译：描述了集成的晶片或衬底弓测量模块。例如，多室系统包括容纳弓测量模块的腔室。在另一示例中，预筛选晶片的方法包括将晶片或基板插入多室系统中。在容纳在多室系统的室中的弓测量模块中测量晶片或基板的弓形参数。

4. 发明申请

US20120315741A1 ENHANCED MAGNESIUM INCORPORATION INTO GALLIUM NITRIDE FILMS THROUGH HIGH PRESSURE OR ALD-TYPE PROCESSING 审中-公开
标题翻译：通过高压或ALD型加工将增强的镁合金纳入氮化铝膜
公开(公告)号：US20120315741A1
公开(公告)日：2012-12-13
申请号：US13485671
申请日：2012-05-31
申请人： Jie Su , Jiang Lu , Hua Chung , Wei-Yung Hsu , David Bour
发明人： Jie Su , Jiang Lu , Hua Chung , Wei-Yung Hsu , David Bour
IPC分类号： H01L21/20
CPC分类号： H01L21/02579 , H01L21/0237 , H01L21/0254 , H01L21/0262
摘要： Enhanced magnesium incorporation into gallium nitride films through high pressure or ALD-type processing is described. In an example, a method of fabricating a group III-nitride film includes flowing a group III precursor, a nitrogen precursor, and a p-type dopant precursor into a reaction chamber having a substrate therein. A p-type doped group III-nitride layer is formed in the reaction chamber, above the substrate, while a total pressure in the reaction chamber is approximately in the range of 300-760 Torr.
摘要翻译：描述了通过高压或ALD型处理将镁掺入到氮化镓膜中。在一个实例中，制造III族氮化物膜的方法包括使III族前体，氮前体和p型掺杂剂前体流入具有衬底的反应室中。在反应室中形成p型掺杂III族氮化物层，同时反应室中的总压力大约在300-760乇的范围内。

5. 发明申请

US20110308551A1 METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CHAMBER CLEANING GAS 有权
标题翻译：用于诱导加工室清洁气体的涡流的方法和装置
公开(公告)号：US20110308551A1
公开(公告)日：2011-12-22
申请号：US13041230
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J.K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J.K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
IPC分类号： B08B9/00 , B08B3/04
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

6. 发明申请

US20120235115A1 GROWTH OF III-V LED STACKS USING NANO MASKS 审中-公开
标题翻译：使用NANO MASKS的III-V LED堆叠的增长
公开(公告)号：US20120235115A1
公开(公告)日：2012-09-20
申请号：US13355255
申请日：2012-01-20
申请人： Sang Won Kang , Jie Su , Tuoh-Bin NG , David Bour , Wei-Yung Hsu
发明人： Sang Won Kang , Jie Su , Tuoh-Bin NG , David Bour , Wei-Yung Hsu
IPC分类号： H01L21/205 , C23C16/34 , C23C16/52 , H01L33/06
CPC分类号： H01L33/007 , H01L21/0237 , H01L21/02458 , H01L21/0254 , H01L21/0262 , H01L21/02639 , H01L21/0265 , H01L33/02 , H01L33/20
摘要： Methods, semiconductor material stacks and equipment for manufacture of light emitting diodes (LEDs) with improve crystal quality. A growth stopper is deposited between nuclei for a group III-V material, such as GaN, to form a nano mask. The group III-V material is laterally overgrown from a region of the nuclei not covered by the nano mask to form a continuous material layer with reduced dislocation density in preparation for subsequent growth of n-type and p-type layers of the LED. The lateral overgrowth from the nuclei may further recover the surface morphology of the buffer layer despite the presence of the nano mask. Presence of the growth stopper may further result in void formation on a substrate side of an LED stack to improve light extraction efficiency.
摘要翻译：方法，用于制造具有改善晶体质量的发光二极管（LED）的半导体材料堆叠和设备。在诸如GaN的III-V族材料的核之间沉积生长塞，以形成纳米掩模。 III-V族材料从未被纳米掩模覆盖的核的区域横向长满，以形成具有降低的位错密度的连续材料层，以准备LED的n型和p型层的随后生长。即使存在纳米掩模，来自核的侧向过度生长也可进一步恢复缓冲层的表面形态。生长停止剂的存在可能进一步导致在LED堆叠的衬底侧上的空隙形成以提高光提取效率。

7. 发明授权

US08910644B2 Method and apparatus for inducing turbulent flow of a processing chamber cleaning gas 有权
标题翻译：用于引起处理室清洁气体的紊流的方法和装置
公开(公告)号：US08910644B2
公开(公告)日：2014-12-16
申请号：US13041230
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
发明人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
IPC分类号： B08B3/02 , B08B5/00 , C23C16/44 , C23C16/455 , H01L21/02 , H01L21/67
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

8. 外观设计

USD664170S1 Cleaning plate for inducing turbulent flow of a processing chamber cleaning glass 有权
标题翻译：用于引起处理室清洁玻璃的湍流的清洁板
公开(公告)号：USD664170S1
公开(公告)日：2012-07-24
申请号：US29386850
申请日：2011-03-04
申请人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya
设计人： Hua Chung , Xizi Dong , Kyawwin Jason Maung , Hiroji Hanawa , Sang Won Kang , David H. Quach , Donald J. K. Olgado , David Bour , Wei-Yung Hsu , Alexander Tam , Anzhong Chang , Sumedh Acharya

9. 发明申请

US20110253685A1 LASER PROCESSING SYSTEM WITH VARIABLE BEAM SPOT SIZE 审中-公开
标题翻译：具有可变光束尺寸的激光加工系统
公开(公告)号：US20110253685A1
公开(公告)日：2011-10-20
申请号：US13076422
申请日：2011-03-30
申请人： Wei-Yung Hsu , Antoine P. Manens
发明人： Wei-Yung Hsu , Antoine P. Manens
IPC分类号： B23K26/00
CPC分类号： B23K26/046 , B23K26/364 , B23K26/40 , B23K2103/16 , B23K2103/42 , B23K2103/50
摘要： Systems for scribing a workpiece incorporate a motorized beam expander to change a laser beam spot size incident on a workpiece. A system includes a frame, a laser coupled with the frame and generating an output to remove material from at least a portion of a workpiece, a beam expander positioned along a path of the laser output and having a motorized mechanism operable to vary a beam expansion ratio applied to the laser output, and at least one scanning device coupled with the frame and operable to control a position of the laser output, after expansion, on the workpiece. The motorized beam expander can be used to selectively vary the width of a laser beam supplied to a scanning device so as to selectively vary the size of the laser beam incident on the workpiece. Alternatively, a variable aperture can be used instead of a beam expander.
摘要翻译：用于对工件进行划线的系统包括电动束扩张器以改变入射在工件上的激光束斑点尺寸。一种系统包括框架，激光器与框架耦合并且产生输出以从工件的至少一部分移除材料;沿着激光输出路径定位的光束扩展器，并具有可操作以改变光束膨胀的电动机构以及至少一个与框架耦合的扫描装置，并可操作以控制激光输出在膨胀之后在工件上的位置。电动光束扩展器可以用于选择性地改变提供给扫描装置的激光束的宽度，以便选择性地改变入射在工件上的激光束的尺寸。或者，可以使用可变光圈来代替光束扩展器。

10. 发明申请

US20110198322A1 IN-LINE METROLOGY METHODS AND SYSTEMS FOR SOLAR CELL FABRICATION 审中-公开
标题翻译：用于太阳能电池制造的在线计量方法和系统
公开(公告)号：US20110198322A1
公开(公告)日：2011-08-18
申请号：US12851471
申请日：2010-08-05
申请人： Antoine P. Manens , Ting-Ruei Shiu , Bassam Shamoun , Wei-Yung Hsu , Manivannan Thothadri
发明人： Antoine P. Manens , Ting-Ruei Shiu , Bassam Shamoun , Wei-Yung Hsu , Manivannan Thothadri
IPC分类号： B23K26/00 , G01J1/42 , H04N7/18
CPC分类号： B23K26/048 , B23K26/032 , B23K26/0673 , B23K26/082 , B23K26/083 , B23K26/364 , B23K26/40 , B23K26/705 , B23K2103/172 , H01L31/046 , H01L31/0463 , Y02E10/50
摘要： In-line metrology methods and systems for use with laser-scribing systems used in solar-cell fabrication are disclosed. Such methods and systems can involve a variety of components, for example, a device for measuring the amount of power input to a laser, a power meter for measuring laser output power, a beam viewer for measuring aspects of a laser beam, a height sensor for measuring a workpiece height, a microscope for measuring workpiece features formed by the laser-scribing system, and a system for monitoring a laser-scribing system and annunciating a warning(s) and/or an error message(s) when operational limits are exceeded. In-line metrology methods can also include the processing of output beam reflections so as to track beam drift over time and/or provide for focusing of an imaging device.
摘要翻译：公开了用于太阳能电池制造中使用的激光划线系统的在线测量方法和系统。这样的方法和系统可以涉及各种部件，例如，用于测量激光输入功率的装置，用于测量激光输出功率的功率计，用于测量激光束的方面的光束观察器，高度传感器用于测量工件高度的显微镜，用于测量由激光划线系统形成的工件特征的显微镜，以及用于监视激光划线系统的系统，并且当操作限度为...时，发出警告和/或错误消息超过了在线测量方法还可以包括输出光束反射的处理，以便随时间跟踪光束漂移和/或提供成像装置的聚焦。

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