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1. 发明授权

US06451222B1 Ferroelectric composition, ferroelectric vapor deposition target and method of making a ferroelectric vapor deposition target 失效
公开(公告)号：US06451222B1
公开(公告)日：2002-09-17
申请号：US09465546
申请日：1999-12-16
申请人： Jianxing Li , Tim Scott , Tamara White
发明人： Jianxing Li , Tim Scott , Tamara White
IPC分类号： C04B3501
CPC分类号： C23C14/3414 , C04B35/462 , C23C14/08 , Y10S977/775 , Y10S977/777 , Y10S977/838 , Y10S977/891
摘要： The invention comprises ferroelectric vapor deposition targets and to methods of making ferroelectric vapor deposition targets. In one implementation, a ferroelectric physical vapor deposition target has a predominate grain size of less than or equal to 1.0 micron, and has a density of at least 95% of maximum theoretical density. In one implementation, a method of making a ferroelectric physical vapor deposition target includes positioning a prereacted ferroelectric powder within a hot press cavity. The prereacted ferroelectric powder predominately includes individual prereacted ferroelectric particles having a maximum straight linear dimension of less than or equal to about 100 nanometers. The prereacted ferroelectric powder is hot pressed within the cavity into a physical vapor deposition target of desired shape having a density of at least about 95% of maximum theoretical density and a predominate maximum grain size which is less than or equal to 1.0 micron. In one implementation, the prereacted ferroelectric powder is hot pressed within the cavity into a physical vapor deposition target of desired shape at a maximum pressing temperature which is at least 200° C. lower than would be required to produce a target of a first density of at least 85% of maximum theoretical density in hot pressing the same powder but having a predominate particle size maximum straight linear dimension of at least 1.0 micron at the same pressure and for the same amount of time, and a target density greater than the first density at the lower pressing temperature is achieved.

2. 发明授权

US06815084B1 Discontinuous high-modulus fiber metal matrix composite for thermal management applications 失效
标题翻译：不连续的高模量纤维金属基复合材料用于热管理应用
公开(公告)号：US06815084B1
公开(公告)日：2004-11-09
申请号：US10405863
申请日：2003-04-01
申请人： Tim Scott , Tamara White , Jianxing Li
发明人： Tim Scott , Tamara White , Jianxing Li
IPC分类号： B32B508
CPC分类号： H01J37/3435 , C22C47/00 , C23C14/3414 , H01L23/06 , H01L23/3733 , H01L23/3736 , H01L2224/16 , H01L2224/73253 , H01L2924/01057 , H01L2924/01079 , H01L2924/04941 , H01L2924/16152 , Y10T428/12007 , Y10T428/12465 , Y10T428/12486 , Y10T428/12528 , Y10T428/249924
摘要： The invention includes the use of a high-modulus fiber metal matrix composite material as a backing plate for physical vapor deposition targets, as a lid for microelectronics packages, as a heat spreader, and as a heat sink. In one implementation, copper-coated carbon fibers are mixed with copper powder. In another implementation, the mixture is consolidated to a carbon fiber metal matrix composite by using a vacuum hot press. The resultant backing plate has a coefficient of thermal expansion of 4.9×10−6/C, thermal conductivity of at least 300 W/mK, density of greater than 99% of theoretical, and the composite material of the backing plate is 30% lighter than Cu while also having higher stiffness than Cu. The high-modulus fiber metal matrix composite backing plate can be used for high power W, Ta, and ceramic PVD targets.
摘要翻译：本发明包括使用高模量纤维金属基复合材料作为物理气相沉积靶的背板，作为微电子封装的盖子，作为散热器，以及作为散热器。在一个实施方案中，将铜包覆的碳纤维与铜粉末混合。在另一个实施方案中，通过使用真空热压机将混合物固结成碳纤维金属基质复合材料。所得的背板的热膨胀系数为4.9×10 -6 /℃，导热率为至少300W / mK，密度大于理论值的99％，背板的复合材料为30％比Cu轻，同时具有比Cu更高的刚度。高模量纤维金属基复合背板可用于大功率W，Ta和陶瓷PVD靶。

3. 发明授权

US06746619B2 Ferroelectric vapor deposition targets 失效
标题翻译：铁电气相沉积靶
公开(公告)号：US06746619B2
公开(公告)日：2004-06-08
申请号：US10422112
申请日：2003-04-23
申请人： Jianxing Li , Tim Scott , Tamara White
发明人： Jianxing Li , Tim Scott , Tamara White
IPC分类号： C04B35001
CPC分类号： C23C14/3414 , C04B35/462 , C23C14/08 , Y10S977/775 , Y10S977/777 , Y10S977/838 , Y10S977/891
摘要： The invention includes a ferroelectric physical vapor deposition target having a predominate grain size of less than or equal to 1.0 micron, and a density of at least 95% of maximum theoretical density. A method of making the target includes hot pressing a prereacted ferroelectric powder predominately including individual prereacted ferroelectric particles having a maximum straight linear dimension of less than or equal to 100 nanometers to form a physical vapor deposition target of desired shape. In one implementation, the prereacted ferroelectric powder is hot pressed at a maximum pressing temperature which is at least 200° C. lower than would be required to produce at least 85% of maximum theoretical density in hot pressing the same powder but having a predominate particle size maximum straight linear dimension of at least 1.0 micron at the same pressure and for the same amount of time.
摘要翻译：本发明包括具有小于或等于1.0微米的主要晶粒尺寸和最大理论密度的至少95％的密度的铁电物理气相沉积靶。制造目标的方法包括热压预先反应的铁电粉末，主要包括具有小于或等于100纳米的最大直线尺寸的单个预反应铁电粒子，以形成所需形状的物理气相沉积靶。在一个实施方案中，将预反应的铁电粉末以最大压制温度进行热压，所述最高压制温度比在相同粉末热挤压但具有主要颗粒的产生至少85％的最大理论密度所需的最低压力温度尺寸最大直线尺寸在相同的压力下和相同的时间量为至少1.0微米。

4. 发明授权

US06596139B2 Discontinuous high-modulus fiber metal matrix composite for physical vapor deposition target backing plates and other thermal management applications 失效
公开(公告)号：US06596139B2
公开(公告)日：2003-07-22
申请号：US09765526
申请日：2001-01-19
申请人： Tim Scott , Tamara White , Jianxing Li
发明人： Tim Scott , Tamara White , Jianxing Li
IPC分类号： C23C1434
CPC分类号： H01J37/3435 , C22C47/00 , C23C14/3414 , H01L23/06 , H01L23/3733 , H01L23/3736 , H01L2224/16 , H01L2224/73253 , H01L2924/01057 , H01L2924/01079 , H01L2924/04941 , H01L2924/16152 , Y10T428/12007 , Y10T428/12465 , Y10T428/12486 , Y10T428/12528 , Y10T428/249924
摘要： The invention includes the use of a high-modulus fiber metal matrix composite material as a backing plate for physical vapor deposition targets, as a lid for microelectronics packages, as a heat spreader, and as a heat sink. In one implementation, copper-coated carbon fibers are mixed with copper powder. In another implementation, the mixture is consolidated to a carbon fiber metal matrix composite by using a vacuum hot press. The resultant backing plate has a coefficient of thermal expansion of 4.9×10−6/C, thermal conductivity of at least 300 W/mK, density of greater than 99% of theoretical, and the composite material of the backing plate is 30% lighter than Cu while also having higher stiffness than Cu. The high-modulus fiber metal matrix composite backing plate can be used for high power W, Ta, and ceramic PVD targets.

5. 发明授权

US06579467B2 Ferroelectric composition, ferroelectric vapor deposition target and method of making a ferroelectric vapor deposition target 失效
公开(公告)号：US06579467B2
公开(公告)日：2003-06-17
申请号：US10143318
申请日：2002-05-08
申请人： Jianxing Li , Tim Scott , Tamara White
发明人： Jianxing Li , Tim Scott , Tamara White
IPC分类号： C04B3501
CPC分类号： C23C14/3414 , C04B35/462 , C23C14/08 , Y10S977/775 , Y10S977/777 , Y10S977/838 , Y10S977/891
摘要： The invention comprises ferroelectric vapor deposition targets and to methods of making ferroelectric vapor deposition targets. In one implementation, a ferroelectric physical vapor deposition target has a predominate grain size of less than or equal to 1.0 micron, and has a density of at least 95% of maximum theoretical density. In one implementation, a method of making a ferroelectric physical vapor deposition target includes positioning a prereacted ferroelectric powder within a hot press cavity. The prereacted ferroelectric powder predominately includes individual prereacted ferroelectric particles having a maximum straight linear dimension of less than or equal to about 100 nanometers. The prereacted ferroelectric powder is hot pressed within the cavity into a physical vapor deposition target of desired shape having a density of at least about 95% of maximum theoretical density and a predominate maximum grain size which is less than or equal to 1.0 micron. In one implementation, the prereacted ferroelectric powder is hot pressed within the cavity into a physical vapor deposition target of desired shape at a maximum pressing temperature which is at least 200° C. lower than would be required to produce a target of a first density of at least 85% of maximum theoretical density in hot pressing the same powder but having a predominate particle size maximum straight linear dimension of at least 1.0 micron at the same pressure and for the same amount of time, and a target density greater than the first density at the lower pressing temperature is achieved.

6. 发明授权

US06596131B1 Carbon fiber and copper support for physical vapor deposition target assembly and method of forming 失效
标题翻译：碳纤维和铜支撑物理气相沉积靶组装及成型方法
公开(公告)号：US06596131B1
公开(公告)日：2003-07-22
申请号：US09702156
申请日：2000-10-30
申请人： Tim Scott , Jianxing Li
发明人： Tim Scott , Jianxing Li
IPC分类号： C23C1434
CPC分类号： C23C14/3407
摘要： The invention includes a method of forming an assembly of a physical vapor deposition target and support. A physical vapor deposition target is provided. The physical vapor deposition target has a coefficient of thermal expansion of less than 10×10−6K−1. The physical vapor deposition target is joined to a support. The support comprises a thermal coefficient of expansion of less than 11×10−6K−1. The invention also includes an assembly comprising a physical vapor deposition target and a support joined to the physical vapor deposition target. The support comprises carbon fibers and copper.
摘要翻译：本发明包括形成物理气相沉积靶和支撑体的组件的方法。提供物理气相沉积靶。物理气相沉积靶的热膨胀系数小于10×10-6K-1。物理气相沉积靶与载体连接。支撑体的热膨胀系数小于11×10-6K-1。本发明还包括一种组件，其包括物理气相沉积靶和连接到物理气相沉积靶的载体。载体包括碳纤维和铜。

7. 发明申请

US20130045131A1 Lead-Free Solder Compositions 审中-公开
标题翻译：无铅焊料组合物
公开(公告)号：US20130045131A1
公开(公告)日：2013-02-21
申请号：US13586074
申请日：2012-08-15
申请人： Jianxing Li , Michael R. Pinter , David E. Steele
发明人： Jianxing Li , Michael R. Pinter , David E. Steele
IPC分类号： B23K35/24 , B22D18/00 , C22C18/04
CPC分类号： B23K35/282 , B23K35/025 , C22C1/02 , C22C18/04 , Y10T428/12
摘要： A solder may include zinc, aluminum, magnesium and gallium. The zinc may be present in an amount from about 82% to 96% by weight of the solder. The aluminum may be present in an amount from about 3% to about 15% by weight of the solder. The magnesium may be present in an amount from about 0.5% to about 1.5% by weight of the solder. The gallium may be present in an amount between about 0.5% to about 1.5% by weight of the solder.
摘要翻译：焊料可以包括锌，铝，镁和镓。锌可以以焊料重量的约82％至96％的量存在。铝可以以焊料重量的约3％至约15％的量存在。镁可以以焊料重量的约0.5％至约1.5％的量存在。镓可以以焊料重量的约0.5％至约1.5％的量存在。

8. 发明授权

US06277254B1 Ceramic compositions, physical vapor deposition targets and methods of forming ceramic compositions 失效
标题翻译：陶瓷组合物，物理气相沉积靶和形成陶瓷组合物的方法
公开(公告)号：US06277254B1
公开(公告)日：2001-08-21
申请号：US09465554
申请日：1999-12-16
申请人： Qi Tan , Jianxing Li
发明人： Qi Tan , Jianxing Li
IPC分类号： C23C1400
CPC分类号： C23C16/409 , C04B35/491 , C23C14/3414
摘要： The invention includes a method for forming a ceramic composition. Materials comprising lead, zirconium, titanium and bismuth are combined together to form a mixture. At least one of the materials is provided in the mixture as a nanophase powder. The mixture is then densified to form the ceramic composition. The invention also includes a method for forming a dense ferroelectric ceramic composition. Lead, zirconium, titanium and bismuth are combined together to form a mixture. The mixture is then densified to form a ferroelectric ceramic composition having a density of greater than or equal to 95% of a theoretical maximum density for the composition. A predominate portion of the composition has a grain size of less than or equal to about 500 nanometers. The invention also includes a ferroelectric ceramic composition comprising lead, zirconium, titanium and bismuth. Such composition has a density of greater than or equal to 95% of a theoretical maximum density for the composition, and a predominate portion of the composition has a grain size of less than or equal to about 500 nanometers.
摘要翻译：本发明包括形成陶瓷组合物的方法。将包含铅，锆，钛和铋的材料组合在一起形成混合物。在混合物中至少提供一种材料作为纳米相粉末。然后将混合物致密化以形成陶瓷组合物。本发明还包括形成致密铁电陶瓷组合物的方法。铅，锆，钛和铋组合在一起形成混合物。然后将混合物致密化以形成密度大于或等于组合物的理论最大密度的95％的铁电陶瓷组合物。组合物的主要部分具有小于或等于约500纳米的粒度。本发明还包括包含铅，锆，钛和铋的铁电陶瓷组合物。这种组合物具有大于或等于组合物的理论最大密度的95％的密度，并且组合物的主要部分具有小于或等于约500纳米的晶粒尺寸。

9. 发明授权

US07153468B2 Physical vapor deposition targets and methods of formation 失效
标题翻译：物理气相沉积目标和形成方法
公开(公告)号：US07153468B2
公开(公告)日：2006-12-26
申请号：US10344772
申请日：2001-08-16
申请人： Vasanth Mohan , Jianxing Li , Timothy A. Scott
发明人： Vasanth Mohan , Jianxing Li , Timothy A. Scott
IPC分类号： B22F3/12 , C22C1/05
CPC分类号： C23C14/3414 , Y10T428/12014 , Y10T428/31678
摘要： A method includes combining a solid first material and a solid second material and melting at least a portion of the first material sufficient to coat the second material and any remaining first material. An approximately homogenous distribution of the second material can be formed throughout the liquid phase of the first material. The first material liquid phase can then be solidified to define a composite target blank exhibiting an approximately homogenous distribution of the solid second material in a matrix of the solidified first material. The first material can comprise SE and the second material can comprise Ge and/or Ag. The composite target blank can include at least about 50 vol % matrix. The first and second materials can be powdered metals. Accordingly, a physical vapor deposition target can include a matrix of a first material and an approximately homogenous distribution of particles of a second material throughout the first material matrix. The second material can include powders exhibiting particles sizes no greater than about 325 mesh.
摘要翻译：一种方法包括组合固体第一材料和固体第二材料，并熔化足以涂覆第二材料和任何剩余的第一材料的第一材料的至少一部分。可以在第一材料的整个液相中形成大致均匀的第二材料分布。然后可以将第一材料液相固化以限定在固化的第一材料的基质中显示固体第二材料的大致均匀分布的复合靶材坯料。第一材料可以包括SE，第二材料可以包括Ge和/或Ag。复合靶材坯料可以包括至少约50vol％的基体。第一和第二种材料可以是金属粉末。因此，物理气相沉积靶可以包括第一材料的基体和第二材料的颗粒在整个第一材料基体中的大致均匀分布。第二种材料可以包括表现出不大于约325目的颗粒尺寸的粉末。

10. 发明授权

US06797079B2 Physical vapor deposition target 失效
标题翻译：物理气相沉积靶
公开(公告)号：US06797079B2
公开(公告)日：2004-09-28
申请号：US09783835
申请日：2001-02-14
申请人： Shozo Nagano , Hinrich Hargarter , Jianxing Li , Jane Buehler
发明人： Shozo Nagano , Hinrich Hargarter , Jianxing Li , Jane Buehler
IPC分类号： C23C1400
CPC分类号： C22C9/00 , C22C5/08 , C22C9/02 , C23C14/3414 , C25D7/12 , H01L23/53233 , H01L23/53238 , H01L2924/0002 , H01L2924/00
摘要： A physical vapor deposition target includes an alloy of copper and silver, with the silver being present in the alloy at from less than 1.0 at % to 0.001 at %. In one implementation, a physical vapor deposition target includes an alloy of copper and silver, with the silver being present in the alloy at from 50 at % to 70 at %. A physical vapor deposition target includes an alloy of copper and tin, with tin being present in the alloy at from less than 1.0 at % to 0.001 at %. In one implementation, a conductive integrated circuit metal alloy interconnection includes an alloy of copper and silver, with the silver being present in the alloy at from less than 1.0 at % to 0.001 at %. A conductive integrated circuit metal alloy interconnection includes an alloy of copper and silver, with the silver being present in the alloy at from 50 at % to 70 at %. A conductive integrated circuit metal alloy interconnection includes an alloy of copper and tin, with tin being present in the alloy at from less than 1.0 at % to 0.001 at %. Other useable copper alloys include an alloy of copper and one or more other elements, the one or more other elements being present in the alloy at a total concentration from less than 1.0 at % to 0.001 at % and being selected from the group consisting of Be, Ca, Sr, Ba, Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Ti, Zr, Hf, Zn, Cd, B, Ga, In, C, Se, Te, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ni, Pd, Pt, Au, Tl, and Pb. An electroplating anode is formed to comprise one or more of the above alloys.
摘要翻译：物理气相沉积靶包括铜和银的合金，合金中的银以小于1.0原子％至0.001原子％存在。在一个实施方案中，物理气相沉积靶包括铜和银的合金，合金中的银以50at％至70at％存在。物理气相沉积靶包括铜和锡的合金，锡在合金中以小于1.0原子％至0.001原子％存在。在一个实施方式中，导电集成电路金属合金互连包括铜和银的合金，合金中的银以小于1.0原子％至0.001原子％存在。导电集成电路金属合金互连包括铜和银的合金，合金中的银以50原子％至70原子％存在。导电集成电路金属合金互连包括铜和锡的合金，合金中存在锡小于1.0原子％至0.001原子％。其他可用的铜合金包括铜和一种或多种其它元素的合金，所述一种或多种其它元素以小于1.0原子％至0.001原子％的总浓度存在于合金中，并且选自Be ，Ca，Sr，Ba，Sc，Y，La，Ce，Pr，Nd，Pm，Sm，Eu，Gd，Tb，Dy，Ho，Er，Tm，Yb，Lu，Ti，Zr，Hf，Zn，Cd ，B，Ga，In，C，Se，Te，V，Nb，Ta，Cr，Mo，W，Mn，Tc，Re，Fe，Ru，Os，Co，Rh，Ni，Pd，Pt，Au，，和Pb。形成电镀阳极以包含一种或多种上述合金。

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