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1. 发明授权

US07153468B2 Physical vapor deposition targets and methods of formation 失效
标题翻译：物理气相沉积目标和形成方法
公开(公告)号：US07153468B2
公开(公告)日：2006-12-26
申请号：US10344772
申请日：2001-08-16
申请人： Vasanth Mohan , Jianxing Li , Timothy A. Scott
发明人： Vasanth Mohan , Jianxing Li , Timothy A. Scott
IPC分类号： B22F3/12 , C22C1/05
CPC分类号： C23C14/3414 , Y10T428/12014 , Y10T428/31678
摘要： A method includes combining a solid first material and a solid second material and melting at least a portion of the first material sufficient to coat the second material and any remaining first material. An approximately homogenous distribution of the second material can be formed throughout the liquid phase of the first material. The first material liquid phase can then be solidified to define a composite target blank exhibiting an approximately homogenous distribution of the solid second material in a matrix of the solidified first material. The first material can comprise SE and the second material can comprise Ge and/or Ag. The composite target blank can include at least about 50 vol % matrix. The first and second materials can be powdered metals. Accordingly, a physical vapor deposition target can include a matrix of a first material and an approximately homogenous distribution of particles of a second material throughout the first material matrix. The second material can include powders exhibiting particles sizes no greater than about 325 mesh.
摘要翻译：一种方法包括组合固体第一材料和固体第二材料，并熔化足以涂覆第二材料和任何剩余的第一材料的第一材料的至少一部分。可以在第一材料的整个液相中形成大致均匀的第二材料分布。然后可以将第一材料液相固化以限定在固化的第一材料的基质中显示固体第二材料的大致均匀分布的复合靶材坯料。第一材料可以包括SE，第二材料可以包括Ge和/或Ag。复合靶材坯料可以包括至少约50vol％的基体。第一和第二种材料可以是金属粉末。因此，物理气相沉积靶可以包括第一材料的基体和第二材料的颗粒在整个第一材料基体中的大致均匀分布。第二种材料可以包括表现出不大于约325目的颗粒尺寸的粉末。

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