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1. 发明申请

US20100009482A1 PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：光电组合物，形成金属图案的方法以及使用其制造显示基板的方法
公开(公告)号：US20100009482A1
公开(公告)日：2010-01-14
申请号：US12419764
申请日：2009-04-07
申请人： Jeong-Min PARK , Jung-Soo LEE , Doo-Hee JUNG , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH , Sang-Won SON , Young-Jin KIM
发明人： Jeong-Min PARK , Jung-Soo LEE , Doo-Hee JUNG , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH , Sang-Won SON , Young-Jin KIM
IPC分类号： H01L21/02 , G03F7/004 , G03F7/20
CPC分类号： H01L27/1288 , G03F7/0226 , G03F7/40 , H01L21/32139 , H01L27/1214
摘要： A photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15 % by weight of a curing agent, and a remainder of an organic solvent. A method of forming a metal pattern includes coating a photoresist composition on a base substrate having a metal layer, and forming a first photoresist film. The photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15% by weight of a curing agent, and a remainder of an organic solvent. The first photoresist film is patterned, and forms a first photo pattern. The base substrate having the first photo pattern is heated, and forms a first baked pattern. The metal layer is patterned using the first baked pattern, and forms a metal pattern.
摘要翻译：光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，以及剩余的有机溶剂。形成金属图案的方法包括在具有金属层的基底衬底上涂覆光致抗蚀剂组合物，并形成第一光致抗蚀剂膜。光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，剩余的有机溶剂。对第一光致抗蚀剂膜进行图案化，并形成第一照相图案。具有第一照片图案的基底基板被加热，并形成第一烘烤图案。使用第一烘烤图案对金属层进行图案化，并形成金属图案。

2. 发明申请

US20070259272A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR SUBSTRATE USING THE SAME 有权
标题翻译：光电组合物及其制造方法使用薄膜晶体管基板
公开(公告)号：US20070259272A1
公开(公告)日：2007-11-08
申请号：US11554194
申请日：2006-10-30
申请人： Hi-Kuk LEE , Woo-Seok JEON , Doo-Hee JUNG , Jeong-Min PARK , Deok-Man KANG , Si-Young JUNG , Jae-Young CHOI
发明人： Hi-Kuk LEE , Woo-Seok JEON , Doo-Hee JUNG , Jeong-Min PARK , Deok-Man KANG , Si-Young JUNG , Jae-Young CHOI
IPC分类号： G03C5/00
CPC分类号： H01L27/1288 , G03F7/0233 , G03F7/0236 , H01L27/1214
摘要： A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. A content of the acryl resin is about 1% to about 15% by weight based on a total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.
摘要翻译：光致抗蚀剂组合物包括约100重量份的包括酚醛清漆树脂和丙烯酸树脂的树脂混合物和约10重量份至约50重量份的萘醌重氮磺酸酯。酚醛清漆树脂的重均分子量不小于约30,000。丙烯酸树脂的重均分子量不小于约20,000。基于树脂混合物的总重量，丙烯酸树脂的含量为约1重量％至约15重量％。当使用光致抗蚀剂组合物形成的光致抗蚀剂膜被加热时，光致抗蚀剂组合物的轮廓变化相对较小。因此，残留的光致抗蚀剂膜具有均匀的厚度，并且可能减小TFT基板中的短路和/或开路缺陷。

3. 发明申请

US20090227058A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：光电组合物及使用其制造阵列基板的方法
公开(公告)号：US20090227058A1
公开(公告)日：2009-09-10
申请号：US12347202
申请日：2008-12-31
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Byung-Uk KIM , Dong-Min KIM
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Byung-Uk KIM , Dong-Min KIM
IPC分类号： H01L21/027 , G03F7/004
CPC分类号： G03F7/0236
摘要： A photoresist composition includes; a novolac resin prepared from a phenol compound, wherein the m-cresol constitutes about 70% to about 85% by weight of the weight of the phenol compound, a diazide compound, and an organic solvent.
摘要翻译：光致抗蚀剂组合物包括：由酚化合物制备的酚醛清漆树脂，其中间甲酚构成酚化合物，重氮化合物和有机溶剂的重量的约70重量％至约85重量％。

4. 发明申请

US20090042127A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME 有权
标题翻译：光电组合物及其形成使用其的光电子图案的方法
公开(公告)号：US20090042127A1
公开(公告)日：2009-02-12
申请号：US12059113
申请日：2008-03-31
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
IPC分类号： G03F7/027
CPC分类号： G03F7/038 , Y10S430/121 , Y10S430/123 , Y10S430/128
摘要： A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.
摘要翻译：光致抗蚀剂组合物包含约0.5至约20重量份的光酸发生剂，约10至约70重量份的含有羟基的酚醛清漆树脂，约1至约40重量份的交联剂，包括烷氧基甲基蜜胺化合物和约10至约150重量份的溶剂。

5. 发明申请

US20090269920A1 METHOD OF FORMING INTERCONNECTION LINE AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE 审中-公开
标题翻译：形成互连线的方法和制造薄膜晶体管基板的方法
公开(公告)号：US20090269920A1
公开(公告)日：2009-10-29
申请号：US12420783
申请日：2009-04-08
申请人： Jeong-Min PARK , Hi-Kuk Lee , Doo-Hee Jung
发明人： Jeong-Min PARK , Hi-Kuk Lee , Doo-Hee Jung
IPC分类号： H01L21/336 , H01L23/52
CPC分类号： H01L21/76873 , H01L21/0272 , H01L21/76804 , H01L21/76843 , H01L21/76879 , H01L27/124 , H01L27/1248
摘要： A method of forming an interconnection line and a method of manufacturing a thin film transistor substrate are provided in accordance with one or more embodiments of the present invention. The method of forming an interconnection line in accordance with one or more embodiments of the present invention includes preparing a substrate, forming a lower organic layer and an upper organic layer on the substrate in lamination, forming trenches in parts of the upper organic layer and the lower organic layer, forming a lower interconnection layer in the trenches formed in parts of the lower organic layer, removing the upper organic layer, and filling the trenches formed in parts of the lower organic layer with an upper interconnection layer.
摘要翻译：根据本发明的一个或多个实施例，提供形成互连线的方法和制造薄膜晶体管基板的方法。根据本发明的一个或多个实施例的形成互连线的方法包括在层压中制备衬底，在衬底上形成下有机层和上有机层，在上有机层的一部分中形成沟槽，在下部有机层的一部分形成的沟槽中形成下部布线层，除去上部有机层，以及在上部互连层上填充下部有机层的部分的沟槽。

6. 发明申请

US20090184325A1 METHOD OF PLANARIZING SUBSTRATE, ARRAY SUBSTRATE AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：基板平面化方法，阵列基板及使用其制造阵列基板的方法
公开(公告)号：US20090184325A1
公开(公告)日：2009-07-23
申请号：US12331044
申请日：2008-12-09
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Young-Wook LEE
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Young-Wook LEE
IPC分类号： H01L33/00 , B44C1/22 , H01L21/336
CPC分类号： H01L21/2686 , H01L21/31058 , H01L27/1248 , H01L29/78636
摘要： A method of planarizing a substrate. An organic layer is formed on a base substrate to cover a metal line formed on the base substrate. A portion of the organic layer is removed to form a pre-planarization layer exposing the metal layer, so that a surface of the base substrate having the metal line is planarized. The pre-planarization layer is cured to flow toward a side surface of the metal line to form a planarization layer making contact with the side surface of the metal line. Therefore, a stepped portion between the base substrate and the metal line can be minimized or substantially eliminated, thereby increasing the surface uniformity of a subsequent layer, thereby improving the reliability of the manufacturing process.
摘要翻译：平面化基板的方法。在基底基板上形成有机层，以覆盖形成在基底基板上的金属线。去除有机层的一部分以形成暴露金属层的预平坦化层，使得具有金属线的基底基板的表面被平坦化。固化预平坦化层以朝金属线的侧面流动，形成与金属线的侧面接触的平坦化层。因此，可以将基底基板与金属线之间的阶梯部分最小化或基本上消除，从而提高后续层的表面均匀性，从而提高制造工艺的可靠性。

7. 发明申请

US20080024415A1 DISPLAY PANEL, MASK AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：显示面板，掩模及其制造方法
公开(公告)号：US20080024415A1
公开(公告)日：2008-01-31
申请号：US11782236
申请日：2007-07-24
申请人： Doo-Hee JUNG , Jeong-Min PARK , Kyung-Su MUN , Hi-Kuk LEE , Joo-Ae YOUN
发明人： Doo-Hee JUNG , Jeong-Min PARK , Kyung-Su MUN , Hi-Kuk LEE , Joo-Ae YOUN
IPC分类号： G09G3/36 , H01L21/84
CPC分类号： G02F1/13454 , G02F2001/133388 , G02F2001/136236
摘要： A display panel includes a substrate, signal lines, a thin film transistor, a pixel electrode and a dummy opening. The substrate has a display area and a peripheral area surrounding the display area. The signal lines are disposed on the substrate and intersect each other to define a unit pixel. The thin film transistor is electrically connected to the signal lines and disposed at the unit pixel. The pixel electrode is electrically connected to the thin film transistor. The pixel electrode is formed in the unit pixel. The dummy opening is disposed at the peripheral area and spaced apart from the signal lines.
摘要翻译：显示面板包括基板，信号线，薄膜晶体管，像素电极和虚拟开口。基板具有显示区域和围绕显示区域的周边区域。信号线设置在基板上并彼此相交以限定单位像素。薄膜晶体管电连接到信号线并且设置在单位像素处。像素电极电连接到薄膜晶体管。像素电极形成在单位像素中。虚设开口设置在周边区域并与信号线间隔开。

8. 发明申请

US20100283932A1 DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：显示基板及其制造方法
公开(公告)号：US20100283932A1
公开(公告)日：2010-11-11
申请号：US12841554
申请日：2010-07-22
申请人： Doo-Hee JUNG , Kyung-Su MUN , Jeong-Min PARK , Joo-Han KIM , Joo-Ae YOUN
发明人： Doo-Hee JUNG , Kyung-Su MUN , Jeong-Min PARK , Joo-Han KIM , Joo-Ae YOUN
IPC分类号： G02F1/136
CPC分类号： G02F1/1362 , G02F1/13458 , G02F2001/136231
摘要： A display substrate includes a first metal pattern, a first insulating layer, a first electrode, and a second metal pattern. The first metal pattern includes a gate line and a signal line. The first insulating layer is disposed on a substrate having the first metal pattern formed thereon. A first opening passes through the first insulating layer to partially expose the signal line. The first electrode is disposed on the first insulating layer corresponding to a unit pixel. The second metal pattern includes a connection electrode contacting the first electrode and the signal line through the first opening and a data line.
摘要翻译：显示基板包括第一金属图案，第一绝缘层，第一电极和第二金属图案。第一金属图案包括栅极线和信号线。第一绝缘层设置在其上形成有第一金属图案的基板上。第一开口穿过第一绝缘层以部分地暴露信号线。第一电极设置在对应于单位像素的第一绝缘层上。第二金属图案包括通过第一开口接触第一电极和信号线的连接电极和数据线。

9. 发明申请

US20080192164A1 DISPLAY SUBSTRATE AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：显示基板及其制造方法
公开(公告)号：US20080192164A1
公开(公告)日：2008-08-14
申请号：US12027607
申请日：2008-02-07
申请人： Doo-Hee JUNG , Kyung-Su MUN , Jeong-Min PARK , Joo-Han KIM , Joo-Ae YOUN
发明人： Doo-Hee JUNG , Kyung-Su MUN , Jeong-Min PARK , Joo-Han KIM , Joo-Ae YOUN
IPC分类号： G02F1/136
CPC分类号： G02F1/1362 , G02F1/13458 , G02F2001/136231
摘要： A display substrate includes a first metal pattern, a first insulating layer, a first electrode, and a second metal pattern. The first metal pattern includes a gate line and a signal line. The first insulating layer is disposed on a substrate having the first metal pattern formed thereon. A first opening passes through the first insulating layer to partially expose the signal line. The first electrode is disposed on the first insulating layer corresponding to a unit pixel. The second metal pattern includes a connection electrode contacting the first electrode and the signal line through the first opening and a data line.
摘要翻译：显示基板包括第一金属图案，第一绝缘层，第一电极和第二金属图案。第一金属图案包括栅极线和信号线。第一绝缘层设置在其上形成有第一金属图案的基板上。第一开口穿过第一绝缘层以部分地暴露信号线。第一电极设置在对应于单位像素的第一绝缘层上。第二金属图案包括通过第一开口接触第一电极和信号线的连接电极和数据线。

10. 发明申请

US20110284853A1 DISPLAY SUBSTRATE, AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：显示基板及其制造方法
公开(公告)号：US20110284853A1
公开(公告)日：2011-11-24
申请号：US13082275
申请日：2011-04-07
申请人： Jeong-Min PARK , Jung-Soo Lee
发明人： Jeong-Min PARK , Jung-Soo Lee
IPC分类号： H01L27/15 , H01L33/18
CPC分类号： H01L27/1244 , G02F1/13458 , H01L27/1225 , H01L27/1288
摘要： A display substrate, a display device having the same and a method of manufacturing the display substrate are provided. The display substrate includes a base substrate having a pixels-populated area (PA) and a surrounding area (SA) outside the PA, a first contact pad portion formed in the surrounding area, a second contact pad portion formed in the surrounding area formed to be spaced apart from the first contact pad portion with a spacing region provided therebetween, an insulating layer formed in the spacing region between the first and second contact pad portions and having a thickness smaller than or equal to a thickness of each of the first and second contact pad portions, and a first conductive film formed on the first and second pad portions.
摘要翻译：提供了显示基板，具有该显示基板的显示装置和制造该显示基板的方法。显示基板包括具有在PA外部的像素填充区域（PA）和周围区域（SA）的基底基板，形成在周围区域中的第一接触焊盘部分，形成在周围区域中的第二接触焊盘部分，形成为与第一接触焊盘部分间隔开间隔开的间隔区域，形成在第一和第二接触焊盘部分之间的间隔区域中的绝缘层，其厚度小于或等于第一和第二接触焊盘部分的厚度接触焊盘部分和形成在第一和第二焊盘部分上的第一导电膜。

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