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1. 发明申请

US20090042127A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME 有权
标题翻译：光电组合物及其形成使用其的光电子图案的方法
公开(公告)号：US20090042127A1
公开(公告)日：2009-02-12
申请号：US12059113
申请日：2008-03-31
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Hyoc-Min YOUN , Ki-Hyuk KOO
IPC分类号： G03F7/027
CPC分类号： G03F7/038 , Y10S430/121 , Y10S430/123 , Y10S430/128
摘要： A photoresist composition comprises about 0.5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent.
摘要翻译：光致抗蚀剂组合物包含约0.5至约20重量份的光酸发生剂，约10至约70重量份的含有羟基的酚醛清漆树脂，约1至约40重量份的交联剂，包括烷氧基甲基蜜胺化合物和约10至约150重量份的溶剂。

2. 发明申请

US20090227058A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：光电组合物及使用其制造阵列基板的方法
公开(公告)号：US20090227058A1
公开(公告)日：2009-09-10
申请号：US12347202
申请日：2008-12-31
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Byung-Uk KIM , Dong-Min KIM
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Byung-Uk KIM , Dong-Min KIM
IPC分类号： H01L21/027 , G03F7/004
CPC分类号： G03F7/0236
摘要： A photoresist composition includes; a novolac resin prepared from a phenol compound, wherein the m-cresol constitutes about 70% to about 85% by weight of the weight of the phenol compound, a diazide compound, and an organic solvent.
摘要翻译：光致抗蚀剂组合物包括：由酚化合物制备的酚醛清漆树脂，其中间甲酚构成酚化合物，重氮化合物和有机溶剂的重量的约70重量％至约85重量％。

3. 发明申请

US20070259272A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR SUBSTRATE USING THE SAME 有权
标题翻译：光电组合物及其制造方法使用薄膜晶体管基板
公开(公告)号：US20070259272A1
公开(公告)日：2007-11-08
申请号：US11554194
申请日：2006-10-30
申请人： Hi-Kuk LEE , Woo-Seok JEON , Doo-Hee JUNG , Jeong-Min PARK , Deok-Man KANG , Si-Young JUNG , Jae-Young CHOI
发明人： Hi-Kuk LEE , Woo-Seok JEON , Doo-Hee JUNG , Jeong-Min PARK , Deok-Man KANG , Si-Young JUNG , Jae-Young CHOI
IPC分类号： G03C5/00
CPC分类号： H01L27/1288 , G03F7/0233 , G03F7/0236 , H01L27/1214
摘要： A photoresist composition includes about 100 parts by weight of resin mixture including novolak resin and acryl resin and about 10 parts to about 50 parts by weight of naphthoquinone diazosulfonic acid ester. A weight-average molecular weight of the novolak resin is no less than about 30,000. A weight-average molecular weight of the acryl resin is no less than about 20,000. A content of the acryl resin is about 1% to about 15% by weight based on a total weight of the resin mixture. When a photoresist film formed using the photoresist composition is heated, a profile variation of the photoresist composition is relatively small. Therefore, a residual photoresist film has a uniform thickness, and a short circuit and/or an open defect in a TFT substrate may be reduced.
摘要翻译：光致抗蚀剂组合物包括约100重量份的包括酚醛清漆树脂和丙烯酸树脂的树脂混合物和约10重量份至约50重量份的萘醌重氮磺酸酯。酚醛清漆树脂的重均分子量不小于约30,000。丙烯酸树脂的重均分子量不小于约20,000。基于树脂混合物的总重量，丙烯酸树脂的含量为约1重量％至约15重量％。当使用光致抗蚀剂组合物形成的光致抗蚀剂膜被加热时，光致抗蚀剂组合物的轮廓变化相对较小。因此，残留的光致抗蚀剂膜具有均匀的厚度，并且可能减小TFT基板中的短路和/或开路缺陷。

4. 发明申请

US20100009482A1 PHOTORESIST COMPOSITION, METHOD OF FORMING A METAL PATTERN, AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：光电组合物，形成金属图案的方法以及使用其制造显示基板的方法
公开(公告)号：US20100009482A1
公开(公告)日：2010-01-14
申请号：US12419764
申请日：2009-04-07
申请人： Jeong-Min PARK , Jung-Soo LEE , Doo-Hee JUNG , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH , Sang-Won SON , Young-Jin KIM
发明人： Jeong-Min PARK , Jung-Soo LEE , Doo-Hee JUNG , Hi-Kuk LEE , Deok-Man KANG , Sae-Tae OH , Sang-Won SON , Young-Jin KIM
IPC分类号： H01L21/02 , G03F7/004 , G03F7/20
CPC分类号： H01L27/1288 , G03F7/0226 , G03F7/40 , H01L21/32139 , H01L27/1214
摘要： A photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15 % by weight of a curing agent, and a remainder of an organic solvent. A method of forming a metal pattern includes coating a photoresist composition on a base substrate having a metal layer, and forming a first photoresist film. The photoresist composition includes 5% to 50% by weight of an alkali-soluble resin, 0.5% to 30% by weight of a quinone diazide compound, 0.1% to 15% by weight of a curing agent, and a remainder of an organic solvent. The first photoresist film is patterned, and forms a first photo pattern. The base substrate having the first photo pattern is heated, and forms a first baked pattern. The metal layer is patterned using the first baked pattern, and forms a metal pattern.
摘要翻译：光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，以及剩余的有机溶剂。形成金属图案的方法包括在具有金属层的基底衬底上涂覆光致抗蚀剂组合物，并形成第一光致抗蚀剂膜。光致抗蚀剂组合物包含5重量％至50重量％的碱溶性树脂，0.5重量％至30重量％的醌二叠氮化合物，0.1重量％至15重量％的固化剂，剩余的有机溶剂。对第一光致抗蚀剂膜进行图案化，并形成第一照相图案。具有第一照片图案的基底基板被加热，并形成第一烘烤图案。使用第一烘烤图案对金属层进行图案化，并形成金属图案。

5. 发明申请

US20090184325A1 METHOD OF PLANARIZING SUBSTRATE, ARRAY SUBSTRATE AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：基板平面化方法，阵列基板及使用其制造阵列基板的方法
公开(公告)号：US20090184325A1
公开(公告)日：2009-07-23
申请号：US12331044
申请日：2008-12-09
申请人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Young-Wook LEE
发明人： Jeong-Min PARK , Doo-Hee JUNG , Hi-Kuk LEE , Young-Wook LEE
IPC分类号： H01L33/00 , B44C1/22 , H01L21/336
CPC分类号： H01L21/2686 , H01L21/31058 , H01L27/1248 , H01L29/78636
摘要： A method of planarizing a substrate. An organic layer is formed on a base substrate to cover a metal line formed on the base substrate. A portion of the organic layer is removed to form a pre-planarization layer exposing the metal layer, so that a surface of the base substrate having the metal line is planarized. The pre-planarization layer is cured to flow toward a side surface of the metal line to form a planarization layer making contact with the side surface of the metal line. Therefore, a stepped portion between the base substrate and the metal line can be minimized or substantially eliminated, thereby increasing the surface uniformity of a subsequent layer, thereby improving the reliability of the manufacturing process.
摘要翻译：平面化基板的方法。在基底基板上形成有机层，以覆盖形成在基底基板上的金属线。去除有机层的一部分以形成暴露金属层的预平坦化层，使得具有金属线的基底基板的表面被平坦化。固化预平坦化层以朝金属线的侧面流动，形成与金属线的侧面接触的平坦化层。因此，可以将基底基板与金属线之间的阶梯部分最小化或基本上消除，从而提高后续层的表面均匀性，从而提高制造工艺的可靠性。

6. 发明申请

US20080024415A1 DISPLAY PANEL, MASK AND METHOD OF MANUFACTURING THE SAME 有权
标题翻译：显示面板，掩模及其制造方法
公开(公告)号：US20080024415A1
公开(公告)日：2008-01-31
申请号：US11782236
申请日：2007-07-24
申请人： Doo-Hee JUNG , Jeong-Min PARK , Kyung-Su MUN , Hi-Kuk LEE , Joo-Ae YOUN
发明人： Doo-Hee JUNG , Jeong-Min PARK , Kyung-Su MUN , Hi-Kuk LEE , Joo-Ae YOUN
IPC分类号： G09G3/36 , H01L21/84
CPC分类号： G02F1/13454 , G02F2001/133388 , G02F2001/136236
摘要： A display panel includes a substrate, signal lines, a thin film transistor, a pixel electrode and a dummy opening. The substrate has a display area and a peripheral area surrounding the display area. The signal lines are disposed on the substrate and intersect each other to define a unit pixel. The thin film transistor is electrically connected to the signal lines and disposed at the unit pixel. The pixel electrode is electrically connected to the thin film transistor. The pixel electrode is formed in the unit pixel. The dummy opening is disposed at the peripheral area and spaced apart from the signal lines.
摘要翻译：显示面板包括基板，信号线，薄膜晶体管，像素电极和虚拟开口。基板具有显示区域和围绕显示区域的周边区域。信号线设置在基板上并彼此相交以限定单位像素。薄膜晶体管电连接到信号线并且设置在单位像素处。像素电极电连接到薄膜晶体管。像素电极形成在单位像素中。虚设开口设置在周边区域并与信号线间隔开。

7. 发明申请

US20120270142A1 PHOTOSENSITIVE COMPOSITION AND METHOD OF MANUFACTURING A SUBSTRATE FOR A DISPLAY DEVICE USING THE SAME 审中-公开
标题翻译：感光性组合物及使用该显影装置制造基板的方法
公开(公告)号：US20120270142A1
公开(公告)日：2012-10-25
申请号：US13358385
申请日：2012-01-25
申请人： Hi-Kuk LEE , Su-Yeon SIM , Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Byung-Uk KIM , Jin-Sun KIM , Tae-Hoon YEO , Hyoc-Min YOUN , Sang-Hoon LEE
发明人： Hi-Kuk LEE , Su-Yeon SIM , Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Byung-Uk KIM , Jin-Sun KIM , Tae-Hoon YEO , Hyoc-Min YOUN , Sang-Hoon LEE
IPC分类号： G03F7/20 , G03F7/031
CPC分类号： G03F7/031 , G03F7/0007 , G03F7/033 , G03F7/105 , G03F7/2053
摘要： A photosensitive composition and a method of manufacturing a substrate used for a display device are disclosed. The photosensitive composition includes an acrylic based copolymer, a photo-initiator, a photo-sensitizer and a solvent. Thus, a photosensitivity of the photosensitive composition for ultra violet light of a long wavelength may be improved.
摘要翻译：公开了一种光敏组合物和用于显示装置的基板的制造方法。光敏组合物包括丙烯酸类共聚物，光引发剂，光敏剂和溶剂。因此，可以提高光敏组合物对长波长紫外线的光敏性。

8. 发明申请

US20110199620A1 METHOD OF DETERMINING AN OVERLAP DISTANCE OF AN OPTICAL HEAD AND DIGITAL EXPOSURE DEVICE USING THE METHOD 有权
标题翻译：使用该方法确定光头和数字曝光装置的重叠距离的方法
公开(公告)号：US20110199620A1
公开(公告)日：2011-08-18
申请号：US12902745
申请日：2010-10-12
申请人： Sang-Hyun YUN , Hi-Kuk LEE , Sang-Woo BAE , Cha-Dong KIM , Jung-In PARK
发明人： Sang-Hyun YUN , Hi-Kuk LEE , Sang-Woo BAE , Cha-Dong KIM , Jung-In PARK
IPC分类号： G01B11/14
CPC分类号： G01B11/14 , G03F7/70291 , G03F7/70475
摘要： An apparatus and a method for determining an overlap distance of an optical head is disclosed. Positions and light amount distributions of each light spot can be measured, which may be provided from an optical head to a substrate. Gaussian distribution may be applied to the positions and the light amount distributions to calculate a compensation model of each of the light spots. A first accumulated light amount corresponding to each first area of the substrate may be calculated if the optical head is scanning along a first direction of the substrate using the compensation model. A second accumulated light amount corresponding to each second area overlapped with the each first area is calculated if the optical head is scanning along the first direction, which is moved in a second direction by a first distance using the compensation model. An overlap distance may be determined based on a uniformity of summations of the first and second accumulated light amount.
摘要翻译：公开了一种用于确定光学头的重叠距离的装置和方法。可以测量每个光点的位置和光量分布，其可以从光学头到基底提供。高斯分布可以应用于位置和光量分布，以计算每个光点的补偿模型。如果光头使用补偿模型沿着衬底的第一方向扫描，则可以计算对应于衬底的每个第一区域的第一累积光量。如果光头沿着使用补偿模型沿第二方向在第二方向上移动第一距离的第一方向进行扫描，则计算与每个第一区域重叠的每个第二区域对应的第二累积光量。可以基于第一和第二累积光量的相加的均匀性来确定重叠距离。

9. 发明申请

US20110171581A1 PHOTORESIST COMPOSTION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：光刻胶组合物及使用其制造阵列基板的方法
公开(公告)号：US20110171581A1
公开(公告)日：2011-07-14
申请号：US13050522
申请日：2011-03-17
申请人： Hi-Kuk LEE , Sang-Hyun YUN , Min-Soo LEE , Deok-Man KANG , Sae-Tae OH , Jae-Young CHOI
发明人： Hi-Kuk LEE , Sang-Hyun YUN , Min-Soo LEE , Deok-Man KANG , Sae-Tae OH , Jae-Young CHOI
IPC分类号： G03F7/004
CPC分类号： H01L27/1288 , G03F7/0233 , H01L27/1214
摘要： A photoresist composition includes a binder resin, a photo acid generator, an acryl resin having four different types of monomers, and a solvent.
摘要翻译：光致抗蚀剂组合物包括粘合剂树脂，光酸产生剂，具有四种不同类型的单体的丙烯酸树脂和溶剂。

10. 发明申请

US20110230019A1 METHOD OF MANUFACTURING A THIN-FILM TRANSISTOR AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 有权
标题翻译：制造薄膜晶体管的方法和使用其制造显示器基板的方法
公开(公告)号：US20110230019A1
公开(公告)日：2011-09-22
申请号：US12900936
申请日：2010-10-08
申请人： Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Hi-Kuk LEE
发明人： Sang-Hyun YUN , Cha-Dong KIM , Jung-In PARK , Hi-Kuk LEE
IPC分类号： H01L21/336
CPC分类号： H01L27/1288 , H01L27/1214
摘要： An approach for patterning and etching without a mask is provided in a manufacturing a thin-film transistor, a gate electrode, a gate insulating layer, a semiconductor layer, an ohmic contact layer and source metal layer of a substrate. A first photoresist pattern including a first photo pattern and a second photo pattern is formed using a digital exposure device by generating a plurality of spot beams, the first photo pattern is formed to a first region of the base substrate and has a first thickness, and the second photo pattern is formed to a second region adjacent to the first region, and has a second thickness and a width in a range of about 50% to about 60% of a diameter of the spot beam. The source metal layer is patterned to form a source electrode and a drain electrode, and the source electrode and the drain electrode are spaced apart from each other in the first region of an active pattern.
摘要翻译：在制造薄膜晶体管，栅极电极，栅极绝缘层，半导体层，欧姆接触层和源极金属层的衬底的制造中提供了用于没有掩模的图案化和蚀刻的方法。使用数字曝光装置通过产生多个点光来形成包括第一照片图案和第二照片图案的第一光致抗蚀剂图案，第一照片图案形成于基底基板的第一区域并具有第一厚度，并且第二照片图案形成在与第一区域相邻的第二区域上，并且具有第二厚度和在点光束直径的约50％至约60％的范围内的宽度。图案化源极金属层以形成源电极和漏电极，并且源电极和漏电极在活性图案的第一区域中彼此间隔开。

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