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1. 外观设计

USD614152S1 Substrate transfer device for semiconductor deposition apparatus 有权
标题翻译：半导体沉积装置用基板转印装置
公开(公告)号：USD614152S1
公开(公告)日：2010-04-20
申请号：US29331021
申请日：2009-01-16
申请人： Jeong Ho Lee , Sang Jin Jeong , Young Seok Choi
设计人： Jeong Ho Lee , Sang Jin Jeong , Young Seok Choi

2. 发明授权

US09062375B2 Lateral flow atomic layer deposition apparatus and atomic layer deposition method using the same 有权
标题翻译：横流原子层沉积装置和使用其的原子层沉积方法
公开(公告)号：US09062375B2
公开(公告)日：2015-06-23
申请号：US13587061
申请日：2012-08-16
申请人： Woo Chan Kim , Jeong Ho Lee , Sang Jin Jeong , Hyun Soo Jang
发明人： Woo Chan Kim , Jeong Ho Lee , Sang Jin Jeong , Hyun Soo Jang
IPC分类号： C23C16/00 , C23C16/455
CPC分类号： C23C16/45527 , C23C16/45504 , C23C16/45548 , C23C16/4558 , C23C16/45591
摘要： A lateral flow atomic layer deposition (ALD) apparatus has two gas inflow channels and two gas outflow channels that are connected to two gas outlets that are symmetrically formed based on a substrate in which a thin film is deposited, thereby differently guiding a flow direction of a gas flowing on the substrate. Therefore, uniformity of a deposited film is improved, compared with the conventional lateral flow ALD apparatus in which a supplied source gas and reaction gas constantly flow in only one direction on the substrate.
摘要翻译：侧流原子层沉积（ALD）装置具有两个气体流入通道和两个气体流出通道，其连接到基于其中沉积薄膜的基底对称形成的两个气体出口，从而不同地引导流动方向在基板上流动的气体。因此，与供给的原料气体和反应气体在基板上仅沿一个方向恒定流动的常规侧流ALD装置相比，沉积膜的均匀性得到改善。

3. 外观设计

USD614593S1 Substrate support for a semiconductor deposition apparatus 有权
标题翻译：用于半导体沉积设备的衬底支撑
公开(公告)号：USD614593S1
公开(公告)日：2010-04-27
申请号：US29331023
申请日：2009-01-16
申请人： Jeong Ho Lee , Sang Jin Jeong , Dong Rak Jung
设计人： Jeong Ho Lee , Sang Jin Jeong , Dong Rak Jung

4. 外观设计

USD606952S1 Plasma inducing plate for semiconductor deposition apparatus 有权
标题翻译：用于半导体沉积装置的等离子体诱导板
公开(公告)号：USD606952S1
公开(公告)日：2009-12-29
申请号：US29331022
申请日：2009-01-16
申请人： Jeong Ho Lee , Sang Jin Jeong , Woo Chan Kim
设计人： Jeong Ho Lee , Sang Jin Jeong , Woo Chan Kim

5. 外观设计

USD702654S1 Plasma power transfer rod for a semiconductor deposition apparatus 有权
标题翻译：用于半导体沉积设备的等离子体功率传递棒
公开(公告)号：USD702654S1
公开(公告)日：2014-04-15
申请号：US29424575
申请日：2012-06-13
申请人： Jeong Ho Lee , Woo Chan Kim , Sang Jin Jeong , Hyun Soo Jang
设计人： Jeong Ho Lee , Woo Chan Kim , Sang Jin Jeong , Hyun Soo Jang

6. 发明申请

US20110308460A1 ATOMIC LAYER DEPOSITION APPARATUS 有权
标题翻译：原子层沉积装置
公开(公告)号：US20110308460A1
公开(公告)日：2011-12-22
申请号：US13171899
申请日：2011-06-29
申请人： Kyung Il Hong , Dae Youn Kim , Hyung-Sang Park , Sang Jin Jeong , Wonyong Koh , Herbert Terhorst
发明人： Kyung Il Hong , Dae Youn Kim , Hyung-Sang Park , Sang Jin Jeong , Wonyong Koh , Herbert Terhorst
IPC分类号： C23C16/455 , C23C16/509 , C23C16/458
CPC分类号： C23C16/45544 , C23C16/045 , C23C16/45508
摘要： The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.
摘要翻译：本发明涉及一种ALD装置，特别涉及适用于在具有大于平面基板的实际面积的基板上快速沉积薄膜的ALD装置。在根据本发明的示例性实施例的ALD装置的反应室中，通过使气体流动空间不同而不是以恒定通量供给气体，将更多的气体供给到需要更多气体的部分，恒定的流速，使得供应反应气体和反应物气体的废物所需的时间可以最小化，以提高ALD设备的生产率。反应空间的顶部被成形为在基底上提供不均匀的间隙。

7. 发明授权

US06987254B2 Microwave oven 有权
标题翻译：微波炉
公开(公告)号：US06987254B2
公开(公告)日：2006-01-17
申请号：US10636998
申请日：2003-08-08
申请人： Sang Jin Jeong
发明人： Sang Jin Jeong
IPC分类号： H05B6/64
CPC分类号： H05B6/6426
摘要： A microwave oven to prevent a side plate of a cabinet from vibrating due to an electromagnetic field which is generated around a high-voltage transformer installed in a machine room. An anti-vibration plate is provided at a predetermined position inside the side plate of the cabinet so as to prevent the side plate from vibrating due to the electromagnetic field. The anti-vibration plate extends from a rear wall of the machine room so as to be adjacent to the side plate at a position between the high-voltage transformer and the side plate. Further, the anti-vibration plate is integrated with the rear wall of the machine room, and is screwed to the side plate. The anti-vibration plate has a rectangular shape. An embossment is formed on the anti-vibration plate to reinforce a strength of the anti-vibration plate.
摘要翻译：用于防止机柜侧板由于安装在机房内的高压变压器周围产生的电磁场而振动的微波炉。防振板设置在机柜侧板内的预定位置，以防止侧板由于电磁场而振动。防振板在高压变压器和侧板之间的位置处从机房的后壁延伸以与侧板相邻。此外，防振板与机房的后壁一体化，并被拧到侧板上。防振板具有矩形形状。在防振板上形成压花以增强防振板的强度。

8. 发明申请

US20080069955A1 ATOMIC LAYER DEPOSITION APPARATUS 有权
标题翻译：原子层沉积装置
公开(公告)号：US20080069955A1
公开(公告)日：2008-03-20
申请号：US11857294
申请日：2007-09-18
申请人： Kyung Il Hong , Dae Youn Kim , Hyung-Sang Park , Sang Jin Jeong , Wonyong Koh , Herbert Terhorst
发明人： Kyung Il Hong , Dae Youn Kim , Hyung-Sang Park , Sang Jin Jeong , Wonyong Koh , Herbert Terhorst
IPC分类号： C23C16/00
CPC分类号： C23C16/45544 , C23C16/045 , C23C16/45508
摘要： The present invention relates to an ALD apparatus, and particularly relates to an ALD apparatus that is suitable for rapidly depositing a thin film on a substrate having an actual area that is larger than a planar substrate. In the reaction chamber of the ALD apparatus according to an exemplary embodiment of the present invention, more gas is supplied to a portion where more gas is required by having differences in the space for gas to flow rather than supplying the gas in a constant flux and a constant flow velocity such that the time required for supplying reactant gases and waste of reactant gases may be minimized to increase productivity of the ALD apparatus. The ceiling of the reaction space is shaped to provide a nonuniform gap over the substrate.
摘要翻译：本发明涉及一种ALD装置，特别涉及适用于在具有大于平面基板的实际面积的基板上快速沉积薄膜的ALD装置。在根据本发明的示例性实施例的ALD装置的反应室中，通过使气体流动空间不同而不是以恒定通量供给气体，将更多的气体供给到需要更多气体的部分，恒定的流速，使得供应反应气体和反应物气体的废物所需的时间可以最小化，以提高ALD设备的生产率。反应空间的顶部被成形为在基底上提供不均匀的间隙。

9. 发明授权

US07342208B2 Linearly Reciprocating Tray for Microwave oven 有权
标题翻译：用于微波炉的线性往复式托盘
公开(公告)号：US07342208B2
公开(公告)日：2008-03-11
申请号：US11289427
申请日：2005-11-30
申请人： Jeon Hong Kang , Sang Jin Jeong
发明人： Jeon Hong Kang , Sang Jin Jeong
IPC分类号： H05B6/78
CPC分类号： H05B6/6411
摘要： A microwave oven in which there is substantially no difference between time when a linearly traveling tray travels from the right side to the left side of a cooking chamber and time when the linearly traveling tray stays at the right side or the left side. The microwave oven includes a linearly traveling tray having a guide channel or hole guiding a linear movement and a power transmission transmitting driving power of a motor to the tray. The guide channel and the guide hole have an oval shape and adjust the staying time at the rightmost or leftmost side in the traveling region. A rotation tray having a locking step formed in the lower surface thereof is further provided. The power transmission may include a linkage, protrusion and/or a roller, and their modifications. Food is uniformly cooked at any place of the cooking chamber, and a user can easily clean and reinstall the tray.
摘要翻译：一种微波炉，其中线性行进托盘从烹饪室的右侧到左侧行进的时间和当线性行进托盘停留在右侧或左侧时的时间基本上没有差异。微波炉包括具有引导线性运动的引导通道或孔的线性行进托盘和将马达的驱动力传递到托盘的动力传递。引导通道和引导孔具有椭圆形状并且调节行进区域中最右侧或最左侧的停留时间。还设置有在其下表面形成有锁定台阶的旋转盘。动力传动装置可以包括连杆机构，突起部和/或滚筒及其变型。食物在烹饪室的任何地方均匀地烹饪，用户可以容易地清洁并重新安装托盘。

10. 发明授权

US07053349B2 Microwave oven 失效
标题翻译：微波炉
公开(公告)号：US07053349B2
公开(公告)日：2006-05-30
申请号：US11110829
申请日：2005-04-21
申请人： Sang Jin Jeong
发明人： Sang Jin Jeong
IPC分类号： H05B6/78 , H05B6/68
CPC分类号： H05B6/6411
摘要： A microwave oven according to the present invention includes a body, an inner case provided in the body and partitioning the interior of the body into an inner space defining a cooking chamber and an outer space defining an electric component chamber, and a magnetron equipped in the electric component chamber for irradiating microwaves into the cooking chamber. The microwave oven also includes a tray mounted on the bottom of the cooking chamber, and a driving apparatus for driving the tray in one mode selected from a first mode in which the tray travels only in a rotational motion, a second mode in which the tray travels only in a linearly reciprocating motion, and a third mode in which the tray travels both in the rotational motion and in the linearly reciprocating motion at the same time.
摘要翻译：根据本发明的微波炉包括主体，设置在主体中的内壳，并将主体内部分隔成限定烹饪室的内部空间和限定电气部件室的外部空间，以及配备在该壳体中的磁控管用于将微波照射到烹饪室中的电气部件室。微波炉还包括安装在烹饪室的底部的托盘以及用于以一种模式驱动托盘的驱动装置，该模式选自托盘仅在旋转运动中运动的第一模式，托盘仅在线性往复运动中行进，并且托盘同时在旋转运动和线性往复运动中同时行进。

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