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    • 8. 发明授权
    • Thin film deposition apparatus and method of maintaining the same
    • 薄膜沉积装置及其保持方法
    • US08273178B2
    • 2012-09-25
    • US12393377
    • 2009-02-26
    • Se Yong KimWoo Chan KimDong Rak Jung
    • Se Yong KimWoo Chan KimDong Rak Jung
    • C23C16/44C23F1/00H01L21/306C23C16/06C23C16/22
    • C23C14/22C23C16/44
    • A thin film deposition apparatus and a method of maintaining the same are disclosed. In one embodiment, a thin film deposition apparatus includes: a chamber including a removable chamber cover; one or more reactors housed in the chamber; a chamber cover lifting device connected to the chamber cover. The chamber cover lifting device is configured to move the chamber cover vertically between a lower position and an upper position. The apparatus further includes a level sensing device configured to detect whether the chamber cover is level, and a level maintaining device configured to adjust the chamber cover if the chamber cover is not level. This configuration maintains the chamber cover to be level as a condition for further vertical movement of the chamber cover.
    • 公开了一种薄膜沉积装置及其保持方法。 在一个实施例中,薄膜沉积设备包括:包括可移除室盖的室; 容纳在室中的一个或多个反应器; 连接到室盖的室盖提升装置。 室盖提升装置构造成在下位置和上位置之间垂直移动室盖。 所述装置还包括液位感测装置,其被配置为检测所述腔室盖是否水平;以及水平维持装置,其被配置为如果所述腔室盖不是水平面则调节所述腔室盖。 这种构造保持室盖被平坦化,作为室盖的进一步垂直移动的条件。