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    • 1. 发明申请
    • Method for preparing storage phosphors
    • 储存荧光粉的制备方法
    • US20060141133A1
    • 2006-06-29
    • US11298730
    • 2005-12-09
    • Jean-Pierre TahonPaul LeblansLuc StruyeJohan Lamotte
    • Jean-Pierre TahonPaul LeblansLuc StruyeJohan Lamotte
    • B05D5/06B05D5/12
    • G03B42/02
    • A method of preparing a stimulable phosphor layer comprising a phosphor composed of a host or matrix compound and a dopant or activator compound or element wherein a precipitate or inclusion having a size in the range from 10−3 μm up to 10 μm is present in said matrix compound, proceeds by the steps of (1) providing one or more crucibles containing precursor compounds for said host, said dopant and said precipitate, by increasing the temperature of said crucible(s) up to a temperature provoking evaporation of all of said precursor compounds as a vaporized latent phosphor cloud, (2) depositing said vaporized latent phosphor cloud in form of a layer onto a temperature controlled substrate, (3) followed by cooling said substrate, and (4) further annealing said phosphor layer at a temperature in the range from 35° C. up to 200° C., wherein said method is characterized by performing said annealing in an atmosphere having a water content of more than 10 g per m3 of dry air at the temperature at which annealing proceeds. In a further embodiment the temperature of the said substrate as presented in the annealing atmosphere when starting annealing, is lower than the dew point of water in said atmosphere.
    • 一种制备可刺激的磷光体层的方法,其包括由主体或基体化合物和掺杂剂或活化剂化合物或元素组成的磷光体,其中尺寸在10 -3以上的沉淀物或夹杂物 通过以下步骤(1)提供一种或多种含有前体化合物的坩埚,所述主体,所述掺杂剂和所述沉淀物的坩埚通过将所述坩埚的温度升高至温度 引起所有前体化合物的蒸发作为蒸发的潜在荧光云,(2)将所述蒸发的潜在荧光云以层的形式沉积到温度受控的基底上,(3)然后冷却所述基底,和(4)进一步退火 所述荧光体层在35℃至200℃的温度范围内,其中所述方法的特征在于在含水量大于10g / m 3的气氛中进行所述退火, SUP>的 在退火的温度下干燥空气。 在进一步的实施方案中,当起始退火时在退火气氛中呈现的所述基材的温度低于所述气氛中的水的露点。
    • 3. 发明申请
    • Method of erasing storage phosphor panels
    • 擦除存储荧光粉板的方法
    • US20080035867A1
    • 2008-02-14
    • US11825435
    • 2007-07-06
    • Luc StruyePaul LeblansJean-Pierre Tahon
    • Luc StruyePaul LeblansJean-Pierre Tahon
    • G01T1/105
    • G01T1/2016
    • In a method of reading a radiation image, stored in a CsBr:Eu type binderless needle-shaped photostimulable or storage phosphor screen after X-ray exposure of said screen, said method comprises the steps of: (1) erasing thermally stimulable energy by exposing said screen to infrared radiation in the wavelength range from 1000 nm to 1550 nm; (2) stimulating said phosphor screen by means of stimulating radiation in the range from 550 to 850 nm; (3) detecting light emitted by the phosphor screen upon stimulation and converting the detected light into a signal representation of said radiation image; (4) erasing said phosphor screen by exposing it to erasing light in the wavelength range of 300 nm to 1500 nm.
    • 在所述屏幕的X射线曝光之后,读取存储在CsBr:Eu型无粘合剂针状可光激励或储存荧光屏中的放射线图像的方法,所述方法包括以下步骤:(1)通过曝光消除热刺激能量 所述屏幕在1000nm至1550nm的波长范围内的红外辐射; (2)通过刺激550至850nm范围内的辐射来刺激所述荧光屏; (3)在刺激时检测由荧光屏发射的光,并将检测到的光转换成所述辐射图像的信号表示; (4)通过将所述荧光屏曝光于300nm至1500nm的波长范围的擦除光来擦除所述荧光屏。
    • 6. 发明授权
    • Radiation pretreated stimulable phosphor screen or panel
    • 辐射预处理可激发荧光屏或面板
    • US07126135B2
    • 2006-10-24
    • US10736926
    • 2003-12-16
    • Johan LamotteJean VerelstLuc StruyePaul Leblans
    • Johan LamotteJean VerelstLuc StruyePaul Leblans
    • H05B33/00
    • G21K4/00C09K11/7733
    • A Eu-doped CsBr-type storage phosphor screen or panel has been disclosed, providing ratios of ultraviolet luminescence intensities of at least 10/9 after having been exposed to radiation having a wavelength in the range from 150 to 400 nm, measured at same sites without and with pretreatment exposure of said storage phosphor screen or panel with short ultraviolet radiation in the range from 150 to 300 nm and having an energy of 10 mJ/mm2, as well as a method of producing a stimulable phosphor screen or panel, characterized in that during or after at least one of the manufacturing steps a radiation exposure treatment is given with radiation sources emitting short ultraviolet radiation in the range from 150 to 300 nm with an energy of at least 10 mJ/mm2.
    • 已经公开了Eu掺杂的CsBr型存储荧光屏或面板,其在暴露于波长在150至400nm的辐射之后提供至少10/9的紫外发光强度的比率,在相同的位置 所述存储荧光屏或面板在150-300nm范围内具有短的紫外线辐射并具有10mJ / mm 2的能量的预处理曝光,以及一种制备 其特征在于,在至少一个制造步骤期间或之后,对发射150至300nm范围内的短紫外线辐射的辐射源进行辐射曝光处理,其能量至少为10mJ / mm 2
    • 10. 发明授权
    • Covering assembly for crucible used for evaporation of raw materials
    • 用于原料蒸发的坩埚覆盖组件
    • US07291224B2
    • 2007-11-06
    • US11143265
    • 2005-06-02
    • Jan KoninckxLuc StruyeJohan Lamotte
    • Jan KoninckxLuc StruyeJohan Lamotte
    • C30B25/12C30B25/14
    • C23C14/243C23C14/0694
    • The present invention provides an assembly comprising two plates or covers, one of which being an outermost plate or cover, and both, at least in part having a perforation pattern over a surface area covering an open side of a crucible having a bottom and surrounding side walls containing raw materials, wherein said outermost cover is mounted at a distance farther from the said crucible than said cover covering said open side of a crucible, and wherein both covers are mounted versus each other, so that, when viewed through an axis in a direction perpendicular to the bottom of the crucible from a distance to said outermost cover of at least 10 times the distance between said two plates or covers, its contents cannot be observed as their perforations and the crucible are never forming one line, perpendicular to the plane formed by said bottom.
    • 本发明提供了一种组件,其包括两个板或盖,其中一个是最外面的板或盖,并且至少部分地在覆盖坩埚的敞开侧的表面区域上具有穿孔图案,该坩埚具有底部和周围 包含原材料的墙壁,其中所述最外面的覆盖物安装在比所述覆盖所述坩埚敞开侧的所述覆盖物的距离远离所述坩埚的位置,并且其中两个盖子相互安装,使得当通过一个轴线观察时 与坩埚的底部垂直的方向距离所述最外盖的距离为所述两个板或盖之间的距离的至少10倍,其内容物不能被观察为它们的穿孔,并且坩埚从不形成垂直于该平面的一条线 由所述底部形成。