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    • 1. 发明授权
    • Method for making negative lith images direct positive images
    • 制造负像图像的方法直接呈现正像
    • US5691121A
    • 1997-11-25
    • US680358
    • 1996-07-15
    • Jean-Marie DewanckeleDavid TerrellHieronymus AndriessenKris Viaene
    • Jean-Marie DewanckeleDavid TerrellHieronymus AndriessenKris Viaene
    • G03C1/06G03C1/485G03C1/73
    • G03C1/48546G03C1/067Y10S430/141
    • A photographic light-sensitive silver halide material is provided for making negative lithographic images or direct-positive images, said material comprising a support, at least one internal latent image-type silver halide emulsion layer (in the case of direct-positive materials) or surface latent image-type silver halide emulsion layer (in the case of lithographic materials) and development-nucleating amounts of a compound or a precursor thereof, said compound having at least one quaternary heterocyclic ring system comprising at least three rings including a tetrahydropyridinium ring wherein carbon-nitrogen and carbon-carbon double bonds are also part of an aromatic ring being one of said three rings and wherein said double bonds and nitrogen atom in said tetrahydropyridinium ring are incorporated into annelated conjugated ring systems. Developing said photographic material after exposure in an alkaline surface developer rapidly converts said precursor into a ring system as defined hereinbefore.
    • 提供摄影感光卤化银材料,用于制作负性平版印刷图像或直接正像,所述材料包括载体,至少一个内部潜像型卤化银乳剂层(在直接正极材料的情况下)或 表面潜像型卤化银乳剂层(在平版印刷材料的情况下)和显影成核量的化合物或其前体,所述化合物具有至少一个四元杂环系统,其包含至少三个包括四氢吡啶鎓环的环,其中 碳 - 氮和碳 - 碳双键也是作为所述三个环之一的芳香环的一部分,并且其中所述四氢吡啶鎓环中的所述双键和氮原子并入到环状共轭环体系中。 在碱性表面显影剂中曝光后显影所述照相材料快速地将所述前体转化成如上所定义的环系。
    • 5. 发明申请
    • METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE
    • 制作平版印刷版的方法
    • US20090155722A1
    • 2009-06-18
    • US12300801
    • 2007-05-22
    • Hieronymus AndriessenSteven LezyHubertus Van AertJoan Vermeersch
    • Hieronymus AndriessenSteven LezyHubertus Van AertJoan Vermeersch
    • G03F7/20B41M5/00
    • B41C1/1025B41C2201/02B41C2201/14B41C2210/04B41C2210/06B41C2210/22B41C2210/24Y10S430/145
    • A method for making a lithographic printing plate includes the steps of (i) providing a negative-working, heat-sensitive lithographic printing plate precursor including a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic thermoplastic polymer particles, a binder, and an infrared absorbing dye, wherein the hydrophobic thermoplastic polymer particles have an average particle diameter, measured by Photon Correlation Spectroscopy, of more than 10 nm and less than 40 nm, and the amount of the IR-dye, without taking into account an optional counter ion, is more than 0.70 mg per m2 of the total surface of the thermoplastic polymer particles, measured by Hydrodynamic Fractionation, and the amount of hydrophobic thermoplastic polymer particles relative to the total weight of the ingredients of the imaging layer is at least 60%; (ii) exposing the precursor to infrared light; and (iii) developing the exposed precursor in an alkaline aqueous solution.
    • 制备平版印刷版的方法包括以下步骤:(i)提供负型热敏平版印刷版原版,其包含具有亲水性表面的载体,或提供有亲水层和设置在其上的涂层, 包括包含疏水性热塑性聚合物颗粒,粘合剂和红外吸收染料的图像记录层的涂层,其中所述疏水性热塑性聚合物颗粒具有通过光子相关光谱测量的平均粒径大于10nm且小于40 nm,并且不考虑任选的抗衡离子的IR染料的量通过流体动力学分级测定的每摩尔热塑性聚合物颗粒的总表面的每摩尔浓度大于0.70mg,并且疏水性热塑性聚合物颗粒的量 相对于成像层的成分的总重量为至少60%; (ii)将前体暴露于红外光; 和(iii)在碱性水溶液中显影暴露的前体。
    • 7. 发明授权
    • Layer configuration with improved stability to sunlight exposure
    • 层状结构具有改善的阳光照射的稳定性
    • US07147936B2
    • 2006-12-12
    • US10642933
    • 2003-08-18
    • Frank LouwetGeert Van DyckJohan LoccufierBert GroenendaalHieronymus Andriessen
    • Frank LouwetGeert Van DyckJohan LoccufierBert GroenendaalHieronymus Andriessen
    • C07D211/021H01L51/50
    • C08G61/126C08L25/08C08L2666/06C09J165/00H01G11/48H01G11/56Y02E60/13Y10S428/917
    • A layer configuration on a support, the layer configuration comprising a layer containing a polymer containing optionally substituted 3,4-alkylenedioxythiophene structural units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, and a compound selected from the group consisting of polyphosphoric acids, polyphosphoric acid salts, thia-alkanedicarboxylic acids, cyclohexadiene compounds and polyhydroxy-compounds selected from the group consisting of tetronic acid derivatives; ortho-dihydroxybenzene compounds with at least one sulpho group, compounds according to formula (I): HO—CH2—CH(OH)—(CH2)m—S—CH2—C(R1)(R2)—CH2—S—(CH2)n—CH(OH)—CH2—OH  (I) wherein R1 and R2 are independently H, —OH or alkyl, and n and m are independently 1, 2 or 3; compounds according to formula (II): HO—(CH2)p—S—CH2—S—(CH2)q—OH  (II) wherein p and q are independently 2, 3 or 4; compounds hydrolyzable to tetronic acid derivatives; compounds hydrolyzable to compounds according to formula (I); and sulpho-substituted 2-thia-alkyl-benzimidazole compounds.
    • 在支撑体上的层构型,该层构型包括含有含有任选取代的3,4-亚烷基二氧噻吩结构单元的聚合物的层,其中两个烷氧基可以相同或不同,或一起代表任选取代的氧基 - 桥,以及选自多磷酸,多磷酸盐,硫杂烷二羧酸,环己二烯化合物和选自由以下组成的组的多羟基化合物的化合物:四氢酸衍生物; 具有至少一个磺酸基的邻二羟基苯化合物,根据式(I)的化合物:<?in-line-formula description =“In-line formula”end =“lead”?> HO-CH 2 -CH(OH) - (CH 2 CH 2)m -S- CH 2 -C(R 1) (R 2) - CH 2 -S-(CH 2)n - (CH 2)n - (CH 2) -CH 2 -O-OH(I)<β在线公式描述=“在线式”末端=“尾”→其中R 1和R 2, SUP> 2独立地是H,-OH或烷基,n和m独立地是1,2或3; 根据式(II)的化合物:<?in-line-formula description =“In-line Formulas”end =“lead”?> HO-(CH 2) > -S-CH 2 -S-(CH 2)2 -O-OH(II)<β在线配方说明书=“ 其中p和q独立地为2,3或4; 可水解成四氢酸衍生物的化合物; 可水解成根据式(I)的化合物的化合物的化合物; 和磺基取代的2-硫代 - 烷基 - 苯并咪唑化合物。