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    • 4. 发明申请
    • METHOD FOR MAKING A LITHOGRAPHIC PRINTING PLATE
    • 制作平版印刷版的方法
    • US20090155722A1
    • 2009-06-18
    • US12300801
    • 2007-05-22
    • Hieronymus AndriessenSteven LezyHubertus Van AertJoan Vermeersch
    • Hieronymus AndriessenSteven LezyHubertus Van AertJoan Vermeersch
    • G03F7/20B41M5/00
    • B41C1/1025B41C2201/02B41C2201/14B41C2210/04B41C2210/06B41C2210/22B41C2210/24Y10S430/145
    • A method for making a lithographic printing plate includes the steps of (i) providing a negative-working, heat-sensitive lithographic printing plate precursor including a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating including an image-recording layer which includes hydrophobic thermoplastic polymer particles, a binder, and an infrared absorbing dye, wherein the hydrophobic thermoplastic polymer particles have an average particle diameter, measured by Photon Correlation Spectroscopy, of more than 10 nm and less than 40 nm, and the amount of the IR-dye, without taking into account an optional counter ion, is more than 0.70 mg per m2 of the total surface of the thermoplastic polymer particles, measured by Hydrodynamic Fractionation, and the amount of hydrophobic thermoplastic polymer particles relative to the total weight of the ingredients of the imaging layer is at least 60%; (ii) exposing the precursor to infrared light; and (iii) developing the exposed precursor in an alkaline aqueous solution.
    • 制备平版印刷版的方法包括以下步骤:(i)提供负型热敏平版印刷版原版,其包含具有亲水性表面的载体,或提供有亲水层和设置在其上的涂层, 包括包含疏水性热塑性聚合物颗粒,粘合剂和红外吸收染料的图像记录层的涂层,其中所述疏水性热塑性聚合物颗粒具有通过光子相关光谱测量的平均粒径大于10nm且小于40 nm,并且不考虑任选的抗衡离子的IR染料的量通过流体动力学分级测定的每摩尔热塑性聚合物颗粒的总表面的每摩尔浓度大于0.70mg,并且疏水性热塑性聚合物颗粒的量 相对于成像层的成分的总重量为至少60%; (ii)将前体暴露于红外光; 和(iii)在碱性水溶液中显影暴露的前体。
    • 6. 发明授权
    • Layer configuration with improved stability to sunlight exposure
    • 层状结构具有改善的阳光照射的稳定性
    • US07147936B2
    • 2006-12-12
    • US10642933
    • 2003-08-18
    • Frank LouwetGeert Van DyckJohan LoccufierBert GroenendaalHieronymus Andriessen
    • Frank LouwetGeert Van DyckJohan LoccufierBert GroenendaalHieronymus Andriessen
    • C07D211/021H01L51/50
    • C08G61/126C08L25/08C08L2666/06C09J165/00H01G11/48H01G11/56Y02E60/13Y10S428/917
    • A layer configuration on a support, the layer configuration comprising a layer containing a polymer containing optionally substituted 3,4-alkylenedioxythiophene structural units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, and a compound selected from the group consisting of polyphosphoric acids, polyphosphoric acid salts, thia-alkanedicarboxylic acids, cyclohexadiene compounds and polyhydroxy-compounds selected from the group consisting of tetronic acid derivatives; ortho-dihydroxybenzene compounds with at least one sulpho group, compounds according to formula (I): HO—CH2—CH(OH)—(CH2)m—S—CH2—C(R1)(R2)—CH2—S—(CH2)n—CH(OH)—CH2—OH  (I) wherein R1 and R2 are independently H, —OH or alkyl, and n and m are independently 1, 2 or 3; compounds according to formula (II): HO—(CH2)p—S—CH2—S—(CH2)q—OH  (II) wherein p and q are independently 2, 3 or 4; compounds hydrolyzable to tetronic acid derivatives; compounds hydrolyzable to compounds according to formula (I); and sulpho-substituted 2-thia-alkyl-benzimidazole compounds.
    • 在支撑体上的层构型,该层构型包括含有含有任选取代的3,4-亚烷基二氧噻吩结构单元的聚合物的层,其中两个烷氧基可以相同或不同,或一起代表任选取代的氧基 - 桥,以及选自多磷酸,多磷酸盐,硫杂烷二羧酸,环己二烯化合物和选自由以下组成的组的多羟基化合物的化合物:四氢酸衍生物; 具有至少一个磺酸基的邻二羟基苯化合物,根据式(I)的化合物:<?in-line-formula description =“In-line formula”end =“lead”?> HO-CH 2 -CH(OH) - (CH 2 CH 2)m -S- CH 2 -C(R 1) (R 2) - CH 2 -S-(CH 2)n - (CH 2)n - (CH 2) -CH 2 -O-OH(I)<β在线公式描述=“在线式”末端=“尾”→其中R 1和R 2, SUP> 2独立地是H,-OH或烷基,n和m独立地是1,2或3; 根据式(II)的化合物:<?in-line-formula description =“In-line Formulas”end =“lead”?> HO-(CH 2) > -S-CH 2 -S-(CH 2)2 -O-OH(II)<β在线配方说明书=“ 其中p和q独立地为2,3或4; 可水解成四氢酸衍生物的化合物; 可水解成根据式(I)的化合物的化合物的化合物; 和磺基取代的2-硫代 - 烷基 - 苯并咪唑化合物。