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1. 发明授权

US6057380A Photogeneration of amines from .alpha.-aminoacetophenones 失效
标题翻译：胺从α-氨基苯乙酮的光生
公开(公告)号：US6057380A
公开(公告)日：2000-05-02
申请号：US985984
申请日：1997-12-05
申请人： Jean-Luc Birbaum , Martin Kunz , Akira Kimura , Hisatoshi Kura , Hidetaka Oka , Hiroko Nakashima
发明人： Jean-Luc Birbaum , Martin Kunz , Akira Kimura , Hisatoshi Kura , Hidetaka Oka , Hiroko Nakashima
IPC分类号： C08F2/48 , C08G59/40 , C08G59/68 , C08K5/00 , C08K5/09 , C08K5/17 , C08K5/37 , C08L63/00 , G03F7/038 , G03C1/735 , C08F2/46 , C08G59/16
CPC分类号： G03F7/038
摘要： Compounds of formula I, II or III ##STR1## X is a divalent radical; Y is C.sub.1 -C.sub.6 aklylene, cyclohexylene or a direct bond;Ar.sub.1 is an aromatic radical as defined in claim 1,R.sub.1 and R.sub.2 are each independently the other, inter alia, a radical of formula ##STR2## in which p is zero or 1, or a radical of formula ##STR3## R.sub.3 is, inter alia, hydrogen, C.sub.1 -C.sub.12 alkyl, C.sub.5 -C.sub.12 cycloalkyl or phenyl-C.sub.1 -C.sub.3 alkyl;R.sub.4 is, inter alia, C.sub.1 -C.sub.12 cycloalkyl, phenyl-C.sub.1 -C.sub.3 alkyl or phenyl;or an acid addition salt of a compound of formula I, II or III;are useful as photosensitive base catalysts in base crosslinking compositions.
摘要翻译：式I，II或III的化合物X是二价基团; Y是C1-C6亚环己基，亚环己基或直接键; Ar 1是如权利要求1所定义的芳族基团，R 1和R 2各自独立地是另一个，特别是其中p为0或1的式的基团，或式R3基团特别是氢，C1- C 5 -C 12环烷基或苯基-C 1 -C 3烷基; R 4特别是C 1 -C 12环烷基，苯基-C 1 -C 3烷基或苯基; 或式I，II或III化合物的酸加成盐; 可用作基础交联组合物中的感光基础催化剂。

2. 发明授权

US07381842B2 Oxime ester photoinitiators 有权
公开(公告)号：US07381842B2
公开(公告)日：2008-06-03
申请号：US11103194
申请日：2005-04-11
申请人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号： C07C251/60
CPC分类号： C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要： Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

3. 发明申请

US20050191567A1 Oxime ester photoinitiators 有权
公开(公告)号：US20050191567A1
公开(公告)日：2005-09-01
申请号：US11103194
申请日：2005-04-11
申请人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号： G03F7/027 , A61K6/083 , B41M3/00 , C07C251/50 , C07C251/62 , C07C251/66 , C07C251/68 , C07C317/28 , C07C317/32 , C07C323/47 , C07C327/30 , C07D207/32 , C07D207/335 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , C08F2/50 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/031 , G03F9/00
CPC分类号： C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要： Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

4. 发明授权

US06949678B2 Oxime ester photoinitiators 失效
公开(公告)号：US06949678B2
公开(公告)日：2005-09-27
申请号：US09734625
申请日：2000-12-12
申请人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
发明人： Kazuhiko Kunimoto , Hidetaka Oka , Masaki Ohwa , Junichi Tanabe , Hisatoshi Kura , Jean-Luc Birbaum
IPC分类号： G03F7/027 , A61K6/083 , B41M3/00 , C07C251/50 , C07C251/62 , C07C251/66 , C07C251/68 , C07C317/28 , C07C317/32 , C07C323/47 , C07C327/30 , C07D207/32 , C07D207/335 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , C08F2/50 , G02B5/20 , G03F7/00 , G03F7/004 , G03F7/029 , G03F7/031 , C07C251/60
CPC分类号： C07D207/335 , A61K6/083 , B33Y70/00 , B41M3/003 , C07C251/66 , C07C251/68 , C07C317/32 , C07C323/47 , C07C327/30 , C07D209/86 , C07D333/20 , C07D335/16 , C07D339/08 , G03F7/0007 , G03F7/0045 , G03F7/031
摘要： Compounds of the formulae I, II, III, IV and V wherein R1 i.a. is C4-C9cycloalkanoyl, C1-C12alkanoyl, C4-C6alkenoyl, or benzoyl; R2 is for example phenyl, C1-C20alkyl, C3-C8cycloalkyl, C2-C20alkanoyl, or benzoyl; Ar1 is R4S-phenyl or NR5R6-phenyl, each of which optionally is substituted; or Ar1 i.a. is optionally substituted; or Ar1 is naphthyl or anthracyl each of which is unsubstituted or substituted; or Ar1 is benzoyl, naphthalenecarbonyl, phenanthrenecarbonyl, anthracenecarbonyl or pyrenecarbonyl, each of which is unsubstituted or substituted, or Ar1 is 3,4,5-trimethoxyphenyl, phenoxyphenyl or biphenyl; Ar2 i.a. is optionally substituted, or naphthyl or anthracyl, each of which is unsubstituted or substituted, x is 2 or 3; M1 when x is 2, for example is phenylene, naphthalene, anthracylene, each of which optionally is substituted; M1, when x is 3, is a trivalent radical; M2 for example is M3 is for example C1-C12alkylene, cyclohexylene, or phenylene; n is 1-20; R3 is for example hydrogen or C1-C12alkyl; R3′ i.a. is C1-C12alkyl; substituted or —O-interrupted C2-C6alkyl; R4 is for example hydrogen, or C1-C12alkyl; and R5 and R6 independently of each other i.a. are hydrogen, C1-C12alkyl, or phenyl; are suitable as photoinitiators in particular in resist applications.

5. 发明授权

US06596445B1 O-acyloxime photoinitiators 有权
标题翻译： O-酰基肟光引发剂
公开(公告)号：US06596445B1
公开(公告)日：2003-07-22
申请号：US09338152
申请日：1999-06-23
申请人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
发明人： Akira Matsumoto , Hidetaka Oka , Masaki Ohwa , Hisatoshi Kura , Jean-Luc Birbaum , Kurt Dietliker
IPC分类号： C07C25164
CPC分类号： C07C251/66 , B33Y70/00 , C07C251/68 , C07C323/47 , C07D295/135 , C07D335/18 , C08F2/50 , G03F7/0007 , G03F7/002 , G03F7/0045 , G03F7/031 , G03F7/0388
摘要： Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
摘要翻译：式I，II，III和IV其中R 1的肟酯化合物是苯基，任选被-O - ，C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基，或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基，或R1'是苯氧基羰基，或R1'是-CONR10R11或CN; R2是C2-C12烷酰基，C4-C6链烯酰基，苯甲酰基，C2-C6烷氧基羰基或苯氧基羰基; R3，R4，R5，R6和R7是氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12烷酰基，C2-C12烷氧基羰基，苯氧基羰基或OR8，SR9，SOR9，SO2R9或NR10R11; R4'，R5'和R6'为氢，卤素，C1-C12烷基，环戊基，环己基，苯基，苄基，苯甲酰基，C2-C12-烷酰基，C2-C12烷氧基羰基，苯氧基羰基，或为OR8，SR9，SOR9，SO2R9 ，NR10R11; 条件是R3，R4，R5，R6，R7，R'4，R'5和R'6中的至少一个是OR8，SR9或NR10R

6. 发明授权

US6022906A .alpha.-aminoacetophenone photoinitiators 失效
标题翻译： α-氨基苯乙酮光引发剂
公开(公告)号：US6022906A
公开(公告)日：2000-02-08
申请号：US982147
申请日：1997-12-01
申请人： Masaki Ohwa , Hitoshi Yamoto , Jean-Luc Birbaum , Hiroko Nakashima , Akira Matsumoto , Hidetaka Oka
发明人： Masaki Ohwa , Hitoshi Yamoto , Jean-Luc Birbaum , Hiroko Nakashima , Akira Matsumoto , Hidetaka Oka
IPC分类号： G03F7/027 , C07C225/16 , C07C233/33 , C07C311/37 , C07C317/32 , C07C323/12 , C07C323/25 , C07C323/31 , C07C323/32 , C07D207/08 , C07D211/20 , C07D295/10 , C07D295/108 , C08F2/50 , G03C1/73 , G03F7/00 , G03F7/031 , C07C221/00 , C07D265/32
CPC分类号： C07D295/108 , C07C323/12 , C07C323/25 , C07C323/32 , C07D211/20 , G03F7/031
摘要： Compounds of the formulae I, II, III and IV ##STR1## wherein Ar for example is a phenyl, biphenyl or benzoylphenyl group, which is unsubstituted or substituted; Ar.sub.1, for example, has the same meanings as Ar; Ar.sub.2 is inter alia phenyl; X may be a direct bond; Y hydrogen, etc.; R.sub.1 and R.sub.2 for example C.sub.1 -C.sub.8 alkyl; R.sub.3 inter alia hydrogen or C.sub.1 -C.sub.12 alkyl; R.sub.4 is inter alia C.sub.1 -C.sub.12 alkyl; or R.sub.3 and R.sub.4 together are C.sub.3 -C.sub.7 alkylene; R.sub.5 is for example C.sub.1 -C.sub.6 alkylene; and Z is a divalent radical; provided that at least one of the radicals Ar, Ar.sub.1, Ar.sub.2, Ar.sub.3, R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 or Y is substituted by 1 to 5 SH groups, or provided that Y contains at least one --SS-- group, are photoinitiators for the polymerization of ethylenically unsaturated compounds.
摘要翻译：其中Ar如式I，II，III和IV的化合物是未取代或取代的苯基，联苯基或苯甲酰基苯基; 例如，Ar1具有与Ar相同的含义; Ar2尤其是苯基; X可能是直接的债券; Y氢等; R1和R2例如C1-C8烷基; R3尤其是氢或C 1 -C 12烷基; R4尤其是C1-C12烷基; 或者R 3和R 4一起是C 3 -C 7亚烷基; R5是例如C1-C6亚烷基; Z为二价基团; 条件是Ar，Ar1，Ar2，Ar3，R1，R2，R3，R4，R5或Y中的至少一个被1至5个SH基团取代，或者Y包含至少一个-SS-基团是用于烯键式不饱和化合物聚合的光引发剂。

7. 发明授权

US6004724A Oxime sulfonates and the use thereof as latent sulfonic acids 失效
标题翻译：肟磺酸盐及其作为潜在磺酸的用途
公开(公告)号：US6004724A
公开(公告)日：1999-12-21
申请号：US104676
申请日：1998-06-25
申请人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
发明人： Hitoshi Yamato , Hartmut Bleier , Jean-Luc Birbaum , Martin Kunz , Kurt Dietliker , Christoph De Leo , Toshikage Asakura
IPC分类号： C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D207/44 , C07D213/90 , C07D333/34 , C07D333/36 , C07D333/44 , G03F7/004 , G03C1/725 , C07C249/04 , C07C251/32 , G03C1/72
CPC分类号： C07D207/44 , C07C309/65 , C07C309/66 , C07C309/73 , C07C323/63 , C07C381/00 , C07D213/90 , C07D333/44 , G03F7/0045 , Y10S430/114 , Y10S430/117 , Y10S430/12 , Y10S430/122
摘要： New oximsulfonate compounds of the formulae I or II, ##STR1## wherein m is 0 or 1; x is 1 or 2; R.sub.1 is, for example phenyl, which is unsubstituted or substituted or R.sub.1 is a heteroaryl radical that is unsubstituted or substituted, or, if m is 0, R.sub.1 additionally is C.sub.2 -C.sub.6 alkoxycarbonyl, phenoxycarbonyl or CN; R'.sub.1 is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.2 has for example one of the meanings of R.sub.1 ; n is 1 or 2; R.sub.3 is for example C.sub.1 -C.sub.18 alkyl, R'.sub.3 when x is 1, has one of the meanings given for R.sub.3, or R'.sub.3 in the formula IV and when x is 2 in the formula 1, is for example C.sub.2 -C.sub.12 alkylene, phenylene; R.sub.4 and R.sub.5 are independently of each other for example hydrogen, halogen, C.sub.1 -C.sub.6 alkyl; R.sub.6 is for example hydrogen, phenyl; R.sub.7 and R.sub.8 are independently of each other for example hydrogen or C.sub.1 -C.sub.12 -alkyl; R.sub.9 is for example C.sub.1 -C.sub.12 alkyl; A is S, O, NR.sub.6, or a group of formula A1, A2, A3 or A4 ##STR2## R.sub.10 and R.sub.11 independently of each other have one of the meanings given for R.sub.4 ; R.sub.12, R.sub.13, R.sub.14 and R.sub.15 independently of one another are for example hydrogen, C.sub.1 -C.sub.4 alkyl; Z is CR.sub.11 or N; Z.sub.1 is --CH.sub.2 --, S, O or NR.sub.6, are useful as latent sulfonic acids, especially in photoresist applications.
摘要翻译：式I或II的新的磺酸磺酸酯化合物，其中m为0或1; x为1或2; R1是例如未取代或取代的苯基，或R1是未取代或取代的杂芳基，或者如果m是0，则R1另外是C 2 -C 6烷氧基羰基，苯氧基羰基或CN; R'1例如为C 2 -C 12亚烷基，亚苯基; R2具有例如R1的含义之一; n为1或2; R3为例如C1-C18烷基，当x为1时为R'3，具有R3给出的含义之一，或式Ⅳ中的R'3，当式Ⅺ中x为2时，为例如C 2 -C 12亚烷基，亚苯基; R4和R5彼此独立，例如氢，卤素，C1-C6烷基; R6是例如氢，苯基; R 7和R 8彼此独立地为氢或C 1 -C 12 - 烷基; R 9为例如C 1 -C 12烷基; A是S，O，NR6或式A1，A2，A3或A4的基团，R10和R11彼此独立地具有对R4给出的含义之一; R 12，R 13，R 14和R 15彼此独立地是例如氢，C 1 -C 4烷基; Z为CR11或N; Z1是-CH2-，S，O或NR6，可用作潜在的磺酸，特别是在光刻胶应用中。

8. 发明授权

US08012672B2 Sulphonium salt photoinitiators 有权
标题翻译：锍盐光引发剂
公开(公告)号：US08012672B2
公开(公告)日：2011-09-06
申请号：US12442823
申请日：2007-09-24
申请人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
发明人： Pascal Hayoz , Jean-Luc Birbaum , Stephan Ilg
IPC分类号： C07C381/12 , G03F7/004 , G03F7/039 , G03C1/73
CPC分类号： C07C381/12 , B33Y70/00 , B33Y80/00 , C07C2601/14 , C08K5/375 , C09D7/63 , G03F7/0045 , G03F7/038
摘要： Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
摘要翻译：式（I）的化合物，其中L1，L2，L3和L4彼此独立地是氢或有机取代基; R是例如C 1 -C 20烷基，C 5 -C 12环烷基，C 2 -C 20烯基，取代的C 1 -C 20烷基; X为O，S，NRa或NCORa; R a是例如氢或C 1 -C 20烷基; Y为无机或有机阴离子; 适合作为光潜酸产生剂。

9. 发明授权

US07901867B2 Sulphonium salt initiators 有权
标题翻译：锍盐引发剂
公开(公告)号：US07901867B2
公开(公告)日：2011-03-08
申请号：US11922444
申请日：2006-06-21
申请人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
发明人： Jean-Pierre Wolf , Attila Latika , Jean-Luc Birbaum , Stephan Ilg , Pascal Hayoz
IPC分类号： G03F7/004 , G03F7/30 , C07C381/12
CPC分类号： C07D209/88 , B33Y70/00 , C07C309/06 , C07C381/12 , G03F7/0045 , G03F7/038 , Y10S430/122
摘要： Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent acid generators.
摘要翻译：式（I），（II），（III），（IV）的化合物，其中R是氢，C 1 -C 20烷基; 被一个或多个O中断的C 2 -C 20烷基; 是-L-X-R2或-L-R2; R1具有例如R给出的含义之一; R2是单价敏化剂或光引发剂部分; Ar 1和Ar 2例如彼此独立地是被C 1 -C 20烷基，卤素或OR 3取代的苯基; 或未取代的萘基，蒽基，菲基或联苯基; 或被C 1 -C 20烷基，OH或OR 3取代的萘基，蒽基，菲基或联苯基; 或为-Ar4-A-Ar3; Ar 3是未取代的苯基萘基，蒽基，菲基或联苯基; 或由C 1 -C 20烷基，OR 3或苯甲酰基取代的苯基，萘基，蒽基，菲基或联苯基; Ar4是亚苯基，亚萘基，亚蒽基或菲基; A是直接键合，S，O或C1-C20亚烷基; X是CO，C（O）O，OC（O），O，S或NR 3; L是被一个或多个O中断的C 1 -C 20亚烷基或C 2 -C 20亚烷基; R3是C1-C20烷基或C1-C20羟烷基; 并且Y是阴离子，适合作为光潜酸产生剂。

10. 发明授权

US06512020B1 Oxime derivatives and the use thereof as latent acids 有权
标题翻译：肟衍生物及其作为潜伏酸的用途
公开(公告)号：US06512020B1
公开(公告)日：2003-01-28
申请号：US09820115
申请日：2001-03-28
申请人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
发明人： Toshikage Asakura , Hitoshi Yamato , Masaki Ohwa , Jean-Luc Birbaum , Kurt Dietliker , Junichi Tanabe
IPC分类号： C08J328
CPC分类号： G03F7/0045 , B33Y70/00 , C07C251/62 , C07C309/00 , C07C309/65 , C07C317/32 , C07C323/47 , C07C381/00 , C07C2602/42 , C07D319/18 , C07D333/22
摘要： Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g. C2-C6haloalkanoyl, or halobenzoyl, R′3 is for example phenylenedisulfonyl, naphthylenedisulfonyl, diphenylenedisulfonyl, or oxydiphenylenedisulfonyl, wherein these radicals are unsubstituted or substituted, X is halogen; are especially suitable as photosensitive acid-donors in chemically amplified resist formulations.
摘要翻译：式I，II和III的化合物，其中R1是例如氢，C1-C12烷基，C3-C30环烷基，C2-C12链烯基，C4-C8环烯基，苯基，未取代或取代的萘基，蒽基或菲基，未取代或取代的，未取代或取代的杂芳基; 其中除氢之外的所有基团R1可以另外被具有在酸作用下切割的-O-C键或-O-Si键的基团取代; R'1是例如亚苯基，亚萘基，亚二苯基或氧联二苯基，其中这些基团是未取代的或被取代的; R2是卤素或C1-C10卤代烷基; R3是例如C1-C18烷基磺酰基，苯基磺酰基，萘基磺酰基，蒽磺酰基或菲基磺酰基，其中基团是未取代的或被取代的，或者R3是例如。 C 2 -C 6卤代烷酰基或卤代苯甲酰基，R'3是例如亚苯基二磺酰基，萘基二磺酰基，二苯基二磺酰基或氧基二苯基二磺酰基，其中这些基团是未取代的或被取代的，X是卤素; 在化学放大抗蚀剂配方中特别适合用作光敏酸供体。

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