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    • 4. 发明授权
    • O-acyloxime photoinitiators
    • O-酰基肟光引发剂
    • US06596445B1
    • 2003-07-22
    • US09338152
    • 1999-06-23
    • Akira MatsumotoHidetaka OkaMasaki OhwaHisatoshi KuraJean-Luc BirbaumKurt Dietliker
    • Akira MatsumotoHidetaka OkaMasaki OhwaHisatoshi KuraJean-Luc BirbaumKurt Dietliker
    • C07C25164
    • C07C251/66B33Y70/00C07C251/68C07C323/47C07D295/135C07D335/18C08F2/50G03F7/0007G03F7/002G03F7/0045G03F7/031G03F7/0388
    • Oximeester compounds of the formulae I, II, III and IV wherein R1 is phenyl, C1-C20alkyl or C2-C20alkyl optionally interrupted by —O—, C2-C20alkanoyl or benzoyl, or R1 is C2-C12alkoxycarbonyl or phenoxycarbonyl; R1′ is C2-C12alkoxycarbonyl, or R1′ is phenoxycarbonyl, or R1′ is —CONR10R11 or CN; R2 is C2-C12alkanoyl, C4-C6alkenoyl, benzoyl, C2-C6alkoxycarbonyl or phenoxycarbonyl; R3, R4, R5, R6 and R7 are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl or a group OR8, SR9, SOR9, SO2R9 or NR10R11; R4′, R5′ and R6′ are hydrogen, halogen, C1-C12alkyl, cyclopentyl, cyclohexyl, phenyl, benzyl, benzoyl, C2-C12-alkanoyl, C2-C12alkoxycarbonyl, phenoxycarbonyl, or are a group OR8, SR9, SOR9, SO2R9, NR10R11; provided that at least one of R3, R4, R5, R6, R7, R′4, R′5 and R′6 is OR8, SR9 or NR10R11; R8, R9, R10 and R11 are for example hydrogen, C1-C12alkyl, phenyl; are suitable as initiators for the photopolymerization of radically polymerizable compounds.
    • 式I,II,III和IV其中R 1的肟酯化合物是苯基,任选被-O - ,C 2 -C 20烷酰基或苯甲酰基中断的C 1 -C 20烷基或C 2 -C 20烷基,或者R 1是C 2 -C 12烷氧基羰基或苯氧基羰基; R1'是C2-C12烷氧基羰基,或R1'是苯氧基羰基,或R1'是-CONR10R11或CN; R2是C2-C12烷酰基,C4-C6链烯酰基,苯甲酰基,C2-C6烷氧基羰基或苯氧基羰基; R3,R4,R5,R6和R7是氢,卤素,C1-C12烷基,环戊基,环己基,苯基,苄基,苯甲酰基,C2-C12烷酰基,C2-C12烷氧基羰基,苯氧基羰基或OR8,SR9,SOR9,SO2R9或NR10R11; R4',R5'和R6'为氢,卤素,C1-C12烷基,环戊基,环己基,苯基,苄基,苯甲酰基,C2-C12-烷酰基,C2-C12烷氧基羰基,苯氧基羰基,或为OR8,SR9,SOR9,SO2R9 ,NR10R11; 条件是R3,R4,R5,R6,R7,R'4,R'5和R'6中的至少一个是OR8,SR9或NR10R
    • 6. 发明授权
    • Oxime ester photoinitiators
    • 肟酯光引发剂
    • US07759043B2
    • 2010-07-20
    • US11660346
    • 2005-08-08
    • Junichi TanabeKazuhiko KunimotoHisatoshi KuraHidetaka OkaMasaki Ohwa
    • Junichi TanabeKazuhiko KunimotoHisatoshi KuraHidetaka OkaMasaki Ohwa
    • G03C1/00C07D213/00C07D207/00C07D209/56C09B5/00G03F7/26C08F2/50
    • G03F7/031B33Y70/00C07D209/86C07D413/10
    • Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.
    • 式(I)化合物,其中R 1,R 2和R 10彼此独立地是C 1 -C 20烷基,苯基,C 1 -C 12烷基苯基或苯基-C 1 -C 6烷基; R 3和R 4彼此独立地是氢,C 1 -C 20烷基,NR 6 R 7或SR 8,条件是R 3或R 4中的至少一个是NR 6 R 7或SR 8; R5是氢或C1-C20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基,或者R 6和R 7与它们所连接的N原子一起形成5或6元环,其任选地被O,S或NR 9中断,并且任选地另外是 被一个或多个C 1 -C 4烷基取代; R8是苯基,联苯基,萘基,蒽基或菲基,它们全部被一个或多个C 1 -C 4烷基取代; 且R 9为氢,C 1 -C 20烷基,C 2 -C 4羟烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。
    • 7. 发明申请
    • Oxime Ester Photoinitiators
    • 肟酯光引发剂
    • US20080096115A1
    • 2008-04-24
    • US11660346
    • 2005-08-08
    • Junichi TanabeKazuhiko KunimotoHisatoshi KuraHidetaka OkaMasaki Ohwa
    • Junichi TanabeKazuhiko KunimotoHisatoshi KuraHidetaka OkaMasaki Ohwa
    • C08F2/46C07D209/88G03F3/00G03F7/40
    • G03F7/031B33Y70/00C07D209/86C07D413/10
    • Compounds of the formula (I), wherein R1, R2 and R10 independently of one another are C1-C20alkyl, phenyl, C1-C12alkylphenyl or phenyl-C1-C6alkyl; R3 and R4 independently of one another are hydrogen, C1-C20alkyl, NR6R7 or SR8, provided that at least one of R3 or R4 is NR6R7 or SR8; R5 is hydrogen or C1-C20alkyl; R6 and R7 independently of one another are C1-C20alkyl, or R6 and R7 together with the N-atom to which they are attached form a 5 or 6 membered ring, which optionally is interrupted by O, S or NR9 and which optionally additionally is substituted by one or more C1-C4alkyl; R8 is phenyl, biphenylyl, naphthyl, anthryl or phenanthryl, all of which optionally are substituted by one or more C1-C4alkyl; and R9 is hydrogen, C1-C20alkyl, C2-C4hydroxyalkyl or phenyl; exhibit an unexpectedly good performance in photopolymerization reactions.
    • 式(I)的化合物,其中R 1,R 2和R 10彼此独立地为C 1〜 C 1 -C 20烷基,苯基,C 1 -C 12烷基苯基或苯基-C 1 -C 1 -C 12烷基, C 6烷基; R 3和R 4彼此独立地是氢,C 1 -C 20烷基,NR N > 6> R 7或SR 8,条件是R 3或R 4中的至少一个是NR 6 R 7或SR 8; R 5是氢或C 1 -C 20烷基; R 6和R 7彼此独立地是C 1 -C 20烷基,或R 1和R 2彼此独立地是C 1 -C 6烷基, 6和R 7与它们所连接的N-原子一起形成5或6元环,其任选被O,S或NR 9中断, 并且其任选另外被一个或多个C 1 -C 4烷基取代; R 8是苯基,联苯基,萘基,蒽基或菲基,它们全部被任意被一个或多个C 1 -C 4烷基取代 ; R 9是氢,C 1 -C 20烷基,C 2 -C 4烷基,C 1 -C 20烷基, 羟基烷基或苯基; 在光聚合反应中表现出出人意料的良好性能。
    • 9. 发明授权
    • Photosensitive resin composition
    • 感光树脂组合物
    • US07829257B2
    • 2010-11-09
    • US09734635
    • 2000-12-12
    • Hidetaka OkaKazuhiko KunimotoHisatoshi KuraMasaki OhwaJunichi Tanabe
    • Hidetaka OkaKazuhiko KunimotoHisatoshi KuraMasaki OhwaJunichi Tanabe
    • G03C1/00
    • C08F2/50G03F7/031
    • Photosensitive compositions comprising (A) an alkali soluble compound; (B) at least one compound, of formula I or II wherein R1 inter alia is C4-C9cycloalkanoyl, C3-C12alkenoyl, or benzoyl which is unsubstituted or substituted; Ar1 is either C6-C20aryl or C6-C20aryloyl each of which is unsubstituted or substituted; x is 2 or 3; M1 when x is 2, inter alia is a group phenylene or naphthylene, each of which optionally is substituted i.a. by OR3, SR4 or NR5R6; or M1, when x is 3, is a trivalent group, optionally substituted; R3 is for example hydrogen or C1-C12alkyl; C2-C6alkyl which is for example substituted by —OH, —SH, —CN, C3-C6alkenoxy, or —OCH2CH2CN; R4 is for example hydrogen, C1-C12alkyl, C3-C12alkenyl, cyclohexyl, or phenyl which is unsubstituted or substituted; R5 and R6 independently of each other inter alia are hydrogen, C1-C12alkyl, C2-C4hydroxyalkyl, C2-C10alkoxyalkyl, C3-C5alkenyl, C3-C8cycloalkyl, phenyl-C1-C3alkyl, C1-C4alkanoyl, C3-C6alkenoyl, benzoyl or phenyl which is unsubstituted or substituted; and (C) a photopolymerizable compound; exhibit an unexpectedly good performance, in particular in photoresist technology.
    • 光敏组合物,其包含(A)碱溶性化合物; (B)至少一种式I或II的化合物,其中R 1特别是C 4 -C 9环烷酰基,C 3 -C 12烯酰基或未取代或取代的苯甲酰基; Ar 1是C 6 -C 20芳基或C 6 -C 20芳酰基,其各自为未取代或取代的; x为2或3; M1当x为2时,特别是亚苯基或亚萘基,其各自任选被取代。 由OR3,SR4或NR5R6; 或M1,当x为3时,为任选取代的三价基团; R3是例如氢或C1-C12烷基; 例如被-OH,-SH,-CN,C 3 -C 6烯氧基或-OCH 2 CH 2 CN取代的C 2 -C 6烷基; R4是例如氢,C1-C12烷基,C3-C12链烯基,环己基或未取代或取代的苯基; R 5和R 6彼此独立地尤其是氢,C 1 -C 12烷基,C 2 -C 4羟烷基,C 2 -C 10烷氧基烷基,C 3 -C 5烯基,C 3 -C 8环烷基,苯基-C 1 -C 3烷基,C 1 -C 4烷酰基,C 3 -C 6烯酰基,苯甲酰基或苯基 未取代或取代; 和(C)可光聚合化合物; 表现出意想不到的良好性能,特别是在光刻胶技术中。