会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Pin photodiode having a low leakage current
    • 引脚光电二极管具有低漏电流
    • US4904608A
    • 1990-02-27
    • US297821
    • 1989-01-17
    • Jean-Louis GentnerJean-Noel PatillonCatherine Mallet-MoukoGerard M. Martin
    • Jean-Louis GentnerJean-Noel PatillonCatherine Mallet-MoukoGerard M. Martin
    • H01L31/10H01L31/105
    • H01L31/105
    • A PIN photodiode having a low leakage current comprises a substrate (10) of indium phosphide (InP) which is n.sup.+ doped and on whose first surface is formed a layer (11) of indium phosphide (InP) which is n.sup.- doped and on which is disposed a MESA structure formed by a layer (12) of gallium indium arsenide (InGaAs) which is n.sup.- doped and is moreover constituted by a layer (13, 113, 213) of the p.sup.+ type formed at the surface, at the edges and along the circumference of the MESA structure. The structure further comprises a metallic contact (22) formed on the second surface of the substrate and an ohmic contact (21) formed on a part of the p.sup.+ layer. The invention is characterized in that the n.sup.- doping of the layer of indium phosphide (InP) (11) is chosen to be lower than the n.sup.- doping of the layer of gallium indium arsenide (InGaAs) (12), and in that the ohmic contact (21) is formed on a part (213) of the p.sup.+ zone located in the layer of indium phosphide (InP) (11) along the circumference of the MESA structure.
    • 具有低泄漏电流的PIN光电二极管包括磷化铟(InP)的衬底(10),其是n +掺杂的,并且其第一表面形成为掺杂的磷化铟(InP)层(11),并且其上 设置由掺杂砷化镓(InGaAs)的层(12)形成的MESA结构,并且还由在表面处形成的p +型的层(13,113,213),在边缘 并沿着MESA结构的圆周。 该结构还包括形成在衬底的第二表面上的金属触点(22)和形成在p +层的一部分上的欧姆接触(21)。 本发明的特征在于,磷化铟层(InP)(11)的n掺杂选择为低于砷化镓砷(InGaAs)(12)的n掺杂,并且因为 欧姆接触(21)沿着MESA结构的圆周形成在位于磷化铟(InP)(11)层中的p +区的部分(213)上。
    • 3. 发明授权
    • Semiconductor optical device on an indium phosphide substrate for long operating wavelengths
    • 磷化铟衬底上的半导体光学器件,用于长波长工作
    • US07109526B2
    • 2006-09-19
    • US10893140
    • 2004-07-15
    • Jean-Louis GentnerFrancois AlexandreBruno ThedrezOlivier Gauthier-Lafaye
    • Jean-Louis GentnerFrancois AlexandreBruno ThedrezOlivier Gauthier-Lafaye
    • H01L33/00
    • B82Y20/00H01S5/3201H01S5/3235H01S5/32366H01S5/3403H01S5/343H01S5/34306H01S2302/00
    • A semiconductor optical device such as a laser or semiconductor optical amplifier (SOA) based on an indium phosphide substrate or equivalent buffer layer. The active layer of the device is based on conventional InGaAs(P) alloy, but additionally includes N in order to increase the operating wavelength to greater than 1.5 μm, preferably to a wavelength lying in the C- or L-band. The active layer composition may thus be denoted In1-xGaxAsyNzPp with x≧0.48, y≦1−z−p, z≦0.05, p≧0. The active layer may include a quantum well or multi-quantum wells in which case its thickness is preferably less than the critical thickness for lattice relaxation. In other embodiments the active layer is a “massive” layer with quasi-bulk properties. The active layer may advantageously be under tensile stress, preferably roughly between 1% and 2.2%, to manipulate the light and heavy hole bands. The active layer is typically bounded by barrier layers made of a suitable semiconductor alloy, such as AlInAs or InGaAs(P).
    • 基于铟磷化物衬底或等效缓冲层的半导体光学器件,例如激光器或半导体光放大器(SOA)。 器件的有源层基于常规的InGaAs(P)合金,但是另外包括N以便将工作波长增加到大于1.5μm,优选地增加到位于C波段或L波段中的波长。 因此,活性层组合物可以表示为:1-x Ga x N z N z, p = 0.48,y <= 1-zp,z <= 0.05,p> = 0。 有源层可以包括量子阱或多量子阱,在这种情况下,其厚度优选小于晶格弛豫的临界厚度。 在其它实施方案中,活性层是具有准体积性质的“块状”层。 活性层可以有利地处于拉伸应力下,优选大约在1%和2.2%之间,以操纵轻质和重型孔带。 有源层通常由诸如AlInAs或InGaAs(P)的合适的半导体合金制成的阻挡层限制。
    • 6. 发明授权
    • Integrated semiconductor arrangement of the coupling type between a
photodetector and a light waveguide
    • 在光电检测器和光波导之间的耦合类型的集成半导体布置
    • US4893162A
    • 1990-01-09
    • US81212
    • 1987-06-29
    • Jean-Louis GentnerMarko Erman
    • Jean-Louis GentnerMarko Erman
    • H01L27/14G02B6/12G02B6/122G02B6/42H01L31/09H01L31/10
    • G02B6/42G02B6/12004
    • An integrated semiconductor arrangement of the coupling type between a photodetector D and a light wave guide G.sub.1, operating in a band of given wavelengths, containing on the surface of a semiconductor substrate S of a III-V compound one after the other a confining layer C.sub.0 of III-V compound and a transparent layer C.sub.1 of a III-V compound for the operating wavelengths having an index superior to that of the confining layer, the light waveguide G.sub.1 being realized in layer C.sub.1, and also containing an absorbing layer C.sub.3 of a III-V compound for the operating wavelengths having an index superior to that of the waveguide, in which layer C.sub.3 the photodetector is realized, characterized in that the absorbing layer C.sub.3 is deposited on top of the transparent layer C.sub.1 such that the photodetector is formed on the surface of the light wave guide G.sub.1 and coupled to the latter in parallel with its axis over a given coupling length L.sub.2 of which is a function the amount of light issued by the guide and received by the photodetector. This arrangement can also include, deposited between the transparent layer C.sub.1, hereinafter called first transparent layer and the absorbing layer C.sub.3, a second transparent layer C.sub.2 of a III-V compound for the operating wavelengths having an index lying between that of the first transparent layer C.sub.1 and that of the absorbing layer C.sub.3.
    • 光电探测器D和光波导G1之间的耦合类型的集成半导体装置,其以一定的波长的波段工作,在III-V族化合物的半导体衬底S的表面上一个接一个地包含限定层C0 的III-V族化合物和III-V族化合物的透明层C1,其对于具有优于限制层的折射率的工作波长,光波导G1在层C1中实现,并且还含有 对于具有优于波导的指数的工作波长的III-V族化合物,其中实现了光电检测器C3,其特征在于,吸收层C3沉积在透明层C1的顶部上,使得光电检测器形成在 光波导G1的表面,并且在其给定的耦合长度L2上与其轴线平行地联接,该耦合长度L2是由导向器发出的光量并且接收的函数 d。 这种布置还可以包括沉积在透明层C1(以下称为第一透明层)和吸收层C3之间的第三透明层C2,III-V族化合物的第二透明层C2具有位于第一透明层 C1和吸收层C3。