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1. 发明授权

US07829897B2 Array substrate of liquid crystal display device having thin film transistor on color filter and method of fabricating the same 有权
标题翻译：在滤色器上具有薄膜晶体管的液晶显示装置的阵列基板及其制造方法
公开(公告)号：US07829897B2
公开(公告)日：2010-11-09
申请号：US12428782
申请日：2009-04-23
申请人： Jean-Ho Song , Chong-Chul Chai , Jin-Ho Ju , Joo-Ae Youn , Jun-Hyung Souk , Min Kang
发明人： Jean-Ho Song , Chong-Chul Chai , Jin-Ho Ju , Joo-Ae Youn , Jun-Hyung Souk , Min Kang
IPC分类号： H01L33/00
CPC分类号： G02F1/1368 , G02F1/133514 , G02F2001/133565 , G02F2001/133567 , H01L27/1214 , H01L27/1248 , H01L29/4908 , H01L29/78633
摘要： An array substrate of a liquid crystal display device having a color filter on a gate metal layer, and a data metal layer formed on the color filter. First a gate insulating layer is formed on the gate metal layer to protect and a second gate insulating layer is formed on the color filter layer. Gate lines and gate electrodes are formed in direct contact with the substrate, and color filters are formed on the gate electrodes. To protect gate lines in the patterning process of color filters, a first gate insulating layer is formed on the gate lines and electrodes. Therefore, a high aperture ratio may be enhanced, and the manufacturing yield may be increased.
摘要翻译：在栅极金属层上具有滤色器的液晶显示装置的阵列基板和形成在滤色器上的数据金属层。首先，在栅极金属层上形成栅极绝缘层以进行保护，并且在滤色器层上形成第二栅极绝缘层。栅极线和栅电极形成为与衬底直接接触，并且在栅电极上形成滤色器。为了在滤色器的图案化工艺中保护栅极线，在栅极线和电极上形成第一栅极绝缘层。因此，可以提高高开口率，并且可以提高制造成品率。

2. 发明申请

US20080185587A1 DISPLAY PANEL AND METHOD OF MANUFACTURE 审中-公开
标题翻译：显示面板及其制造方法
公开(公告)号：US20080185587A1
公开(公告)日：2008-08-07
申请号：US11928697
申请日：2007-10-30
申请人： Sang-Woo Whangbo , Jun-Hyung Souk , Yong-Suk Jin , Jin-Ho Ju , Min Kang , Myo-Kyong Joo
发明人： Sang-Woo Whangbo , Jun-Hyung Souk , Yong-Suk Jin , Jin-Ho Ju , Min Kang , Myo-Kyong Joo
IPC分类号： H01L29/04 , H01L21/336
CPC分类号： H01L27/1218 , G02F1/1333 , G02F2001/133302 , G02F2001/133357 , H01L27/1214 , H01L29/78603
摘要： A display panel and a manufacturing method in which the display panel includes an alkali-containing glass substrate having a surface waviness of less about 0.06 μm, a gate electrode formed the substrate, a gate insulating layer formed on the gate electrode, a semiconductor formed on the gate insulating layer, a source electrode and a drain electrode contacting the semiconductor, and a pixel electrode electrically connected to the drain electrode.
摘要翻译：一种显示面板及其制造方法，其特征在于，所述显示面板包括具有小于0.06μm的表面波度的含碱玻璃基板，形成在所述基板上的栅电极，形成在所述栅电极上的栅极绝缘层，栅极绝缘层，与半导体接触的源电极和漏电极以及与漏电极电连接的像素电极。

3. 发明申请

US20090280587A1 METHOD OF TREATING SODA-LIME GLASS SUBSTRATE AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME 审中-公开
标题翻译：处理透明玻璃基材的方法及使用其制造显示基板的方法
公开(公告)号：US20090280587A1
公开(公告)日：2009-11-12
申请号：US12427996
申请日：2009-04-22
申请人： Sang-Woo WHANGBO , Bong-Kyu Shin , Sang-Uk Lim , Jun-Hyung Souk , Jin-Ho Ju
发明人： Sang-Woo WHANGBO , Bong-Kyu Shin , Sang-Uk Lim , Jun-Hyung Souk , Jin-Ho Ju
IPC分类号： H01L33/00 , B08B5/00 , B05D3/10
CPC分类号： C03C23/006 , C03C17/36 , C03C17/3626 , C03C17/3636 , C03C23/0075
摘要： A method of treating a soda-lime glass (SLG) substrate includes cleaning the SLG substrate using an alkali cleaning solution and cleaning the cleaned SLG substrate using a plasma process. The SLG substrate is cleaned using the alkali cleaning solution to remove particles adhered to the SLG substrate. Thus, defects due to the adhering particles may be reduced.
摘要翻译：处理钠钙玻璃（SLG）衬底的方法包括使用碱性清洗溶液清洗SLG衬底并使用等离子体工艺清洁清洁的SLG衬底。使用碱性清洁溶液清洁SLG基板以除去附着在SLG基板上的颗粒。因此，可能减少由于粘附颗粒引起的缺陷。

4. 发明申请

US20070139597A1 DISPLAY SUBSTRATE, METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICE HAVING THE SAME 审中-公开
标题翻译：显示基板，其制造方法和具有该基板的显示装置
公开(公告)号：US20070139597A1
公开(公告)日：2007-06-21
申请号：US11559589
申请日：2006-11-14
申请人： Yi-Seop Shim , Gug-Rae Jo , Byoung-Joo Kim , Ji-Won Choi , Jang-Soo Kim , Shi-Yul Kim , Jin-Ho Ju , Chong-Chul Chai
发明人： Yi-Seop Shim , Gug-Rae Jo , Byoung-Joo Kim , Ji-Won Choi , Jang-Soo Kim , Shi-Yul Kim , Jin-Ho Ju , Chong-Chul Chai
IPC分类号： G02F1/1343 , G02F1/1335
CPC分类号： G02F1/1362 , G02F1/136227 , G02F2001/136222
摘要： A display substrate includes a thin film transistor layer, a color filter layer, a plurality of pixel electrodes, a first cover layer and an alignment layer. The thin film transistor layer includes a plurality of pixel regions. The color filter layer is formed on the thin film transistor layer. The pixel electrodes are formed on the color filter layer with at least one gap defined between adjacent pixel electrodes. The first cover layer is provided in the gap between adjacent pixel electrodes and covers a portion of the color filter layer exposed by the gap between the pixel electrodes. The alignment layer is formed on the pixel electrodes and the first cover layer. Therefore, the color filter layer is spaced apart from the alignment layer to decrease an afterimage, thereby improving an image display quality
摘要翻译：显示基板包括薄膜晶体管层，滤色器层，多个像素电极，第一覆盖层和取向层。薄膜晶体管层包括多个像素区域。滤色器层形成在薄膜晶体管层上。像素电极形成在滤色器层上，在相邻像素电极之间限定有至少一个间隙。第一覆盖层设置在相邻像素电极之间的间隙中，并且覆盖由像素电极之间的间隙暴露的滤色器层的一部分。取向层形成在像素电极和第一覆盖层上。因此，滤色器层与对准层间隔开以减少残像，从而提高图像显示质量

5. 发明申请

US20080204615A1 LIQUID CRYSTAL DISPLAY AND METHOD THEREOF 审中-公开
标题翻译：液晶显示及其方法
公开(公告)号：US20080204615A1
公开(公告)日：2008-08-28
申请号：US12033188
申请日：2008-02-19
申请人： Kyoung-Ju Shin , Jin-Ho Ju , Chong-Chul Chai
发明人： Kyoung-Ju Shin , Jin-Ho Ju , Chong-Chul Chai
IPC分类号： G02F1/1333 , G02F1/1368 , G02F1/13
CPC分类号： G02F1/136213 , G02F1/13624 , G02F2001/134345 , G02F2001/13606
摘要： A liquid crystal display (“LCD”) includes a gate line, a data line intersecting the gate line, a pixel including first and second sub-pixels connected to the gate line and the data line, and a coupling capacitor coupled between the first and the second sub-pixels. The first sub-pixel includes a first liquid crystal (“LC”) capacitor and a first thin film transistor (“TFT”). The second sub-pixel includes a second LC capacitor and a second TFT. The first and second TFTs respectively include a gate electrode, a source electrode, and a drain electrode. The gate electrodes of the first and second TFTs are connected to the gate line, the source electrodes of the first and second TFTs are connected to the data line, and the coupling capacitor includes the sub-pixel electrode of the second sub-pixel and the drain electrode of the second TFT as two terminals.
摘要翻译：液晶显示器（“LCD”）包括栅极线，与栅极线相交的数据线，包括连接到栅极线和数据线的第一和第二子像素的像素，以及耦合电容器，耦合在第一和第二个子像素。第一子像素包括第一液晶（“LC”）电容器和第一薄膜晶体管（“TFT”）。第二子像素包括第二LC电容器和第二TFT。第一和第二TFT分别包括栅电极，源电极和漏电极。第一和第二TFT的栅电极连接到栅极线，第一和第二TFT的源电极连接到数据线，耦合电容器包括第二子像素的子像素电极和第二TFT的漏电极作为两个端子。

6. 发明申请

US20080001937A1 DISPLAY SUBSTRATE HAVING COLORABLE ORGANIC LAYER INTERPOSED BETWEEN PIXEL ELECTRODE AND TFT LAYER, PLUS METHOD OF MANUFACTURING THE SAME AND DISPLAY DEVICE HAVING THE SAME 审中-公开
标题翻译：具有像素电极和TFT层之间的有色有机层的显示基板，其制造方法及其显示装置
公开(公告)号：US20080001937A1
公开(公告)日：2008-01-03
申请号：US11759515
申请日：2007-06-07
申请人： Kyoung-Ju Shin , Jin-Ho Ju , Shi-Yul Kim , Jang-Soo Kim , Chong-Chul Chai , Hye-Young Ryu
发明人： Kyoung-Ju Shin , Jin-Ho Ju , Shi-Yul Kim , Jang-Soo Kim , Chong-Chul Chai , Hye-Young Ryu
IPC分类号： G09G5/00
CPC分类号： G02F1/136227 , G02F2001/136222 , H01L27/1248
摘要： A display substrate includes a TFT layer, a passivation layer, an organic layer, an inorganic insulating layer and a pixel electrode. The TFT layer includes gate and data lines, a thin film transistor and a storage electrode. The data line crosses the gate line, and is electrically insulated from the gate line by a gate insulating layer. The TFT is electrically connected to the gate and data lines. The passivation layer covers the TFT layer. The organic layer is on the passivation layer. The inorganic insulating layer of a low temperature deposition is on the organic layer, and the low temperature is about 100° C. to about 250° C. The pixel electrode is on the inorganic insulating layer to be electrically connected to the TFT through a contact hole that is formed through the inorganic insulating layer, the organic layer and the passivation layer. The inorganic insulating layer helps to block leakage of impurities from the organic layer to layers above the inorganic insulating layer.
摘要翻译：显示基板包括TFT层，钝化层，有机层，无机绝缘层和像素电极。 TFT层包括栅极和数据线，薄膜晶体管和存储电极。数据线与栅极线交叉，并通过栅极绝缘层与栅极线电绝缘。 TFT与栅极和数据线电连接。钝化层覆盖TFT层。有机层位于钝化层上。低温沉积的无机绝缘层在有机层上，低温约为100℃至约250℃。像素电极位于无机绝缘层上，通过接触电连接到TFT 通过无机绝缘层，有机层和钝化层形成的孔。无机绝缘层有助于阻止杂质从有机层泄漏到无机绝缘层上方的层。

7. 发明申请

US20130048604A1 PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME 审中-公开
标题翻译：光刻胶组合物和使用其形成微细图案的方法
公开(公告)号：US20130048604A1
公开(公告)日：2013-02-28
申请号：US13568233
申请日：2012-08-07
申请人： Min Kang , Jin-Ho Ju , Jong-Kwang Lee , Bong-Yeon Kim , Jeong-Won Kim , Deok-Man Kang , Jung-Hwan Cho , Kyung-Mi Choi
发明人： Min Kang , Jin-Ho Ju , Jong-Kwang Lee , Bong-Yeon Kim , Jeong-Won Kim , Deok-Man Kang , Jung-Hwan Cho , Kyung-Mi Choi
IPC分类号： G03F7/004 , B44C1/22 , G03F7/022 , G03F7/027 , G03F7/016
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046 , G03F7/11
摘要： A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern.
摘要翻译：光致抗蚀剂组合物包括约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％的光吸收剂，剩余部分包括有机溶剂。还提供了形成包括在基板上形成薄膜的精细图案的方法; 通过使用光致抗蚀剂组合物形成光致抗蚀剂图案，所述光致抗蚀剂组合物包含约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％的光吸收剂，余量包含有机溶剂; 并通过使用光致抗蚀剂图案作为蚀刻停止层来图案化薄膜以形成精细图案。

8. 发明申请

US20090239733A1 Methods of heat-treating soda-lime glass substrates and heat-treated soda-lime glass substrates formed using the same 审中-公开
标题翻译：对使用其制作的钠钙玻璃基板和加热处理的钠钙玻璃基板进行热处理的方法
公开(公告)号：US20090239733A1
公开(公告)日：2009-09-24
申请号：US12381207
申请日：2009-03-09
申请人： Se-Ah Kwon , Min Kang , Byoung-Joo kim , Jin-Ho Ju , Chul Huh , Sang-Woo Whangbo
发明人： Se-Ah Kwon , Min Kang , Byoung-Joo kim , Jin-Ho Ju , Chul Huh , Sang-Woo Whangbo
IPC分类号： C03C3/04 , C03B29/00
CPC分类号： C03B29/08 , C03C23/007
摘要： A soda-lime glass substrate formed through a heat-treatment method has an absorption coefficient ranging from about 0.15 λ,W/m·K to about 0.54 λ,W/m·K, and a free path length ranging from about 0.12 cm to about 0.24 cm. The heat-treated soda-lime glass substrate is formed by heating for a selected time at a pre-specified maximum temperature of about 270° C. to about 330° C. so as to remove thermally induced residual deformations from the substrate and then the substrate is slowly cooled so as to substantially avoid reintroducing thermally induced residual deformations into the cooling substrate. Thus, the soda-lime glass substrate is transformed to one at or close to its contraction saturation point. This allows the heat-treated soda-lime glass substrate to serve in a practical way as a substrate of a flat display panel.
摘要翻译：通过热处理方法形成的钠钙玻璃基板的吸收系数范围为约0.15λ，W / m.K至约0.54λ，W / m.K，自由通道长度范围为约0.12cm至约0.24cm。热处理的钠钙玻璃基板通过在约270℃至约330℃的预先规定的最高温度下加热选定的时间而形成，以便从基板除去热诱导的残余变形，然后衬底被缓慢冷却，以便基本上避免将热诱导的残留变形重新引入冷却衬底。因此，钠钙玻璃基板在其收缩饱和点处或其附近被转变成一个。这样，作为平面显示面板的基板，能够以实用的方式使热处理的钠钙玻璃基板。

9. 发明授权

US08809467B2 Organic layer composition and liquid crystal display using the same 有权
标题翻译：有机层组成和使用其的液晶显示器
公开(公告)号：US08809467B2
公开(公告)日：2014-08-19
申请号：US12723419
申请日：2010-03-12
申请人： Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Jin-Ho Ju , Doo-Hee Jung , Jung-In Park , Shi-Yul Kim
发明人： Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Jin-Ho Ju , Doo-Hee Jung , Jung-In Park , Shi-Yul Kim
IPC分类号： C08G59/00
CPC分类号： C08F220/06 , C08F220/26 , C08F222/04 , C08F224/00 , C08G73/1067 , G02F1/133707 , G02F1/133719 , G02F1/133753 , G02F1/133788 , G02F1/136209 , G02F1/13624 , G02F2001/133726 , G02F2001/133746 , G02F2001/133757 , G02F2001/136222 , G02F2201/086 , G02F2202/022 , G02F2202/103 , G02F2202/104
摘要： An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group.
摘要翻译：提供了有机层组合物和包括其的液晶显示器。根据示例性实施方案的有机层组合物包括通过共聚第一组中包含的化合物和第二组而形成的粘合剂，其中第一组包括丙烯酸类化合物，第二组包括不含-COO-基团的化合物。

10. 发明授权

US07888675B2 Thin film transistor array panel and fabrication 有权
标题翻译：薄膜晶体管阵列和制造
公开(公告)号：US07888675B2
公开(公告)日：2011-02-15
申请号：US12099718
申请日：2008-04-08
申请人： Sang-Gab Kim , Woo-Geun Lee , Shi-Yul Kim , Jin-Ho Ju , Jang-Soo Kim , Sang-Woo Whangbo , Min-Seok Oh , Hye-Young Ryu , Hong-Kee Chin
发明人： Sang-Gab Kim , Woo-Geun Lee , Shi-Yul Kim , Jin-Ho Ju , Jang-Soo Kim , Sang-Woo Whangbo , Min-Seok Oh , Hye-Young Ryu , Hong-Kee Chin
IPC分类号： H01L21/00
CPC分类号： H01L27/124 , G02F2001/13629 , H01L29/458
摘要： The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor layer, and an ohmic contact on the gate line; forming a first conducting film including Mo, a second conducting film including Al, and a third conducting film including Mo on the ohmic contact; forming a first photoresist pattern on the third conducting film; etching the first, second, and third conducting films, the ohmic contact, and the semiconductor layer using the first photoresist pattern as a mask; removing the first photoresist pattern by a predetermined thickness to form a second photoresist pattern; etching the first, second, and third conducting films using the second photoresist pattern as a mask to expose a portion of the ohmic contact; and etching the exposed ohmic contact using a Cl-containing gas and a F-containing gas.
摘要翻译：本发明提供一种薄膜晶体管阵列面板的制造方法，其包括在基板上形成栅极线; 在栅极线上形成栅极绝缘层，半导体层和欧姆接触; 形成包括Mo的第一导电膜，包括Al的第二导电膜和在欧姆接触上包含Mo的第三导电膜; 在所述第三导电膜上形成第一光致抗蚀剂图案; 使用第一光致抗蚀剂图案作为掩模蚀刻第一，第二和第三导电膜，欧姆接触和半导体层; 将第一光致抗蚀剂图案去除预定厚度以形成第二光致抗蚀剂图案; 使用第二光致抗蚀剂图案作为掩模蚀刻第一，第二和第三导电膜以暴露欧姆接触的一部分; 并使用含Cl气体和含F气体蚀刻暴露的欧姆接触。

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