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1. 发明授权

US4657845A Positive tone oxygen plasma developable photoresist 失效
标题翻译：正音氧等离子可显影光刻胶
公开(公告)号：US4657845A
公开(公告)日：1987-04-14
申请号：US818584
申请日：1986-01-14
申请人： Jean M. J. Frechet , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
发明人： Jean M. J. Frechet , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
IPC分类号： G03C5/00 , G03F7/039 , G03F7/26 , G03F7/30 , G03F7/36 , G03F7/38 , H01L21/027 , B44C1/22
CPC分类号： G03F7/265 , G03F7/039
摘要： A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, the resist is treated with an organometallic reagent containing an element which forms a non-volatile oxide. It is then developed by means of oxygen reactive ion etching.
摘要翻译：在没有溶剂显影步骤的情况下获得正色调光致抗蚀剂。抗蚀剂是含有掩蔽的反应性官能团的聚合物，其被成像曝光以揭示随后用非有机金属试剂处理的功能以重新获得该功能。在暴露曝光后，用含有形成非挥发性氧化物的元素的有机金属试剂处理抗蚀剂。然后通过氧反应离子蚀刻来开发。

2. 发明授权

US4939070A Thermally stable photoresists with high sensitivity 失效
标题翻译：热稳定的光致抗蚀剂具有高灵敏度
公开(公告)号：US4939070A
公开(公告)日：1990-07-03
申请号：US215966
申请日：1988-07-07
申请人： William R. Brunsvold , Ming-Fea Chow , Willard E. Conley , Dale M. Crockatt , Jean M. J. Frechet , George J. Hefferon , Hiroshi Ito , Nancy E. Iwamoto , Carlton G. Willson
发明人： William R. Brunsvold , Ming-Fea Chow , Willard E. Conley , Dale M. Crockatt , Jean M. J. Frechet , George J. Hefferon , Hiroshi Ito , Nancy E. Iwamoto , Carlton G. Willson
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/143 , Y10S430/168
摘要： The present invention discloses particular lithographic polymeric materials and methods of using these materials, wherein the polymeric materials have acid labile or photolabile groups pendant to the polymer backbone. The polymeric materials are sufficiently transparent to deep UV radiation to permit deep UV imaging, can be used to produce resist structures having thermal stability at temperatures greater than about 160.degree. C., and are sufficiently resistant to excessive crosslinking when heated to temperatures ranging from about 160.degree. C. to about 250.degree. C. that they remain soluble in common lithographic developers and strippers.The present invention also discloses resists comprising substituted polyvinyl benzoates which, after imaging, exhibit unexpectedly high thermal stability, in terms of plastic flow. These resists cannot be imaged using deep UV because they exhibit such a high degree of opacity below 280 nm; however, they are useful as the top, imaging layer in a bilayer resist process wherein the top layer acts as a mask during deep UV exposure of the bottom layer.
摘要翻译：本发明公开了特定的平版印刷聚合物材料和使用这些材料的方法，其中聚合物材料具有垂直于聚合物主链的酸不稳定性或光不稳定性基团。聚合物材料对于深紫外线辐射具有足够的透明度以允许深紫外成像，可用于生产在大于约160℃的温度下具有热稳定性的抗蚀剂结构，并且当加热至约 160℃至约250℃，它们仍溶于普通的平版印刷显影剂和剥离剂。本发明还公开了包含取代的聚乙烯基苯甲酸酯的抗蚀剂，其在成像之后，在塑性流动方面表现出意想不到的高热稳定性。这些抗蚀剂不能使用深紫外成像，因为它们在280nm以下表现出如此高的不透明度; 然而，它们可用作双层抗蚀剂工艺中的顶部成像层，其中顶层在底层的深紫外线曝光期间用作掩模。

3. 发明授权

US4491628A Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone 失效
标题翻译：具有酸产生光引发剂的正性和负性抗蚀剂组合物和由聚合物主链悬挂的酸不稳定基团的聚合物
公开(公告)号：US4491628A
公开(公告)日：1985-01-01
申请号：US410201
申请日：1982-08-23
申请人： Hiroshi Ito , Carlton G. Willson , Jean M. J. Frechet
发明人： Hiroshi Ito , Carlton G. Willson , Jean M. J. Frechet
IPC分类号： C08K5/00 , C08F8/00 , C08L33/00 , C08L33/02 , G03F7/004 , G03F7/021 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , H01L21/027 , G03C1/60 , G03C1/68
CPC分类号： G03F7/039 , G03F7/021 , Y10S430/109 , Y10S430/111 , Y10S430/115
摘要： Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.
摘要翻译：正确选择显色剂后，对具有正或负色调的紫外线，电子束和X射线辐射敏感的抗体由具有复发性侧基的聚合物配制，所述聚合物具有经历有效酸解和伴随变化的叔丁酯或叔丁基碳酸酯极性（溶解度）与光引发剂一起，其在辐射分解时产生酸。还可以添加改变波长灵敏度的敏化剂组分。

4. 发明授权

US4551418A Process for preparing negative relief images with cationic photopolymerization 失效
标题翻译：用阳离子光聚合制备负浮雕图像的方法
公开(公告)号：US4551418A
公开(公告)日：1985-11-05
申请号：US702514
申请日：1985-02-19
申请人： Anders Hult , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
发明人： Anders Hult , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
IPC分类号： H01L21/30 , G03F7/20 , G03F7/26 , G03F7/38 , H01L21/027 , H01L21/302 , H01L21/3065 , G03C5/00
CPC分类号： G03F7/265
摘要： Negative relief images are generated by a process comprising the use of cationic polymerization and plasma etching.
摘要翻译：负浮雕图像通过包括使用阳离子聚合和等离子体蚀刻的方法产生。

5. 发明授权

US4908298A Method of creating patterned multilayer films for use in production of semiconductor circuits and systems 失效
标题翻译：制造用于制造半导体电路和系统的图案化多层膜的方法
公开(公告)号：US4908298A
公开(公告)日：1990-03-13
申请号：US117383
申请日：1987-10-30
申请人： George J. Hefferon , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
发明人： George J. Hefferon , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
IPC分类号： G03F7/40
CPC分类号： G03F7/405 , Y10S438/948
摘要： A method is provided for creating multilayer patterned films wherein at least one layer is an etch-resistant patterned layer, and wherein either positive or negative tone patterns can be obtained.The etch-resistant patterned layer is obtained by reacting a patterned polymeric film containing reactive functional groups with an organometallic reagent such as a silicon-containing compound. The pattern is subsequently transferred through adjacent polymeric layers using an oxygen plasma or equivalent dry-etch method.
摘要翻译：提供了一种用于产生多层图案化膜的方法，其中至少一层是耐蚀刻图案层，并且其中可以获得正或负色调图案。通过使含有反应性官能团的图案化聚合物膜与有机金属试剂如含硅化合物反应，获得耐蚀刻图案层。随后使用氧等离子体或等效的干法蚀刻方法将图案转移通过相邻的聚合物层。

6. 发明授权

US4552833A Radiation sensitive and oxygen plasma developable resist 失效
标题翻译：辐射敏感和氧等离子显影抗蚀剂
公开(公告)号：US4552833A
公开(公告)日：1985-11-12
申请号：US609690
申请日：1984-05-14
申请人： Hiroshi Ito , Scott A. MacDonald , Robert D. Miller , Carlton G. Willson
发明人： Hiroshi Ito , Scott A. MacDonald , Robert D. Miller , Carlton G. Willson
IPC分类号： G03F7/30 , G03F7/038 , G03F7/039 , G03F7/26 , G03F7/36 , G03F7/38 , H01L21/027 , G03C5/16 , G03C1/72
CPC分类号： G03F7/038 , G03F7/265 , G03F7/36
摘要： A negative tone resist image is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organometallic reagent; (4) developing the relief image by the oxygen plasma etching.
摘要翻译：负色调抗蚀剂图像通过（1）用含有掩蔽的反应性官能团的聚合物膜涂覆基材来实现; （2）以使掩蔽的功能被释放的方式将膜成像曝光于辐射; （3）使膜与有机金属试剂接触; （4）通过氧等离子体蚀刻显影浮雕图像。

7. 发明授权

US09674511B2 Stereoscopic image display device 有权
公开(公告)号：US09674511B2
公开(公告)日：2017-06-06
申请号：US13825507
申请日：2011-03-15
申请人： Hiroshi Ito
发明人： Hiroshi Ito
IPC分类号： H04N13/04 , G02B27/22
CPC分类号： H04N13/341 , G02B27/225 , G02B27/2264 , H04N13/32
摘要： The invention can provide a stereoscopic image display device, which achieves advantages of both a “glasses” device and a “naked-eye” device, while having a small size. When a right-eye image is displayed, a light blocking region forms on the left side of the center line, and when a left-eye image is displayed, a light blocking region forms on the right side of the center line. When the viewer is located in the regions, the right eye views the right-eye image, and the left eye views the left-eye image. Thus, even when the viewer faces stereoscopic display device with naked eyes, the viewer can view the stereoscopic image as long as the eyes of the viewer are located in the light blocking regions. The right and left images are mixed in the region other than the light blocking regions. However, multiple viewers can view the stereoscopic image when wearing the glasses.

8. 发明授权

US09330613B2 Image display method and liquid crystal display device employing same 有权
标题翻译：图像显示方法和采用该方法的液晶显示装置
公开(公告)号：US09330613B2
公开(公告)日：2016-05-03
申请号：US13885109
申请日：2011-06-13
申请人： Hiroshi Ito
发明人： Hiroshi Ito
IPC分类号： G09G5/10 , G09G3/36 , H04N13/00 , H04N13/04 , G09G3/00
CPC分类号： G09G3/3607 , G09G3/003 , G09G3/3648 , G09G2310/0224 , G09G2310/061 , H04N13/144 , H04N13/315 , H04N13/341
摘要： Uniformize afterimages caused by black insertion to each image when two types of images are alternately displayed. There are provided a left and right image alternate output unit, a mask pattern storage unit, a mask pattern selection counter, and a mask synthesizing unit. The left and right image alternate output unit alternately outputs two types of video frames. The mask pattern storage unit stores m mask patterns, wherein basic regions are defined in a pixel region of a liquid crystal panel, the pixel region has m pixels arrayed in a matrix, m is an even number equal to or greater than 4, the in mask patterns have different arrangements of mask pixels in the basic region, and the number of the mask pixels is an even number smaller than m and equal to or greater than 2.
摘要翻译：当交替显示两种类型的图像时，均匀化由黑色插入引起的每个图像所造成的余像。提供了左右图像交替输出单元，掩模图案存储单元，掩模图案选择计数器和掩码合成单元。左右图像交替输出单元交替输出两种类型的视频帧。掩模图案存储单元存储m个掩模图案，其中基本区域被限定在液晶面板的像素区域中，像素区域具有以矩阵排列的m个像素，m为等于或大于4的偶数，掩模图案在基本区域中具有不同的掩模像素布置，并且掩模像素的数量是小于m且等于或大于2的偶数。

9. 发明授权

US08819903B2 Manufacturing method of a piezoelectric element and a liquid ejecting head 有权
标题翻译：压电元件和液体喷射头的制造方法
公开(公告)号：US08819903B2
公开(公告)日：2014-09-02
申请号：US13197464
申请日：2011-08-03
申请人： Toshihiro Shimizu , Jiro Kato , Eiju Hirai , Hiroshi Ito
发明人： Toshihiro Shimizu , Jiro Kato , Eiju Hirai , Hiroshi Ito
IPC分类号： H04R17/00 , H01L41/29 , B41J2/16 , H01L41/314 , B41J2/14
CPC分类号： H01L41/29 , B41J2/161 , B41J2/1628 , B41J2/1631 , B41J2002/14491 , H01L41/314 , Y10T29/42 , Y10T29/49002 , Y10T29/49401
摘要： A manufacturing method of a piezoelectric element includes: forming a first conductive layer upon a substrate; forming a piezoelectric layer upon the first conductive layer; forming a second conductive layer upon the piezoelectric layer; forming a third conductive layer upon the second conductive layer; forming a first portion, a second portion, and an opening portion provided between the first portion and the second portion by patterning the third conductive layer; forming a resist layer that covers the opening portion and covers the edges of the first portion and the second portion that face the opening portion side; and forming a first conductive portion and a second conductive portion configured from the first portion and the second portion, and forming a third conductive portion configured from the second conductive layer, by dry-etching the second conductive layer using the first portion, the second portion, and the resist layer as a mask.
摘要翻译：压电元件的制造方法包括：在基板上形成第一导电层; 在所述第一导电层上形成压电层; 在所述压电层上形成第二导电层; 在所述第二导电层上形成第三导电层; 通过对第三导电层进行构图而形成第一部分，第二部分和设置在第一部分和第二部分之间的开口部分; 形成覆盖所述开口部并且覆盖所述第一部分和面向所述开口部侧的所述第二部分的边缘的抗蚀剂层; 以及形成由所述第一部分和所述第二部分构成的第一导电部分和第二导电部分，以及通过使用所述第一部分干蚀刻所述第二导电层，形成由所述第二导电层构成的第三导电部分，所述第二部分，抗蚀剂层作为掩模。

10. 发明授权

US08802357B2 Method for using a topcoat composition 有权
标题翻译：使用面漆组合物的方法
公开(公告)号：US08802357B2
公开(公告)日：2014-08-12
申请号：US13326404
申请日：2011-12-15
申请人： Hiroshi Ito , Linda Karin Sundberg
发明人： Hiroshi Ito , Linda Karin Sundberg
IPC分类号： G03F7/095
CPC分类号： G03F7/2041 , G03F7/0046 , G03F7/11
摘要： A method of forming an image on a photoresist. The method includes: forming a photoresist over a substrate; applying a topcoat composition, the topcoat composition comprising at least one fluorine-containing polymer and a casting solvent, onto the photoresist; removing the casting solvent of the topcoat composition resulting in the formation of a topcoat material over the photoresist; exposing the photoresist to radiation, the radiation changing a chemical composition of the regions of the photoresist exposed to the radiation, forming exposed and unexposed regions in the photoresist; and removing i) the topcoat material and ii) the exposed regions of the photoresist or the unexposed regions of the photoresist.
摘要翻译：在光致抗蚀剂上形成图像的方法。该方法包括：在衬底上形成光致抗蚀剂; 将面漆组合物，包含至少一种含氟聚合物和浇铸溶剂的面漆组合物涂覆到光致抗蚀剂上; 除去顶涂层组合物的浇铸溶剂，导致在光致抗蚀剂上形成顶涂层材料; 将光致抗蚀剂暴露于辐射，辐射改变暴露于辐射的光刻胶的区域的化学组成，在光致抗蚀剂中形成暴露和未曝光的区域; 并去除i）面漆材料和ii）光致抗蚀剂的曝光区域或光致抗蚀剂的未曝光区域。

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