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1. 发明授权

US4491628A Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone 失效
标题翻译：具有酸产生光引发剂的正性和负性抗蚀剂组合物和由聚合物主链悬挂的酸不稳定基团的聚合物
公开(公告)号：US4491628A
公开(公告)日：1985-01-01
申请号：US410201
申请日：1982-08-23
申请人： Hiroshi Ito , Carlton G. Willson , Jean M. J. Frechet
发明人： Hiroshi Ito , Carlton G. Willson , Jean M. J. Frechet
IPC分类号： C08K5/00 , C08F8/00 , C08L33/00 , C08L33/02 , G03F7/004 , G03F7/021 , G03F7/038 , G03F7/039 , G03F7/20 , G03F7/30 , H01L21/027 , G03C1/60 , G03C1/68
CPC分类号： G03F7/039 , G03F7/021 , Y10S430/109 , Y10S430/111 , Y10S430/115
摘要： Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.
摘要翻译：正确选择显色剂后，对具有正或负色调的紫外线，电子束和X射线辐射敏感的抗体由具有复发性侧基的聚合物配制，所述聚合物具有经历有效酸解和伴随变化的叔丁酯或叔丁基碳酸酯极性（溶解度）与光引发剂一起，其在辐射分解时产生酸。还可以添加改变波长灵敏度的敏化剂组分。

2. 发明授权

US4939070A Thermally stable photoresists with high sensitivity 失效
标题翻译：热稳定的光致抗蚀剂具有高灵敏度
公开(公告)号：US4939070A
公开(公告)日：1990-07-03
申请号：US215966
申请日：1988-07-07
申请人： William R. Brunsvold , Ming-Fea Chow , Willard E. Conley , Dale M. Crockatt , Jean M. J. Frechet , George J. Hefferon , Hiroshi Ito , Nancy E. Iwamoto , Carlton G. Willson
发明人： William R. Brunsvold , Ming-Fea Chow , Willard E. Conley , Dale M. Crockatt , Jean M. J. Frechet , George J. Hefferon , Hiroshi Ito , Nancy E. Iwamoto , Carlton G. Willson
IPC分类号： G03F7/039
CPC分类号： G03F7/039 , Y10S430/143 , Y10S430/168
摘要： The present invention discloses particular lithographic polymeric materials and methods of using these materials, wherein the polymeric materials have acid labile or photolabile groups pendant to the polymer backbone. The polymeric materials are sufficiently transparent to deep UV radiation to permit deep UV imaging, can be used to produce resist structures having thermal stability at temperatures greater than about 160.degree. C., and are sufficiently resistant to excessive crosslinking when heated to temperatures ranging from about 160.degree. C. to about 250.degree. C. that they remain soluble in common lithographic developers and strippers.The present invention also discloses resists comprising substituted polyvinyl benzoates which, after imaging, exhibit unexpectedly high thermal stability, in terms of plastic flow. These resists cannot be imaged using deep UV because they exhibit such a high degree of opacity below 280 nm; however, they are useful as the top, imaging layer in a bilayer resist process wherein the top layer acts as a mask during deep UV exposure of the bottom layer.
摘要翻译：本发明公开了特定的平版印刷聚合物材料和使用这些材料的方法，其中聚合物材料具有垂直于聚合物主链的酸不稳定性或光不稳定性基团。聚合物材料对于深紫外线辐射具有足够的透明度以允许深紫外成像，可用于生产在大于约160℃的温度下具有热稳定性的抗蚀剂结构，并且当加热至约 160℃至约250℃，它们仍溶于普通的平版印刷显影剂和剥离剂。本发明还公开了包含取代的聚乙烯基苯甲酸酯的抗蚀剂，其在成像之后，在塑性流动方面表现出意想不到的高热稳定性。这些抗蚀剂不能使用深紫外成像，因为它们在280nm以下表现出如此高的不透明度; 然而，它们可用作双层抗蚀剂工艺中的顶部成像层，其中顶层在底层的深紫外线曝光期间用作掩模。

3. 发明授权

US4657845A Positive tone oxygen plasma developable photoresist 失效
标题翻译：正音氧等离子可显影光刻胶
公开(公告)号：US4657845A
公开(公告)日：1987-04-14
申请号：US818584
申请日：1986-01-14
申请人： Jean M. J. Frechet , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
发明人： Jean M. J. Frechet , Hiroshi Ito , Scott A. MacDonald , Carlton G. Willson
IPC分类号： G03C5/00 , G03F7/039 , G03F7/26 , G03F7/30 , G03F7/36 , G03F7/38 , H01L21/027 , B44C1/22
CPC分类号： G03F7/265 , G03F7/039
摘要： A positive tone photoresist is obtained without a solvent development step. The resist is a polymer containing masked reactive functionality which is imagewise exposed to unmask the functionality then treated with a non-organometallic reagent to remask that functionality. Following flood exposure, the resist is treated with an organometallic reagent containing an element which forms a non-volatile oxide. It is then developed by means of oxygen reactive ion etching.
摘要翻译：在没有溶剂显影步骤的情况下获得正色调光致抗蚀剂。抗蚀剂是含有掩蔽的反应性官能团的聚合物，其被成像曝光以揭示随后用非有机金属试剂处理的功能以重新获得该功能。在暴露曝光后，用含有形成非挥发性氧化物的元素的有机金属试剂处理抗蚀剂。然后通过氧反应离子蚀刻来开发。

4. 发明授权

US4800152A Negative resist compositions 失效
标题翻译：负性抗蚀剂组合物
公开(公告)号：US4800152A
公开(公告)日：1989-01-24
申请号：US26425
申请日：1987-03-16
申请人： Robert D. Allen , Jean M. J. Frechet , Robert J. Twieg , Carlton G. Willson
发明人： Robert D. Allen , Jean M. J. Frechet , Robert J. Twieg , Carlton G. Willson
IPC分类号： G03F7/004 , G03F7/029 , G03F7/038 , G03F7/039 , H01L21/027 , G03C1/71
CPC分类号： G03F7/038 , G03F7/029 , G03F7/039 , Y10S430/115 , Y10S430/12 , Y10S430/122 , Y10S430/126 , Y10S430/128
摘要： Heat stable, negative resist compositions are provided for use, particularly in deep ultraviolet light X-ray and electron beams. The composition comprises an acid generating onium salt photoinitiator, a source of polyfunctional activated aromatic rings and a source of polyfunctional carbonium ions, with at least one of said sources being a polymer.

5. 发明授权

US5545509A Photoresist composition with photosensitive base generator 失效
标题翻译：光敏组合物与光敏底物发生器
公开(公告)号：US5545509A
公开(公告)日：1996-08-13
申请号：US190716
申请日：1994-02-01
申请人： James F. Cameron , Jean M. J. Frechet , Man-Kit Leung , Claus-Peter Niesert , Scott A MacDonald , Carlton G. Willson
发明人： James F. Cameron , Jean M. J. Frechet , Man-Kit Leung , Claus-Peter Niesert , Scott A MacDonald , Carlton G. Willson
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0045 , G03F7/038
摘要： The present invention relates to an improved lithographic photoresist composition comprising a photosensitive base generator. The composition is useful in the manufacture of integrated circuits.
摘要翻译：本发明涉及包含光敏基底产生剂的改进的光刻胶组合物。该组合物可用于集成电路的制造。

6. 发明授权

US07431888B2 Photoinitiated grafting of porous polymer monoliths and thermoplastic polymers for microfluidic devices 有权
标题翻译：用于微流体装置的多孔聚合物整料和热塑性聚合物的光引发接枝
公开(公告)号：US07431888B2
公开(公告)日：2008-10-07
申请号：US10665900
申请日：2003-09-19
申请人： Jean M. J. Frechet , Frantisek Svec , Thomas Rohr
发明人： Jean M. J. Frechet , Frantisek Svec , Thomas Rohr
IPC分类号： B01L3/02
CPC分类号： B01L3/502707 , B01L2200/12 , B01L2300/069 , B01L2300/0809 , B01L2300/16 , Y10T436/2575
摘要： A microfluidic device preferably made of a thermoplastic polymer that includes a channel or a multiplicity of channels whose surfaces are modified by photografting. The device further includes a porous polymer monolith prepared via UV initiated polymerization within the channel, and functionalization of the pore surface of the monolith using photografting. Processes for making such surface modifications of thermoplastic polymers and porous polymer monoliths are set forth.
摘要翻译：优选由热塑性聚合物制成的微流体装置，该微流体装置包括通道或多个通道，其表面通过光栅改性而被修饰。该装置还包括通过通道内的UV引发聚合制备的多孔聚合物整料，以及使用光栅功能化整体的孔表面。阐述了制备热塑性聚合物和多孔聚合物整料的这种表面改性的方法。

7. 发明授权

US07101937B1 Dendritic based macromolecules 失效
标题翻译：基于树枝状的大分子
公开(公告)号：US07101937B1
公开(公告)日：2006-09-05
申请号：US08422627
申请日：1995-04-14
申请人： Jean M. J. Frechet , Craig J. Hawker , Karen Wooley
发明人： Jean M. J. Frechet , Craig J. Hawker , Karen Wooley
IPC分类号： C08F255/00
CPC分类号： C08G83/003 , C08G81/00
摘要： Macromolecules in the shape of three-dimensional kites, barbells, and other shapes are disclosed. The shaped macromolecules are prepared the reaction of one or more dendritic polymers and a linear polymer. The kite-shaped macromolecules are dendritic polymers attached at either their focal points or at an outer to a long carbon chain group. The barbell macromolecules have dendritic polymers at either end of the molecule, which polymers are connected together through the focal points of each by a suitable connecting substituent such as a linear polymer. The shaped macromolecules are used in specialty medical and technological applications including such as drug delivery agents, imaging materials, molecular devices, thin film devices, surface modifiers, transport agents, compatibilizers, rheology control agents, molecular ball bearings, molecular dipoles, non-linear optical materials, medical imaging agents, membrane and cell modifiers, complexing agents, adhesives, interface strengthening agents, and the like.
摘要翻译：公开了三维风筝，杠铃和其他形状的大分子。形成的大分子是制备一种或多种树枝状聚合物和线性聚合物的反应。风筝形大分子是在其焦点附近或在长碳链基团外部连接的树枝状聚合物。杠铃大分子在分子的任一端具有树枝状聚合物，该聚合物通过各自的焦点通过适当的连接取代基如线性聚合物连接在一起。成型的大分子用于特殊医疗和技术应用，包括药物递送剂，成像材料，分子装置，薄膜装置，表面改性剂，输送剂，增容剂，流变控制剂，分子球轴承，分子偶极子，非线性光学材料，医学成像剂，膜和细胞改性剂，络合剂，粘合剂，界面强化剂等。

8. 发明授权

US5670581A Metalation and functionalization of polymers and copolymers 失效
标题翻译：聚合物和共聚物的金属化和官能化
公开(公告)号：US5670581A
公开(公告)日：1997-09-23
申请号：US476753
申请日：1995-06-07
申请人： Jean M. J. Frechet , Shah A. Haque , Joachim Hans Georg Steinke , Hsien-Chang Wang
发明人： Jean M. J. Frechet , Shah A. Haque , Joachim Hans Georg Steinke , Hsien-Chang Wang
IPC分类号： C08F8/00 , C08F8/42
CPC分类号： C08F8/42 , C08F8/00 , C08F2800/10 , C08F2810/30 , C08F2810/50
摘要： There is provided a method of introducing functionality into a copolymer of an isoolefin and an alkylstyrene at the alkylbenzyl carbon atom comprising the steps of: forming a solution of said copolymer in a hydrocarbon solvent; adding to said polymer solution an alkali metal Cs, K, Na alkoxide and an alkyl lithium compound to form a superbase with the polymer solution; and adding an electrophile to said base polymer solution also provided are the metalated copolymers and the functionalized derivative therefrom.
摘要翻译：提供了在烷基苄基碳原子上将官能度引入异烯烃和烷基苯乙烯的共聚物的方法，包括以下步骤：在烃溶剂中形成所述共聚物的溶液; 向所述聚合物溶液中加入碱金属Cs，K，醇钠和烷基锂化合物以与所述聚合物溶液形成超基; 还向所述基础聚合物溶液中加入亲电试剂也是金属化共聚物和由其衍生的官能化衍生物。

9. 发明授权

US5635571A Polymerizable macromonomers and polymers prepared therefrom 失效
标题翻译：可聚合的大分子单体和由其制备的聚合物
公开(公告)号：US5635571A
公开(公告)日：1997-06-03
申请号：US660684
申请日：1996-06-05
申请人： Jean M. J. Frechet , Koji Yui
发明人： Jean M. J. Frechet , Koji Yui
IPC分类号： A61K47/48 , C08F290/06 , C08G73/02 , C08G73/04 , C08G83/00 , C08L79/04 , C08G73/06
CPC分类号： C08G83/005 , A61K47/48207 , C08F290/06 , C08G73/0233
摘要： Polyoxazolines having the structural formula: ##STR1## wherein R is phenylene or alkylene containing 2 to 18 carbon atoms, R.sup.2 is C.sub.1-4 alkyl and R.sub.1 is selected from the group consisting of C.sub.1-12 alkyl, vinyl, isopropylidene, pentafluoroethyl, phenyl, hydroxyphenyl which is optionally interrupted by up to 20 ethylene oxide groups, C.sub.1-2 -alkoxyphenyl which is optionally interrupted by up to 20 ethylene oxide groups and .paren open-st.CH.sub.2 CH.sub.2 --O.paren close-st..sub.r CH.sub.3 in which r ranges from 1-20, X is NH.sub.2 or OH, n ranges from 2 to 50 and m ranges from 0 to 50, wherein R.sub.1 is hydroxyphenyl optionally interrupted by up to 20 ethylene oxide groups only when X is NH.sub.2, are polymerizable to form hyperbranched polymers which have a number average molecular weight ranging from 5,000 to 150,000, a weight average molecular weight ranging from 5,500 to 5,000,000 and a polydispersity ranging from 1.1 to 300 and which are very polar and highly wettable and are useful as adhesives, biodegradable materials, biomaterials, carriers for chemicals, carriers for image contrast agents, coatings, components of blends, components of medical imaging formulations, crosslinkers, dispersants, drug carriers, imaging materials, resists for lighography, slow release agents, vectors for gene therapy, and viscosity modifiers.
摘要翻译：具有以下结构式的聚恶唑啉：其中R是亚苯基或含2至18个碳原子的亚烷基，R 2是C 1-4烷基，R 1选自C 1-12烷基，乙烯基，异亚丙基，五氟乙基，任选地被多达20个环氧乙烷基团间隔的苯基，羟基苯基，任选地被多达20个环氧乙烷基团间隔的C 1-2 - 烷氧基苯基和+545个CH 2 CH 2 -O + 546 rCH 3，其中r在1-20， X为NH 2或OH，n为2至50，m为0至50，其中R 1为仅在X为NH 2时任选地被至多20个环氧乙烷基团间隔的羟基苯基，可聚合形成数均分子量的超支化聚合物分子量为5,000至150,000，重均分子量为5,500至5,000,000，多分散性为1.1至300，非极性和高度可湿性，可用作粘合剂，可生物降解材料，生物材料，载体用于化学品，图像造影剂的载体，涂料，共混物组分，医学成像制剂的组分，交联剂，分散剂，药物载体，成像材料，用于光刻的抗蚀剂，缓释剂，用于基因治疗的载体和粘度调节剂。

10. 发明授权

US5593729A Pore-size selective modification of porous materials 失效
公开(公告)号：US5593729A
公开(公告)日：1997-01-14
申请号：US388721
申请日：1995-02-15
申请人： Jean M. J. Frechet , Frantisek Svec
发明人： Jean M. J. Frechet , Frantisek Svec
IPC分类号： B01D67/00 , B01J19/00 , B01J20/32 , B01J31/02 , B01J31/06 , B01J31/10 , B01J35/10 , C08J9/40 , C08J9/42 , G01N30/52 , B05D3/10
CPC分类号： B01D67/0093 , B01J19/0093 , B01J20/06 , B01J20/08 , B01J20/103 , B01J20/24 , B01J20/261 , B01J20/264 , B01J20/267 , B01J20/28057 , B01J20/28069 , B01J20/28078 , B01J20/28092 , B01J20/28097 , B01J20/285 , B01J20/286 , B01J20/3064 , B01J20/3204 , B01J20/321 , B01J20/3212 , B01J20/3257 , B01J20/3263 , B01J20/327 , B01J20/3285 , B01J31/0204 , B01J31/0274 , B01J31/0275 , B01J31/061 , B01J31/10 , B01J35/10 , C08J9/40 , C08J9/42 , B01J2219/00835 , B01J2219/00844 , B01J2220/4825 , B01J2220/54 , B01J35/1019 , B01J35/1042 , B01J35/1061 , B01J35/1066 , C08J2429/00 , C08J2433/00 , C08J2479/00 , G01N2030/525 , G01N2030/528
摘要： A method of pore-size selective chemical modification of materials having pores of about 1 to 1,500 nm is disclosed. The resulting novel porous materials are particularly useful as separation media in chromatography, for selective isolation, adsorption and catalysis.

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