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1. 发明申请

US20050034653A1 Polycrystalline tft uniformity through microstructure mis-alignment 有权
标题翻译：多晶Tft均匀性通过微结构不对准
公开(公告)号：US20050034653A1
公开(公告)日：2005-02-17
申请号：US10487170
申请日：2002-08-27
申请人： James Im , Paul Van Der Wilt
发明人： James Im , Paul Van Der Wilt
IPC分类号： H01L21/20 , C30B13/00 , C30B13/24 , C30B29/06 , H01L21/336 , H01L29/786 , C30B23/00 , C30B25/00 , C30B28/12 , C30B28/14
CPC分类号： C30B29/06 , C30B13/24
摘要： Methods of making a polycrystalline silicon thin-film transistor having a uniform microstructure. One exemplary method requires receiving a polycrystalline silicon thin film having a grain structure which is periodic in at least a first direction, and placing at least portions (410, 420) of one or more thin-film transistors on the received film such that they are tilted relative to the periodic structure of the thin film.
摘要翻译：制造具有均匀微观结构的多晶硅薄膜晶体管的方法。一种示例性方法需要接收具有在至少第一方向上周期性的晶粒结构的多晶硅薄膜，并且在接收的薄膜上放置一个或多个薄膜晶体管的至少一部分（410,420），使得它们是相对于薄膜的周期性结构倾斜。

2. 发明申请

US20060254500A1 Line scan sequential lateral solidification of thin films 有权
标题翻译：线扫描顺序横向固化薄膜
公开(公告)号：US20060254500A1
公开(公告)日：2006-11-16
申请号：US11293655
申请日：2005-12-02
申请人： James Im , Paul Van Der Wilt
发明人： James Im , Paul Van Der Wilt
IPC分类号： C30B21/04 , C30B13/00 , C30B28/08
CPC分类号： H01L21/02686 , B23K26/0738 , C30B13/00 , C30B13/24 , C30B29/06 , H01L21/02532 , H01L21/02678 , H01L21/2026 , H01L27/1285 , H01L27/1296 , Y10T117/10 , Y10T117/1004 , Y10T117/1008
摘要： A polycrystalline film is prepared by (a) providing a substrate having a thin film disposed thereon, said film capable of laser-induced melting, (b) generating a sequence of laser pulses having a fluence that is sufficient to melt the film throughout its thickness in an irradiated region, each pulse forming a line beam having a predetermined length and width, said width sufficient to prevent nucleation of solids in a portion of the thin film that is irradiated by the laser pulse, (c) irradiating a first region of the film with a first laser pulse to form a first molten zone, said first molten zone demonstrating a variation in width along its length to thereby define a maximum width (Wmax) and a minimum width (Wmin), wherein the first molten zone crystallizes upon cooling to form one or more laterally grown crystals, (d) laterally moving the film in the direction of lateral growth a distance that is greater than about one-half Wmax and less than Wmin; and (e) irradiating a second region of the film with a second laser pulse to form a second molten zone having a shape that is substantially the same as the shape of the first molten zone, wherein the second molten zone crystallizes upon cooling to form one or more laterally grown crystals that are elongations of the one or more crystals in the first region.
摘要翻译：通过（a）提供具有设置在其上的薄膜的基板，所述膜能够进行激光诱导熔化，（b）产生具有足以使膜在整个厚度上熔化的能量密度的激光脉冲序列来制备多晶膜在照射区域中，每个脉冲形成具有预定长度和宽度的线束，所述宽度足以防止由激光脉冲照射的薄膜部分中的固体成核，（c）照射第一区域薄膜具有第一激光脉冲以形成第一熔融区，所述第一熔融区表现出沿其长度的宽度变化，从而限定最大宽度（W max）和最小宽度（W _{max 且小于W mi n}

3. 发明授权

US08937770B2 Excimer laser apparatus projecting a beam with a selectively variable short-axis beam profile 有权
标题翻译：准分子激光装置用选择性可变的短轴光束轮廓投影光束
公开(公告)号：US08937770B2
公开(公告)日：2015-01-20
申请号：US13557073
申请日：2012-07-24
申请人： Frank Simon , Paul Van Der Wilt , Ludwig Schwenger
发明人： Frank Simon , Paul Van Der Wilt , Ludwig Schwenger
IPC分类号： G02B27/10 , G02B13/08 , G02B27/09 , B23K26/00 , H01L21/02
CPC分类号： G02B27/09 , B23K26/0006 , B23K26/0608 , B23K26/0648 , B23K26/0652 , B23K26/0676 , B23K26/0732 , B23K26/354 , B23K2101/40 , B23K2103/56 , G02B27/095 , H01L21/02532 , H01L21/02686
摘要： Apparatus for homogenizing and projecting two laser-beams is arranged such that the projected homogenized beams are aligned parallel to each other in a first transverse axis and partially overlap in second transverse axis perpendicular to the first transverse axis. The projected homogenized laser-beams have different intensities in the second axis and the degree of partial overlap is selected such that the combined intensity of the laser beams in the second axis has a step profile.
摘要翻译：用于使两个激光束均匀化并投影的装置被布置成使得投射均匀化的光束在第一横向轴线上彼此平行地对准并且在垂直于第一横向轴线的第二横轴中部分重叠。投影均匀化的激光束在第二轴上具有不同的强度，并且选择部分重叠的程度，使得第二轴中的激光束的组合强度具有台阶轮廓。

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