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    • 2. 发明申请
    • Method of making heterojunction P-I-N diode
    • 异质结P-I-N二极管的制造方法
    • US20050006729A1
    • 2005-01-13
    • US10915579
    • 2004-08-10
    • David HoagTimothy BolesJames Brogle
    • David HoagTimothy BolesJames Brogle
    • H01L29/861H01L29/868H01L31/075
    • H01L29/868
    • A heterojunction P—I—N diode switch comprises a first layer of doped semiconductor material of a first doping type, a second layer of doped semiconductor material of a second doping type and a substrate on which is disposed the first and second layers. An intrinsic layer of semiconductor material is disposed between the first layer and second layer. The semiconductor material composition of at least one of the first layer and second layer is sufficiently different from that of the intrinsic layer so as to form a heterojunction therebetween, creating an energy barrier in which injected carriers from the junction are confined by the barrier, effectively reducing the series resistance within the I region of the P—I—N diode and the insertion loss relative to that of homojunction P—I—N diodes.
    • 异质结P-I-N二极管开关包括第一掺杂类型的第一掺杂半导体材料层,第二掺杂类型的掺杂半导体材料的第二层和在其上设置第一和第二层的衬底。 半导体材料的本征层设置在第一层和第二层之间。 第一层和第二层中的至少一个的半导体材料组成与本征层的半导体材料组成充分不同,从而在它们之间形成异质结,产生能量势垒,其中来自接合处的注入的载流子被屏障限制 降低PIN二极管的I区域内的串联电阻和相对于同型结PIN二极管的插入损耗。