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    • 1. 发明授权
    • High-intensity solid-state solar-cell device
    • 高强度固态太阳能电池装置
    • US4352948A
    • 1982-10-05
    • US209942
    • 1980-11-17
    • Roy KaplowRobert I. FrankJoel Goodrich
    • Roy KaplowRobert I. FrankJoel Goodrich
    • H01L27/142H01L31/0352H01L31/06
    • H01L31/035281H01L31/047Y02E10/50
    • The invention contemplates a solar-cell construction wherein plural spaced elongate unit cells of an array are formed from a parallel-grooved single wafer or body of substrate material of a first conductivity type, with adjacent sidewalls of adjacent units at each inter-unit groove formation. Both sidewalls at each of a succession of grooves are formed with regions of second conductivity type, and an electrically conductive coating lines each sidewall having a second conductivity type region. A first output-terminal interconnect extends along one margin of the body and has ohmic contact with the coatings of the sidewalls having regions of the second conductivity type. A second output-terminal connection has ohmic contact to the body in a surface region of first conductivity type. Various embodiments are disclosed.
    • 本发明考虑了一种太阳能电池结构,其中阵列的多个间隔开的细长单元电池由平行沟槽的第一导电类型的衬底材料的单个晶片或主体形成,在每个单元间沟槽形成处具有相邻单元的相邻侧壁 。 在一连串的槽中的每一个的两个侧壁形成有第二导电类型的区域,并且每个侧壁的导电涂层线具有第二导电类型区域。 第一输出端子互连沿主体的一个边缘延伸,并且与具有第二导电类型区域的侧壁的涂层欧姆接触。 第二输出端子连接在第一导电类型的表面区域中与主体具有欧姆接触。 公开了各种实施例。
    • 3. 发明授权
    • Process to preserve silver metal while forming integrated circuits
    • 在形成集成电路的同时保存银金属的工艺
    • US5672282A
    • 1997-09-30
    • US591063
    • 1996-01-25
    • Percy ChinoyJoel Goodrich
    • Percy ChinoyJoel Goodrich
    • H01L21/285H01L21/3213B44C1/22C23F1/00
    • H01L21/3213H01L21/28512
    • A process to form integrated circuits comprising silver metal circuits. Deposition techniques such as sputtering, not plating, upon substrates to form such silver metal circuits are common. However in the conventional processes to remove the resist and the metal overlaying the resist, these conventional processes are deleterious to the silver metal. Thereby a new process is provided. This new process entails the metal overlaying the resist of the wafer is initially removed by a high pressure force. The resist, in this new process, is then removed by a benign stripper solution having the temperature of the solution raised to the highest temperature without degrading the stripper solution and said circuit is exposed to said stripper solution for one to five minutes.
    • 一种形成包括银金属电路的集成电路的工艺。 沉积技术,例如溅射,而不是镀覆在基板上以形成这种银金属电路是常见的。 然而,在除去抗蚀剂和覆盖抗蚀剂的金属的常规方法中,这些常规方法对银金属是有害的。 从而提供了新的过程。 这种新工艺需要金属覆盖,晶片的抗蚀剂最初被高压力除去。 然后,在该新工艺中的抗蚀剂通过将溶液的温度升至最高温度的良性汽提器溶液除去,而不会使汽提溶液溶解而使所述电路暴露于所述汽提溶液中1至5分钟。